Patents by Inventor Yuji Ando

Yuji Ando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200214968
    Abstract: A urea group-containing organopolysiloxane represented by the following formula (1), wherein, R1 is —R5—NHCONH2 (R5 is a divalent hydrocarbon group), R2 is any of a hydrogen atom, a hydroxy group, an alkoxy group, an alkyl group, a fluoroalkyl group, an aryl group, and an aralkyl group, R3 is R1 or R2, and R4 is an organopolysiloxane segment represented by the following formula (2), (Q is an oxygen atom or a divalent hydrocarbon group), the urea group-containing organopolysiloxane represented by the formula (1) has one or more R1 in the molecule, when “c” is 0, “a”+“d”+“f”+“h”+“i” is 1 or more. Accordingly, there is provided a urea group-containing organopolysiloxane that can obtain a cosmetic having excellent cosmetic durability while maintaining a light feel and good spreadability, and a method for manufacturing the same, as well as a cosmetic containing the same.
    Type: Application
    Filed: August 10, 2018
    Publication date: July 9, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masanao KAMEI, Munenao HIROKAMI, Yuji ANDO
  • Publication number: 20200199302
    Abstract: An organic silicon compound-modified copolymer having structural units represented by formula (1) and formula (2) and having a hydroxyl group at at least one end has excellent compatibility with alcohol compounds and isocyanate compounds and also gives a cured product having excellent water repellency and moisture resistance. (In the formulas, an asterisk * represents a bond to an adjacent structural unit, each R1 independently represents a C1-10 alkyl group or C6-10 aryl group, and n represents an integer of 1 or higher.
    Type: Application
    Filed: April 10, 2018
    Publication date: June 25, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Munenao HIROKAMI, Yuji ANDO
  • Patent number: 10676617
    Abstract: Provided is a method for producing an organopolysiloxane emulsion composition which contains an organopolysiloxane having a trialkyl group at a terminal thereof and having a viscosity of 50,000 mm2/s or more at 25° C., within a shorter time compared with the conventional methods. A method for producing an emulsion composition which contains an organopolysiloxane having a viscosity of 50,000 mm2/s or more at 25° C. and capped with a trialkylsilyl group, said method comprising: (I) emulsifying a mixture comprising (A) an organopolysiloxane, (B) a nonionic surfactant, (C) an anionic surfactant, (D-1) an acidic compound and (E-1) water to prepare an emulsion composition; (II) adding (D-2) an acidic compound and (E-2) water to the emulsion composition to perform emulsion polymerization; and (III) adding 0.001 part by mass or more of (F) a compound to the resultant product to perform emulsion polymerization again.
    Type: Grant
    Filed: May 12, 2015
    Date of Patent: June 9, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Akihiro Kobayashi, Yuji Ando, Yuko Takada, Shunji Aoki
  • Publication number: 20200147970
    Abstract: A cap includes a lip portion, and an inner bottom wall and an atmosphere communication wall that, when an opening with the lip portion as an edge is covered by a member, form a recessed portion that forms a space with the member, the atmosphere communication wall being provided at a position between the opening and the inner bottom wall in a depth direction of the recessed portion, the atmosphere communication wall having a communication port of an atmosphere communication portion that opens the space to the atmosphere, the communication port being formed in the atmosphere communication wall toward the opening.
    Type: Application
    Filed: November 11, 2019
    Publication date: May 14, 2020
    Inventors: Yuji KANAZAWA, Masaaki ANDO
  • Publication number: 20200130355
    Abstract: A liquid ejecting apparatus includes a liquid ejector having a nozzle surface having nozzles, a cap configured to perform capping when coming into contact with the nozzle surface, a capping mechanism configured to move the cap between a capping position for the capping and a separated position separated from the nozzle surface, a cleaning-liquid supply mechanism configured to supply a cleaning liquid into the cap, and a facing portion configured to face a lip portion of the cap coming into contact with the nozzle surface in the capping, in which the lip portion and the facing portion are made to face each other and a predetermined space is provided between the lip portion and the facing portion for the cleaning liquid supplied in the cap to come into contact with the facing portion.
