Patents by Inventor Yuichiro Nakamura
Yuichiro Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180164587Abstract: Embodiments provide a suitable viewing environment, in accordance with whether a head-mounted display is mounted or detached. A control device includes a state identification unit configured to identify whether a head-mounted display is mounted or detached, and an output control unit configured to control, in accordance with the mounting or the detachment, at least one of sound output and video output from a display device provided separately from the head-mounted display.Type: ApplicationFiled: June 3, 2016Publication date: June 14, 2018Applicant: Sony Interactive Entertainment Inc.Inventor: Yuichiro Nakamura
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Patent number: 9988709Abstract: A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher excluding C, a density of 3.57 g/cm3 or higher, and a whiteness of 60% or less. In order to uniformly deposit a magnesium oxide film, a magnesium oxide target having a higher purity and a higher density is being demanded. An object of this invention is to provide a target capable of realizing the above, and a method for producing such a target. While a magnesium oxide sintered compact sputtering target is produced by hot-pressing a raw material powder, there is a problem in that color shading occurs in roughly ?60 (within a circle having a diameter of 60 mm) at the center part of the target. Conventionally, no particularly attention was given to this problem. However, in recent years, it has become necessary to investigate and resolve this problem in order to improve the deposition quality.Type: GrantFiled: December 25, 2012Date of Patent: June 5, 2018Assignee: JX Nippon Mining & Metals CorporationInventors: Akira Hisano, Yuichiro Nakamura
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Patent number: 9970099Abstract: A sputtering target for a magnetic recording medium, wherein an average grain area of a B-rich phase is 90 ?m2 or less. A process for producing a sputtering target for a magnetic recording medium, wherein an alloy cast ingot is subject to heat treatment, thereafter subject to primary rolling which includes at least one pass of cold rolling, thereafter subject to secondary rolling, and machined to prepare a target. The obtained sputtering target for a magnetic recording medium has few cracks in the B-rich phase and has a high leakage flux density, and by using this target, it is possible to stabilize the discharge during sputtering, suppress arcing which occurs from cracks in the B-rich phase, and suppress the generation of particles.Type: GrantFiled: March 1, 2013Date of Patent: May 15, 2018Assignee: JX Nippon Mining & Metals CorporationInventors: Shin-Ichi Ogino, Yuichiro Nakamura
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Publication number: 20180076685Abstract: This invention is concerning a linear motor, in which a movable body includes an electricity storage device, a circuit section constituted by an inverter and a control circuit and converting and outputting power supplied from the electricity storage device, and a plurality of armatures, the magnetic fields of which vary in accordance with the power output from the circuit section, and which are arranged so as to be separated from a stator core via a gap. Further, when only the mounted body, the electricity storage device, the circuit section, and the armatures are viewed, the electricity storage device is arranged adjacent to the mounted body.Type: ApplicationFiled: March 16, 2016Publication date: March 15, 2018Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Yuichiro NAKAMURA, Shinichi YAMAGUCHI
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Publication number: 20180005807Abstract: Provided is an oxide-containing magnetic material sputtering target wherein the oxides have an average grain diameter of 400 nm or less. Also provided is a method of producing an oxide-containing magnetic material sputtering target. The method involves depositing a magnetic material on a substrate by the PVD or CVD method, then removing the substrate from the deposited magnetic material, pulverizing the material to obtain a raw material for the target, and further sintering the raw material. An object is to provide a magnetic material target, in particular, a nonmagnetic grain-dispersed ferromagnetic sputtering target capable of suppressing discharge abnormalities of oxides that are the cause of particle generation during sputtering.Type: ApplicationFiled: September 13, 2017Publication date: January 4, 2018Inventors: Shin-ichi Ogino, Yuichiro Nakamura
