Patents by Inventor Yuji Masui
Yuji Masui has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8035187Abstract: The present invention provides a semiconductor light receiving element capable of reducing capacity while minimizing increase in travel time of carriers. The semiconductor light receiving element includes a semiconductor stacked structure including a first conductivity type layer, a light absorbing layer, and a second conductivity type layer having a light incidence plane in order. The semiconductor light receiving element has an oxidation layer including a non-oxidation region and an oxidation region in a stacking in-plane direction in the light absorbing layer or between the first conductivity type layer and the light absorbing layer.Type: GrantFiled: January 29, 2009Date of Patent: October 11, 2011Assignee: Sony CorporationInventors: Yoshinori Yamauchi, Takahiro Arakida, Rintaro Koda, Norihiko Yamaguchi, Yuji Masui, Tomoyuki Oki
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Patent number: 8027370Abstract: The present invention provides a semiconductor device realizing improved adhesion between a low-dielectric-constant material and a semiconductor material. The semiconductor device includes, on a semiconductor layer, an adhesion layer and a low-dielectric-constant material layer in order from the semiconductor layer side. The adhesion layer has a projection/recess structure, and the low-dielectric-constant material layer is formed so as to bury gaps in the projection/recess structure.Type: GrantFiled: January 20, 2010Date of Patent: September 27, 2011Assignee: Sony CorporationInventors: Yuji Masui, Takahiro Arakida, Kayoko Kikuchi, Terukazu Naruse, Tomoyuki Oki, Naoki Jogan
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Patent number: 8022424Abstract: A method of manufacturing a semiconductor device capable of largely increasing the yield and a semiconductor device manufactured by using the method is provided. After a semiconductor layer is formed on a substrate, as one group, a plurality of functional portions with at least one parameter value different from each other is formed in the semiconductor layer for every unit chip area. Then, a subject that is changed depending on the parameter value is measured and evaluated and after that, the substrate is divided for every chip area so that a functional portion corresponding with a given criterion as a result of the evaluation is not broken. Thereby, at least one functional portion corresponding with a given criterion can be formed by every chip area by appropriately adjusting each parameter value.Type: GrantFiled: June 5, 2007Date of Patent: September 20, 2011Assignee: Sony CorporationInventors: Yuji Masui, Takahiro Arakida, Yoshinori Yamauchi, Kayoko Kikuchi, Rintaro Koda, Norihiko Yamaguchi
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Publication number: 20110176570Abstract: A semiconductor light emitting device includes a first-conductivity-type first multilayer film reflecting mirror, and a second-conductivity-type second multilayer film reflecting mirror; a cavity layer; and a first conductive section, a second conductive section, and a third conductive section. The cavity layer has a stacked configuration including a first-conductivity-type or undoped first cladding layer, an undoped first active layer, a second-conductivity-type or undoped second cladding layer, a second-conductivity-type first contact layer, a first-conductivity-type second contact layer, a first-conductivity-type or undoped third cladding layer, an undoped second active layer, and a second-conductivity-type or undoped fourth cladding layer.Type: ApplicationFiled: March 21, 2011Publication date: July 21, 2011Applicant: Sony CorporationInventors: Yuji Masui, Takahiro Arakida, Yoshinori Yamauchi, Rintaro Koda, Tomoyuki Oki, Naoki Jogan
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Patent number: 7965750Abstract: A semiconductor light emitting device includes a first-conductivity-type first multilayer film reflecting mirror, and a second-conductivity-type second multilayer film reflecting mirror; a cavity layer; and a first conductive section, a second conductive section, and a third conductive section. The cavity layer has a stacked configuration including a first-conductivity-type or undoped first cladding layer, an undoped first active layer, a second-conductivity-type or undoped second cladding layer, a second-conductivity-type first contact layer, a first-conductivity-type second contact layer, a first-conductivity-type or undoped third cladding layer, an undoped second active layer, and a second-conductivity-type or undoped fourth cladding layer.Type: GrantFiled: April 21, 2009Date of Patent: June 21, 2011Assignee: Sony CorporationInventors: Yuji Masui, Takahiro Arakida, Yoshinori Yamauchi, Rintaro Koda, Tomoyuki Oki, Naoki Jogan
