Abstract: An object of the present disclosure is to perform appropriate communication quality control even when a terminal out of management of a controller is connected to an access point. The present disclosure is a control system for controlling traffic of a wireless network, the control system including: a terminal and an access point that mutually transmit a packet via the wireless network; and a controller that performs transmission control with respect to the terminal and the access point, in which the controller notifies the access point of information of a terminal under management of the own device, and the access point collates information of the terminal a notification of which has been given with information of a terminal connected to the own device, and suppresses notification of transmission permission to an unmanaged terminal different from a terminal under management of the controller.

Abstract: A working method using an AUV includes a step of working on a work object with a work device included in the AUV while causing the AUV to sail along the work object, a step of dropping and sinking a transponder to the bottom of water, a step of causing the AUV to sail toward a return destination, and a step of resuming work on the work object by causing the AUV to sail from a return destination to the vicinity of a work suspended position, at which work on the work object is suspended, based on information obtained by acoustic positioning using the transponder that is sunk to the bottom of water.

Abstract: An engine system in which blow-by gas with a specific gravity less than 1 with reference to air is generatable includes a cylinder block. The cylinder block includes a cylinder and a crank chamber which are arranged in an up/down direction, the crank chamber being positioned below the cylinder. An internal peripheral face of the cylinder block has a ventilation port that connects to a ventilation passage that connects an internal space of the crank chamber with an external space out of the cylinder block, and that is open. The ventilation port is placed above a center in the up/down direction in the crank chamber.

Abstract: The present technology relates to an information processing device and an information processing method that enable output of information using a more optimal output modal. Provided is an information processing device including a processing unit configured to perform processes of: acquiring apparatus information regarding an output modal for each electronic apparatus; selecting an electronic apparatus having an output modal that outputs information from among a plurality of electronic apparatuses on the basis of the acquired apparatus information; and outputting the information from an output modal of the selected electronic apparatus. The present technology can be applied to, for example, electronic apparatuses such as information apparatuses, video apparatuses, audio apparatuses, or household electrical appliances.

Abstract: A bevel portion treatment agent composition of the present invention is a bevel portion treatment agent composition containing a silylating agent, which is used for treating a bevel portion of a wafer, in which a surface modification index Y and a surface modification index Z measured by a predetermined procedure have a characteristic of satisfying 0.5?Y/Z?1.0.

Abstract: A surface treatment method for semiconductor substrates of the present invention is a treatment method of treating a main surface of a semiconductor substrate that has, on the main surface of the substrate, a pattern formation region in which a pattern having a concave-convex structure with a pattern dimension of 30 nm or less is formed and a bevel region which is formed on a periphery of the pattern formation region, the method including a surface treatment step of bringing a surface treatment agent composition including a silylating agent into contact with the pattern formation region and the bevel region on the main surface of the semiconductor substrate, in which, with respect to a surface of a silicon oxide substrate brought into contact with the surface treatment agent composition, an IPA receding contact angle is 3° or more at a room temperature of 25° C., and/or a water receding contact angle is 40° or more at the room temperature of 25° C.

Abstract: A surface treatment method for a semiconductor substrate of the present invention is a treatment method of treating a main surface of a semiconductor substrate that has, on the main surface of the substrate, a pattern formation region in which a pattern having a concave-convex structure with a pattern dimension of 30 nm or less is formed and a pattern non-formation region in which no pattern is formed, the method including a surface treatment step of bringing a surface treatment agent composition including a silylating agent into contact with the pattern formation region and the pattern non-formation region on the main surface of the semiconductor substrate, in which, with respect to a surface of the pattern non-formation region after the surface treatment step, an IPA contact angle with 2-propanol is 2° or more at a room temperature of 25° C. and/or a water contact angle with pure water is 50° or more at the room temperature of 25° C.

Abstract: According to the present disclosure, there are provided a surface treatment agent having the advantage that the raw material components can be dissolved in a short time during preparation of the surface treatment agent and capable of exerting a good water repellency imparting effect, and a method of manufacturing a surface-treated body with the use of the surface treatment agent. The surface treatment agent according to the present disclosure includes the following components: (I) at least one kind selected from the group consisting of silicon compounds represented by the following general formulas [1], [2] and [3]; (II) at least one kind selected from the group consisting of a nitrogen-containing heterocyclic compound represented by the following general formula [4], a nitrogen-containing heterocyclic compound represented by the following general formula [5], and imidazole; and (III) an organic solvent.

Abstract: The sublimable film formation composition of the present invention includes a sublimable substance and a solvent in which a saturation solubility of the sublimable substance is more than 10% by mass.

Abstract: Please substitute the new Abstract submitted herewith for the original Abstract: The present disclosure provides a surface treatment agent capable of not only being prepared by dissolving raw materials in a short time but also exerting a good water repellency imparting effect, and a method for manufacturing a surface treated body with the use of the surface treatment agent.

