Patents by Inventor Yuichi Shibazaki

Yuichi Shibazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220121125
    Abstract: In corner sections of first to fourth quadrants whose origin point is a center of an upper surface of a stage, three each of two-dimensional heads are provided. The three each of two-dimensional heads include one first head and two second heads. The stage is driven, while measuring a position of the stage using three first heads that face a two-dimensional grating of a scale plate provided above the stage from the four first heads, and during the driving, difference data of measurement values of the two second heads with respect to the first head in a measurement direction are taken in for head groups to which the three first heads belong, respectively, and using the difference data, grid errors are calibrated.
    Type: Application
    Filed: December 28, 2021
    Publication date: April 21, 2022
    Applicant: NIKON CORPORATION
    Inventor: Yuichi SHIBAZAKI
  • Patent number: 11274919
    Abstract: A measurement system to be used in a micro-device manufacturing line is equipped with: a plurality of measurement devices which performs measurement processing on each substrate; and a controller that can control the plurality of measurement devices, and the plurality of measurement devices includes at least one first measurement device which acquires position information of a plurality of marks formed on a substrate.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: March 15, 2022
    Assignee: NIKON CORPORATION
    Inventors: Go Ichinose, Yuichi Shibazaki
  • Patent number: 11276558
    Abstract: A beam irradiation device that irradiates a plurality of electron beams includes a multibeam optical system that emits the plurality of beams to be irradiated on a target; and a controller that controls an irradiation state of each of the plurality of beams in accordance with change in a relative position between the target and the multibeam optical system, and based on the irradiation state of a first beam of the plurality of beams, controls the irradiation state of a second beam of the plurality of beams.
    Type: Grant
    Filed: April 24, 2020
    Date of Patent: March 15, 2022
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 11256175
    Abstract: In corner sections of first to fourth quadrants whose origin point is a center of an upper surface of a stage, three each of two-dimensional heads are provided. The three each of two-dimensional heads include one first head and two second heads. The stage is driven, while measuring a position of the stage using three first heads that face a two-dimensional grating of a scale plate provided above the stage from the four first heads, and during the driving, difference data of measurement values of the two second heads with respect to the first head in a measurement direction are taken in for head groups to which the three first heads belong, respectively, and using the difference data, grid errors are calibrated.
    Type: Grant
    Filed: October 28, 2020
    Date of Patent: February 22, 2022
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Publication number: 20210370444
    Abstract: A processing apparatus has: a light irradiation apparatus configured to irradiate a coat formed on a base member with a processing light; and a controlling apparatus configured to control the light irradiation apparatus. The processing apparatus is configured to change a thickness of at least a part of the coat by irradiating the coat with the processing light so that the base member is not exposed from the coat.
    Type: Application
    Filed: October 25, 2017
    Publication date: December 2, 2021
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Shigeki EGAMI, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Patent number: 11181832
    Abstract: A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.
    Type: Grant
    Filed: September 3, 2020
    Date of Patent: November 23, 2021
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Publication number: 20210354243
    Abstract: A shaping apparatus is equipped with: a beam shaping system having a beam irradiation section that includes a condensing optical system which emits a beam and a material processing section which supplies a shaping material irradiated by the beam from the beam irradiation section; and a controller which, on the basis of 3D data of a three-dimensional shaped object to be formed on a target surface, controls a workpiece movement system and the beam shaping system such that a target portion on the target surface is shaped by supplying the shaping material from the material processing section while moving the beam from the beam irradiation section and the target surface on a workpiece (or a table) relative to each other. Further the intensity distribution of the beam in the shaping plane facing the emitting surface of the condensing optical system can be modified.
    Type: Application
    Filed: July 27, 2021
    Publication date: November 18, 2021
    Applicant: NIKON CORPORATION
    Inventor: Yuichi SHIBAZAKI
  • Publication number: 20210346988
    Abstract: This shaping apparatus is equipped with: a movement system which moves a target surface; a measurement system for acquiring position information of the target surface in a state movable by the movement system, a beam shaping system that has a beam irradiation section and a material processing section which supplies a shaping material irradiated by a beam from beam irradiation section; and a controller. On the basis of 3D data of a three-dimensional shaped object to be formed on a target surface and position information of the target surface acquired using the measurement system, the controller controls the movement system and the beam shaping system such that a target portion on the target surface is shaped by supplying the shaping material while moving the target surface and the beam from beam irradiation section relative to each other.
    Type: Application
    Filed: July 23, 2021
    Publication date: November 11, 2021
    Applicant: NIKON CORPORATION
    Inventor: Yuichi SHIBAZAKI
  • Patent number: 11161202
    Abstract: A shaping apparatus is equipped with: a beam shaping system having a beam irradiation section that includes a condensing optical system which emits a beam and a material processing section which supplies a shaping material irradiated by the beam from the beam irradiation section; and a controller which, on the basis of 3D data of a three-dimensional shaped object to be formed on a target surface, controls a workpiece movement system and the beam shaping system such that a target portion on the target surface is shaped by supplying the shaping material from the material processing section while moving the beam from the beam irradiation section and the target surface on a workpiece (or a table) relative to each other. Further the intensity distribution of the beam in the shaping plane facing the emitting surface of the condensing optical system can be modified.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: November 2, 2021
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Publication number: 20210313278
    Abstract: A determination apparatus has a calculation section, where first and second direction pitches intersecting within a predetermined plane of a plurality of detection areas are D1 and D2, respectively, sizes in the first and second directions of each of a plurality of divided areas arranged two-dimensionally along the first and second directions on a substrate are W1 and W2, respectively, and first and second direction pitches of a plurality of marks arranged on the substrate are p1 and p2, respectively, calculates pitch p1 and pitch p2 of the plurality of marks that satisfy formulas (a) and (b) below, based on pitch D1, pitch D2, size W1, and size W2.
