Abstract: A substrate cleaning apparatus that cleans a processing target substrate by blasting the gas clusters to the processing target substrate. The apparatus includes: a chamber configured to accommodate the processing target substrate; a rotary stage configured to rotatably support the processing target substrate in the chamber; an blasting unit configured to blast the gas clusters to the processing target substrate supported by the rotary stage; a driving unit configured to scan a gas cluster-blasted position on the processing target substrate; an exhaust port configured to evacuate the chamber; and a control mechanism configured to control a scattering direction of particles by controlling a rotation direction of the processing target substrate by the rotary stage and a scanning direction of the gas cluster-blasted position, thereby suppressing re-adhesion of the particles to the processing target substrate.

Abstract: There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.

Abstract: There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.

Abstract: There is provided a gas cluster processing device for performing a predetermined process on a workpiece by irradiating the workpiece with a gas cluster, including: a processing container in which the workpiece is disposed; a gas supply part configured to supply a gas for generating the gas cluster; a flow rate controller configured to control a flow rate of the gas supplied from the gas supply part; a cluster nozzle configured to receive the gas for generating the gas cluster at a predetermined supply pressure, spray the gas into the processing container maintained in a vacuum state, and convert the gas into the gas cluster through an adiabatic expansion; and a pressure control part provided in a pipe between the flow rate controller and the cluster nozzle and including a back pressure controller configured to control a supply pressure of the gas for generating the gas cluster.

Abstract: An embodiment of the present invention is a printer that includes a platen roller to feed a print medium, a print head to print on the print medium fed by the platen roller, a connector that is attachable and detachable with respect to the print head the print head, and a controller to stop power supply to the print head via the connector when the platen roller and the print head are separated.

Abstract: According to the present invention, a substrate processing apparatus has a chamber (1), a stage (4) for holding a substrate (W) to be processed in the chamber (1), and a nozzle part (13) from which a gas cluster is blasted onto the substrate (W) to be processed, and has a function for processing the substrate (W) to be processed by the gas cluster. Cleaning of the inside of the chamber (1) is performed by: placing a prescribed reflecting member (dW, 60) in the chamber (1), blasting a gas cluster (C) onto the reflecting member (dW, 60), and applying the gas-cluster flow reflected by the reflecting member (dW, 60) onto a wall section of the chamber (1) to remove particles (P) adhered to the wall section of the chamber (1).

Abstract: There is provide a gas supply method including: preparing a gas container filled with an easy-to-liquefy gas; and supplying the easy-to-liquefy gas from the gas container to a processing container in which a substrate process is performed using the easy-to-liquefy gas, via a gas supply path, wherein a pressure and a temperature of the easy-to-liquefy gas are controlled such that in the gas supply path, the pressure of the easy-to-liquefy gas decreases in a step-by-step manner and the temperature of the easy-to-liquefy gas increases from the gas container toward the processing container.

Abstract: A roller-type depressing device, an imprinting device, and a roller-type depressing method which are capable of suppressing an uneven elastic deformation of a main roller, and which are also capable of depressing an object uniformly. A roller-type depressing device depresses an object, and includes a main roller having at least a surface formed of an elastic material, and depressing the object, a roller moving unit moving the main roller relative to the object, a pressure adjusting unit adjusting pressure applied to the object by the main roller, a pressure receiving stage receiving the pressure from the main roller via the object, an intermediate roller having at least a surface formed of a material with a larger elastic modulus than the elastic material, and supporting the main roller, and, a backup roller formed shorter in an axial direction than the main roller and the intermediate roller, and supporting the intermediate roller.

Abstract: An embodiment of the present invention is a printer that includes a platen roller to feed a print medium, a print head to print on the print medium fed by the platen roller, a connector that is attachable and detachable with respect to the print head the print head, and a controller to stop power supply to the print head via the connector when the platen roller and the print head are separated.

Abstract: According to the present invention, a substrate processing apparatus has a chamber (1), a stage (4) for holding a substrate (W) to be processed in the chamber (1), and a nozzle part (13) from which a gas cluster is blasted onto the substrate (W) to be processed, and has a function for processing the substrate (W) to be processed by the gas cluster. Cleaning of the inside of the chamber (1) is performed by: placing a prescribed reflecting member (dW, 60) in the chamber (1), blasting a gas cluster (C) onto the reflecting member (dW, 60), and applying the gas-cluster flow reflected by the reflecting member (dW, 60) onto a wall section of the chamber (1) to remove particles (P) adhered to the wall section of the chamber (1).

Abstract: A substrate cleaning apparatus that cleans a processing target substrate by blasting the gas clusters to the processing target substrate. The apparatus includes: a chamber configured to accommodate the processing target substrate; a rotary stage configured to rotatably support the processing target substrate in the chamber; an blasting unit configured to blast the gas clusters to the processing target substrate supported by the rotary stage; a driving unit configured to scan a gas cluster-blasted position on the processing target substrate; an exhaust port configured to evacuate the chamber; and a control mechanism configured to control a scattering direction of particles by controlling a rotation direction of the processing target substrate by the rotary stage and a scanning direction of the gas cluster-blasted position, thereby suppressing re-adhesion of the particles to the processing target substrate.

Abstract: A roller-type depressing device, an imprinting device, and a roller-type depressing method which are capable of suppressing an uneven elastic deformation of a main roller, and which are also capable of depressing an object uniformly. A roller-type depressing device depresses an object, and includes a main roller having at least a surface formed of an elastic material, and depressing the object, a roller moving unit moving the main roller relative to the object, a pressure adjusting unit adjusting pressure applied to the object by the main roller, a pressure receiving stage receiving the pressure from the main roller via the object, an intermediate roller having at least a surface formed of a material with a larger elastic modulus than the elastic material, and supporting the main roller, and, a backup roller formed shorter in an axial direction than the main roller and the intermediate roller, and supporting the intermediate roller.

Abstract: A film forming device forms a thin film on a substrate by reacting reaction gases in a process vessel. Electrode portions each oriented vertically are arranged to be spaced from each other in a horizontal direction. By applying high-frequency powers having different phases to adjacent electrode portions, a strong plasma generation space is formed above the substrate placed on a mounting table, while a weak plasma generation space is formed in the gap between the electrode portions and the substrate. A first reaction gas is supplied to the strong plasma generation space and a second reaction gas that forms the thin film by reacting with the active species of the first reaction gas is supplied to the weak plasma generation space. The reaction gases in the weak plasma generation space are discharged through exhaust channels.

Abstract: A laminate type light emitting diode device having excellent heat radiation performance and high output capability is provided. A plurality of reflection type light emitting diode units 10 each of which includes a light emitting diode 2 and a dichroic mirror 3 in a hollow metal holder case 5 having high thermal conductivity so as to face each other are joined to one another through joint members 4 formed of electrical insulating material, thereby constructing the laminate type light emitting diode device 100.

Abstract: A laminate type light emitting diode device having excellent heat radiation performance and high output capability is provided. A plurality of reflection type light emitting diode units 10 each of which includes a light emitting diode 2 and a dichroic mirror 3 in a hollow metal holder case 5 having high thermal conductivity so as to face each other are joined to one another through joint members 4 formed of electrical insulating material, thereby constructing the laminate type light emitting diode device 100.

Abstract: A laminate type light emitting diode device having excellent heat radiation performance and high output capability is provided. A plurality of reflection type light emitting diode units 10 each of which includes a light emitting diode 2 and a dichroic mirror 3 in a hollow metal holder case 5 having high thermal conductivity so as to face each other are joined to one another through joint members 4 formed of electrical insulating material, thereby constructing the laminate type light emitting diode device 100.

Abstract: The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a heating unit provided on an inside wall of the heating-furnace body; a reaction container consisting of a single tube contained in the heating-furnace body; a gas-discharging-pipe connecting portion formed at an upper portion of the reaction container; and a first temperature controlling unit provided around the gas-discharging-pipe connecting portion.

Abstract: A laminate type light emitting diode device having excellent heat radiation performance and high output capability is provided. A plurality of reflection type light emitting diode units 10 each of which includes a light emitting diode 2 and a dichroic mirror 3 in a hollow metal holder case 5 having high thermal conductivity so as to face each other are joined to one another through joint members 4 formed of electrical insulating material, thereby constructing the laminate type light emitting diode device 100.

Abstract: The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a heating unit provided on an inside wall of the heating-furnace body; a reaction container consisting of a single tube contained in the heating-furnace body; a gas-discharging-pipe connecting portion formed at an upper portion of the reaction container; and a first temperature controlling unit provided around the gas-discharging-pipe connecting portion.

Abstract: The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a heating unit provided on an inside wall of the heating-furnace body; a reaction container consisting of a single tube contained in the heating-furnace body; a gas-discharging-pipe connecting portion formed at an upper portion of the reaction container; and a first temperature controlling unit provided around the gas-discharging-pipe connecting portion.