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Publication number: 20170365424Abstract: A power-circuit breaking device includes a receptacle and a plug. The receptacle includes a power terminal and a signal terminal. The plug includes a main terminal and a sub-terminal. The plug includes a plug housing, a lever which is attached to the plug housing, a lock slider which is attached to the plug housing, and a sub-connector which is supported by the lock slider. The plug housing holds the main terminal. The sub-connector holds the sub-terminal. When the lock slider slides, the sub-connector moves. When the lever is located at a closed position, the main terminal is connected to the power terminal. When the lock slider is located at a connected position, the sub-terminal is connected to the signal terminal.Type: ApplicationFiled: June 15, 2017Publication date: December 21, 2017Applicant: JAPAN AVIATION ELECTRONICS INDUSTRY, LIMITEDInventors: Yuya TABATA, Yuichiro NAKAMURA
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Patent number: 9793099Abstract: Provided is an oxide-containing magnetic material sputtering target wherein the oxides have an average grain diameter of 400 nm or less. Also provided is a method of producing an oxide-containing magnetic material sputtering target. The method involves depositing a magnetic material on a substrate by the PVD or CVD method, then removing the substrate from the deposited magnetic material, pulverizing the material to obtain a raw material for the target, and further sintering the raw material. An object of the present invention is to provide a magnetic material target, in particular a nonmagnetic grain-dispersed ferromagnetic sputtering target capable of suppressing discharge abnormalities of oxides that are the cause of particle generation during sputtering.Type: GrantFiled: February 26, 2013Date of Patent: October 17, 2017Assignee: JX Nippon Mining & Metals CorporationInventors: Shin-ichi Ogino, Yuichiro Nakamura
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Patent number: 9761422Abstract: A magnetic material sputtering target characterized in that, in a plane for observing the oxide in the target, oxide grains in the target have an average diameter of 1.5 ?m or less, and that 60% or more of the oxide grains in the observing plane of the target have a difference between a maximum diameter and a minimum diameter of 0.4 ?m or less, where the maximum diameter is a maximum distance between arbitrary two points on the periphery of an oxide grain, and the minimum diameter is a minimum distance between two parallel lines across the oxide grain. A non-magnetic grain dispersion-type magnetic material sputtering target that can inhibit abnormal discharge due to an oxide causing occurrence of particles during sputtering is obtained.Type: GrantFiled: February 15, 2013Date of Patent: September 12, 2017Assignee: JX Nippon Mining & Metals CorporationInventors: Atsutoshi Arakawa, Hideo Takami, Yuichiro Nakamura
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Patent number: 9732414Abstract: A sputtering target containing, as metal components, 0.5 to 45 mol % of Cr and remainder being Co, and containing, as non-metal components, two or more types of oxides including Ti oxide, wherein a structure of the sputtering target is configured from regions where oxides including at least Ti oxide are dispersed in Co (non-Cr-based regions), and a region where oxides other than Ti oxide are dispersed in Cr or Co—Cr (Cr-based region), and the non-Cr-based regions are scattered in the Cr-based region. An object of this invention is to provide a sputtering target for forming a granular film which suppresses the formation of coarse complex oxide grains and generates fewer particles during sputtering.Type: GrantFiled: December 12, 2012Date of Patent: August 15, 2017Assignee: JX Nippon Mining and Metals CorporationInventors: Atsushi Sato, Yuki Ikeda, Atsutoshi Arakawa, Hideo Takami, Yuichiro Nakamura
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Patent number: 9683284Abstract: A sputtering target for a magnetic recording film which contains carbon, the sputtering target is characterized in that the ratio (IG/ID) of peak intensities of the G-band to the D-band in Raman scattering spectrometry is 5.0 or less. The sputtering target for a magnetic recording film, which contains carbon powders dispersed therein, makes it possible to produce a magnetic thin film having a granular structure without using an expensive apparatus for co-sputtering; and in particular, the target is an Fe—Pt-based sputtering target. Carbon is a material which is difficult to sinter and has a problem that carbon particles are apt to form agglomerates. There is hence a problem that carbon masses are readily detached during sputtering to generate a large number of particles on the film after sputtering. The high-density sputtering target can solve these problems.Type: GrantFiled: March 23, 2012Date of Patent: June 20, 2017Assignee: JX Nippon Mining & Metals CorporationInventors: Shin-ichi Ogino, Yuichiro Nakamura