    Type: Application
    Filed: June 22, 2021
    Publication date: October 7, 2021
    Applicant: NIKON CORPORATION
    Inventor: Yuichi SHIBAZAKI
  • Patent number: 11067894
    Abstract: Correction information is acquired for compensating for a measurement error of a second encoder system that occurs due to a displacement between four sections of a scale member of the second encoder system, based on measurement information of the second encoder system obtained in a fifth area in which four heads of the second encoder system that are provided on a second stage, which holds a substrate, respectively face the four sections of the scale member.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: July 20, 2021
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Publication number: 20210205920
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a plurality of processing lights; and a first change apparatus that changes a relative positional relationship between light concentration positions of the plurality of processing lights in a direction that intersects with the surface of the object, the processing apparatus changes a thickness of a part of the object by irradiating the surface of the object with the plurality of processing lights.
    Type: Application
    Filed: October 25, 2017
    Publication date: July 8, 2021
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Yoshio KAWABE, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Publication number: 20210041789
    Abstract: In corner sections of first to fourth quadrants whose origin point is a center of an upper surface of a stage, three each of two-dimensional heads are provided. The three each of two-dimensional heads include one first head and two second heads. The stage is driven, while measuring a position of the stage using three first heads that face a two-dimensional grating of a scale plate provided above the stage from the four first heads, and during the driving, difference data of measurement values of the two second heads with respect to the first head in a measurement direction are taken in for head groups to which the three first heads belong, respectively, and using the difference data, grid errors are calibrated.
    Type: Application
    Filed: October 28, 2020
    Publication date: February 11, 2021
    Applicant: NIKON CORPORATION
    Inventor: Yuichi SHIBAZAKI
  • Publication number: 20200401056
    Abstract: A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.
    Type: Application
    Filed: September 3, 2020
    Publication date: December 24, 2020
    Applicant: NIKON CORPORATION
    Inventor: Yuichi SHIBAZAKI
  • Publication number: 20200391325
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; a first position change apparatus that changes a position of at least one of the object and an irradiation area that is formed on the surface of the object by the light irradiation apparatus; and a control apparatus that controls the first position change apparatus to form a structure for reducing a frictional resistance of the surface of the object to a fluid by irradiating the surface of the object with the processing light while changing the position of at least one of the irradiation area and the object to change a thickness of a part of the object.
    Type: Application
    Filed: October 25, 2017
    Publication date: December 17, 2020
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Shigeki EGAMI, Yoshio KAWABE, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Patent number: 10852639
    Abstract: In corner sections of first to fourth quadrants whose origin point is a center of an upper surface of a stage, three each of two-dimensional heads are provided. The three each of two-dimensional heads include one first head and two second heads. The stage is driven, while measuring a position of the stage using three first heads that face a two-dimensional grating of a scale plate provided above the stage from the four first heads, and during the driving, difference data of measurement values of the two second heads with respect to the first head in a measurement direction are taken in for head groups to which the three first heads belong, respectively, and using the difference data, grid errors are calibrated.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: December 1, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Publication number: 20200363738
    Abstract: A lithography system is provided with: a measurement device measuring position information of marks on a substrate held in a first stage; and an exposure apparatus on a second stage, the substrate for which the position information measurement for the marks has been completed, performs alignment measurement to measure position information for part of marks selected from among the marks on the substrate, and performs exposure. The measurement device measures position information of marks on the substrate to obtain higher-degree components of correction amounts of an arrangement of divided areas, and the exposure apparatus measures position information of a small number of marks on the substrate to obtain lower-degree components of the correction amounts of the arrangement of the divided areas and exposes the plurality of divided areas while controlling the position of the substrate by using the obtained lower-degree components and the higher-degree components obtained by the measurement device.
    Type: Application
    Filed: August 3, 2020
    Publication date: November 19, 2020
    Applicant: NIKON CORPORATION
    Inventor: Yuichi SHIBAZAKI
  • Publication number: 20200361036
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a plurality of processing lights; and a first change apparatus that changes an intensity distribution of the plurality of processing lights from the light irradiation apparatus on the surface of the object, the processing apparatus changes a thickness of a part of the object by irradiating the surface of the object with the plurality of processing lights.
    Type: Application
    Filed: October 25, 2017
    Publication date: November 19, 2020
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Yoshio KAWABE, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Publication number: 20200353560
    Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; and a measurement apparatus that measures a position of an irradiation area, which is formed on the surface of the object by the light irradiation apparatus, relative to the object.
    Type: Application
    Filed: October 25, 2017
    Publication date: November 12, 2020
    Applicant: NIKON CORPORATION
    Inventors: Masayuki SHIRAISHI, Shigeki EGAMI, Yoshio KAWABE, Yosuke TATSUZAKI, Yuichi SHIBAZAKI
  • Patent number: 10788760
    Abstract: A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: September 29, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki