Patents by Inventor Yukio Miyairi

Yukio Miyairi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7763222
    Abstract: An exhaust gas purifying system has a honeycomb filter including a porous partition wall having a number of pores arranged so that a plurality of cells communicating between two end faces are formed, and a plugging portion disposed in either of the end faces or inside the cell so as to plug the cell; and a NOx purifying catalyst including a honeycomb catalyst carrier having substantially same shape as the honeycomb filter, and a NOx selective reducing SCR catalyst or a NOx occluding catalyst carried on surface of the partition wall and/or on surface of the pores, wherein the honeycomb filter and the NOx purifying catalytic member are disposed in this order in an exhaust gas flow path where exhaust gas discharged from a diesel engine circulates. To provide an exhaust gas purifying system which realizes excellent purifying efficiency of NOx contained in exhaust gas discharged from a diesel engine, and small pressure loss, and can be mounted in limited space.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: July 27, 2010
    Assignee: NGK Insulators, Ltd.
    Inventors: Yukio Miyairi, Akira Takahashi
  • Publication number: 20100184589
    Abstract: There is provided a honeycomb structure where a catalyst is loaded on surfaces of inner pores of the surface layer and on a surface of the surface layer; a relation between a catalyst area proportion A of the catalyst to a gap area proportion B of a gap in a cross-section of the surface layer on the inlet side is 1%<A/B<90%; and a relation between an average catalyst area proportion, A1, from the surface to a point having a depth of one third of the thickness of the surface layer including the surface of the surface layer on the inlet side and a catalyst area proportion A2 in a central portion of the surface layer is A1/A2>1.5.
    Type: Application
    Filed: January 13, 2010
    Publication date: July 22, 2010
    Applicant: NGK Insulators, Ltd.
    Inventors: Yukio Miyairi, Takashi Mizutani, Takuya Hiramatsu
  • Patent number: 7754160
    Abstract: A honeycomb catalyst body includes: porous partition walls having a large number of pores and disposed to form a plurality of cells communicating between two end faces, plugged portions disposed to plug each of the cells on one of the end faces, and catalyst layers loaded in layers on an inner surface of the cells and an inner surface of the pores and containing a noble metal. Mass (Mc) of the noble metal contained in the catalyst layer loaded on the inner surface of the cells and mass (Mp) of the noble metal contained in the catalyst layer loaded on the inner surface of the pores satisfy the relation of (Mp)/(Mc)?4. The honeycomb catalyst body is excellent in purification efficiency, has low pressure loss, and is mountable even in a limited space.
    Type: Grant
    Filed: August 29, 2006
    Date of Patent: July 13, 2010
    Assignee: NGK Insulators
    Inventors: Yukio Miyairi, Toshio Yamada
  • Patent number: 7749458
    Abstract: This is directed to a honeycomb structure (10) including two or more honeycomb segments (11) having numerous through channels having been partitioned by walls and penetrating in axial direction thereof, the walls for through channels having a filtering function, and one end being clogged at predetermined through channels, and the other end at the remaining ones, and joint layers (12) for joining two or more honeycomb segments (11) each other. It may satisfy at least either that the Young's modulus of material of the joint layer (12) is 20% or less of that of the honeycomb segment (11), or that the material strength of joint layer (12) is lower than that of the honeycomb segment (11). This honeycomb structure shows a less thermal stress during use, has such a durability that no crack is formed, hardly shows a difference in temperature between the central portion and outer peripheral portion, and shows a lower pressure loss of fluid.
    Type: Grant
    Filed: January 11, 2001
    Date of Patent: July 6, 2010
    Assignee: NGK Insulators, Ltd.
    Inventors: Takashi Harada, Yukio Miyairi
  • Publication number: 20100135866
    Abstract: A honeycomb filter including partition walls having a porous partition wall base material and a surface layer provided on only inflow side or both inflow and outflow sides of the partition wall base material, and satisfying the following conditions capable of using as a DPF. The surface layer has a peak pore diameter of from 0.3 ?m to 20 ?m (exclusive) being equal to or smaller than the average pore diameter of the base material; the porosity of from 60% to 95% (exclusive) when measured by mercury porosimetry being larger than that of the base material; and the thickness L1 of from 0.5% to 30% (exclusive) of the partition wall thickness L2; and mass per filtration area of from 0.01 mg/cm2 to 6 mg/cm2 (exclusive). The base material has an average pore diameter of from 10 ?m to 60 ?m (exclusive) and a porosity of from 40% to 65% (exclusive).
    Type: Application
    Filed: October 21, 2009
    Publication date: June 3, 2010
    Applicant: NGK INSULATORS, LTD.
