Patents by Inventor Yuichiro Nakamura

Yuichiro Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120088853
    Abstract: Disclosed is a molding material for extrusion foam molding from which woody molded foam of high quality can be obtained. From the molding material, woody molded foam of high quality with no defects is efficiently produced. Constituent materials comprising woodmeal and a thermoplastic resin as major components and containing 1-5 wt % alkane having a molecular weight of 300-1,000 g/mol are melt-kneaded until the components come into an evenly dispersed state, and the resultant mixture is molded into pellets having a given diameter to obtain a molding material. Subsequently, this molding material is extrusion-molded into a given shape together with a blowing agent by means of an extrusion molding device, thereby obtaining woody molded foam.
    Type: Application
    Filed: May 13, 2010
    Publication date: April 12, 2012
    Inventors: Takeyasu Kikuchi, Kazumasa Morita, Koji Higashi, Yuichiro Nakamura
  • Publication number: 20120039211
    Abstract: A radio controller 03 of the present invention includes a threshold value holding unit 11 configured to associate a traffic channel configuration with at least one threshold value and hold these associated traffic channel configuration and threshold value, a threshold value extraction unit 13 configured to extract at least one threshold value associated with a traffic channel configuration of a mobile station and a threshold value determination unit 14 configured to determine whether or not to change the traffic channel configuration of the mobile station by comparing the extracted threshold value with a communication state at a predetermined timing.
    Type: Application
    Filed: January 29, 2010
    Publication date: February 16, 2012
    Applicant: NTT DOCOMO, Inc.
    Inventors: Yuichiro Nakamura, Yasuhiro Kawabe, Masafumi Masuda
  • Publication number: 20110284373
    Abstract: Provided is an inorganic-particle-dispersed sputtering target in which inorganic particles are dispersed in a Co base material, wherein the inorganic particles have an electric resistivity of 1×101 ?·m or less and the volume ratio of the inorganic particles in the target is 50% or less. The sputtering target thus adjusted is advantageous in that, when sputtering is performed using a magnetron sputtering device comprising a DC power source, the inorganic particles are less charged, and arcing occurs less frequently. Accordingly, by using the sputtering target of the present invention, the occurrence of particles attributable to the arcing reduces, and a significant effect of improving the yield in forming a thin film is obtained.
    Type: Application
    Filed: July 27, 2010
    Publication date: November 24, 2011
    Applicant: JX NIPPON MINING & METALS CORPORATION
    Inventors: Atsushi Sato, Yuichiro Nakamura
  • Publication number: 20110162971
    Abstract: A sputtering target with low generation of particles in which oxides, carbides, nitrides, borides, intermetallic compounds, carbonitrides, and other substances without ductility exist in a matrix phase made of a highly ductile substance at a volume ratio of 1 to 50%, wherein a highly ductile and conductive metal coating layer is formed on an outermost surface of the target.
    Type: Application
    Filed: February 24, 2010
    Publication date: July 7, 2011
    Applicant: JX NIPPON MINING & METALS CORPORATION
    Inventors: Yuichiro Nakamura, Akira Hisano, Junnosuke Sekiguchi
  • Publication number: 20110132757
    Abstract: A sputtering target and surface processing method is provided. Intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in the target surface in a highly ductile matrix phase at a volume ratio of 1 to 50%. The target surface is preliminarily subjected to primary processing of cutting work, and then subsequently subjected to finish processing via polishing. The sputtering target subject to this surface processing has an improved target surface with numerous substances without ductility and prevents or suppresses the generation of nodules and particles upon sputtering.
    Type: Application
    Filed: February 11, 2011
    Publication date: June 9, 2011
    Applicant: JX NIPPON MINING & METALS CORPORATION
    Inventors: Yuichiro Nakamura, Akira Hisano
  • Patent number: 7927434
    Abstract: Provided is a Co—Cr—Pt—B alloy sputtering target comprising an island-shaped rolled structure formed from a Co-rich phase based on the primary crystal formed upon casting, and a Co—Cr—Pt—B alloy sputtering target in which the island-shaped rolled structure has an average size of 200 ?m or less. This Co—Cr—Pt—B alloy sputtering target has an uniform and fine rolled structure with minimal segregation and residual stress upon casting, and the present invention aims to enable the stable and inexpensive manufacture of the target, prevent or suppress the generation of particles, and to improve the production yield of deposition.
