Patents by Inventor Yuichiro Yamazaki
Yuichiro Yamazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6768112Abstract: A substrate inspection system includes: a charged particle beam irradiation part; an electron image detecting part; a mapping projecting part which projects the secondary and/or reflected charge particle generated from a substrate on the electron image detecting part; and a control part. The electron image detecting part includes a charged particle multiplying device which has an entrance surface for the secondary and/or reflected charged particle, and an image grabbing element having a fluorescent body with a light receiving surface to receive the multiplied secondary and/or reflected charged particle and a fluorescent surface on which an optical image appears. The control part causes the fluorescent surface of the fluorescent body to be grounded and applies a first negative potential to the entrance surface of the charged particle multiplying device.Type: GrantFiled: December 27, 2001Date of Patent: July 27, 2004Assignee: Kabushiki Kaisha ToshibaInventors: Yuichiro Yamazaki, Motosuke Miyoshi
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Publication number: 20040029046Abstract: A charged particle beam lithography system includes a charged particle beam emitter which generates a charged particle beam and which emits the charged particle beam to a wafer, the charged particle beam emitter emitting the charged particle beam at an acceleration voltage lower than a voltage causing a proximity effect that back scattered electrons generated from the wafer by irradiation of the charged particle beam influence an exposure amount of a pattern to be written close to an irradiation position of the charged particle beam; an illumination optical system which adjusts a beam radius of the charged particle beam; a cell aperture having a cell pattern of a shape corresponding to a desired pattern to be written; a first deflector which deflects the charged particle beam with a first electric field so as to enter a desired cell pattern of the cell aperture, and which deflects the charged particle beam which passes through the cell pattern back to an optical axis thereof; a demagnification projection optiType: ApplicationFiled: March 24, 2003Publication date: February 12, 2004Inventors: Osamu Nagano, Susumu Hashimoto, Yuichiro Yamazaki, Atsushi Ando
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Patent number: 6690529Abstract: A hard disk controller (HDC) receives a request an operation to retrieve, read, or write data using a magnetic disk. An MPU determines the contents of the received request, and transfers to an IC such as a head IC (HDIC), a PRML read channel process (RDC), a servo-demodulator (SV-DEMO), etc. set values of minimal parameters to control the parameters whose settings are to be changed to control the operations of a storage device to perform the processes for the request.Type: GrantFiled: November 28, 2000Date of Patent: February 10, 2004Assignee: Fujitsu LimitedInventors: Kiyohide Toshikawa, Yuichiro Yamazaki
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Publication number: 20030213893Abstract: A defect inspecting apparatus is provided for generating a less distorted test image to reliably observe a surface of a sample for detecting defects thereon. The defect detecting apparatus comprises a primary electron beam source for irradiating a sample, electrostatic lenses for focusing secondary electrons emitted from the surface of the sample irradiated with the primary electron beam, a detector for detecting the secondary electrons, and an image processing unit for processing a signal from the detector. Further, a second electron source may be provided for emitting an electron beam irradiated to the sample, wherein the sample may be irradiated with the electron beam from the second electron source before it is irradiated with the primary electron beam from the first electron source for observing the sample. A device manufacturing method is also provided for inspecting devices under processing with high throughput using the defect detecting apparatus.Type: ApplicationFiled: May 15, 2003Publication date: November 20, 2003Applicants: EBARA CORPORATION, KABUSHIKI KAISHA TOSHIBAInventors: Ichirota Nagahama, Yuichiro Yamazaki, Kenji Watanabe, Masahiro Hatakeyama, Tohru Satake, Nobuharu Noji
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Publication number: 20030215722Abstract: A photomask repair method including scanning an electron beam across a main surface of the photomask, thereby producing a pattern image of the photomask, identifying the position of a defective portion from the pattern image thus produced, and applying an electron beam to a region to be etched including a defective portion under an atmosphere of a gas capable of performing a chemical etching of a film material forming the photomask pattern, thereby removing a defect. In this method, the electron beam to be applied to the region to be etched is a shaped beam. The electron beam is set such that the side of the electron beam is applied in parallel to a borderline between a non-defective pattern and the defect.Type: ApplicationFiled: December 23, 2002Publication date: November 20, 2003Inventors: Shingo Kanamitsu, Takashi Hirano, Fumiaki Shigemitsu, Motosuke Miyoshi, Kazuyoshi Sugihara, Yuichiro Yamazaki, Makoto Sekine, Takayuki Sakai, Ichiro Mori, Katsuya Okumura
