Abstract: A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing

Abstract: An intake system for an internal combustion engine includes an intake manifold adapted to be attached to a side wall of the engine, and an air cleaner for supplying intake air to the intake manifold. The air cleaner is disposed opposite to the side wall of the engine while interposing therebetween the intake manifold. The air cleaner has an air cleaner main body joined with the intake manifold to constitute a single unit. The air cleaner main body is made of a material lower in the strength than a material which the intake manifold is made of.

Abstract: An organic electroluminescent device comprises a pair of electrodes, and a layer structure provided between the pair of electrodes and including a charge transport layer capable of transporting electrons or holes and an emission layer comprising a major proportion of an organic material capable of emitting light on application of a voltage thereto via the pair of electrodes. The organic material undergoes concentration quenching and the emission layer has a thickness of 4 nm or below. The emission layer may be made of an electroluminescent organic material, which has a fluorescent lifetime shorter than an organic material present in the charge transport layer.

Abstract: An intake system for an internal combustion engine includes an intake manifold adapted to be attached to a side wall of the engine, and an air cleaner for supplying intake air to the intake manifold. The air cleaner is disposed opposite to the side wall of the engine while interposing therebetween the intake manifold. The air cleaner has an air cleaner main body joined with the intake manifold to constitute a single unit. The air cleaner main body is made of a material lower in the strength than a material which the intake manifold is made of.

Abstract: An intake arrangement for a multi-cylinder internal combustion engine of a vehicle which has a row of cylinders. The arrangement includes an intake manifold, which includes a collector extending along a direction of the row of the cylinders and a branch portion communicated with the collector, a fuel pipe extending along the collector, and a protector extending along the fuel pipe between the branch portion and the fuel pipe. The fuel pipe is disposed at a downstream end portion of the branch portion which allows air to be introduced into the cylinders. The protector is secured to the downstream end portion of the branch portion and deformable to cover the fuel pipe upon an impact load being applied to the branch portion.

Abstract: An illumination optical system for illuminating an illumination area on an illumination surface based on a light from a light source has a wavefront dividing type optical integrator and a light source image enlarging member. The wavefront dividing type optical integrator is arranged in an optical path between the light source and the illumination surface which forms a plurality of light source image. The light source image enlarging member is arranged in an optical path between the light source and the optical integrator at or near a position optically conjugate with the illumination surface. The light source image enlarging member enlarges the light source image. The illumination area has a slot shape with a first dimension and a second dimension which is perpendicular to the first dimension and the light source image enlarging member stretches the light source image along the first direction corresponding to the first dimension.

Abstract: The present invention is aimed at providing a wavefront dividing type optical integrator which can yield a uniform illuminance distribution substantially over the whole illumination field formed thereby even when the size of each micro lens constituting the optical integrator is made smaller so as to set a large number of wavefront divisions. The optical integrator in accordance with the present invention is a wavefront dividing type optical integrator, having a number of micro lenses arranged two-dimensionally, for forming a number of light sources by dividing a wavefront of an incident beam; each micro lens having a rectangular entrance surface and a rectangular exit surface, and satisfying at least one of the following conditions: (d1/2)(D1/2)/(&lgr;·f)≧3.05 (d2/2)(D2/2)/(&lgr;·f)≧3.

Abstract: An organic electroluminescent device comprises a pair of electrodes and a layer structure provided between the paired electrodes and including, at least, an emission layer comprising a specific type of oligomer. The layer structure may further comprise an electron injection layer and an electron transport layer, one of which comprises a specific type of oligomer. Alternatively, the layer structure may be of the type which comprises an organic layer having a charge transport interference layer in the inside thereof along with an emission layer.

Abstract: An organic electroluminescent device comprises a pair of electrodes and a layer structure provided between the paired electrodes and including, at least, an emission layer comprising a specific type of oligomer. The layer structure may further comprise an electron injection layer and an electron transport layer, one of which comprises a specific type of oligomer. Alternatively, the layer structure may be of the type which comprises an organic layer having a charge transport interference layer in the inside thereof along with an emission layer.

Abstract: A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path.

Abstract: This invention pertains to systems for extending the pulse length of pulsed sources of optical radiation. These systems reduce peak optical pulse power without reducing average optical power. The pulse-width extending systems split optical pulses into pulse portions, introduce relative delays among the pulse portions, and then redirect the pulse portions (or portions thereof) along a common axis. Such pulse-width extending systems are especially useful in projection-exposure apparatus for the manufacture of semiconductor devices where short wavelength, high power optical sources tend to damage optical components.

Abstract: An intake arrangement for a multi-cylinder internal combustion engine of a vehicle which has a row of cylinders. The arrangement includes an intake manifold, which includes a collector extending along a direction of the row of the cylinders and a branch portion communicated with the collector, a fuel pipe extending along the collector, and a protector extending along the fuel pipe between the branch portion and the fuel pipe. The fuel pipe is disposed at a downstream end portion of the branch portion which allows air to be introduced into the cylinders. The protector is secured to the downstream end portion of the branch portion and deformable to cover the fuel pipe upon an impact load being applied to the branch portion.

Abstract: This invention pertains to systems for extending the pulse length of pulsed sources of optical radiation. These systems reduce peak optical pulse power without reducing average optical power. The pulse-width extending systems split optical pulses into pulse portions, introduce relative delays among the pulse portions, and then redirect the pulse portions (or portions thereof) along a common axis. Such pulse-width extending systems are especially useful in projection-exposure apparatus for the manufacture of semiconductor devices where short wavelength, high power optical sources tend to damage optical components.

Abstract: A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing

Abstract: A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing

Abstract: A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing

Abstract: A projection exposure apparatus including an Irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing

Abstract: An object of the invention is to provide an illumination apparatus and exposure apparatus and method employing this, whereby the illumination distribution on a mask or wafer can be compensated to a desired distribution, and whereby it is possible to independently alter the pupil shape (coherence factor) of illuminating light in respect of various image heights above the wafer.

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path.