Patents by Inventor Yukio Nishimura

Yukio Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7076576
    Abstract: A method and system transfers data between intra-node firmware and inter-nodes firmware in a multi-node computer system using reduced hardware resources. A set of control codes and data transfer functions are provided to enable data communications between computer nodes and inter-nodes controller through a one-byte control module and a one-byte data module.
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: July 11, 2006
    Assignee: Fujitsu Limited
    Inventors: Yukio Nishimura, Prabhunandan B. Narasimharmurthy, Sudheer Miryala, Kazunori Masuyama
  • Publication number: 20060074139
    Abstract: An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.
    Type: Application
    Filed: November 4, 2003
    Publication date: April 6, 2006
    Inventors: Hiroyuki Ishii, Kouichi Fujiwara, Hiroshi Yamaguchi, Yukio Nishimura
  • Patent number: 6964840
    Abstract: A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.
    Type: Grant
    Filed: June 16, 2004
    Date of Patent: November 15, 2005
    Assignees: JSR Corporation, International Business Machines Corporation
    Inventors: Yukio Nishimura, Noboru Yamahara, Masafumi Yamamoto, Toru Kajita, Tsutomu Shimokawa, Hiroshi Ito
  • Patent number: 6961761
    Abstract: A domain partitioning system for a multi-node computer system is disclosed. An external server manager is coupled to a domain configuration unit by a dedicated sideband channel. The server manager has write privileges to the domain configuration unit that allows the server manager to control the domain partitioning and the routing tables. None of the domains of the computer system are permitted write access to the domain configuration unit. In one embodiment, the domain configuration unit is a set of domain partition registers and routing table registers coupled to a system interconnect.
    Type: Grant
    Filed: May 17, 2001
    Date of Patent: November 1, 2005
    Assignee: Fujitsu Limited
    Inventors: Kazunori Masuyama, Patrick N. Conway, Hitoshi Oi, Jeremy Farrell, Sudheer Miryala, Yukio Nishimura, Prabhu Murthy
  • Publication number: 20050214680
    Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
    Type: Application
    Filed: April 28, 2005
    Publication date: September 29, 2005
    Inventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
  • Patent number: 6943826
    Abstract: To facilitate the debugging an imaging device having a large number of pixels, a debugging apparatus has an image view display for qualitatively displaying pixel characteristics in a first range of the imaging device, and a code view displaying unit for quantitatively displaying numerical or symbolic data of individual pixels in a second range that is smaller than the first range and designated in an area displayed by the image view display.
    Type: Grant
    Filed: June 28, 2000
    Date of Patent: September 13, 2005
    Assignee: Agilent Technologies, Inc.
    Inventors: Hiroshi Tatekawa, Yukio Nishimura, Katsumi Sakamoto
  • Patent number: 6933094
    Abstract: A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.
    Type: Grant
    Filed: September 18, 2001
    Date of Patent: August 23, 2005
    Assignee: JSR Corporation
    Inventors: Masaaki Miyaji, Tomoki Nagai, Yuji Yada, Jun Numata, Yukio Nishimura, Masafumi Yamamoto, Hiroyuki Ishii, Toru Kajita, Tsutomu Shimokawa
  • Patent number: 6908722
    Abstract: A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z1 and Z2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.
    Type: Grant
    Filed: June 28, 2002
    Date of Patent: June 21, 2005
    Assignee: JSR Corporation
    Inventors: Satoshi Ebata, Eiji Yoneda, Tomoki Nagai, Tatsuya Toneri, Yong Wang, Haruo Iwasawa, Yukio Nishimura
  • Publication number: 20050053861
    Abstract: An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
    Type: Application
    Filed: December 24, 2003
    Publication date: March 10, 2005
    Inventors: Eiji Yoneda, Yong Wang, Yukio Nishimura
  • Patent number: 6838225
    Abstract: A radiation-sensitive resin composition comprising: (A) an acid-dissociable group-containing resin, insoluble or scarcely soluble in alkali but becoming soluble in alkali when the acid-dissociable group dissociates, and containing recurring units with specific structures and (B) a photoacid generator of the formula (3), wherein R5 represents a monovalent aromatic hydrocarbon group, m is 1-8, and n is 0-5. The resin composition is suitable as a chemically-amplified resist responsive to deep ultraviolet rays such as a KrF excimer laser and ArF excimer laser, exhibits high transparency, excellent resolution, dry etching resistance, and sensitivity, produces good pattern shapes, and well adheres to substrates.
    Type: Grant
    Filed: January 16, 2002
    Date of Patent: January 4, 2005
    Assignee: JSR Corporation
    Inventors: Yukio Nishimura, Masafumi Yamamoto, Atsuko Kataoka, Toru Kajita
  • Publication number: 20040241580
    Abstract: A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed.
