Patents by Inventor Yukio Fukuda

Yukio Fukuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8153091
    Abstract: To provide a simple highly-pure Xe retrieval method and device with high retrieval efficiency by functionally removing such elements as water, CO2 and FCs from waste gases from semiconductor production processes, such as the plasma etching, that contain low-concentration Xe. For samples containing xenon and fluorocarbon, this invention is characterized by having at least first adsorption means (A1) filled with synthetic zeolite with pore size of 4A or smaller and aluminum oxide, arranged serially, gas separation means (A2) composed of silicone or polyethylene hollow fiber gas separation membrane modules 4, second adsorption means (A3) filled with either activated carbon, synthetic zeolite with pore size of 5A or larger, molecular sieving carbon with pore size of 5A or larger, or a combination of these, and reaction means (A4) filled with calcium compounds as reactant.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: April 10, 2012
    Assignee: L'Air Liquide Societe Anonyme Pour l'Etude Et l'Exploitation des Procedes Georges Claude
    Inventors: Masahiro Kimoto, Terumasa Koura, Yukio Fukuda, Masaki Narazaki, Taiji Hashimoto, Toru Sakai, Kazuo Yokogi
  • Patent number: 7717061
    Abstract: A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device (12) excites a reducing gas supplied thereinto, and the excited reducing gas is supplied into a process chamber (2). A switching mechanism (20) is arranged between the excitation device (12) and the process chamber (2), and a bypass line (22) is connected to the switching mechanism (20). The switching mechanism (20) switches the flow of the excited reducing gas from the excitation device (12) between the process chamber (2) and the bypass line (22).
    Type: Grant
    Filed: September 23, 2005
    Date of Patent: May 18, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Tadahiro Ishizaka, Naoki Yoshii, Kohei Kawamura, Yukio Fukuda, Takashi Shigeoka, Yasuhiko Kojima, Yasuhiro Oshima, Junichi Arami, Atsushi Gomi
  • Publication number: 20100074820
    Abstract: To provide a simple highly-pure Xe retrieval method and device with high retrieval efficiency by functionally removing such elements as water, CO2 and FCs from waste gases from semiconductor production processes, such as the plasma etching, that contain low-concentration Xe. For samples containing xenon and fluorocarbon, this invention is characterized by having at least first adsorption means (A1) filled with synthetic zeolite with pore size of 4A or smaller and aluminum oxide, arranged serially, gas separation means (A2) composed of silicone or polyethylene hollow fiber gas separation membrane modules 4, second adsorption means (A3) filled with either activated carbon, synthetic zeolite with pore size of 5A or larger, molecular sieving carbon with pore size of 5A or larger, or a combination of these, and reaction means (A4) filled with calcium compounds as reactant.
    Type: Application
    Filed: November 30, 2007
    Publication date: March 25, 2010
    Inventors: Masahiro Kimoto, Terumasa Koura, Yukio Fukuda, Masaki Narazaki, Taiji Hashimoto, Toru Sakai, Kazuo Yokogi
  • Publication number: 20060068104
    Abstract: A film fabrication method for forming a film over a substrate in a processing chamber includes a first film formation process and a second film formation process. In the first film formation process, (a) a first step of supplying a first source gas containing a metal-organic compound and without containing a halogen element into the chamber and then removing the first source gas from the chamber, and (b) a second step of supplying a second source gas containing hydrogen or a hydrogen compound into the chamber and then removing the second source gas from the chamber, are repeated a predetermined number of times.
    Type: Application
    Filed: September 22, 2005
    Publication date: March 30, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tadahiro Ishizaka, Yasuhiro Oshima, Naoki Yoshii, Takashi Shigeoka, Kohei Kawamura, Yukio Fukuda, Yasuhiko Kojima
  • Publication number: 20060027167
    Abstract: A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device (12) excites a reducing gas supplied thereinto, and the excited reducing gas is supplied into a process chamber (2). A switching mechanism (20) is arranged between the excitation device (12) and the process chamber (2), and a bypass line (22) is connected to the switching mechanism (20). The switching mechanism (20) switches the flow of the excited reducing gas from the excitation device (12) between the process chamber (2) and the bypass line (22).
    Type: Application
    Filed: September 23, 2005
    Publication date: February 9, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tadahiro Ishizaka, Naoki Yoshii, Kohei Kawamura, Yukio Fukuda, Takashi Shigeoka, Yasuhiko Kojima, Yasuhiro Oshima, Junichi Arami, Atsushi Gomi
  • Publication number: 20050115603
    Abstract: Edge face sealing member(s) may be roughly c-shaped in cross-section, may be frame-like in shape and formed in more or less parallel fashion with respect to outer shape(s) of solar cell module body or bodies, may comprise upper sealing region(s) abutting front surface(s) of solar cell module body or bodies, may further comprise lower sealing region(s) abutting back surface(s) of solar cell module body or bodies, and may further comprise side sealing region(s) abutting edge face(s) of solar cell module body or bodies.