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Patent number: 6563308Abstract: A thickness measuring system comprises: an eddy current loss measuring sensor having an exciting coil for receiving a high frequency current to excite a high frequency magnetic field to excite an eddy current in a conductive film, and a receiving coil for outputting the high frequency current which is influenced by an eddy current loss caused by the eddy current; an impedance analyzer for measuring the variation in impedance of the eddy current loss measuring sensor, the variation in current value of the high frequency current or the variation in phase of the high frequency current on the basis of the high frequency current outputted from the receiving coil; an optical displacement sensor for measuring the distance between the conductive film and the eddy current loss measuring sensor; and a control computer including a thickness calculating part for calculating the thickness of the conductive film on the basis of various measured results of the impedance analyzer and optical displacement sensor, and the eddyType: GrantFiled: March 27, 2001Date of Patent: May 13, 2003Assignee: Kabushiki Kaisha ToshibaInventors: Osamu Nagano, Yuichiro Yamazaki, Motosuke Miyoshi, Hisashi Kaneko, Tetsuo Matsuda
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Publication number: 20030067298Abstract: A thickness measuring system comprises: an eddy current loss measuring sensor having an exciting coil for receiving a high frequency current to excite a high frequency magnetic field to excite an eddy current in a conductive film, and a receiving coil for outputting the high frequency current which is influenced by an eddy current loss caused by the eddy current; an impedance analyzer for measuring the variation in impedance of the eddy current loss measuring sensor, the variation in current value of the high frequency current or the variation in phase of the high frequency current on the basis of the high frequency current outputted from the receiving coil; an optical displacement sensor for measuring the distance between the conductive film and the eddy current loss measuring sensor; and a control computer including a thickness calculating part for calculating the thickness of the conductive film on the basis of various measured results of the impedance analyzer and optical displacement sensor, and the eddyType: ApplicationFiled: March 27, 2001Publication date: April 10, 2003Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Osamu Nagano, Yuichiro Yamazaki, Motosuke Miyoshi, Hisashi Kaneko, Tetsuo Matsuda
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Patent number: 6534766Abstract: A charged particle beam system comprising a charged beam source, a condenser lens, a scanning deflecting device, an objective lens and a secondary electron detector further comprises a slant observing deflecting device arranged between the objective lens and a sample. The slant observing deflecting device deflects charged particle beams immediately before the surface of the sample, to cause the charged particle beams to be slantingly incident on the sample. The deflection angle of the charged particle beams is controlled by a DC current component which is inputted to the slant observing deflecting device. The irradiation position shift of the charged particle beams due to the slant deflection is corrected and controlled by feeding an input value of the slant observing deflecting device and the slant angle of the charged particle beams back to the input value of the scanning deflecting device.Type: GrantFiled: March 26, 2001Date of Patent: March 18, 2003Assignees: Kabushiki Kaisha Toshiba, Kabushiki Kaisha TopconInventors: Hideaki Abe, Yuichiro Yamazaki, Kazuyoshi Sugihara, Masahiro Inoue
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Publication number: 20030047682Abstract: A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.Type: ApplicationFiled: September 10, 2002Publication date: March 13, 2003Inventors: Masahiro Hatakeyama, Takeshi Murakami, Tohru Satake, Nobuharu Noji, Ichirota Nagahama, Yuichiro Yamazaki
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Patent number: 6525328Abstract: An electron beam lithography system 10 comprises an electron gun including a rectangular cathode 1 having an emission surface having an aspect ratio of other than 1, an illumination optical system 3 of an asymmetric lens system including multipole lenses Qa1 and Qa2, a CP aperture 5, and a projection optical system 8 of a symmetric lens system including multipole lenses Qb1 through Qb4.Type: GrantFiled: July 24, 2000Date of Patent: February 25, 2003Assignee: Kabushiki Kaisha ToshibaInventors: Motosuke Miyoshi, Yuichiro Yamazaki, Katsuya Okumura