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Publication number: 20110122910Abstract: The present invention provides a semiconductor device realizing reduced occurrence of a defect such as a crack at the time of adhering elements to each other. The semiconductor device includes a first element and a second element adhered to each other. At least one of the first and second elements has a pressure relaxation layer on the side facing the other of the first and second elements, and the pressure relaxation layer includes a semiconductor part having a projection/recess part including a projection projected toward the other element, and a resin part filled in a recess in the projection/recess part.Type: ApplicationFiled: January 31, 2011Publication date: May 26, 2011Applicant: Sony CorporationInventors: Rintaro Koda, Takahiro Arakida, Yuji Masui, Tomoyuki Oki
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Publication number: 20110064109Abstract: A laser diode with which separation of a current narrowing layer is able to be prevented is provided. The laser diode includes a mesa that has a first multilayer film reflector, an active layer, and a second multilayer film reflector in this order, and has a current narrowing layer for narrowing a current injected into the active layer and a buffer layer adjacent to the current narrowing layer. The current narrowing layer is formed by oxidizing a first oxidized layer containing Al. The buffer layer is formed by oxidizing a second oxidized layer whose material and a thickness are selected so that an oxidation rate is higher than that of the first multilayer film reflector and the second multilayer film reflector and is lower than that of the first oxidized layer. A thickness of the buffer layer is 10 nm or more.Type: ApplicationFiled: August 23, 2010Publication date: March 17, 2011Applicant: Sony CorporationInventors: Yuji Masui, Rintaro Koda, Tomoyuki Oki, Takahiro Arakida, Naoki Jogan, Yoshinori Yamauchi
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Publication number: 20110042558Abstract: An optical device and a method of making an optical device is described herein. The optical device comprises a housing, an optical element, a base structure that supports the optical element and that interfaces with the housing to form a gap section between an outer wall section of the base structure and an inner wall section of the housing, a resin within the gap section fixing the housing to the base structure, and a light accommodation section in the housing. The light accommodation section accommodates a transmittance of light to the resin within the gap section.Type: ApplicationFiled: August 3, 2010Publication date: February 24, 2011Applicant: Sony CorporationInventors: Terukazu Naruse, Takahiro Arakida, Hidehiko Nakata, Yuji Masui, Naoki Jogan
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Patent number: 7884386Abstract: A semiconductor light-emitting device includes a semiconductor light-emitting element including a first multilayer reflector, an active layer having a light-emitting region, and a second multilayer reflector in the stated order; a semiconductor light-detecting element disposed opposite the first multilayer reflector in relation to the semiconductor light-emitting element and including a light-absorbing layer configured to absorb light emitted from the light-emitting region; a transparent substrate disposed between the semiconductor light-emitting element and the semiconductor light-detecting element; a first metal layer having a first opening in a region including a region opposite the light-emitting region and bonding the semiconductor light-emitting element and the substrate; and a second metal layer having a second opening in a region including a region opposite the light-emitting region and bonding the semiconductor light-detecting element and the substrate.Type: GrantFiled: January 28, 2010Date of Patent: February 8, 2011Assignee: Sony CorporationInventors: Yuji Masui, Rintaro Koda, Osamu Maeda, Takahiro Arakida, Terukazu Naruse, Naoki Jogan
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Patent number: 7880178Abstract: The present invention provides a semiconductor device realizing reduced occurrence of a defect such as a crack at the time of adhering elements to each other. The semiconductor device includes a first element and a second element adhered to each other. At least one of the first and second elements has a pressure relaxation layer on the side facing the other of the first and second elements, and the pressure relaxation layer includes a semiconductor part having a projection/recess part including a projection projected toward the other element, and a resin part filled in a recess in the projection/recess part.Type: GrantFiled: April 15, 2008Date of Patent: February 1, 2011Assignee: Sony CorporationInventors: Rintaro Koda, Takahiro Arakida, Yuji Masui, Tomoyuki Oki
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Publication number: 20110019709Abstract: The present invention provides a method of manufacturing a semiconductor device realizing improved yield. The semiconductor device includes: a substrate having a top face, an under face, and side faces; an optical function unit formed on the top face; a plurality of electrode pads formed on the under face; and a wiring formed on at least the side face and electrically connecting the optical function unit and at least one of the plurality of electrode pads.Type: ApplicationFiled: July 8, 2010Publication date: January 27, 2011Applicant: Sony CorporationInventors: Yuji Masui, Takahiro Arakida, Naoki Jogan, Rintaro Koda, Kouichi Kondo