    Type: Grant
    Filed: February 15, 2005
    Date of Patent: April 19, 2011
    Assignee: JX Nippon Mining & Metals Corporation
    Inventors: Yuichiro Nakamura, Akira Hisano
  • Patent number: 7909949
    Abstract: Provided is a surface processing method of a sputtering target, wherein a target surface in which intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in a highly ductile matrix phase at a volume ratio of 1 to 50% is preliminarily subject to the primary processing of cutting work, then subsequently subject to finish processing via polishing. The sputtering target subject to this surface processing method is able to improve the target surface having numerous substances without ductility, and prevent or suppress the generation of nodules and particles upon sputtering.
    Type: Grant
    Filed: February 15, 2005
    Date of Patent: March 22, 2011
    Assignee: JX Nippon Mining & Metals Corporation
    Inventors: Yuichiro Nakamura, Akira Hisano
  • Publication number: 20110059742
    Abstract: A mobile communication method according to the present invention includes a step A of offering a particular service through a second radio data link established between a mobile station and a cell in the second area in a state in which a first radio data link is not established between the mobile station and a cell in the first area and a step B of suspending the offer of the particular service through the second radio data link when the state in which the first radio data link is not established continues for a predetermined time period.
    Type: Application
    Filed: November 7, 2008
    Publication date: March 10, 2011
    Inventors: Yuichiro Nakamura, Masafumi Masuda, Takaaki Sato, Takanori Utano
  • Patent number: 7771375
    Abstract: A cushion comprises a resin body with a spring structure having permeability comprising a three-dimensional structure including voids at a predetermined bulk density, the three-dimensional structure being obtained by contacting, entwining, and gathering adjacent ones of random loops or curls of continuous filaments made from a thermoplastic resin in such a manner as to allow the resulting structure to have a layered structure in which layers composed of filaments having a high bulk density as superficial layers are formed on a front and a rear of the resin body in a lengthwise direction, and a layer composed of the filaments having a low bulk density as a core layer is interposed between the superficial layers; and a speaker incorporated in the resin body or disposed on one of the superficial layers of the resin body.
    Type: Grant
    Filed: September 27, 2004
    Date of Patent: August 10, 2010
    Assignee: EIN Co. Ltd. Technical Center
    Inventors: Sadao Nishibori, Iwao Kouno, Yuichiro Nakamura
  • Patent number: 7713364
    Abstract: A manganese alloy sputtering target characterized in that oxygen is 1000 ppm or less, sulfur is 200 ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained.
    Type: Grant
    Filed: March 19, 2007
    Date of Patent: May 11, 2010
    Assignee: Nippon Mining & Metals Co., Ltd.
    Inventor: Yuichiro Nakamura
  • Patent number: 7377762
    Abstract: The present invention relates to a resin-molded article with a spring structure, and to a method and apparatus for preparing a superficial layer of such a resin-molded article with a spring structure which has surfaces free from undulations, comprises fused filaments whose fusion is resistant to separation, maintains its cushioning activity and strength even after long use. A water flows from a cooling water outlet 53b into a space between a water-permeating sheet 55 and an inclined plate 51a. Some part of the flowing water C penetrates the water-permeating sheet 55 to appear on its top surface to form there an overlying current M on which receives lengthwise arranged peripheral continuous filaments, and agitates them to cause adjacent filaments to contact each other, to be entwined and gathered, thereby enabling the formation of a superficial layer of the three-dimensional structure 3.
    Type: Grant
    Filed: December 24, 2003
    Date of Patent: May 27, 2008
    Assignee: Ein Co., Ltd. Technical Center
    Inventors: Sadao Nishibori, Iwao Kouno, Yuichiro Nakamura
  • Publication number: 20070187236
    Abstract: Provided is a Co—Cr—Pt—B alloy sputtering target comprising an island-shaped rolled structure formed from a Co-rich phase based on the primary crystal formed upon casting, and a Co—Cr—Pt—B alloy sputtering target in which the island-shaped rolled structure has an average size of 200 ?m or less. This Co—Cr—Pt—B alloy sputtering target has an uniform and fine rolled structure with minimal segregation and residual stress upon casting, and the present invention aims to enable the stable and inexpensive manufacture of the target, prevent or suppress the generation of particles, and to improve the production yield of deposition.
    Type: Application
    Filed: February 15, 2005
    Publication date: August 16, 2007
    Applicant: NIPPON MINING & METALS CO., LTD.
    Inventors: Yuichiro Nakamura, Akira Hisano
  • Publication number: 20070163878
    Abstract: A manganese alloy sputtering target characterized in that oxygen is 1000 ppm or less, sulfur is 200 ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained.
    Type: Application
    Filed: March 19, 2007
    Publication date: July 19, 2007
    Applicant: NIPPON MINING & METALS CO., LTD.
