Abstract: An angle adjuster for nuclear magnetic resonance (NMR) includes a linear motion member composed of a shaft and a support member, a rotary member, a conversion mechanism, and a spring. The linear motion member is a member that serves to change, in an NMR probe device, an angle of a sample tube by a linear motion. The rotary member is rotated by a motor. The conversion mechanism converts a rotary motion of the rotary member into a linear motion of the linear motion member. The spring provides, at a portion where the linear motion member and the rotary member are in engagement with each other, a force that urges the linear motion member in one direction toward the rotary member.

Abstract: An information processing apparatus includes a crowd characteristic estimator and a plan controller. The crowd characteristic estimator estimates information regarding a characteristic of a crowd on the basis of a sensing result of an external environment. The crowd is a collection of individuals present in the external environment. The plan controller controls a creation mode of an action plan for a movable body in the external environment on the basis of at least the information regarding the characteristic.

Abstract: A resist underlayer film forming composition which has high storage stability, has a low film curing start temperature, can cause the generation of a sublimated product in a reduced amount, and enables the formation of a film that is rarely eluted into a photoresist solvent; a method for forming a resist pattern using the resist underlayer film forming composition; and a method for manufacturing a semiconductor device. The resist underlayer film forming composition includes a crosslinkable resin, a crosslinking agent, a crosslinking catalyst represented by formula (I) and a solvent. (A-SO3)?(BH)+[wherein A represents a linear, branched or cyclic saturated or unsaturated aliphatic hydrocarbon group which may be substituted, an aryl group which may be substituted by a group other than a hydroxy group, or a heteroaryl group which may be substituted; and B represents a base having a pKa value of 6.5 to 9.5.

Abstract: A protective film-forming composition excelling in preservation stability and having a favorable masking (protection) function against wet etching solutions when processing a semiconductor substrate, a protective film manufactured by using the composition, a substrate with a resist pattern, and a method for manufacturing a semiconductor device. The protective film-forming composition provides protection against wet etching solutions for semiconductors and contains: a polymer having a unit structure represented by Formula (1-1): Ar represents a benzene ring, a naphthalene ring, or an anthracene ring; R1 represents a hydroxy group, a mercapto group; n1 represents an integer from 0-3; n2 represents 1 or 2; L1 represents a single bond or an alkylene group that has 1-10 carbons; E represents an epoxy group; when n2=1, T1 represents an alkylene group that has 1-10 carbons; and when n2=2, T1 represents a nitrogen atom or an amide bond.

Abstract: Provided is a method for producing a polymer, comprising: a first step for synthesizing a crude polymer by reacting a monomer containing a pyrimidinetrione structure, an imidazolidinedione structure, or a triazinetrione structure, in an organic solvent in the presence of a quaternary phosphonium salt or quaternary ammonium salt; and a second step for precipitating and separating a purified polymer by mixing a poor solvent with the crude polymer-containing solution obtained in the first step.

Abstract: An NMR apparatus includes a depressurizing device for depressurizing an NMR probe, a gas supply device for supplying gas into the NMR probe to thereby pressurize the NMR probe, and a control device. The control device alternately repeats depressurization of the NMR probe, using the depressurizing device, and pressurization of the NMR probe, using the gas supply device. This replaces the gas in the NMR probe.

Abstract: Provided is a composition which is for forming a resist underlayer film and with which the amount of a sublimate derived from a low-molecular-weight component such as an oligomer can be reduced, the composition comprising, for example, an organic solvent and a polymer having a repeating unit represented by formula (1-1), wherein the content of a low-molecular-weight component having a weight average molecular weight of 1,000 or less is 10 mass % or less in the polymer.

Abstract: An acoustic wave resonator includes: a piezoelectric substrate; and an interdigital transducer (IDT) located on the piezoelectric substrate, the IDT including a pair of comb-shaped electrodes having a plurality of electrode fingers and a bus bar to which the plurality of electrode fingers are coupled, the IDT having: a first region in which a pitch of electrode fingers is substantially constant; a second region in which a pitch of electrode fingers decreases at closer distances to an outer side; and a third region in which a pitch of electrode fingers increases at closer distances to an outer side, the second region being located outside the first region in an arrangement direction of the plurality of electrode fingers, and the third region being located outside the second region in the arrangement direction.

Abstract: An information processing device (100) according to an embodiment includes a reception unit (121) that accepts designation of a tracking target, a setting unit (127) that sets a virtual tracking target different from the tracking target, and a drive control unit (129) that controls driving of a mobile body on the basis of the virtual tracking target.

Abstract: A resist underlayer film that exhibits removability and preferably solubility only in wet etching reagent solutions, while exhibiting good resistance to resist developers that are resist solvents or aqueous alkali solutions. The composition for forming a resist underlayer film includes a dicyanostyryl group-bearing polymer (P) or dicyanostyryl group-bearing compound (C) and includes solvent, and does not contain a protonic acid curing catalyst and does not contain an alkylated aminoplast crosslinking agent derived from melamine, urea, benzoguanamine, or glycoluril.