    Type: Application
    Filed: November 29, 2004
    Publication date: June 2, 2005
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Hiroyuki Yoshida, Yukio Fukuda, Yuji Suzuki, Akimasa Umemoto
  • Patent number: 6847755
    Abstract: An optical switch comprising an array of voltage-controlled interferometric switching elements. Different configurations and modes of operation are possible, but in each configuration the elements are arranged relative to the input and output fibers, such that a beam of light is incident or outgoing at an angle of 45 degrees to the surface of a corresponding element. This permits each element to be electronically controlled to either transmit or reflect light, such that the output beam exits the switch either parallel to or perpendicular to the input beam.
    Type: Grant
    Filed: November 20, 2002
    Date of Patent: January 25, 2005
    Assignee: Texas Instruments Incorporated
    Inventors: Katsuhiro Aoki, Munenori Oizumi, Susumu Kato, Yukio Fukuda
  • Patent number: 6747203
    Abstract: A photovoltaic module including: a light-transmissive substrate; a first sealing polymer layer stacked on the substrate; a photovoltaic cell stacked on the first sealing polymer layer; a second sealing polymer layer stacked on the photovoltaic cell and a weatherproof film stacked on the second sealing polymer layer, wherein the weatherproof film includes a moisture-proof layer provided on the second sealing polymer layer and a gas-proof layer provided on the moisture-proof layer, the gas-proof layer being made of polyphenylene sulfide.
    Type: Grant
    Filed: July 10, 2002
    Date of Patent: June 8, 2004
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Yukio Fukuda, Akimasa Umemoto, Noriaki Shibuya
  • Patent number: 6747353
    Abstract: A barrier layer (20, 62) for an integrated circuit structure is disclosed. The barrier layer (20, 62) is a refractory metal silicon compound, such as a refractor metal silicon nitride compound, formed in an amorphous state. The barrier layer (20, 62) has a relatively low composition ratio of silicon, and of nitrogen if present, to provide low resistivity in combination with the high diffusion barrier properties provided by the amorphous state of the film. A disclosed example of the barrier layer (20, 62) is a compound of tantalum, silicon, and nitrogen, formed by controlled co-sputtering of tantalum and silicon in a gas atmosphere including nitrogen and argon. The barrier layer (20) may be used to underlie copper metallization (22), or the barrier layer (62) may be part or all of a lower plate in a ferroelectric memory capacitor (70).
    Type: Grant
    Filed: October 18, 2001
    Date of Patent: June 8, 2004
    Assignee: Texas Instruments Incorporated
    Inventors: Munenori Oizumi, Katsuhiro Aoki, Yukio Fukuda
  • Publication number: 20040084078
    Abstract: Edge face sealing member(s) 1 may be roughly c-shaped in cross-section, may be frame-like in shape and formed in more or less parallel fashion with respect to outer shape(s) of solar cell module body or bodies, may comprise upper sealing region(s) 11 abutting front surface(s) of solar cell module(s), may further comprise lower sealing region(s) 12 abutting back surface(s) of solar cell module(s), and may further comprise side sealing region(s) 13 abutting edge face(s) of solar cell module(s). Furthermore, respectively formed on facing surfaces of upper sealing region(s) 11 and lower sealing region(s) 12 there may be projections 11b, 12b. Furthermore, polypropylenic and/or polystyrenic elastomer resin(s) may be used as material(s) making up edge face sealing member(s) 1, and magnesium silicate may be present as additive(s) for prevention of yellowing of sealing resin layer(s) at solar cell module body or bodies.