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Patent number: 7871841Abstract: A method of manufacturing a semiconductor light-emitting device includes steps of forming a vertical cavity structure including a layer to be oxidized on a semiconductor substrate, and then forming a circular groove having a depth which penetrates at least the layer to be oxidized from an upper surface of the vertical cavity structure, thereby forming a columnar mesa whose side face is surrounded by the groove, oxidizing the layer to be oxidized from the side face of the mesa, thereby forming a current confinement layer, and forming a mask layer covering at least a central region of the upper surface of the mesa and exposing at least an edge of the upper surface and the side face of the mesa to an external, and then etching at least the edge of the upper surface and the side face of the mesa by using the mask layer as a mask.Type: GrantFiled: October 1, 2008Date of Patent: January 18, 2011Assignee: Sony CorporationInventors: Yuji Masui, Takahiro Arakida, Yoshinori Yamauchi, Rintaro Koda, Tomoyuki Oki
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Patent number: 7873092Abstract: The present invention provides a laser diode realizing improved light detection precision. The laser diode includes a stack structure in which a first semiconductor layer of a first conduction type, an active layer, and a second semiconductor layer of a second conduction type are included in this order; a photodetection layer; and a plurality of light absorption layers provided on the corresponding position of antinodes or nodes of standing waves of light output from the active layer.Type: GrantFiled: October 31, 2007Date of Patent: January 18, 2011Assignee: Sony CorporationInventors: Yuji Masui, Takahiro Arakida, Yoshinori Yamauchi, Norihiko Yamaguchi, Rintaro Koda, Tomoyuki Oki
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Publication number: 20110007769Abstract: A laser diode includes: a first multilayer film reflecting mirror, an active layer, and a second multilayer film reflecting mirror in this order; and a first oxide narrowing layer and a second oxide narrowing layer. The first oxide narrowing layer is formed close to the active layer, in comparison with the second oxide narrowing layer, includes a first unoxidized region in a middle region in a plane, and includes a first oxidized region on a periphery of the first unoxidized region. The second oxide narrowing layer includes, in a region facing the first unoxidized region, a second unoxidized region having a diameter smaller than that of the first unoxidized region, includes a third unoxidized region in a region not facing the first unoxidized region, and includes a second oxidized region on a periphery of the second unoxidized region and the third unoxidized region.Type: ApplicationFiled: June 28, 2010Publication date: January 13, 2011Applicant: SONY CORPORATIONInventors: Yuji Masui, Osamu Maeda, Rintaro Koda, Takahiro Arakida, Naoki Jogan, Kouichi Kondo
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Publication number: 20100285625Abstract: A method for making a light-emitting element assembly including a support substrate having a first surface, a second surface facing the first surface, a recessed portion, and a conductive material layer formed over the first surface and the inner surface of the recessed portion, and a light-emitting element. The light-emitting element has a laminated structure including a first compound semiconductor layer, a light-emitting portion, and a second compound semiconductor layer, at least the second compound semiconductor layer and the light-emitting portion constituting a mesa structure. The light-emitting element further includes an insulating layer formed, a second electrode, and a first electrode. The mesa structure is placed in the recessed portion so that the conductive material layer and the second electrode are in at least partial contact with each other, and light emitted from the light-emitting portion is emitted from the second surface side of the first compound semiconductor layer.Type: ApplicationFiled: July 22, 2010Publication date: November 11, 2010Applicant: SONY CORPORATIONInventors: Rintaro Koda, Takahiro Arakida, Satoshi Taniguchi, Yuji Masui, Nobuhiro Suzuki, Tomoyuki Oki, Chiyomi Uchiyama, Kayoko Kikuchi
