Abstract: A computer-implemented method for determining container information associated with detected container mutation events is disclosed. The computer-implemented method includes: determining that a system call event to a host operating system includes a call to join a namespace and execute a parent process inside the namespace; determining that the namespace is associated with an existing container; responsive to determining that the namespace is associated with an existing container, determining that the system call event further includes a call to execute a child process inside the namespace; and responsive to determining that the system call event further includes a call to execute a child process inside the namespace: designating the child process as a mutation event to the existing container, and determining container information associated with the mutation event to the existing container. A corresponding computer system and computer program product are also disclosed.

Abstract: Methods and systems for verifying a resource definition include simulating an original resource definition to identify at least one change that is made to the original resource definition by a management service. A signature of a received resource definition is generated, omitting portions of the received resource definition that correspond to the at least one identified change. The signature of the received resource definition is compared to a signature of the original resource definition to find a match and to verify the received resource definition. The received resource definition is implemented, responsive to finding the match.

Abstract: Provided is an information processing apparatus including: an input unit into which shape data of a surface to be measured including a plurality of recesses is input; and a setting unit that detects each of the plurality of recesses on the basis of the input shape data and sets, for the detected recess, a region to be removed including the recess.

Abstract: According to an embodiment of the present invention, a method of measuring a surface of an object having a curved shape by measuring a distance from a measurement head to the object, includes: setting a measuring region of the object and a threshold value of concave and convex; acquiring shape reference data including the curved shape of the object; acquiring three-dimensional data of the surface of the object by measuring the distance between the object in the measuring region and the measurement head; acquiring curve removed data by removing the shape reference data from the three-dimensional data; calculating second reference data by calculating first reference data based on the curve removed data, by removing data exceeding the threshold value with respect to the first reference data, from the curve removed data, and by averaging the curve removed data; and calculating shape data of the concave and convex.

Abstract: Provided is an information processing apparatus including: an input unit into which shape data of a surface to be measured including a plurality of recesses is input; and a setting unit that detects each of the plurality of recesses on the basis of the input shape data and sets, for the detected recess, a region to be removed including the recess.

Abstract: According to an embodiment of the present invention, a method of measuring a surface of an object having a curved shape by measuring a distance from a measurement head to the object, includes: setting a measuring region of the object and a threshold value of concave and convex; acquiring shape reference data including the curved shape of the object; acquiring three-dimensional data of the surface of the object by measuring the distance between the object in the measuring region and the measurement head; acquiring curve removed data by removing the shape reference data from the three-dimensional data; calculating second reference data by calculating first reference data based on the curve removed data, by removing data exceeding the threshold value with respect to the first reference data, from the curve removed data, and by averaging the curve removed data; and calculating shape data of the concave and convex.

Abstract: In an evaluation device, an analyzer is rotated so that the azimuth of the transmission axis of the analyzer has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer. An imaging camera captures a regularly reflected image of a wafer under each condition, and an image processing unit evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer captured by the imaging camera.

Abstract: There is provide an inspection apparatus configured to detect a change in shape of a pattern in the depth direction o the pattern, the apparatus including: an illumination section 20 which illuminates a wafer 5 having a periodic pattern with an illumination light having transmittance with respect to the wafer 5; a reflected diffraction light detecting section 30 which outputs a first detection signal by receiving a reflected diffraction light generated by the pattern on a surface, of the wafer, on an illumination side illuminated with the illumination light; a transmitted diffraction light detecting section 40 which outputs a second detection signal by receiving a transmitted diffraction light generated by the pattern to a back surface, of the wafer, opposite to the illumination side; and a signal processing section 51 which detects a state of the pattern based on at least one of the first and second detection signals.

Abstract: In an evaluation device an analyzer is rotated so that the azimuth of the transmission axis of the analyzer has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer. An imaging camera captures a regularly reflected image of a wafer under each condition, and an image processing unit evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer captured by the imaging camera.

Abstract: In an evaluation device (1), an analyzer (42) is rotated so that the azimuth of the transmission axis of the analyzer (42) has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer (32), an imaging camera (44) captures a regularly reflected image of a wafer (10) under each condition, and an image processing unit (50) evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer (10) captured by the imaging camera (44).

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S121) which applies an inspection light to a surface of a wafer; a second step (S122) which detects a diffracted light from the surface of the wafer to which the inspection light has been applied; and a third step (S123) which checks whether a defect is present in the repeated pattern according to the diffracted light detected in the second step. The second step detects a diffracted light corresponding to a pattern having a pitch multiplied by 2 with respect to the pitch of the repeated pattern.

Abstract: A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S121) which applies an inspection light to a surface of a wafer; a second step (S122) which detects a diffracted light from the surface of the wafer to which the inspection light has been applied; and a third step (S123) which checks whether a defect is present in the repeated pattern according to the diffracted light detected in the second step. The second step detects a diffracted light corresponding to a pattern having a pitch multiplied by 2 with respect to the pitch of the repeated pattern.

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.

Abstract: An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.

Abstract: A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.

Abstract: An illumination optical apparatus is able to well suppress a change in a polarization state of light in an optical path and to illuminate a surface to be illuminated, with light in a desired polarization state or in an unpolarized state. The illumination optical apparatus illuminates the surface to be illuminated, based on light with a polarization degree of not less than 0.9 supplied from a light source. The illumination optical apparatus comprises a polarization setter disposed in the optical path between the light source and the surface to be illuminated, and adapted for setting a polarization state of light reaching the surface to be illuminated, to a predetermined polarization state, and a holding member for supporting one optical surface of at least one optically transparent member incorporated in an optical system in the optical path between the light source and the surface to be illuminated, at three points located in three regions respectively.

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.