    Type: Application
    Filed: October 21, 2003
    Publication date: May 6, 2004
    Applicant: Sharp Kaushiki Kaisha
    Inventors: Hiroyuki Yoshida, Yukio Fukuda, Akimasa Umemoto
  • Patent number: 6728128
    Abstract: A ferroelectric memory structure is described for the 1T1C arrangement in a ferroelectric capacitor cell array for FeRAM memory device applications. The device structure provides an accurate reference voltage and a simple sensing scheme for the sense amplifier used for reading the state of a target memory cell of the FeRAM array. A reference circuit generates a reference voltage which is a function of a charge shared between a plurality of FeRAM dummy cells. Each dummy cell of the plurality of FeRAM dummy cells is selectively coupleable to a plurality of bitlines. A shorting transistor in the reference circuit couples two bitlines or two bitline-bars neighboring the selected target memory cell. One dummy cell is coupled to a select one of the two shorted bitlines or bitline-bars, and another dummy cell is coupled to a another of the two shorted bitlines or bitline-bars, wherein at least one dummy cell is biased to a “0” state, and at least one other dummy cell is biased to a “1” state.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: April 27, 2004
    Assignee: Texas Instrument Incorporated
    Inventors: Akitoshi Nishimura, Yukio Fukuda, Katsuhiro Aoki
  • Patent number: 6724646
    Abstract: A ferroelectric memory structure is described for the 1T1C arrangement in a ferroelectric capacitor cell array for FeRAM memory device applications. The device structure provides an accurate reference voltage and a simple sensing scheme for the sense amplifier used for reading the state of a target memory cell of the FeRAM array. A reference circuit generates a reference voltage which is a function of a charge shared between a plurality of FeRAM dummy cells. Each dummy cell of the plurality of FeRAM dummy cells is selectively coupleable to a plurality of bitlines. A shorting transistor in the reference circuit couples two bitlines or two bitline-bars neighboring the selected target memory cell. One dummy cell is coupled to a select one of the two shorted bitlines or bitline-bars, and another dummy cell is coupled to a another of the two shorted bitlines or bitline-bars, wherein at least one dummy cell is biased to a “0” state, and at least one other dummy cell is biased to a “1” state.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: April 20, 2004
    Assignee: Texas Instruments Incorporated
    Inventors: Akitoshi Nishimura, Yukio Fukuda, Katsuhiro Aoki
  • Patent number: 6721200
    Abstract: A ferroelectric memory structure is described for the 1T1C arrangement in a ferroelectric capacitor cell array for FeRAM memory device applications. The device structure provides an accurate reference voltage and a simple sensing scheme for the sense amplifier used for reading the state of a target memory cell of the FeRAM array. A reference circuit generates a reference voltage which is a function of a charge shared between a plurality of FeRAM dummy cells. Each dummy cell of the plurality of FeRAM dummy cells is selectively coupleable to a plurality of bitlines. A shorting transistor in the reference circuit couples two bitlines or two bitline-bars neighboring the selected target memory cell. One dummy cell is coupled to a select one of the two shorted bitlines or bitline-bars, and another dummy cell is coupled to a another of the two shorted bitlines or bitline-bars, wherein at least one dummy cell is biased to a “0” state, and at least one other dummy cell is biased to a “1” state.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: April 13, 2004
    Assignee: Texas Instruments Incorporated
    Inventors: Akitoshi Nishimura, Yukio Fukuda, Katsuhiro Aoki
  • Publication number: 20030202391
    Abstract: A ferroelectric memory structure is described for the 1T1C arrangement in a ferroelectric capacitor cell array for FeRAM memory device applications. The device structure provides an accurate reference voltage and a simple sensing scheme for the sense amplifier used for reading the state of a target memory cell of the FeRAM array. A reference circuit generates a reference voltage which is a function of a charge shared between a plurality of FeRAM dummy cells. Each dummy cell of the plurality of FeRAM dummy cells is selectively coupleable to a plurality of bitlines. A shorting transistor in the reference circuit couples two bitlines or two bitline-bars neighboring the selected target memory cell. One dummy cell is coupled to a select one of the two shorted bitlines or bitline-bars, and another dummy cell is coupled to a another of the two shorted bitlines or bitline-bars, wherein at least one dummy cell is biased to a “0” state, and at least one other dummy cell is biased to a “1” state.
    Type: Application
    Filed: March 26, 2003
    Publication date: October 30, 2003
    Inventors: Akitoshi Nishimura, Yukio Fukuda, Katsuhiro Aoki
  • Publication number: 20030185072
    Abstract: A ferroelectric memory structure is described for the 1T1C arrangement in a ferroelectric capacitor cell array for FeRAM memory device applications. The device structure provides an accurate reference voltage and a simple sensing scheme for the sense amplifier used for reading the state of a target memory cell of the FeRAM array. A reference circuit generates a reference voltage which is a function of a charge shared between a plurality of FeRAM dummy cells. Each dummy cell of the plurality of FeRAM dummy cells is selectively coupleable to a plurality of bitlines. A shorting transistor in the reference circuit couples two bitlines or two bitline-bars neighboring the selected target memory cell. One dummy cell is coupled to a select one of the two shorted bitlines or bitline-bars, and another dummy cell is coupled to a another of the two shorted bitlines or bitline-bars, wherein at least one dummy cell is biased to a “0” state, and at least one other dummy cell is biased to a “1” state.
