Patents by Inventor Yukio Nishimura

Yukio Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10761201
    Abstract: An object detection device includes: a classifier that receives, from a radar device that transmits a transmission wave and receives a reflected wave that is the transmission wave reflected by an object around a subject vehicle, detection result information indicative of an intensity, an azimuth, and a Doppler velocity obtained from a Doppler frequency shift of the reflected wave, and determines whether the detection result information is first detection result information corresponding to a moving object or second detection result information corresponding to a still object; a calculator that calculates distances from the radar device to reflection points of the moving object on the basis of the first detection result information; and an output that supplies, to a predetermined device, first reflection point information indicating the distances of the reflection points and azimuths of the reflection points based on the radar device.
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: September 1, 2020
    Assignee: Panasanic Intellectul Property Management Co., Ltd.
    Inventors: Yukio Okazaki, Hirofumi Nishimura, Asako Hamada
  • Publication number: 20200181339
    Abstract: A pultruded material includes a thermosetting resin, and a reinforced fibers impregnated with the thermosetting resin. The thermosetting resin includes a solid resin that contains a fire-resistant resin having a median oxygen index of equal to or higher than, a long-chain fatty acid ester that has a median number of carbons per molecule within a range equal to or more than 3 and equal to or less than 1000, and that has a median flash point within a range equal to or higher than 150 degrees Celsius, and an additive that has a median BET specific surface area within a range equal to or more than 150 m2/g and equal to or less than 250 m2/g, and that has a median primary particle diameter within a range equal to or more than 5 nanometers and equal to or smaller than 20 nanometers.
    Type: Application
    Filed: December 5, 2019
    Publication date: June 11, 2020
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Yukio Takeuchi, Kosuke Ikeda, Wataru Nishimura
  • Publication number: 20200124961
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: December 19, 2019
    Publication date: April 23, 2020
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu NAKASHIMA, Gouji WAKAMATSU, Kentarou GOTOU, Yukio NISHIMURA, Takeo SHIOYA
  • Patent number: 10620534
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Grant
    Filed: August 17, 2018
    Date of Patent: April 14, 2020
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Patent number: 10478085
    Abstract: The present disclosure provides an apparatus including: one or more needle-like bases enabled to be inserted into the brain; a first electrode having a first impedance and enabling an input of an electric activity of a nucleus with which the first electrode comes into contact; and a second electrode having a second impedance lower than the first impedance and being able to output an electric stimulation to the nucleus, wherein the first electrode is provided at a tip portion of at least one of the bases, and the second electrode is provided on a part of the at least one of the bases at a position identical to a position of at least one of the first electrode or on a proximal side with respect to the first electrode, in a direction along a long axis of the base on which the first electrode is provided.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: November 19, 2019
    Assignee: INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION NATIONAL INSTITUTES OF NATURAL SCIENCES
    Inventors: Atsushi Nambu, Satomi Chiken, Yukio Nishimura, Sayuki Takara
  • Publication number: 20190278175
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: August 17, 2018
    Publication date: September 12, 2019
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu NAKASHIMA, Gouji WAKAMATSU, Kentarou GOTOU, Yukio NISHIMURA, Takeo SHIOYA
  • Patent number: 10302721
    Abstract: Procedure instruction sequences (P1˜PN) in an instruction sequence (for example, an instruction sequence for an NMR spectrometer) are generated in a precedential manner, and transferred to a procedure storage area on a transmission and reception unit in a precedential manner. After the precedential transfer, a remaining portion of the instruction sequence (streaming instruction sequence (SM1, . . . )) is sequentially generated in predetermined units from the beginning, and sequentially transferred to a FIFO area on the transmission and reception unit. A sequencer refers to the streaming instruction sequence, executes the instruction, and refers to a procedure instruction sequence on the procedure storage area.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: May 28, 2019
    Assignee: JEOL Ltd.
    Inventors: Kenichi Hachitani, Kenya Izumi, Yukio Nishimura, Takayuki Suzuki
  • Publication number: 20190038168
    Abstract: The present disclosure provides an apparatus including: one or more needle-like bases enabled to be inserted into the brain; a first electrode having a first impedance and enabling an input of an electric activity of a nucleus with which the first electrode comes into contact; and a second electrode having a second impedance lower than the first impedance and being able to output an electric stimulation to the nucleus, wherein the first electrode is provided at a tip portion of at least one of the bases, and the second electrode is provided on a part of the at least one of the bases at a position identical to a position of at least one of the first electrode or on a proximal side with respect to the first electrode, in a direction along a long axis of the base on which the first electrode is provided.