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Publication number: 20170051148Abstract: A synthetic wood meal for a pellet that enables to manufacture a molded product with no deformation such as warping and distortion or, if any, deformation that can be alleviated to a practically non-problematic level and also features high mechanical strength. The synthetic wood meal includes 30 wt % to 70 wt % of a thermoplastic resin including polypropylene or a mixed material of polypropylene and polyethylene or polyvinyl chloride; 70 wt % to 30 wt % of a wood meal having a bulk density of 0.14 to 0.22 g/cm3 and a mean fiber length of 80 to 250 ?m in which 30 wt % or less of the wood meal having a shortest fiber length of 60 ?m or less, and 25 wt % or less of the wood meal having a shortest fiber length of 30 ?m or less; and an additive including a reinforcing agent.Type: ApplicationFiled: October 21, 2016Publication date: February 23, 2017Inventors: Takeyasu Kikuchi, Kazumasa Morita, Yuichiro Nakamura, Koji Higashi
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Patent number: 9505932Abstract: A synthetic wood meal for a pellet that enables to manufacture a molded product with no deformation such as warping and distortion or, if any, deformation that can be alleviated to a practically non-problematic level and also features high mechanical strength. The synthetic wood meal comprises 30 wt % to less than 45 wt % of a thermoplastic resin including polypropylene or a mixed material of polypropylene and polyethylene; 50 wt % to 35 wt % of a wood meal having a bulk density of 0.15 to 0.21 g/ cm3 and a mean fiber length of 101 to 189 ?m in which 19 to 29% or less of the wood meal having a shortest fiber length of 60 ?m or less, and 9 to 20% or less of the wood meal having a shortest fiber length of 30 ?m or less; and an additive including a reinforcing agent.Type: GrantFiled: December 12, 2012Date of Patent: November 29, 2016Assignee: BEIJING SHENGSHENG CULTURE LIMITED LIABILITY COMPANYInventors: Takeyasu Kikuchi, Kazumasa Morita, Yuichiro Nakamura, Koji Higashi
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Publication number: 20160296993Abstract: A method for forming an end plate for a heat exchanger and a heat exchanger formed by this method are provided. The endplate is formed by preparing a concave die including a groove bottom surface and a pair of groove wall surfaces extending from both ends in the width direction of the groove bottom surface; preparing a convex die including a convex top surface facing the groove bottom surface of the concave die, convex wall surfaces facing the groove wall surfaces of the concave die, and protrusions provided along both sides in the width direction of the convex top surface; and inserting a plate member between the concave die and the convex die.Type: ApplicationFiled: October 1, 2014Publication date: October 13, 2016Inventor: Yuichiro NAKAMURA
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Publication number: 20160270084Abstract: Object is to perform appropriate communication control even if a size of “UE-EUTRA-Capability” is increased. A mobile communication method according to the present invention includes a mobile station (UE) notifying a radio base station (eNB) of “UE-EUTRA-Capability”, the radio base station (eNB) deleting, when a size of the “UE-EUTRA-Capability” exceeds a size that can be stored in the radio base station (eNB) or a mobility management node (MME), a predetermined capability from the “UE-EUTRA-Capability”, and the radio base station (eNB) notifying the mobility management node (MME) of a capability deleted from the “UE-EUTRA-Capability” or a remaining capability that is not deleted from the “UE-EUTRA-Capability”.Type: ApplicationFiled: October 22, 2014Publication date: September 15, 2016Applicant: NTT DOCOMO, INC.Inventors: Yusuke Sasaki, Kenji Fukazawa, Yasuhiro Kawabe, Hideyuki Matsutani, Yuichiro Nakamura, Wuri Andarmawanti Hapsari
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Patent number: 9445310Abstract: During a transition procedure from a first communication system to a second communication system, when the priority of a second communication call, whose setup is requested, is the first priority, the second communication system does not set up the bearer of a first communication call between the second communication system and the mobile communication terminal, and notifies the first communication system that the setup of the first communication is not possible, but the setup of the second communication call is possible. When notified that the setup of the first communication is not possible, but the setup of the second communication call is possible, the first communication system aborts the handover procedure, and instructs the mobile communication terminal to switch to the second communication system by another procedure.Type: GrantFiled: July 2, 2010Date of Patent: September 13, 2016Assignee: NTT DOCOMO, INC.Inventors: Kenichiro Aoyagi, Yuichiro Nakamura, Hideyuki Matsutani, Mikio Iwamura, Takahiro Hayashi, Kazunori Obata