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Patent number: 6512237Abstract: A charged beam exposing method comprises a step of applying a voltage to a sample to thereby form an acceleration electric field on the sample, a step of accelerating an electron beam emitted from an electron gun and scanning an alignment mark formed on the sample with the electron beam, a step of detecting back-scattered electrons and secondary electrons, generated from the alignment mark, by means of a detector, a step of acquiring the position of the alignment mark based on a signal waveform detected, a step of eliminating or reducing the acceleration electric field by changing the applied voltage to the sample, and a step of exposing a pattern with the electron beam emitted from the electron gun based on information of the position of the alignment mark.Type: GrantFiled: February 15, 2002Date of Patent: January 28, 2003Assignee: Kabushiki Kaisha ToshibaInventors: Tetsuro Nakasugi, Yuichiro Yamazaki, Hideaki Abe
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Patent number: 6495841Abstract: In an electron beam drawing apparatus including an objective lens for focusing an electron beam emitted from an electron gun on a sample surface and an objective deflector for controlling the position of the electron beam on the sample surface, an objective driving mechanism for mechanically moving the objective lens and objective deflector in a plane perpendicular to the optical axis of the electron beam is provided and an optical axis shifting deflector arranged nearer to the electron gun than the objective lens and objective deflector, for deflecting the electron beam in synchronism with the operation of the objective lens and objective deflector is provided.Type: GrantFiled: April 26, 1999Date of Patent: December 17, 2002Assignee: Kabushiki Kaisha ToshibaInventors: Atsushi Ando, Shunko Magoshi, Kazuyoshi Sugihara, Yuichiro Yamazaki, Motosuke Miyoshi, Katsuya Okumura, Kiyoshi Hattori
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Publication number: 20020156545Abstract: A district assisting system for making a plan of a waste disposal network, Icons (I1 to I3) indicating the kinds of waste are displayed on a monitor screen. The operator selects, e.g., a gasification melting furnace from a disposal facility item box (W2), creates an icon (I4) in a plan sheet box (W1), and draw a line (L1) linking the icon (I1) to the icon (I4). When the operator clicks the icon (I4), the kinds and amounts of residual and valuable substances produced when combustible waste is processed in a gasification melting furnace are displayed. The operator selects the next disposal facility according to the displayed unconnected residual substances, creates an icon of the selected facility on the monitor screen, and links the icon to the icon (I4). Thus a plan is completed.Type: ApplicationFiled: April 29, 2002Publication date: October 24, 2002Inventors: Hideo Sekino, Satoshi Inoue, Yuichiro Yamazaki, Masashi Ohbuchi, June Toda, Shu Susami, Yoshie Yamanishi
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Publication number: 20020088940Abstract: An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.Type: ApplicationFiled: November 2, 2001Publication date: July 11, 2002Inventors: Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa, Tsutomu Karimata, Mamoru Nakasuji, Masahiro Hatakeyama, Takeshi Murakami, Yuichiro Yamazaki, Ichirota Nagahama, Takamitsu Nagai, Kazuyoshi Sugihara
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Publication number: 20020084411Abstract: A substrate inspection system includes: a substrate mounting part which mounts thereon a substrate to be inspected; a charged particle beam irradiation part which generates a charged particle beam to irradiate the substrate with the charged particle beam, the irradiation of the charged particle beam causing a secondary charged particle and/or a reflected charged particle to generate from the substrate; an electron image detecting part which detects an electron image which is formed by the secondary charged particle and/or the reflected charged particle and is indicative of a physical property of the surface part of the substrate and which outputs a picture signal of the image; the electron image detecting part including a charged particle multiplying device which multiplies the secondary charged particle and/or the reflected charged particle, and an image grabbing element having a fluorescent body which receives the multiplied secondary charged particle and/or reflected charged particle as the electron imageType: ApplicationFiled: December 27, 2001Publication date: July 4, 2002Inventors: Yuichiro Yamazaki, Motosuke Miyoshi