    Type: Application
    Filed: October 30, 2019
    Publication date: April 30, 2020
    Inventors: Yuji KANAZAWA, Masaaki ANDO
  • Publication number: 20200120824
    Abstract: A plurality of electronic circuit boards (2), on which electronic components are mounted, is inserted in parallel through an electronic circuit insertion port (11) of a casing body (1). A gap (3) is formed between front panels (22) of inserted and adjacent electronic circuit boards (2) inserted. A bridge body (5) constituting conduction means electrically conducts a first conductive side portion (22a) of a front panel (22) in one electronic circuit board (2) of adjacent electronic circuit boards (2) and a second conductive side portion (22b) of a front panel (22) in another electronic circuit board (2) that faces the first conductive side portion (22a) via a gap (3).
    Type: Application
    Filed: May 22, 2017
    Publication date: April 16, 2020
    Applicant: Mitsubishi Electric Corporation
    Inventors: Yuji ANDO, Chiharu MIYAZAKI
  • Publication number: 20200078289
    Abstract: A silicone resin represented by formula (1) and having a Mw of 1,000-8,000 is useful in cosmetics. [(C6H5)3SiO1/2]a[R13SiO1/2]b[R22SiO2/2]c[R3SiO3/2]d[SiO4/2]e??(1) R1 is a C1-C8 alkyl group, C6-C12 aryl group (exclusive of phenyl) or C1-C8 fluorinated alkyl group, R2 and R3 are each independently a C1-C8 alkyl group, C6-C12 aryl group or C1-C8 fluorinated alkyl group, a=0-0.2, b=0.1-0.5, c=0-0.2, d=0.01-0.5, e=0-0.6, a+b+c+d+e=1.0, at least one phenyl group is included in the molecule. A film of the silicone resin has a refractive index of at least 1.48.
    Type: Application
    Filed: November 15, 2019
    Publication date: March 12, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroomi IYOKU, Yuji ANDO
  • Publication number: 20200075768
    Abstract: A coating liquid for forming a metal oxide film, the coating liquid including: a metal source, which is at least one selected from the group consisting of inorganic salts, oxides, hydroxides, metal complexes, and organic acid salts; at least one alkali selected from the group consisting of organic alkalis and inorganic alkalis; and a solvent.
    Type: Application
    Filed: March 22, 2018
    Publication date: March 5, 2020
    Inventors: Naoyuki UEDA, Yuki NAKAMURA, Yukiko ABE, Shinji MATSUMOTO, Yuji SONE, Ryoichi SAOTOME, Sadanori ARAE, Minehide KUSAYANAGI, Yuichi ANDO
  • Publication number: 20200070521
    Abstract: A liquid ejecting apparatus includes a liquid ejecting portion configured to eject a first liquid from a nozzle, a liquid receiving portion configured to receive, in a state where a second liquid is accommodated in the liquid receiving portion, for a purpose of maintenance of the liquid ejecting portion, the first liquid discharged from the nozzle, a maintenance portion that maintains a liquid surface of a liquid accommodated in the liquid receiving portion at an upper limit position, and a discharge portion configured to discharge, from a discharge port open to the liquid receiving portion, the liquid accommodated in the liquid receiving portion. The discharge port is positioned below the upper limit position.
    Type: Application
    Filed: August 28, 2019
    Publication date: March 5, 2020
    Inventors: Toshio ARIMURA, Yuji KANAZAWA, Masaaki ANDO, Noritaka MITSUO
  • Patent number: 10544425
    Abstract: By a QTL analysis and so forth using 4-HPPD inhibitor-susceptible rice and 4-HPPD inhibitor-resistant rice, a hypothetical gene (HIS1 gene) of an iron/ascorbate-dependent oxidoreductase gene located on a short arm of chromosome 2 of rice has been identified as a 4-HPPD inhibitor-resistance gene. Further, it has also been revealed that a homologous gene (HSL1 gene) of the HIS1 gene is located on chromosome 6 of rice. Furthermore, it has been found out that utilizations of these genes make it possible to efficiently produce a plant having increased resistance or susceptibility to a 4-HPPD inhibitor and to efficiently determine whether a plant has resistance or susceptibility to a 4-HPPD inhibitor.
    Type: Grant
    Filed: December 26, 2011
    Date of Patent: January 28, 2020
    Assignees: Incorporated Administrative Agency National Agriculture Agriculture and Food Research Organization, TOYAMA PREFECTURE, SDS BIOTECH K.K.