    Inventors: Yukio MIZUNO, Naomi NODA, Toshio YAMADA, Yukio MIYAIRI, Yukari NAKANE, Yasushi NOGUCHI
  • Patent number: 7727488
    Abstract: A plasma generating electrode 1 of the present invention includes two or more electrodes 2 disposed to face each other, and holding members 3 for holding electrodes 2 at a predetermined interval, and can generate plasma by applying voltage between electrodes 2. At least one of electrodes facing each other 2 has a plate-shaped ceramic body 6 serving as a dielectric body, and a conductive film 7 disposed inside the body 6, and the holding members 3 fix the opposite side end portions 5 (fixed end portions 5a) of electrodes facing each other 2 in the state of a cantilever in such a condition that electrodes 2 are held by holding members in the state of cantilevers of the different directions alternately at a predetermined interval as a whole. This relaxes the thermal stress and effectively prevents distortion and breakage of electrodes caused by to a temperature change.
    Type: Grant
    Filed: July 7, 2004
    Date of Patent: June 1, 2010
    Assignees: NGK Insulators, Ltd., Honda Motor Co., Ltd.
    Inventors: Yukio Miyairi, Yasumasa Fujioka, Masaaki Masuda, Takeshi Sakuma
  • Patent number: 7727487
    Abstract: In the plasma reaction vessel (1) of the invention, two or more laminate-structures (6) having ceramic formed bodies (3, 4) in which a plasma generating electrode (2) capable of generating plasma is formed in two-tape-form, and an electrically continuous film-like electrically conductive electrode (5) held between the two ceramic formed bodies (3, 4) are formed in such a manner as to form a plasma generating space (7) containing mutual laminate planes therein. Of the electrically conductive electrodes (5), adjacent ones are capable of having electric discharge produced therebetween so as to generate the plasma in the plasma generating space (7) and of generating uniform stabilized plasma at low electric power, it being possible to reduce a passage resistance to a gas passing therein.
    Type: Grant
    Filed: February 12, 2004
    Date of Patent: June 1, 2010
    Assignees: NGK Insulators, Ltd., Honda Motor Co., Ltd.
    Inventors: Yuichiro Imanishi, Shinichi Miwa, Fumio Abe, Yukio Miyairi
  • Patent number: 7700051
    Abstract: An exhaust gas treating apparatus 1 includes; a case body 2 and a plasma producing means 3 capable of producing plasma inside the case body 2 and treats the substances to be treated contained in the exhaust gas by the plasma producing means 3. The plasma producing means 3 has one or more each of a pulse electrode 4 and a ground electrode 5 that are oppositely disposed in the case body 2 and has a pulse power source 6 capable of feeding a pulse current to the pulse electrode 4 by switching frequency and/or voltage for different values at predetermined time intervals. The substances to be treated contained in the exhaust gas can selectively be treated by switching frequency and/or voltage value for different values at predetermined time intervals so that plasma of a kind adequate for the substances to be treated contained in an exhaust gas is produced between the pulse electrode 4 and the ground electrode 5.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: April 20, 2010
    Assignees: NGK Insulators, Ltd., Honda Motor Co., Ltd.
    Inventors: Yukio Miyairi, Yasumasa Fujioka, Masaaki Masuda, Tatsuhiko Hatano, Takeshi Sakuma, Yuuichiro Imanishi, Keizo Iwama, Kenji Dosaka
  • Patent number: 7695798
    Abstract: A honeycomb structure 1 for a catalyst carrier including partition walls 4 arranged so as to form a plurality of cells 3 which connect two end faces 2a, 2b, the partition walls 4 being porous and having a large number of pores; the structure further including plugging portions 10 arranged so as to alternately plug one of the end portions of each of the cells 3 in the two end faces 2a, 2b. A geometrical surface area (GSA: a value ((S1+S2)/V) obtained by dividing a total of the whole inner surface area (S1) excluding the cell pores and the whole inner surface area (S2) of the pores by the whole volume (V) of the honeycomb structure) is 80) cm2/cm3 or more and less than 300 cm2/cm3.
    Type: Grant
    Filed: April 25, 2008
    Date of Patent: April 13, 2010
    Assignee: NGK Insulators, Ltd.
    Inventors: Shinichi Miwa, Yukio Miyairi
  • Patent number: 7648683
    Abstract: A plasma generating electrode 1 of the present invention includes a plurality of unit electrodes 2 hierarchically layered at predetermined intervals, the unit electrodes 2 including a deficient unit electrode 2b in which a conductive film 4 has an absent portion and a normal unit electrode 2a in which the conductive film 4 does not have an absent portion. Spaces V formed between the unit electrodes 2 include a normal space Va formed so that the distance between conductive films 4 corresponds to the distance between the unit electrodes 2 and a deficient space Vb formed so that the distance between the conductive films 4 is greater than the distance between the conductive films 4 in the normal space Va. The plasma generating electrode 1 of the present invention can efficiently treat a plurality of predetermined components contained in a treatment target fluid by utilizing different types of plasma suitable for respective reactions by causing the treatment target fluid to flow only once.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: January 19, 2010
    Assignees: NGK Insulators, Ltd., Honda Motor Co., Ltd.