    Inventor: Yuichiro Nakamura
  • Patent number: 7229510
    Abstract: A manganese alloy sputtering target characterized in that oxygen is 1000 ppm or less, sulfur is 200 ppm or less and a forged texture is provided, and a method for producing a forged manganese alloy target stably by eliminating the drawbacks of manganese alloy that it is susceptible to cracking and has a low rupture strength. A manganese alloy sputtering target which can form a thin film exhibiting high characteristics and high corrosion resistance while suppressing generation of nodules or particles is thereby obtained.
    Type: Grant
    Filed: February 18, 2002
    Date of Patent: June 12, 2007
    Assignee: Nippon Mining & Metals, Co., Ltd.
    Inventor: Yuichiro Nakamura
  • Publication number: 20070125645
    Abstract: Provided is a surface processing method of a sputtering target, wherein a target surface in which intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in a highly ductile matrix phase at a volume ratio of 1 to 50% is preliminarily subject to the primary processing of cutting work, then subsequently subject to finish processing via polishing. The sputtering target subject to this surface processing method is able to improve the target surface having numerous substances without ductility, and prevent or suppress the generation of nodules and particles upon sputtering.
    Type: Application
    Filed: February 15, 2005
    Publication date: June 7, 2007
    Applicant: NIPPON MINING & METALS CO., LTD.
    Inventors: Yuichiro Nakamura, Akira Hisano
  • Publication number: 20070086612
    Abstract: To obtain a to obtain a cushion function and suitable sound effects and a sound pressure effect by containing a speaker without giving sense of incongruity and avoiding impact from an outside to the speaker at the same time.
    Type: Application
    Filed: September 27, 2004
    Publication date: April 19, 2007
    Inventors: Sadao Nishibori, Iwao Kouno, Yuichiro Nakamura
  • Publication number: 20070001336
    Abstract: There is provided a method for producing a cushion material composed of a resin molded article with a spring structure which is so moldable as to allow the mold take any shape and size, is cheap, and resistant to collapsing, does not cause fatigue even after prolonged use, and has high shock absorbing capability and load capacity, and thus suitably used as a material of any supports on which one can sit, rest or mount such as seats of automotive vehicles, motor cycles, bicycles, electric trains, and aircraft, saddles for horse riding, chairs, sofas and beds, and a method for producing a cushion material requiring only a low cost for its disposal.
    Type: Application
    Filed: August 26, 2003
    Publication date: January 4, 2007
    Inventors: Sadao Nishibori, Tatsumi Kobayashi, Maki Shirai, Yuichiro Nakamura
  • Patent number: 7087161
    Abstract: A resin cultivating base serves as seedling beds for vegetation which are planted and are partially immersed in a river, lake, marsh, pond or waterway. The resin cultivating base is a three-dimensional structure constituted by long and short filaments of thermoplastic resin. The long and short filaments are curled or looped at random, and contacted, entwined and gathered, thereby forming a low density portion and a high density portion. Vegetables planted on the low density portion of the resin cultivating base suck nutritious salt such as phosphor and nitride. Microorganisms living in the resin cultivating base decompose organisms in the water, thereby purifying the water.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: August 8, 2006
    Inventors: Sadao Nishibori, Takeyasu Kikuchi, Maki Shirai, Yuichiro Nakamura, Emi Sasaki
  • Publication number: 20060116045
    Abstract: The present invention relates to a resin-molded article with a spring structure, and to a method and apparatus for preparing a superficial layer of such a resin-molded article with a spring structure which has surfaces free from undulations, comprises fused filaments whose fusion is resistant to separation, maintains its cushioning activity and strength even after long use. A water flows from a cooling water outlet 53b into a space between a water-permeating sheet 55 and an inclined plate 51a. Some part of the flowing water C penetrates the water-permeating sheet 55 to appear on its top surface to form there an overlying current M on which receives lengthwise arranged peripheral continuous filaments, and agitates them to cause adjacent filaments to contact each other, to be entwined and gathered, thereby enabling the formation of a superficial layer of the three-dimensional structure 3.
    Type: Application
    Filed: December 24, 2003
    Publication date: June 1, 2006
    Inventors: Sadao Nishibori, Iwao Kouno, Yuichiro Nakamura
  • Patent number: 7051355
    Abstract: In a step S1, when the user executes a tuning operation (a service-number input operation) on an input section, the information is output to a control section. In a step S3, the control section determines whether the service number selected in the step S1 corresponds to a promotion channel. When it is determined that the service number corresponds to a promotion channel, the procedure proceeds to a step S11. In the step S11, the control section displays on the monitor a message indicating that the selected service number is not found.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: May 23, 2006
    Assignee: Sony Corporation
    Inventors: Kenji Inose, Katsumi Oishi, Hirofumi Yuchi, Haruhiko Yata, Keiichi Kurokawa, Yuichiro Nakamura