    Inventors: Hiroshi Kato, Hideo Maeda, Yoshihiro Sunohara, Ikuo Ando, Masahiro Oshima, Motoshige Kawata, Hitoshi Yoshida, Sakiko Hirose, Makiko Kawagishi, Yojiro Taniguchi, Kazumasa Murata, Hiroaki Maeda, Yuji Yamada, Keisuke Sekino, Akihiko Yamazaki
  • Patent number: 10529875
    Abstract: The present invention is provided with an interface layer that minimizes interdiffusion between a silicon substrate and copper electrode wiring that are used as a solar cell, that improves the adhesive properties of copper wiring, and that is used to obtain ohmic contact characteristics. This silicon solar cell comprises a silicon substrate and is provided with a metal oxide layer that is formed on the silicon substrate and wiring that is formed on the metal oxide layer and that comprises mainly copper. The metal oxide layer contains (a) one of either titanium or manganese, (b) one of vanadium, niobium, tantalum, or silicon, and (c) at least one of copper and nickel. In addition, the metal oxide layer comprises copper or nickel as metal particles that are diffused in the interior of the metal oxide layer.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: January 7, 2020
    Assignee: MATERIAL CONCEPT, INC.
    Inventors: Junichi Koike, Yuji Sutou, Daisuke Ando, Tri Hai Hoang
  • Publication number: 20200006400
    Abstract: (Object) To miniaturize a field-effect transistor. (Means of Achieving the Object) A field-effect transistor includes a semiconductor film formed on a base, a gate insulating film formed on a part of the semiconductor film, a gate electrode formed on the gate insulating film, and a source electrode and a drain electrode formed in contact with the semiconductor film, wherein a thickness of the source electrode and the drain electrode is smaller than a thickness of the gate insulating film, and the gate insulating film includes a region that is not in contact with the source electrode or the drain electrode.
    Type: Application
    Filed: March 15, 2018
    Publication date: January 2, 2020
    Applicant: Ricoh Company, Ltd.
    Inventors: Sadanori ARAE, Yuichi ANDO, Yuki NAKAMURA, Yukiko ABE, Shinji MATSUMOTO, Yuji SONE, Naoyuki UEDA, Ryoichi SAOTOME, Minehide KUSAYANAGI
  • Publication number: 20190365632
    Abstract: A silicone resin represented by formula (1) and having a Mw of 1,000-8,000 is useful in cosmetics. [(C6H5)3SiO1/2]a[R13SiO1/2]b[R22SiO2/2]c[R3SiO3/2]d[SiO4/2]e??(1) R1 is a C1-C8 alkyl group, C6-C12 aryl group (exclusive of phenyl) or C1-C8 fluorinated alkyl group, R2 and R3 are each independently a C1-C8 alkyl group, C6-C12 aryl group or C1-C8 fluorinated alkyl group, a=0-0.2, b=0.1-0.5, c=0-0.2, d=0.01-0.5, e=0-0.6, a+b+c+d+e=1.0, at least one phenyl group is included in the molecule. A film of the silicone resin has a refractive index of at least 1.48.
    Type: Application
    Filed: June 4, 2018
    Publication date: December 5, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroomi IYOKU, Yuji ANDO
  • Patent number: 10433427
    Abstract: To provide a method for firing a copper paste, which improves sinterability of copper particles for the purpose of forming a copper wiring line that is decreased in the electrical conductivity. A method for firing a copper paste, which comprises: an application step wherein a copper paste is applied over a substrate; a first heating step wherein the substrate is heated in a nitrogen gas atmosphere containing from 500 ppm to 2,000 ppm (inclusive) of an oxidizing gas in terms of volume ratio after the application step, thereby oxidizing and sintering copper particles in the copper paste; and a second heating step wherein the substrate is heated in a nitrogen gas atmosphere containing 1% or more of a reducing gas in terms of volume ratio after the first heating step, thereby reducing the oxidized and sintered copper oxide.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: October 1, 2019
    Assignee: MATERIAL CONCEPT, INC.
