Patents by Inventor Yuki Endo

Yuki Endo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240168385
    Abstract: A protection film formation composition for a wet-etching solution for semiconductors, the protection film formation composition including: (A) a compound having no repeating structural unit and contains a terminal group (A1), a polyvalent group (A2) and a linking group (A3). Terminal group (A1) binds only to linking group (A3), polyvalent group (A2) binds only to linking group (A3), linking group (A3) binds to terminal group (A1) at one terminal and to polyvalent group (A2) at the other terminal and optionally binds to another linking group (A3), terminal group (A1) is represented by formula (I), polyvalent group (A2) represents a group having a valency of 2 to 4; and linking group (A3) represents an aromatic hydrocarbon group; (B) a thermoacid generator (B-1) and/or a curing agent (B-2); and (C) a solvent.
    Type: Application
    Filed: March 3, 2022
    Publication date: May 23, 2024
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Tokio NISHITA, Yuto HASHIMOTO, Yuki ENDO
  • Publication number: 20240151789
    Abstract: An angle adjustment mechanism has a block, a projecting piece, and a connection mechanism. The projecting piece is fixed to a stator. The connection mechanism has elongated holes provided in the block and a shaft member provided in the projecting piece. The shaft member is inserted in the elongated holes. During a tilt angle adjustment process, the shaft member is caused to move in a sliding motion in the elongated holes. During a cooling process, the shaft member is also caused to move in a sliding motion in the elongated holes.
    Type: Application
    Filed: November 6, 2023
    Publication date: May 9, 2024
    Applicant: JEOL Ltd.
    Inventors: Fumio Hobo, Yusuke Tanimoto, Yuki Endo, Hiroki Takahashi
  • Patent number: 11977331
    Abstract: A resist underlayer film that exhibits removability and preferably solubility only in wet etching reagent solutions, while exhibiting good resistance to resist developers that are resist solvents or aqueous alkali solutions. The composition for forming a resist underlayer film includes a dicyanostyryl group-bearing polymer (P) or dicyanostyryl group-bearing compound (C) and includes solvent, and does not contain a protonic acid curing catalyst and does not contain an alkylated aminoplast crosslinking agent derived from melamine, urea, benzoguanamine, or glycoluril.
    Type: Grant
    Filed: June 17, 2020
    Date of Patent: May 7, 2024
    Assignee: NISSAN CHEMICAL CORPORATION
    Inventors: Takafumi Endo, Yuki Endo
  • Patent number: 11965059
    Abstract: A protective film-forming composition including good mask (protection) function against a wet etching liquid and a high dry etching rate during processing of semiconductor substrates, including good coverage even in stepped substrates, and from which flat films can be formed due to a small difference in film thickness after embedding; a protective film produced using said composition; a substrate with a resist pattern; and a method for manufacturing a semiconductor device. A protective film-forming composition which protects against a semiconductor wet etching liquid, wherein a reaction product (P) of a diepoxy compound (B) and an bifunctional proton-generating compound (C) contains a structure represented by formula (1) (in formula (1), Ar represents a C6-40 aryl group, n represents an integer of 2-10, —Y— represents —OCO—, —O— or —S—, and * represents the bonding site with the reaction product (P) molecule terminal). The protective film-forming composition further includes an organic solvent (S).
    Type: Grant
    Filed: April 9, 2020
    Date of Patent: April 23, 2024
    Assignee: NISSAN CHEMICAL CORPORATION
    Inventors: Shigetaka Otagiri, Tokio Nishita, Takafumi Endo, Yuki Endo, Takahiro Kishioka
  • Publication number: 20240069129
    Abstract: A load unit jets a load gas from a cone-shaped slit to a first position located in a pathway. As a result, a first gas stream for loading a sample tube is generated. An eject unit jets an eject gas from a cone-shaped slit to a second position in the pathway. As a result, a second gas stream for ejecting a sample tube is generated.
    Type: Application
    Filed: August 24, 2023
    Publication date: February 29, 2024
    Inventor: Yuki Endo
  • Patent number: 11914009
    Abstract: An NMR apparatus includes a depressurizing device for depressurizing an NMR probe, a gas supply device for supplying gas into the NMR probe to thereby pressurize the NMR probe, and a control device. The control device alternately repeats depressurization of the NMR probe, using the depressurizing device, and pressurization of the NMR probe, using the gas supply device. This replaces the gas in the NMR probe.