    Type: Application
    Filed: August 10, 2018
    Publication date: February 7, 2019
    Applicant: INTER-UNIVERSITY RESEARCH INSTITUTE CORPORATION NATIONAL INSTITUTES OF NATURAL SCIENCES
    Inventors: Atsushi NAMBU, Satomi CHIKEN, Yukio NISHIMURA, Sayuki TAKARA
  • Publication number: 20190025695
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: August 17, 2018
    Publication date: January 24, 2019
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu NAKASHIMA, Gouji WAKAMATSU, Kentarou GOTOU, Yukio NISHIMURA, Takeo SHIOYA
  • Patent number: 10082733
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: September 25, 2018
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Publication number: 20170199453
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: October 21, 2016
    Publication date: July 13, 2017
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Publication number: 20170160637
    Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.
    Type: Application
    Filed: December 22, 2015
    Publication date: June 8, 2017
    Applicant: JSR Corporation
    Inventors: Takahiro Hayama, Kazunori Kusabiraki, Yukio Nishimura, Ken Maruyama, Kiyoshi Tanaka
  • Patent number: 9598520
    Abstract: A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer has a structure unit represented by a following formula (1-1), a structure unit represented by a following formula (1-2), or both thereof, and has a content of fluorine atoms of no less than 5% by mass to a total mass of the first polymer. The second polymer has an acid-dissociable group, and has a content of fluorine atoms of less than 5% by mass to a total mass of the second polymer.
    Type: Grant
    Filed: May 17, 2012
    Date of Patent: March 21, 2017
    Assignee: JSR Corporation
    Inventors: Yuko Kiridoshi, Takehiko Naruoka, Yukio Nishimura, Yusuke Asano, Takanori Kawakami, Hiromitsu Nakashima
  • Patent number: 9500950
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: November 22, 2016
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Publication number: 20160187440
    Abstract: Procedure instruction sequences (P1˜PN) in an instruction sequence (for example, an instruction sequence for an NMR spectrometer) are generated in a precedential manner, and transferred to a procedure storage area on a transmission and reception unit in a precedential manner. After the precedential transfer, a remaining portion of the instruction sequence (streaming instruction sequence (SM1, . . . )) is sequentially generated in predetermined units from the beginning, and sequentially transferred to a FIFO area on the transmission and reception unit. A sequencer refers to the streaming instruction sequence, executes the instruction, and refers to a procedure instruction sequence on the procedure storage area.
    Type: Application
    Filed: July 22, 2015
    Publication date: June 30, 2016
    Inventors: Kenichi Hachitani, Kenya Izumi, Yukio Nishimura, Takayuki Suzuki
  • Publication number: 20160109801
    Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.
    Type: Application
    Filed: December 22, 2015
    Publication date: April 21, 2016
    Applicant: JSR Corporation
    Inventors: Takahiro Hayama, Kazunori Kusabiraki, Yukio Nishimura, Ken Maruyama, Kiyoshi Tanaka
  • Publication number: 20160062237
    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).
    Type: Application
    Filed: November 5, 2015
    Publication date: March 3, 2016
    Applicant: JSR CORPORATION
    Inventors: Hiroki NAKAGAWA, Hiromitsu NAKASHIMA, Gouji WAKAMATSU, Kentarou GOTOU, Yukio NISHIMURA, Takeo SHIOYA
  • Patent number: 9261789
    Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: February 16, 2016
    Assignee: JSR CORPORATION
    Inventors: Takahiro Hayama, Kazunori Kusabiraki, Yukio Nishimura, Ken Maruyama, Kiyoshi Tanaka
  • Patent number: 9213236
    Abstract: A fluorine-containing polymer for use in a radiation-sensitive resin composition is used for forming a photoresist film in a process of forming a resist pattern, including a liquid immersion lithographic process in which radiation is emitted through a liquid having a refractive index larger than the refractive index of air at a wavelength of 193 nm, and being present between a lens and the photoresist film. The fluorine-containing polymer has a weight average molecular weight determined by gel permeation chromatography in the range from 1,000 to 50,000 and a receding contact angle with water and the photoresist film formed therefrom is 70° or more.
    Type: Grant
    Filed: February 12, 2014
    Date of Patent: December 15, 2015
    Assignee: JSR CORPORATION
    Inventors: Hiroki Nakagawa, Hiromitsu Nakashima, Gouji Wakamatsu, Kentarou Gotou, Yukio Nishimura, Takeo Shioya
  • Patent number: 9182674
    Abstract: An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.
    Type: Grant
    Filed: July 17, 2012
    Date of Patent: November 10, 2015
    Assignee: JSR CORPORATION
    Inventors: Toru Kimura, Yukio Nishimura, Tomohiro Utaka, Hiroaki Nemoto, Atsushi Nakamura, Takashi Chiba, Hiroki Nakagawa