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Publication number: 20020072012Abstract: A charged beam exposing method comprises a step of applying a voltage to a sample to thereby form an acceleration electric field on the sample, a step of accelerating an electron beam emitted from an electron gun and scanning an alignment mark formed on the sample with the electron beam, a step of detecting back-scattered electrons and secondary electrons, generated from the alignment mark, by means of a detector, a step of acquiring the position of the alignment mark based on a signal waveform detected, a step of eliminating or reducing the acceleration electric field by changing the applied voltage to the sample, and a step of exposing a pattern with the electron beam emitted from the electron gun based on information of the position of the alignment mark.Type: ApplicationFiled: February 15, 2002Publication date: June 13, 2002Applicant: Kabushiki Kaisha ToshibaInventors: Tetsuro Nakasugi, Yuichiro Yamazaki, Hideaki Abe
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Patent number: 6376136Abstract: A charged beam exposing method comprises a step of applying a voltage to a sample to thereby form an acceleration electric field on the sample, a step of accelerating an electron beam emitted from an electron gun and scanning an alignment mark formed on the sample with the electron beam, a step of detecting back-scattered electrons and secondary electrons, generated from the alignment mark, by means of a detector, a step of acquiring the position of the alignment mark based on a signal waveform detected, a step of eliminating or reducing the acceleration electric field by changing the applied voltage to the sample, and a step of exposing a pattern with the electron beam emitted from the electron gun based on information of the position of the alignment mark.Type: GrantFiled: December 17, 1999Date of Patent: April 23, 2002Assignee: Kabushiki Kaisha ToshibaInventors: Tetsuro Nakasugi, Yuichiro Yamazaki, Hideaki Abe
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Publication number: 20020033458Abstract: A charged particle beam exposure system comprising: a charged particle beam emitting device which generates charged particle beams with which a substrate is irradiated, the charged particle beam emitting device generating the charged particle beams at an accelerating voltage which is lower than that at which an influence of a proximity effect occurs; an illumination optical system which adjusts a beam diameter of the charged particle beams so that density of the charged particle beams is uniform; an character aperture in which an aperture hole is formed in a shape corresponding to a desired pattern to be written; a first deflector which deflects the charged particle beams by an electrostatic field that the charged particle beams have a desired sectional shape and travel towards a desired aperture hole and which returns the charged particle beams passing through the aperture hole to an optical axis thereof; a reducing projecting optical system which forms a multi-pole lens field so that the charged particle beType: ApplicationFiled: August 3, 2001Publication date: March 21, 2002Inventors: Osamu Nagano, Yuichiro Yamazaki, Susumu Hashimoto, Motosuke Miyoshi
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Publication number: 20020028399Abstract: An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.Type: ApplicationFiled: June 27, 2001Publication date: March 7, 2002Inventors: Mamoru Nakasuji, Nobuharu Noji, Tohru Satake, Masahiro Hatakeyama, Toshifumi Kimba, Hirosi Sobukawa, Shoji Yoshikawa, Takeshi Murakami, Kenji Watanabe, Tsutomu Karimata, Shin Oowada, Mutsumi Saito, Yuichiro Yamazaki, Takamitsu Nagai, Ichirota Nagahama
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Publication number: 20010025925Abstract: A charged particle beam system comprising a charged beam source, a condenser lens, a scanning deflecting device, an objective lens and a secondary electron detector further comprises a slant observing deflecting device arranged between the objective lens and a sample. The slant observing deflecting device deflects charged particle beams immediately before the surface of the sample, to cause the charged particle beams to be slantingly incident on the sample. The deflection angle of the charged particle beams is controlled by a DC current component which is inputted to the slant observing deflecting device. The irradiation position shift of the charged particle beams due to the slant deflection is corrected and controlled by feeding an input value of the slant observing deflecting device and the slant angle of the charged particle beams back to the input value of the scanning deflecting device.Type: ApplicationFiled: March 26, 2001Publication date: October 4, 2001Applicant: Kabushiki Kaisha ToshibaInventors: Hideaki Abe, Yuichiro Yamazaki, Kazuyoshi Sugihara, Masahiro Inoue