    Inventors: Yukio Miyairi, Yasumasa Fujioka, Masaaki Masuda, Tatsuhiko Hatano, Takeshi Sakuma, Yuuichiro Imanishi, Keizo Iwama, Kenji Dosaka
  • Patent number: 7638103
    Abstract: A plasma generating electrode 1 of the invention includes at least a pair of electrodes 5, at least one electrode 5a of the pair of electrodes 5 including a plate-like ceramic body 2 as a dielectric and a plurality of conductive films 3 disposed in the ceramic body 2 and each having a plurality of through-holes 4 formed through the conductive film 3 in its thickness direction in a predetermined arrangement pattern, the through-holes 4 having a cross-sectional shape including an arc shape along a plane perpendicular to the thickness direction, an arrangement pattern of the through-holes 4a formed in at least one conductive film 3a being different from an arrangement pattern of the through-holes 4b formed in the other conductive film 3b. The plasma generating electrode 1 is capable of simultaneously generating different states of plasma upon application of voltage between the pair of electrodes 5 due to the different arrangement patterns of the through-holes 4 in the conductive films 3.
    Type: Grant
    Filed: June 18, 2004
    Date of Patent: December 29, 2009
    Assignees: NGK Insulators, Ltd., Honda Motor Co., Ltd.
    Inventors: Masanobu Miki, Kenji Dosaka, Yukio Miyairi, Yasumasa Fujioka, Masaaki Masuda, Tatsuhiko Hatano, Takeshi Sakuma, Yuuichiro Imanishi
  • Patent number: 7635824
    Abstract: A plasma generating electrode of the invention present includes at least a pair of electrodes 5, at least one electrode 5a of the pair of electrodes 5 including a plate-like ceramic body 2 as a dielectric and a conductive film 3 disposed inside the ceramic plate 2 and having a plurality of through-holes 4 formed through the conductive film 3 in its thickness direction, the through-holes having a cross-sectional shape including an arc shape along a plane perpendicular to the thickness direction. The plasma generating electrode can generate uniform and stable plasma at low power consumption.
    Type: Grant
    Filed: June 18, 2004
    Date of Patent: December 22, 2009
    Assignees: NGK Insulators, Ltd., Honda Motor Co., Ltd.
    Inventors: Masanobu Miki, Kenji Dosaka, Yukio Miyairi, Yasumasa Fujioka, Masaaki Masuda, Takeshi Sakuma, Tatsuhiko Hatano
  • Publication number: 20090309571
    Abstract: A particulate matter sensor (1) which may be used as an onboard particulate matter diagnostic sensor includes an insulating base (2) that has at least a pair of opposing plane surfaces, an electrode nucleus (3) that is formed on one of the pair of opposing plane surfaces of the base (2), and forms an electrode when a conductive substance adheres to the plane surface, and an electrode (4) that is disposed parallel to the electrode nucleus (3) and is provided on the other of the pair of opposing plane surfaces, or provided on a side surface of the base (2) that is adjacent to the pair of opposing plane surfaces, or provided inside the base (2).
    Type: Application
    Filed: August 20, 2009
    Publication date: December 17, 2009
    Applicant: NGK Insulators, Ltd.
    Inventors: Kyosuke KATSUYAMA, Kenshin Kitoh, Takeshi Sakuma, Yukio Miyairi, Junichi Suzuki
  • Publication number: 20090282817
    Abstract: A plasma processing apparatus includes a main body that has an inlet for a purification target gas and an outlet for a purified gas, an insulator honeycomb that includes a plurality of cells that are partitioned by a partition wall and serve as gas passages, a conductor honeycomb that is disposed to be able to transmit heat to the insulator honeycomb, a discharge electrode that is disposed opposite to the conductor honeycomb and forms a pair of electrodes with the conductor honeycomb, and a pulse power supply that applies a pulse voltage between the pair of electrodes, the insulator honeycomb, the conductor honeycomb, and the discharge electrode being disposed in an inner space of the main body. The plasma processing apparatus generates plasma by applying a pulse voltage to promote purification of the purification target gas in the insulator honeycomb by utilizing heat generated by plasma.
    Type: Application
    Filed: May 4, 2009
    Publication date: November 19, 2009
    Applicant: NGK INSULATORS, LTD.
    Inventors: Masaaki Masuda, Yukio Miyairi, Michio Takahashi
  • Publication number: 20090196800
    Abstract: In the plasma reaction vessel (1) of the invention, two or more laminate-structures (6) having ceramic formed bodies (3, 4) in which a plasma generating electrode (2) capable of generating plasma is formed in two-tape-form, and an electrically continuous film-like electrically conductive electrode (5) held between the two ceramic formed bodies (3, 4) are formed in such a manner as to form a plasma generating space (7) containing mutual laminate planes therein. Of the electrically conductive electrodes (5), adjacent ones are capable of having electric discharge produced therebetween so as to generate the plasma in the plasma generating space (7) and of generating uniform stabilized plasma at low electric power, it being possible to reduce a passage resistance to a gas passing therein.