    Inventors: Junichi Koike, Yuji Sutou, Daisuke Ando
  • Patent number: 10421839
    Abstract: One of the purposes of the present invention is to provide an aminoalkyl group-containing siloxane, in particular an aminoalkyl group- and polyoxyalkylene group-containing siloxane, in which an amount of a cyclic siloxane as an impurity contained is decreased, and a method for preparing the same.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: September 24, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Yuji Ando
  • Publication number: 20190288076
    Abstract: A coating liquid for forming an oxide, the coating liquid including: A element, which is at least one alkaline earth metal; and B element, which is at least one selected from the group consisting of gallium (Ga), scandium (Sc), yttrium (Y), and lanthanoid, wherein when a total of concentrations of the A element is denoted by CA mg/L and a total of concentrations of the B element is denoted by CB mg/L, a total of concentrations of sodium (Na) and potassium (K) in the coating liquid is (CA+CB)/103 mg/L or less and a total of concentrations of chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), nickel (Ni), and copper (Cu) in the coating liquid is (CA+CB)/103 mg/L or less.
    Type: Application
    Filed: March 14, 2019
    Publication date: September 19, 2019
    Inventors: Ryoichi SAOTOME, Naoyuki UEDA, Yuichi ANDO, Yuki NAKAMURA, Yukiko ABE, Shinji MATSUMOTO, Yuji SONE, Sadanori ARAE, Minehide KUSAYANAGI
  • Publication number: 20190280098
    Abstract: A coating liquid for forming an oxide or oxynitride insulator film, the coating liquid including: A element; at least one selected from the group consisting of B element and C element; and a solvent, wherein the A element is at least one selected from the group consisting of Sc, Y, Ln (lanthanoid), Sb, Bi, and Te, the B element is at least one selected from the group consisting of Ga, Ti, Zr, and Hf, the C element is at least one selected from the group consisting of Group 2 elements in a periodic table, and the solvent includes at least one selected from the group consisting of an organic solvent having a flash point of 21° C. or more but less than 200° C. and water.
    Type: Application
    Filed: May 29, 2019
    Publication date: September 12, 2019
    Inventors: Naoyuki UEDA, Yuki NAKAMURA, Yukiko ABE, Shinji MATSUMOTO, Yuji SONE, Ryoichi SAOTOME, Sadanori ARAE, Minehide KUSAYANAGI, Yuichi ANDO
  • Patent number: 10412413
    Abstract: There is provided an encoder that enables an image of a field-of-view range of a user to be displayed immediately. The encoder encodes, for a pair of opposite surfaces among a plurality of surfaces of a model for an omnidirectional image, a first composite image obtained by combining an omnidirectional image of a first surface of a high resolution and an omnidirectional image of a second surface of a resolution lower than the high resolution and a second composite image obtained by combining an omnidirectional image of the second surface of the high resolution and an omnidirectional image of the first surface of a low resolution. For example, the present disclosure can be applied to an image display system or the like.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: September 10, 2019
    Assignees: SONY CORPORATION, SONY INTERACTIVE ENTERTAINMENT INC.
    Inventors: Nobuaki Izumi, Yuji Ando, Takayuki Shinohara
  • Publication number: 20190241749
    Abstract: The invention provides an aqueous silicone resin emulsion for preparing a coating composition, an aqueous coating composition using the same, and a method for producing an aqueous clear coating composition.
    Type: Application
    Filed: February 4, 2019
    Publication date: August 8, 2019
    Applicant: NIPPON PAINT INDUSTRIAL COATINGS CO., LTD.
    Inventors: Yuji ITO, Takehiro OJIMA, Masahiko HARADA, Hiroki ANDO
  • Patent number: 10358530
    Abstract: One of the purposes of the present invention is to provide a polyether-modified siloxane having a good thickening property, in particular a good thickening property for an aqueous liquid. The present invention provides a polyether-modified siloxane represented by the following general formula (1): Sx-(CH2)aCOO—(C2H4O)n—(C3H6O)s—CO(CH2)a-Sx?? (1) wherein n is an integer of from 50 to 10000, s is an integer which meets the equation, 0<=s<=n/50, a is an integer of from 2 to 40, and Sx is, independently of each other, an organo(poly)siloxanyl group represented by the following formula (a) or (b): wherein R is, independently of each other, a hydrogen atom, a hydroxyl group, an alkoxyl group, or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms, m is an integer of from 0 to 350, and m? is an integer of from 0 to 348, wherein a ratio of a total molecular weight of the Sx-(CH2)aCO moieties to a molecular weight of the O(C2H4O)n(C3H6O)s moiety is 0.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: July 23, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Yuji Ando