Patents by Inventor Yuki SUKA

Yuki SUKA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11066430
    Abstract: A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: July 20, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Patent number: 10975042
    Abstract: The present invention is a method for purifying an NCA, including the steps of: a) dissolving an NCA contaminated with impurities into a solvent which is a good solvent and is not a chlorinated solvent followed by stirring to precipitate an undissolved impurity to afford a suspension, b) adding an acidic filter aid having ability to trap a basic impurity to the obtained suspension followed by filtration and/or forming a fixed bed of the acidic filter aid having ability to trap a basic impurity followed by filtering the suspension to bring the suspension to be in contact with the acidic filter aid having ability to trap a basic impurity, and c) adding the obtained filtrate dropwise to a poor solvent for NCA to crystallize out the NCA in which the impurities are removed. This makes it possible to purify a low-purity NCA conveniently to afford a high-purity NCA.
    Type: Grant
    Filed: May 21, 2019
    Date of Patent: April 13, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuki Suka, Yuji Harada, Shiori Nonaka, Kazuomi Sato, Takeru Watanabe, Takehiko Ishii
  • Patent number: 10836861
    Abstract: A polyalkylene glycol derivative with a minimal impurity content is prepared simply by the steps of reacting a compound having formula (III-I) or (III-II) with an electrophile having formula (IV) in the presence of an optional basic compound, to form a reaction solution containing a compound having formula (V), and passing the reaction solution through a column of cation and anion exchange resins to remove water-soluble impurities, for thereby purifying the desired polyalkylene glycol derivative.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: November 17, 2020
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shiori Nonaka, Yuki Suka, Yuji Harada
  • Publication number: 20200102271
    Abstract: A novel onium salt having formula (1) and a resist composition comprising the same as a quencher are provided. When the resist composition is processed by photolithography using high-energy radiation, there is formed a resist pattern which is improved in LWR and CDU. In formula (1), R1, R2 and R3 each are a C1-C20 monovalent hydrocarbon group which may contain a heteroatom exclusive of fluorine, and Z+ is a sulfonium, iodonium or ammonium cation.
    Type: Application
    Filed: September 26, 2019
    Publication date: April 2, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Kazuya Honda, Yuki Suka, Yuki Kera
  • Patent number: 10550136
    Abstract: A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: February 4, 2020
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Publication number: 20190359579
    Abstract: The present invention is a method for purifying an NCA, including the steps of: a) dissolving an NCA contaminated with impurities into a solvent which is a good solvent and is not a chlorinated solvent followed by stirring to precipitate an undissolved impurity to afford a suspension, b) adding an acidic filter aid having ability to trap a basic impurity to the obtained suspension followed by filtration and/or forming a fixed bed of the acidic filter aid having ability to trap a basic impurity followed by filtering the suspension to bring the suspension to be in contact with the acidic filter aid having ability to trap a basic impurity, and c) adding the obtained filtrate dropwise to a poor solvent for NCA to crystallize out the NCA in which the impurities are removed. This makes it possible to purify a low-purity NCA conveniently to afford a high-purity NCA.
    Type: Application
    Filed: May 21, 2019
    Publication date: November 28, 2019
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuki SUKA, Yuji HARADA, Shiori NONAKA, Kazuomi SATO, Takeru WATANABE, Takehiko ISHII
  • Patent number: 10472377
    Abstract: A method for producing a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end, a polymerization initiator for use in the method, and a precursor of the polymerization initiator are provided.
    Type: Grant
    Filed: June 13, 2017
    Date of Patent: November 12, 2019
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Publication number: 20190322688
    Abstract: A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst.
    Type: Application
    Filed: June 27, 2019
    Publication date: October 24, 2019
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Publication number: 20190315777
    Abstract: A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst.
    Type: Application
    Filed: June 27, 2019
    Publication date: October 17, 2019
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Patent number: 10377775
    Abstract: A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: August 13, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Publication number: 20190023841
    Abstract: A polyalkylene glycol derivative with a minimal impurity content is prepared simply by the steps of reacting a compound having formula (III-I) or (III-II) with an electrophile having formula (IV) in the presence of an optional basic compound, to form a reaction solution containing a compound having formula (V), and passing the reaction solution through a column of cation and anion exchange resins to remove water-soluble impurities, for thereby purifying the desired polyalkylene glycol derivative.
    Type: Application
    Filed: July 23, 2018
    Publication date: January 24, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shiori NONAKA, Yuki SUKA, Yuji HARADA
  • Publication number: 20170275305
    Abstract: A method for producing a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end, a polymerization initiator for use in the method, and a precursor of the polymerization initiator are provided.