    Type: Application
    Filed: March 9, 2009
    Publication date: August 6, 2009
    Applicants: NGK INSULATORS, LTD., HONDA MOTOR CO., LTD.
    Inventors: Yuichiro Imanishi, Shinichi Miwa, Fumio Abe, Yukio Miyairi
  • Publication number: 20090176053
    Abstract: There are disclosed a honeycomb structure capable of providing a honeycomb catalytic body which is excellent in purification efficiency with a small pressure loss and which can be mounted even in a limited space, a honeycomb catalytic body which is excellent in purification efficiency with a small pressure loss and which can be mounted even in a limited space, and a manufacturing method of the same. A honeycomb catalytic body 50 of the present invention is a honeycomb catalytic body of a flow-through type through which cells as through channels extend from an inlet to an outlet, both the surfaces of partition walls 4 of a honeycomb structure 1 and the inner surfaces of pores 25 carry a catalyst to form catalyst layers 5, and the catalyst carrying partition walls have a permeability of 1×10?12 [m2] or more, preferably 1×10?9 [m2] or less.
    Type: Application
    Filed: November 28, 2008
    Publication date: July 9, 2009
    Applicant: NGK INSULATORS, LTD.
    Inventors: Yukio MIYAIRI, Yoshihiro YAMAMOTO, Shogo HIROSE
  • Publication number: 20090047188
    Abstract: There is provided a honeycomb catalyst body 100 having a deviation in face positions on the inner side of the cells perpendicular to a direction in which the cells 3 extends of a plurality of plugged portions 10 having predetermined length. The honeycomb catalyst body 100 provides a catalyst converter where thermal stress is dispersed and a local temperature rise in the vicinity of the inlet and the outlet is suppressed. The catalyst converter is hence less apt to crack.
    Type: Application
    Filed: September 8, 2008
    Publication date: February 19, 2009
    Applicant: NGK Insulators, Ltd.
    Inventors: Yukio MIYAIRI, Naomi NODA, Shinichi MIWA
  • Publication number: 20080295469
    Abstract: A honeycomb filter 1 of the present invention includes a honeycomb structure 2 having partition walls 7 and plugging portions, and the partition walls 7 are constituted of a porous layer in which a first wall portion 7a having an average pore diameter of 20 ?m or more and carrying an oxidation catalyst 11 on the inner surfaces of formed pores 8, a second wall portion 7b functioning as a buffer and having a high porosity, and a third wall portion 7c having an average pore diameter of 1 to 15 ?m and a porosity of 50 to 90% are laminated in the thickness direction of the partition walls 7 from a surface side where cells 9a having opening end portions opened on an inflow side and opening end portions plugged on an outflow side are defined.
    Type: Application
    Filed: May 27, 2008
    Publication date: December 4, 2008
    Applicant: NGK INSULATORS, LTD.
    Inventors: Yukio MIZUNO, Yukio MIYAIRI
  • Publication number: 20080292513
    Abstract: Disclosed is a catalyst carrier which is used for carrying a catalyst thereon. The catalyst carrier is characterized in that the apparent specific heat measured at 800° C. is 1.8 times or more greater than that measured at room temperature, wherein the apparent specific heat means a charge heat amount required for substantially increasing the temperature of a unit mass (kg) by 1 K, inclusive of the influence of endotherm or exotherm caused by change in crystalline form, partial melting, coagulation, phase transformation, vitrification, amorphous-formation, crystallization and the like.
    Type: Application
    Filed: June 11, 2008
    Publication date: November 27, 2008
    Applicant: NGK Insulators, Ltd.
    Inventor: Yukio Miyairi
  • Patent number: 7451067
    Abstract: A method for analysis of a cell structure includes a macroanalysis step and a microanalysis step. The macroanalysis step includes replacing a cell structure or a part of the cell structure with an anisotropic solid body having property values of equivalent rigidity characteristics, creating a finite element model of the anisotropic solid body based on the property values, applying an internal temperature distribution or an external pressure to the finite element model of the anisotropic solid body, determining the stress distribution in the anisotropic solid body, and selecting an aimed cell structure of which the stress should be calculated as a cell structure based on the stress distribution. The microanalysis step includes creating a finite element model of the aimed cell structure, and determining the stress distribution in the aimed cell structure based on the finite element model of the aimed cell structure.
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: November 11, 2008
    Assignee: NGk Insulators, Ltd.
    Inventors: Motomichi Itou, Yukio Miyairi