    Type: Grant
    Filed: August 11, 2022
    Date of Patent: February 27, 2024
    Assignees: JEOL Ltd., OSAKA UNIVERSITY
    Inventors: Hiroki Takahashi, Yuki Endo, Toshimichi Fujiwara, Yoh Matsuki
  • Patent number: 11884839
    Abstract: An acetal-protected polysiloxane composition, used as a photosensitive composition and a coating composition for forming a flat film on a substrate to be processed for performing pattern reversal. A coating composition or photosensitive composition including: a polysiloxane obtained from a hydrolysis-condensation product of a hydrolyzable silane having 2 to 4 hydrolyzable groups in a molecule by protecting the condensation product's silanol groups with acetal groups, wherein in the hydrolysis-condensation product, an organic group bonded to silicon atoms through Si—C bonds exists in molar ratio of 0?(organic group)/(Si)?0.29 on average.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: January 30, 2024
    Assignee: NISSAN CHEMICAL CORPORATION
    Inventors: Yuki Endo, Hiroaki Yaguchi, Makoto Nakajima
  • Publication number: 20230393479
    Abstract: A resist underlayer film-forming composition contains: (A) a compound having a partial structure represented by Formula (1). In Formula (1), R1 and R2 each denote a hydrogen atom, an alkyl group having 1-10 carbon atoms or an aryl group having 6-40 carbon atoms, X denotes an alkyl group having 1-10 carbon atoms, a hydroxyl group, an alkoxy group having 1-10 carbon atoms, an alkoxycarbonyl group having 1-10 carbon atoms, a halogen atom, a cyano group, a nitro group or a combination of these, Y denotes a direct bond, an ether bond, a thioether bond or an ester bond, n is an integer between 0 and 4, and * denotes a site of bonding to a residue of compound (A)); and a solvent.
    Type: Application
    Filed: March 2, 2022
    Publication date: December 7, 2023
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Shun KUBODERA, Tokio NISHITA, Yuki ENDO, Takahiro KISHIOKA
  • Publication number: 20230341263
    Abstract: According to one embodiment of a method of generating synthesized light, a light emitter emits a first light element and a second light element, the synthesized light includes the first light element and the second light element, the first light element passing through a first optical path propagates toward a first direction, the second light element passing through a second optical path propagates toward a second direction, the first optical path has a first optical path length, the second optical path has a second optical path length, the first optical path length is different from the second optical path length, and the first direction is different from the second direction.
    Type: Application
    Filed: June 27, 2023
    Publication date: October 26, 2023
    Applicant: Japan Cell Co., Ltd.
    Inventors: Yuki ENDO, Hideo ANDO, Satoshi HAYATA
  • Publication number: 20230332618
    Abstract: A fluid machine includes a projection, projecting from one surface toward the other surface, is provided in at least one gap among a gap between an outer peripheral surface of a rotary shaft and an inner peripheral surface of a through hole, a gap between a rear surface of a first impeller and a first facing surface of a partition wall, and a gap between a rear surface of a second impeller and a second facing surface of the partition wall. The projection cooperates with the other surface to form therebetween a clearance smaller than a first tip clearance between the first impeller and a first shroud surface of a housing and a second tip clearance between the second impeller and a second shroud surface of the housing. The projection has a collision surface that collides with the other surface when the first impeller and the second impeller vibrate.
    Type: Application
    Filed: August 6, 2021
    Publication date: October 19, 2023
    Applicant: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Yuki OKANO, Hiroshi SAITO, Yuki ENDO
  • Publication number: 20230336047
    Abstract: A fluid machine includes a thrust bearing support supporting a dynamic thrust bearing that includes a first dynamic thrust bearing and a second dynamic thrust bearing and including a first bearing base and a second bearing base fixed to each other via a spacer member. The fluid machine includes a main passage through which fluid flows from a motor chamber toward an operation chamber, and a space between an inner side of the spacer member and an outer side of the first dynamic thrust bearing and the second dynamic thrust bearing in a radial direction of a rotary shaft. The space communicates with a first through hole of the first bearing base communicating with the motor chamber and a second through hole of the second bearing base communicating with the main passage. The thrust bearing support includes a connecting passage interconnecting the space and the main passage.