Abstract: A resist underlayer film having an especially high dry etching rate; a composition for forming the resist underlayer film; a method for forming a resist pattern; and a method for producing a semiconductor device. The composition for forming the resist underlayer film has a solvent and a product of reaction between an epoxidized compound and a heterocyclic compound containing at least one moiety having reactivity with an epoxy group. It is preferable that the heteroring contained in the heterocyclic compound be selected from among furan, pyrrole, pyran, imidazole, pyrazole, oxazole, thiophene, thiazole, thiadiazole, imidazolidine, thiazolidine, imidazoline, dioxane, morpholine, diazine, thiazine, triazole, tetrazole, dioxolane, pyridazine, pyrimidine, pyrazine, piperidine, piperazine, indole, purine, quinoline, isoquinoline, quinuclidine, chromene, thianthrene, phenothiazine, phenoxazine, xanthene, acridine, phenazine, and carbazole.

Abstract: A resist underlayer film, which, while exhibiting excellent resistance to a resist developer which is a resist solvent or an alkaline aqueous solution, exhibits removability, and preferably solubility, only in wet etching chemicals. This composition for forming a resist underlayer film contains a solvent, a heterocyclic compound having a dicyanostyryl group, a cyclic compound including an amide group, for example, and the reaction product of a heterocyclic compound precursor having an epoxy group and an active proton compound, for example.

Abstract: A direction shifting mechanism for changing a direction of a sample tube is installed on a path of the sample tube between a sample tube supporting unit for supporting, during an NMR measurement, the sample tube used for the NMR measurement and an insertion port through which the sample tube is inserted in and extracted from the sample tube supporting unit. The direction shifting mechanism has a shape which partially includes a form of an arc, and the shape is designed to cause the sample tube to change its direction in such a manner that the sample tube is turned toward the insertion port along the arc while being maintained in contact with at least two points on an inner wall of the direction shifting mechanism.

Abstract: A protective film-forming composition including good mask (protection) function against a wet etching liquid and a high dry etching rate during processing of semiconductor substrates, including good coverage even in stepped substrates, and from which flat films can be formed due to a small difference in film thickness after embedding; a protective film produced using said composition; a substrate with a resist pattern; and a method for manufacturing a semiconductor device. A protective film-forming composition which protects against a semiconductor wet etching liquid, wherein a reaction product (P) of a diepoxy compound (B) and an bifunctional proton-generating compound (C) contains a structure represented by formula (1) (in formula (1), Ar represents a C6-40 aryl group, n represents an integer of 2-10, —Y— represents —OCO—, —O— or —S—, and * represents the bonding site with the reaction product (P) molecule terminal). The protective film-forming composition further includes an organic solvent (S).

Abstract: A rotary connector includes a case, a rotor, a flexible cable, an external connection terminal, and a terminal holder. The case includes an outer cylindrical part, the rotor includes an inner cylindrical part, disposed within a housing space of the case, and is rotatably held by the case, the flexible cable is housed in a wound state between the inner cylindrical part and the outer cylindrical part within the housing space, the external connection terminal is provided on an end portion of the flexible cable, and the terminal holder holds the external connection terminal, such that the external connection terminal is movable in a first axis direction and in a second axis direction and is rotatable about a rotation center axis that is parallel to the first axis direction. The first axis direction intersects the second axis direction.

Abstract: A fluid machine includes a rotary shaft, an operation body configured to discharge fluid by rotation of the rotary shaft, a housing accommodating the rotary shaft and the operation body, and a foil bearing disposed in the housing rotatably supporting the rotary shaft. The foil bearing includes a cylindrical bearing housing, a top foil between the bearing housing and the rotary shaft, and a bump foil between the bearing housing and the top foil and elastically supporting the top foil. The bearing housing has a protrusion protruding inwardly in a radial direction from the bearing housing. The protrusion includes an abutment surface configured to restrict deformation of the bump foil to an elastic range not to reach a plastic range by abutting against the top foil or the bump foil when the top foil is displaced outwardly in the radial direction of the bearing housing.

Abstract: A composition for forming a protective film having excellent resistance to a wet etching solution for semiconductors during a lithographic process in the manufacture of semiconductors; a method of forming a resist pattern using said protective film; and a method for manufacturing a semiconductor device. This composition for forming a protective film against a wet etching solution for semiconductors includes: a compound or polymer which contains at least one among an acetal structure and an amide structure; and a solvent. The polymer is preferably a copolymer of: a compound (a) containing at least one acetal structure in a molecule; and a compound (b) containing at least one amide structure in a molecule.

Abstract: A rotational force is applied to a sample tube by blowing of a drive gas to the sample tube. A spinning frequency of the sample tube is sequentially detected as a detection value. Acceleration control to gradually increase a pressure of the drive gas is executed until the detection value reaches a target value. In a process of the acceleration control, abnormality is determined based on a change with respect to time (difference: ?F) of the detection value. The determination is executed in a section of interest including a resonance frequency.

Abstract: A rotation mechanism includes a bearing mechanism and a drive mechanism. Prior to loading of a sample unit, bearing gas is supplied to a bearing mechanism. In the course of inserting the sample unit, bearing gas is sprayed to a surface of the sample tube from around the sample tube to thereby center the sample unit.

Abstract: A resist underlayer film having a particularly high dry etching rate; a resist underlayer film-forming composition; a resist pattern forming method; and a semiconductor device production method. The resist underlayer film-forming composition contains a solvent and an epoxy adduct obtained by reacting a compound represented by formula (1) and an epoxy adduct-forming compound. The epoxy adduct-forming compound is one or more compounds selected from the group made of carboxylic acid-containing compounds, carboxylic anhydride-containing compounds, hydroxy group-containing compounds, thiol group-containing compounds, amino group-containing compounds, and imide group-containing compounds.