    Type: Application
    Filed: March 26, 2003
    Publication date: October 2, 2003
    Inventors: Akitoshi Nishimura, Yukio Fukuda, Katsuhiro Aoki
  • Publication number: 20030179632
    Abstract: A ferroelectric memory structure is described for the 1T1C arrangement in a ferroelectric capacitor cell array for FeRAM memory device applications. The device structure provides an accurate reference voltage and a simple sensing scheme for the sense amplifier used for reading the state of a target memory cell of the FeRAM array. A reference circuit generates a reference voltage which is a function of a charge shared between a plurality of FeRAM dummy cells. Each dummy cell of the plurality of FeRAM dummy cells is selectively coupleable to a plurality of bitlines. A shorting transistor in the reference circuit couples two bitlines or two bitline-bars neighboring the selected target memory cell. One dummy cell is coupled to a select one of the two shorted bitlines or bitline-bars, and another dummy cell is coupled to a another of the two shorted bitlines or bitline-bars, wherein at least one dummy cell is biased to a “0” state, and at least one other dummy cell is biased to a “1” state.
    Type: Application
    Filed: March 26, 2003
    Publication date: September 25, 2003
    Inventors: Akitoshi Nishimura, Yukio Fukuda, Katsuhiro Aoki
  • Publication number: 20030152314
    Abstract: An optical switch comprising an array of voltage-controlled interferometric switching elements. Different configurations and modes of operation are possible, but in each configuration the elements are arranged relative to the input and output fibers, such that a beam of light is incident or outgoing at an angle of 45 degrees to the surface of a corresponding element. This permits each element to be electronically controlled to either transmit or reflect light, such that the output beam exits the switch either parallel to or perpendicular to the input beam.
    Type: Application
    Filed: November 20, 2002
    Publication date: August 14, 2003
    Inventors: Katsuhiro Aoki, Munenori Oizumi, Susumu Kato, Yukio Fukuda
  • Patent number: 6587367
    Abstract: A ferroelectric memory structure is described for the 1T1C arrangement in ferroelectric capacitor cell array for FeRAM memory device applications. The device structure provides an accurate reference voltage and a simple sensing scheme for the sense amplifier used for reading the state of a target memory cell of the FeRAM array. A reference circuit generates a reference voltage which is a function of a charge shared between a plurality of FeRAM dummy cells. Each dummy cell of the plurality of FeRAM dummy cells is selectively coupleable to a plurality of bitlines. A shorting transistor in the reference circuit couples two bitlines or two bitline-bars neighboring the selected target memory cell. One dummy cell is coupled to a select one of the two shorted bitlines or bitline-bars, and another dummy cell is coupled to a another of the two shorted bitlines or bitline-bars, wherein at least one dummy cell is biased to a “0” state, and at least one other dummy cell is biased to a “1” state.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: July 1, 2003
    Assignee: Texas Instruments Incorporated
    Inventors: Akitoshi Nishimura, Yukio Fukuda, Katsuhiro Aoki
  • Publication number: 20030010377
    Abstract: A photovoltaic module including: a light-transmissive substrate; a first sealing polymer layer stacked on the substrate; a photovoltaic cell stacked on the first sealing polymer layer; a second sealing polymer layer stacked on the photovoltaic cell and a weatherproof film stacked on the second sealing polymer layer, wherein the weatherproof film includes a moisture-proof layer provided on the second sealing polymer layer and a gas-proof layer provided on the moisture-proof layer, the gas-proof layer being made of polyphenylene sulfide.
    Type: Application
    Filed: July 10, 2002
    Publication date: January 16, 2003
    Inventors: Yukio Fukuda, Akimasa Umemoto, Noriaki Shibuya
  • Patent number: 6472229
    Abstract: The purpose of this invention is to provide a method for manufacturing capacitors free of polarization fatigue even when the treatment is performed at a low temperature. Amorphous layer 32 made of lead zirconate titanate and containing excess lead is formed on lower electrode 13 made of iridium. The amorphous layer is crystallized by a heat treatment to form PZT film 14. Structural transition layer 33 containing excess Pb formed on the surface of PZT film 14 during the aforementioned crystallization is removed by means of dry etching. In this way, a PZT capacitor is obtained.
    Type: Grant
    Filed: June 5, 1998
    Date of Patent: October 29, 2002
    Assignee: Texas Instruments Incorporated
    Inventors: Katsuhiro Aoki, Yukio Fukuda, Ken Numata