Abstract: The composition for drying an uneven pattern of the present invention includes a sublimable substance, and a solvent whose boiling point at 1 atm is lower than a boiling point or a sublimation point of the sublimable substance by 5° C. or more and whose boiling point at 1 atm is 75° C. or lower.

Abstract: According to the present disclosure, there is provided a water-repellent protective film-forming liquid chemical capable of achieving an improved water repellency imparting effect. The water-repellent protective film-forming liquid chemical according to the present disclosure contains the following compositions: (I) an aminosilane composition of the following general formula [1]; (II) a silicon compound of the following general formula [2]; and (III) an aprotic solvent, wherein the amount of the component (I) contained is 0.02 to 0.5 mass % based on the total amount of the components (I) to (III).

Abstract: A bevel portion treatment agent composition of the present invention is a bevel portion treatment agent composition containing a silylating agent, which is used for treating a bevel portion of a wafer, in which a surface modification index Y and a surface modification index Z measured by a predetermined procedure have a characteristic of satisfying 0.5?Y/Z?1.0.

Abstract: The present invention provides a gas generator including: a housing having a top plate, a bottom plate located axially opposite to the top plate, and a circumferential wall located between the top plate and the bottom plate and provided with a gas discharge port; a partition wall provided with a single first communication hole, the partition wall being radially disposed in the housing to partition an interior of the housing into a first combustion chamber on the side of the top plate, which accommodates a first gas generating agent, and a second combustion chamber on the side of the bottom plate, which accommodates a second gas generating agent; a cylindrical guide member disposed between the first igniter attached to the bottom surface and the first communication hole, and provided with a second communication hole in a cylindrical wall thereof, the cylindrical guide member being disposed so as to enclose the first igniter, such that a second end opening thereof is connected to the first communication hole

Abstract: The present invention provides a gas generator including: a housing including a top plate, a bottom plate axially opposite to the top plate, and a circumferential wall located between the top plate and the bottom plate and provided with a gas discharge port; a partition wall having a single connection hole and a second communication hole, the partition wall being radially disposed in the housing to partition an interior of the housing into a first combustion chamber on the side of the top plate, which accommodates a first gas generating agent, and a second combustion chamber on the side of the bottom plate, which accommodates a second gas generating agent; an inner cylindrical member disposed in the housing to enclose the first igniter attached to the bottom plate, such that a second end opening side thereof passes through the connection hole in the partition wall in order to be located within the first combustion chamber, closer to the top plate than the partition wall is, and to be spaced from the top p

Abstract: According to the present disclosure, there are provided a surface treatment agent having the advantage that the raw material components can be dissolved in a short time during preparation of the surface treatment agent and capable of exerting a good water repellency imparting effect, and a method of manufacturing a surface-treated body with the use of the surface treatment agent. The surface treatment agent according to the present disclosure includes the following components: (I) at least one kind selected from the group consisting of silicon compounds represented by the following general formulas [1], [2] and [3]; (II) at least one kind selected from the group consisting of a nitrogen-containing heterocyclic compound represented by the following general formula [4], a nitrogen-containing heterocyclic compound represented by the following general formula [5], and imidazole; and (III) an organic solvent.

Abstract: According to the present disclosure, there is provided a water-repellent protective film-forming liquid chemical capable of achieving an improved water repellency imparting effect. The water-repellent protective film-forming liquid chemical according to the present disclosure contains the following compositions: (I) an aminosilane composition of the following general formula [1]; (II) a silicon compound of the following general formula [2]; and (III) an aprotic solvent, wherein the amount of the component (I) contained is 0.02 to 0.5 mass % based on the total amount of the components (I) to (III).

Abstract: The present invention is directed to a liquid chemical for forming a water-repellent protective film on a silicon element-containing wafer surface, a method of preparing the liquid chemical and a method of manufacturing a surface-treated body with the use of the liquid chemical, wherein the liquid chemical includes the following components: (I) a silylation agent; (II) at least one kind of nitrogen-containing compound selected from the group consisting of those of the following general formulas [1] and [2]; and (III) an organic solvent.

Abstract: The present invention is directed to a novel water-repellent protective film-forming agent and a novel water-repellent protective film-forming liquid chemical, each of which is for forming a water-repellent protective film on a silicon element-containing surface of a wafer, and a method of surface-treating a wafer with the use of the agent in liquid form or the liquid chemical. The water-repellent protective film-forming agent according to the present invention includes at least one kind of silicon compound selected from the group consisting of guanidine derivatives of the following general formula [1] and amidine derivatives of the following general formula [2].

Abstract: Provided is a gas generator including in a housing having a top plate, a bottom plate and a circumferential wall provided with a gas discharge port; a first combustion chamber arranged on the side of the top plate; a second combustion chamber arranged on the side of the bottom plate; a plenum chamber facing the gas discharge port and arranged between the first combustion chamber and the second combustion chamber; a first igniter for igniting and burning a first gas generating agent in the first combustion chamber; and a second igniter for igniting and burning a second gas generating agent in the second combustion chamber.