    Type: Application
    Filed: June 16, 2004
    Publication date: December 2, 2004
    Inventors: Yukio Nishimura, Noboru Yamahara, Masafumi Yamamoto, Toru Kajita, Tsutomu Shimokawa, Hiroshi Ito
  • Patent number: 6800419
    Abstract: A radiation-sensitive resin composition comprising: (A) an alkali insoluble or scarcely alkali-soluble resin having an acid-dissociable protecting group of the following formula [I], wherein R1 groups are monovalent alicyclic hydrocarbon groups or alkyl groups, provided that at least one of the R1 groups is the monovalent alicyclic hydrocarbon group, or any two of the R1 groups and the carbon atom form a divalent alicyclic hydrocarbon group, (B) a photoacid generator, and (C) propylene glycol monomethyl ether acetate, &ggr;-butyrolactone, and cyclohexanone as solvents. The resin composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays and exhibits excellent film thickness uniformity and storage stability.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: October 5, 2004
    Assignee: JSR Corporation
    Inventors: Akimasa Soyano, Hiroyuki Ishii, Hidemitsu Ishida, Motoyuki Shima, Yukio Nishimura
  • Patent number: 6800414
    Abstract: A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.
    Type: Grant
    Filed: June 14, 2001
    Date of Patent: October 5, 2004
    Assignee: JSR Corporation
    Inventors: Yukio Nishimura, Noboru Yamahara, Masafumi Yamamoto, Toru Kajita, Tsutomu Shimokawa, Hiroshi Ito
  • Patent number: 6753124
    Abstract: A radiation-sensitive resin composition used as a chemically amplified positive tone resist responsive to short wavelength active radiation such as KrF excimer laser and ArF excimer laser is disclosed. The resin composition comprises: (A) an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, the resin comprising a lactone cyclic structure of the following formula (1): wherein a is an integer from 1-3, b is an integer from 0-9, and R1 represents a monovalent organic group, and (B) a photoacid generator. The composition has high transmittance of radiation, exhibits high sensitivity, resolution, and pattern shape, and can produce semiconductors at a high yield without producing resolution defects during microfabrication.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: June 22, 2004
    Assignee: JSR Corporation
    Inventors: Yukio Nishimura, Katsuji Douki, Toru Kajita, Tsutomu Shimokawa
  • Publication number: 20040063024
    Abstract: Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer component comprising an acid-sensitive polymer having a monomeric unit with a pendant group containing a remote acid labile moiety.
    Type: Application
    Filed: September 30, 2002
    Publication date: April 1, 2004
    Applicants: International Business Machines Corporation, JSR Corporation
    Inventors: Mahmoud H. Khojasteh, Kuang-Jung Chen, Pushkara Rao Varanasi, Yukio Nishimura, Eiichi Kobayashi
  • Patent number: 6677419
    Abstract: A scaleable and high-yielding method of preparing copolymers that is useful as a component of a radiation sensitive resin composition is provided. The method includes the step of reacting at least one monomer A which is an unsaturated alicyclic monomer and forms a polymer main chain by dissociation of the unsaturated bond, and at least one unsaturated monomer B, which also forms a polymer chain by dissociation of an unsaturated bond, wherein less than two electron-withdrawing groups are directly appended to said unsaturation, and where said monomer B is other than the unsaturated alicyclic monomer and forms a polymer main chain, in the presence of a free radical initiator. The reacting step is carried out in a stoichiometric excess of monomer A as compared to monomer B. By carrying out the reacting step in an excess of monomer A as compared to monomer B, the resultant copolymer will have a greater molar concentration of monomer A than is obtainable using other methods.
    Type: Grant
    Filed: November 13, 2002
    Date of Patent: January 13, 2004
    Assignees: International Business Machines Corporation, JSR Corporation
    Inventors: Phillip J. Brock, Eiichi Kobayashi, Isao Nishimura, Yukio Nishimura, Thomas I. Wallow, Masafumi Yamamoto
  • Publication number: 20030219680
    Abstract: A radiation-sensitive resin composition suitable as a chemically-amplified resist is provided. The composition comprised (A) a resin insoluble or scarcely soluble in alkali, but becoming alkali soluble by the action of an acid, and (B) a photoacid generator.
    Type: Application
    Filed: May 2, 2003
    Publication date: November 27, 2003
    Inventors: Yukio Nishimura, Hiroyuki Ishii, Isao Nishimura, Eiichi Kobayashi
  • Publication number: 20030203309
    Abstract: 1. A radiation-sensitive resin composition comprising: (A) a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid and (B) a photoacid generator.
    Type: Application
    Filed: March 13, 2003
    Publication date: October 30, 2003
    Inventors: Yukio Nishimura, Hiroyuki Ishii, Masafumi Yamamoto, Isao Nishimura
  • Publication number: 20030203307
    Abstract: A radiation-sensitive resin composition comprising: (A) an alkali insoluble or scarcely alkali-soluble resin having an acid-dissociable protecting group of the following formula [I], 1
    Type: Application
    Filed: February 21, 2003
    Publication date: October 30, 2003
    Inventors: Akimasa Soyano, Hiroyuki Ishii, Hidemitsu Ishida, Motoyuki Shima, Yukio Nishimura
  • Publication number: 20030113658
    Abstract: A novel photoacid generator containing a structure of the following formula (I), 1
    Type: Application
    Filed: June 28, 2002
    Publication date: June 19, 2003
    Inventors: Satoshi Ebata, Eiji Yoneda, Tomoki Nagai, Tatsuya Toneri, Yong Wang, Haruo Iwasawa, Yukio Nishimura