    Type: Application
    Filed: September 17, 2021
    Publication date: October 19, 2023
    Applicant: KABUSHIKI KAISAH TOYOTA JIDOSHOKKI
    Inventors: Yuki ENDO, Hiroshi SAITO, Yuki OKANO, Hayato ONDA
  • Publication number: 20230333470
    Abstract: A protective film formation composition contains a polymer having a unit structure represented by formula (1-1), a compound or a polymer having phenolic hydroxy group other than catechol, (C) a thermal acid generator, and (D) a solvent. (Ar represents a benzene, naphthalene, or an anthracene ring; R1 represents a hydroxy, mercapto,amino, halogeno, or an alkyl group that has 1-10 carbon atoms and that may be substituted or interrupted by a hetero atom and may be substituted by a hydroxy group; n1 represents an integer of 0-3; L1 represents a single bond or an alkylene group having 1-10 carbon atoms; E represents an epoxy group; when n2=1, T1 represents a single bond or an alkylene group having 1-10 carbon atoms and may be interrupted by an ether bond, an ester bond, or an amide bond; and when n2=2, T1 represents a nitrogen atom or an amide bond.
    Type: Application
    Filed: September 9, 2021
    Publication date: October 19, 2023
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Tokio NISHITA, Yuki ENDO
  • Patent number: 11774525
    Abstract: A direction shifting mechanism for changing a direction of a sample tube is installed on a path of the sample tube between a sample tube supporting unit for supporting, during an NMR measurement, the sample tube used for the NMR measurement and an insertion port through which the sample tube is inserted in and extracted from the sample tube supporting unit. The direction shifting mechanism has a shape which partially includes a form of an arc, and the shape is designed to cause the sample tube to change its direction in such a manner that the sample tube is turned toward the insertion port along the arc while being maintained in contact with at least two points on an inner wall of the direction shifting mechanism.
    Type: Grant
    Filed: March 14, 2022
    Date of Patent: October 3, 2023
    Assignee: JEOL Ltd.
    Inventors: Masahide Nishiyama, Yuki Endo, Hiroki Takahashi
  • Patent number: 11739761
    Abstract: A fluid machine includes a rotary shaft, an operation body configured to discharge fluid by rotation of the rotary shaft, a housing accommodating the rotary shaft and the operation body, and a foil bearing disposed in the housing rotatably supporting the rotary shaft. The foil bearing includes a cylindrical bearing housing, a top foil between the bearing housing and the rotary shaft, and a bump foil between the bearing housing and the top foil and elastically supporting the top foil. The bearing housing has a protrusion protruding inwardly in a radial direction from the bearing housing. The protrusion includes an abutment surface configured to restrict deformation of the bump foil to an elastic range not to reach a plastic range by abutting against the top foil or the bump foil when the top foil is displaced outwardly in the radial direction of the bearing housing.
    Type: Grant
    Filed: September 27, 2021
    Date of Patent: August 29, 2023
    Assignee: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Yuki Okano, Hiroshi Saito, Yuki Endo
  • Publication number: 20230213857
    Abstract: Provided is a resist underlayer film-forming composition that is used in a lithographic process in semiconductor manufacturing and has excellent storage stability. The resist underlayer film-forming composition contains: a polymer having a disulfide bond in a main chain; a radical trapping agent; and a solvent. The radical trapping agent is preferably a compound having a ring structure or a thioether structure. The ring structure is preferably an aromatic ring structure having 6-40 carbon atoms or a 2,2,6,6-tetramethylpiperidine structure.