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Patent number: 9328412Abstract: An Fe—Pt-based ferromagnetic material sputtering target comprising a metal and a metal oxide, wherein the metal has a composition in which Pt is contained in an amount of 5 mol % or more and 60 mol % or less and the remainder is Fe. An object of the present invention is to provide a ferromagnetic material sputtering target, which enables to form a magnetic recording layer composed of a magnetic phase such as an Fe—Pt alloy, and a non-magnetic phase to isolate the magnetic phase, and in which a metal oxide is used as one of the materials for the non-magnetic phase. Provided is a ferromagnetic material sputtering target wherein an inadvertent release of the metal oxide during sputtering and particle generation due to abnormal electrical discharge starting at a void inherently included in the target are suppressed, the adherence between the metal oxide and the matrix alloy is enhanced, and its density is increased.Type: GrantFiled: August 5, 2011Date of Patent: May 3, 2016Assignee: JX Nippon Mining & Metals CorporationInventors: Shin-ichi Ogino, Yuichiro Nakamura
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Patent number: 9326198Abstract: A UE 300 is connectable to a first radio communication system and a second radio communication system which differs from the first radio communication system and uses multiple frequency bands. The UE 300 receives RRC CONNECTION REJECT which gives an instruction to switch from the first radio communication system to the second radio communication system and an indication on multiple switching target frequencies included in the frequency bands used by the second radio communication system, and, if the multiple switching target frequencies include an unavailable frequency at which the UE 300 is incapable of transmission/reception, searches for only a cell of a switching target frequency among the multiple switching target frequencies exclusive of the unavailable frequency.Type: GrantFiled: January 16, 2012Date of Patent: April 26, 2016Assignee: NTT DOCOMO, INC.Inventors: Yuichiro Nakamura, Kenichiro Aoyagi, Hideyuki Matsutani
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Patent number: 9325112Abstract: A connector device comprises a connector and a mating connector. The connector is mateable with the mating connector and removable from the mating connector. The mating connector includes a mating primary terminal and a mating secondary terminal. The connector includes a housing, a sub-connector, a first operation member and a second operation member. The housing holds a primary terminal while the sub-connector holds a secondary terminal. When the first operation member is operated, the housing is moved, and the primary terminal is connected to the mating primary terminal. When the second operation member is operated, the sub-connector is moved, and the secondary terminal is connected to the mating secondary terminal.Type: GrantFiled: August 1, 2014Date of Patent: April 26, 2016Assignee: Japan Aviation Electronics Industry, LimitedInventors: Yuya Tabata, Yuichiro Nakamura, Akira Kuwahara, Yuji Kamei
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Patent number: 9247475Abstract: A radio control apparatus determines a call type of a communication terminal, and transmits a release redirection control signal to the communication terminal. When the call type is a general call, the release redirection signal not including broadcast information is transmitted to the communication terminal. When the call type is an important communication call, the release redirection control signal including the broadcast information is transmitted to the communication terminal.Type: GrantFiled: November 12, 2012Date of Patent: January 26, 2016Assignee: NTT DOCOMO, INC.Inventors: Yuichiro Nakamura, Kenichiro Aoyagi, Hideyuki Matsutani, Kouichi Morikawa
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Patent number: 9181617Abstract: Provided is a sputtering target of ferromagnetic material comprising a metal having a composition containing 20 mol % or less of Cr, and Co as the remainder; wherein the target structure includes a phase (A) which is a basis metal, and metal phases (B) having a component composition different from the peripheral texture within the phase (A), the area ratio occupied by oxides within 1 ?m from the most outer periphery of metal phases (B) is 80% or less, and the average grain size of the metal phases (B) is 10 ?m or more and 150 ?m or less. Provided is a sputtering target of ferromagnetic material capable of inhibiting the generation of particles during sputtering, and improving the pass-through flux to achieve a stable electrical discharge with a magnetron sputtering device.Type: GrantFiled: January 28, 2011Date of Patent: November 10, 2015Assignee: JX Nippon Mining & Metals CorporationInventors: Shin-ichi Ogino, Atsushi Sato, Yuichiro Nakamura, Atsutoshi Arakawa