    Type: Application
    Filed: June 13, 2017
    Publication date: September 28, 2017
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Patent number: 9708350
    Abstract: A method for producing a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end, a polymerization initiator for use in the method, and a precursor of the polymerization initiator are provided.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: July 18, 2017
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Publication number: 20160159831
    Abstract: A method simply produces a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end without using a heavy metal catalyst.
    Type: Application
    Filed: December 4, 2015
    Publication date: June 9, 2016
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Publication number: 20160159979
    Abstract: A method for producing a narrowly distributed and high-purity polyalkylene glycol derivative having an amino group at an end, a polymerization initiator for use in the method, and a precursor of the polymerization initiator are provided.
    Type: Application
    Filed: December 4, 2015
    Publication date: June 9, 2016
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Shiori Nonaka
  • Patent number: 9284408
    Abstract: A method for producing a narrow molecular weight distribution polyalkylene glycol derivative having an amino group at an end is provided and allows for polymerization of ethylene oxide under mild conditions with suppressed occurrence of diol polymer impurities includes at least the steps of polymerizing ethylene oxide by using a compound represented by the following general formula (2) and converting a polymer end to R3: wherein R1 represents a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 10 carbon atoms; R2 represents a linear or branched divalent hydrocarbon group having 1 to 5 carbon atoms; R3 represents a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms; M represents sodium or potassium; m represents an integer of 1 to 5; n represents an integer of 1 to 450; and k represents an integer of 1 to 5.
    Type: Grant
    Filed: January 14, 2015
    Date of Patent: March 15, 2016
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Osamu Watanabe
  • Patent number: 9187404
    Abstract: A method for producing a narrow molecular weight distribution polyalkylene glycol derivative having an amino group at an end under mild conditions. A method for producing a compound of the general formula (1): CH3O(CH2CH2O)nCH2CH2CH2NH2 (wherein n is an integer of 1 to 450) comprises the following steps of: 1) a step of producing a compound of the general formula (3): CH3O(CH2CH2O)k-1CH2CH2O?M+ from a compound of the general formula (2): CH3O(CH2CH2O)kH (wherein k is an integer of 2 to 5); 2) a step of producing a compound of the general formula (4): CH3O(CH2CH2O)n-1CH2CH2O?M+ from a compound of the general formula (3); 3) a step of reacting a compound of the general formula (4) with acrylonitrile to obtain a compound of the general formula (5): CH3O(CH2CH2O)nCH2CH2CN; and 4) a step of reducing a compound of the general formula (5) to obtain a compound of the general formula (1).
    Type: Grant
    Filed: January 14, 2015
    Date of Patent: November 17, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuji Harada, Yuki Suka, Osamu Watanabe, Takeru Watanabe
  • Publication number: 20150197601
    Abstract: A method for producing a narrow molecular weight distribution polyalkylene glycol derivative having an amino group at an end is provided and allows for polymerization of ethylene oxide under mild conditions with suppressed occurrence of diol polymer impurities includes at least the steps of polymerizing ethylene oxide by using a compound represented by the following general formula (2) and converting a polymer end to R3: wherein R1 represents a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 10 carbon atoms; R2 represents a linear or branched divalent hydrocarbon group having 1 to 5 carbon atoms; R3 represents a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms; M represents sodium or potassium; m represents an integer of 1 to 5; n represents an integer of 1 to 450; and k represents an integer of 1 to 5.
    Type: Application
    Filed: January 14, 2015
    Publication date: July 16, 2015
    Inventors: Yuki Suka, Yuji Harada, Takeru Watanabe, Osamu Watanabe
  • Publication number: 20150197482
    Abstract: A method for producing a narrow molecular weight distribution polyalkylene glycol derivative having an amino group at an end under mild conditions. A method for producing a compound of the general formula (1): CH3O(CH2CH2O)nCH2CH2CH2NH2 (wherein n is an integer of 1 to 450) comprises the following steps of: 1) a step of producing a compound of the general formula (3): CH3O(CH2CH2O)k-1CH2CH2O?M+ from a compound of the general formula (2): CH3O(CH2CH2O)kH (wherein k is an integer of 2 to 5); 2) a step of producing a compound of the general formula (4): CH3O(CH2CH2O)n-1CH2CH2O?M+ from a compound of the general formula (3); 3) a step of reacting a compound of the general formula (4) with acrylonitrile to obtain a compound of the general formula (5): CH3O(CH2CH2O)nCH2CH2CN; and 4) a step of reducing a compound of the general formula (5) to obtain a compound of the general formula (1).
    Type: Application
    Filed: January 14, 2015
    Publication date: July 16, 2015
    Inventors: Yuji Harada, Yuki Suka, Osamu Watanabe, Takeru Watanabe
  • Patent number: 9040222
    Abstract: The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.
    Type: Grant
    Filed: January 16, 2013
    Date of Patent: May 26, 2015
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yuki Suka, Jun Hatakeyama, Koji Hasegawa