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Publication number: 20100226402Abstract: A laser diode allowed to stabilize the polarization direction of laser light in one direction is provided. The laser diode includes a laminate configuration including a lower multilayer reflecting mirror, an active layer and an upper multilayer reflecting mirror in order from a substrate side, in which the laminate configuration includes a columnar mesa section including an upper part of the lower multilayer reflecting mirror, the active layer and the upper multilayer reflecting mirror, and the lower multilayer reflecting mirror includes a plurality of pairs of a low refractive index layer and a high refractive index layer, and a plurality of oxidation layers nonuniformly distributed in a direction rotating around a central axis of the mesa section in a region except for a central region of one or more of the low refractive index layers.Type: ApplicationFiled: January 29, 2010Publication date: September 9, 2010Applicant: Sony CorporationInventors: Osamu Maeda, Yuji Masui, Masaki Shiozaki, Susumu Sato, Takahiro Arakida
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Patent number: 7791085Abstract: Disclosed herein is a semiconductor light emitting apparatus that includes: a semiconductor light emitting device having a first semiconductor laminate structure including a light emitting region, and a light outgoing window permitting the light emitted from the light emitting region to go out therethrough in the lamination direction; a light transmitting part provided in a region corresponding to the light emitting region; a metal part provided in a region, corresponding to an outer peripheral region of the light emitting region, of the first semiconductor laminate structure; and a semiconductor light detector having a second semiconductor laminate structure including a light absorbing layer for absorbing a part of the light incident from the lamination direction. In the apparatus, the semiconductor light emitting device, a layer including the light transmitting part and the metal part, and the semiconductor light detector are integrally formed in the state of being laminated in this order.Type: GrantFiled: November 27, 2006Date of Patent: September 7, 2010Assignee: Sony CorporationInventors: Rintaro Koda, Takahiro Arakida, Yoshinori Yamauchi, Norihiko Yamaguchi, Yuji Masui
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Patent number: 7787512Abstract: A light-emitting element assembly includes a support substrate having a first surface, a second surface facing the first surface, a recessed portion, and a conductive material layer formed over the first surface and the inner surface of the recessed portion, and a light-emitting element. The light-emitting element has a laminated structure including a first compound semiconductor layer, a light-emitting portion, and a second compound semiconductor layer, at least the second compound semiconductor layer and the light-emitting portion constituting a mesa structure. The light-emitting element further includes an insulating layer formed, a second electrode, and a first electrode. The mesa structure is placed in the recessed portion so that the conductive material layer and the second electrode are in at least partial contact with each other, and light emitted from the light-emitting portion is emitted from the second surface side of the first compound semiconductor layer.Type: GrantFiled: December 12, 2008Date of Patent: August 31, 2010Assignee: Sony CorporationInventors: Rintaro Koda, Takahiro Arakida, Satoshi Taniguchi, Yuji Masui, Nobuhiro Suzuki, Tomoyuki Oki, Chiyomi Uchiyama, Kayoko Kikuchi
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Publication number: 20100202486Abstract: A vertical cavity surface emitting laser capable of reducing parasitic capacitance while suppressing power consumption, and a method of manufacturing thereof are provided. The vertical cavity surface emitting laser includes a columnar mesa including, on a substrate, a first multilayer reflector, an active layer, and a second multilayer reflector in order from the substrate side, and also including a current narrowing layer. The columnar portion of the mesa including the active layer and the current narrowing layer is formed within a region opposed to the first multilayer reflector and a region opposed to the second multilayer reflector, and a cross section area of the columnar portion is smaller than a cross section area of the second multilayer reflector.Type: ApplicationFiled: January 20, 2010Publication date: August 12, 2010Applicant: Sony CorporationInventors: Yuji Masui, Takahiro Arakida, Terukazu Naruse, Rintaro Koda, Naoki Jogan
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Publication number: 20100202482Abstract: The present invention provides a semiconductor device realizing improved adhesion between a low-dielectric-constant material and a semiconductor material. The semiconductor device includes, on a semiconductor layer, an adhesion layer and a low-dielectric-constant material layer in order from the semiconductor layer side. The adhesion layer has a projection/recess structure, and the low-dielectric-constant material layer is formed so as to bury gaps in the projection/recess structure.Type: ApplicationFiled: January 20, 2010Publication date: August 12, 2010Applicant: Sony CorporationInventors: Yuji Masui, Takahiro Arakida, Kayoko Kikuchi, Terukazu Naruse, Tomoyuki Oki, Naoki Jogan