    Type: Application
    Filed: February 13, 2020
    Publication date: July 6, 2023
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Satoshi KAMIBAYASHI, Takafumi ENDO, Yuto HASHIMOTO, Yuki ENDO, Takahiro KISHIOKA, Rikimaru SAKAMOTO
  • Publication number: 20230205086
    Abstract: A composition contains an organic solvent and compound (formula (1)), theoretical molecular weight 999 or less. (Z1 contains a nitrogen-containing heterocyclic ring; U represents a monovalent organic group (formula (2)); and p represents 2 to 4.) (In formula (2), R1 represents an alkylene group having 1 to 4 carbon atoms; A1 to A3 represent a hydrogen atom, or methyl or ethyl group: X represents —COO—, —OCO—, —O—, —S— or —NRa-; Ra represents a hydrogen atom or methyl group; Y represents a direct bond or optionally substituted alkylene group having 1 to 4 carbon atoms; R2, R3 and R4 represent a hydrogen atom or optionally substituted alkyl group having 1 to 10 carbon atoms or aryl group having 6 to 40 carbon atoms; R5 represents a hydrogen atom or hydroxy group; n represents 0 or 1; m1 and m2 represent 0 or 1; and * represents a binding site to Z1.
    Type: Application
    Filed: June 11, 2021
    Publication date: June 29, 2023
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Satoshi KAMIBAYASHI, Yuki ENDO
  • Publication number: 20230187208
    Abstract: A composition for protective film formation can form a flat film that satisfactorily functions as a mask (protection) against wet etchants during semiconductor substrate processing and has a low dry etching rate, the composition having satisfactory covering and recess-filling properties when applied to rugged substrates and having a small thickness difference after the recess filling. A protective film, a resist underlayer film, and a resist-pattern-coated substrate each produced using the composition; and a method for producing a semiconductor device. The composition, which is for forming films for protection against wet etchants for semiconductors, includes an organic solvent and a compound that has a molecular end having a structure including at least one pair of adjoining hydroxyl groups and has a molecular weight of 1,500 or less, wherein particles present therein have an average particle diameter, as determined by a dynamic light scattering method, of 3 nm or smaller.
    Type: Application
    Filed: June 11, 2021
    Publication date: June 15, 2023
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Tokio NISHITA, Yuto HASHIMOTO, Yuki ENDO
  • Patent number: 11675031
    Abstract: A rotation mechanism includes a bearing mechanism and a drive mechanism. Prior to loading of a sample unit, bearing gas is supplied to a bearing mechanism. In the course of inserting the sample unit, bearing gas is sprayed to a surface of the sample tube from around the sample tube to thereby center the sample unit.
    Type: Grant
    Filed: March 3, 2021
    Date of Patent: June 13, 2023
    Assignee: JEOL Ltd.
    Inventors: Yuki Endo, Yutaka Horino, Naohiro Kosaka, Atsuyuki Ichikawa
  • Publication number: 20230167829
    Abstract: A turbo fluid machine includes: a housing including an impeller chamber and a motor chamber accommodating an electric motor; an impeller that is accommodated in the impeller chamber and compresses fluid by the electric motor; a drive shaft extending in an axial direction of the drive shaft to connect the impeller and the electric motor; and a gasket sealing between the impeller chamber and an outside of the housing. The housing includes a first housing and a second housing that form the impeller chamber. The first housing and the second housing are arranged in the axial direction. The gasket is disposed between the first housing and the second housing in the axial direction. The first housing and the second housing are in contact with each other in the axial direction on at least one of an outer circumferential side and an inner circumferential side of the gasket.
    Type: Application
    Filed: November 17, 2022
    Publication date: June 1, 2023
    Applicant: KABUSHIKI KAISHA TOYOTA JIDOSHOKKI
    Inventors: Yuki OKANO, Hiroshi SAITO, Yuki ENDO
  • Publication number: 20230145398
    Abstract: An angle adjuster for nuclear magnetic resonance (NMR) includes a linear motion member composed of a shaft and a support member, a rotary member, a conversion mechanism, and a spring. The linear motion member is a member that serves to change, in an NMR probe device, an angle of a sample tube by a linear motion. The rotary member is rotated by a motor. The conversion mechanism converts a rotary motion of the rotary member into a linear motion of the linear motion member. The spring provides, at a portion where the linear motion member and the rotary member are in engagement with each other, a force that urges the linear motion member in one direction toward the rotary member.
    Type: Application
    Filed: November 10, 2022
    Publication date: May 11, 2023
    Inventor: Yuki Endo