Abstract: Provided is an information processing apparatus including: an input unit into which shape data of a surface to be measured including a plurality of recesses is input; and a setting unit that detects each of the plurality of recesses on the basis of the input shape data and sets, for the detected recess, a region to be removed including the recess.

Abstract: According to an embodiment of the present invention, a method of measuring a surface of an object having a curved shape by measuring a distance from a measurement head to the object, includes: setting a measuring region of the object and a threshold value of concave and convex; acquiring shape reference data including the curved shape of the object; acquiring three-dimensional data of the surface of the object by measuring the distance between the object in the measuring region and the measurement head; acquiring curve removed data by removing the shape reference data from the three-dimensional data; calculating second reference data by calculating first reference data based on the curve removed data, by removing data exceeding the threshold value with respect to the first reference data, from the curve removed data, and by averaging the curve removed data; and calculating shape data of the concave and convex.

Abstract: Provided is an information processing apparatus including: an input unit into which shape data of a surface to be measured including a plurality of recesses is input; and a setting unit that detects each of the plurality of recesses on the basis of the input shape data and sets, for the detected recess, a region to be removed including the recess.

Abstract: According to an embodiment of the present invention, a method of measuring a surface of an object having a curved shape by measuring a distance from a measurement head to the object, includes: setting a measuring region of the object and a threshold value of concave and convex; acquiring shape reference data including the curved shape of the object; acquiring three-dimensional data of the surface of the object by measuring the distance between the object in the measuring region and the measurement head; acquiring curve removed data by removing the shape reference data from the three-dimensional data; calculating second reference data by calculating first reference data based on the curve removed data, by removing data exceeding the threshold value with respect to the first reference data, from the curve removed data, and by averaging the curve removed data; and calculating shape data of the concave and convex.

Abstract: In an evaluation device, an analyzer is rotated so that the azimuth of the transmission axis of the analyzer has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer. An imaging camera captures a regularly reflected image of a wafer under each condition, and an image processing unit evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer captured by the imaging camera.

Abstract: There is provide an inspection apparatus configured to detect a change in shape of a pattern in the depth direction o the pattern, the apparatus including: an illumination section 20 which illuminates a wafer 5 having a periodic pattern with an illumination light having transmittance with respect to the wafer 5; a reflected diffraction light detecting section 30 which outputs a first detection signal by receiving a reflected diffraction light generated by the pattern on a surface, of the wafer, on an illumination side illuminated with the illumination light; a transmitted diffraction light detecting section 40 which outputs a second detection signal by receiving a transmitted diffraction light generated by the pattern to a back surface, of the wafer, opposite to the illumination side; and a signal processing section 51 which detects a state of the pattern based on at least one of the first and second detection signals.

Abstract: In an evaluation device an analyzer is rotated so that the azimuth of the transmission axis of the analyzer has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer. An imaging camera captures a regularly reflected image of a wafer under each condition, and an image processing unit evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer captured by the imaging camera.

Abstract: In an evaluation device (1), an analyzer (42) is rotated so that the azimuth of the transmission axis of the analyzer (42) has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer (32), an imaging camera (44) captures a regularly reflected image of a wafer (10) under each condition, and an image processing unit (50) evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer (10) captured by the imaging camera (44).

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S121) which applies an inspection light to a surface of a wafer; a second step (S122) which detects a diffracted light from the surface of the wafer to which the inspection light has been applied; and a third step (S123) which checks whether a defect is present in the repeated pattern according to the diffracted light detected in the second step. The second step detects a diffracted light corresponding to a pattern having a pitch multiplied by 2 with respect to the pitch of the repeated pattern.

Abstract: A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S121) which applies an inspection light to a surface of a wafer; a second step (S122) which detects a diffracted light from the surface of the wafer to which the inspection light has been applied; and a third step (S123) which checks whether a defect is present in the repeated pattern according to the diffracted light detected in the second step. The second step detects a diffracted light corresponding to a pattern having a pitch multiplied by 2 with respect to the pitch of the repeated pattern.

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.

Abstract: An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.

Abstract: A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.

Abstract: An illumination optical apparatus is able to well suppress a change in a polarization state of light in an optical path and to illuminate a surface to be illuminated, with light in a desired polarization state or in an unpolarized state. The illumination optical apparatus illuminates the surface to be illuminated, based on light with a polarization degree of not less than 0.9 supplied from a light source. The illumination optical apparatus comprises a polarization setter disposed in the optical path between the light source and the surface to be illuminated, and adapted for setting a polarization state of light reaching the surface to be illuminated, to a predetermined polarization state, and a holding member for supporting one optical surface of at least one optically transparent member incorporated in an optical system in the optical path between the light source and the surface to be illuminated, at three points located in three regions respectively.

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing

Abstract: An intake system for an internal combustion engine includes an intake manifold adapted to be attached to a side wall of the engine, and an air cleaner for supplying intake air to the intake manifold. The air cleaner is disposed opposite to the side wall of the engine while interposing therebetween the intake manifold. The air cleaner has an air cleaner main body joined with the intake manifold to constitute a single unit. The air cleaner main body is made of a material lower in the strength than a material which the intake manifold is made of.