Patents by Inventor Yukio Sano

Yukio Sano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11390944
    Abstract: A cleaning method of cleaning a film-forming device, which includes a processing container having a substrate holder provided in the processing container so as to hold a SiC substrate, and which supplies a source gas to the processing container, an interior of which is depressurized, and heats the SiC substrate so as to perform a film formation on the SiC substrate, includes: a reaction product removal process of removing a reaction product, which is formed during the film formation and attached to portions other than the SiC substrate, by supplying a ClF3 gas into the processing container after the film formation; and a residue removal process of removing a substance, which remains after the reaction product removal process and serves as an unnecessary impurity or causes a defect during a subsequent film formation, by supplying air into the processing container.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: July 19, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Masayuki Harashima, Yukio Sano
  • Publication number: 20220098726
    Abstract: A film forming method of forming a silicon carbide film on a substrate to be processed includes: forming the silicon carbide film on the substrate to be processed by loading a holder that holds the substrate to be processed into a processing container of a film forming apparatus to place the holder on a stage, and supplying a raw material gas into the processing container; and removing a reaction product, which has been adhered to a part other than the substrate to be processed during the forming the silicon carbide film, by loading a plate-shaped member having at least a surface formed by pyrolytic carbon into the processing container to place the plate-shaped member on the stage, and supplying a fluorine-containing gas into the processing container.
    Type: Application
    Filed: January 27, 2020
    Publication date: March 31, 2022
    Inventors: Masayuki HARASHIMA, Yukio SANO, Michikazu NAKAMURA, Hirokatsu KOBAYASHI
  • Publication number: 20210108331
    Abstract: A film forming apparatus for forming a silicon carbide film on a target substrate includes a substrate support on which the target substrate is placed, a gas supply mechanism configured to form a flow of a raw material gas along a direction perpendicular to a central axis of the substrate support from outside of the substrate support, and an induction coil configured to heat the target substrate. The gas supply mechanism supplies, in addition to a first Si-containing gas containing silicon without containing carbon and a first C-containing gas containing carbon without containing silicon, at least one of a second Si-containing gas having a thermal decomposition temperature higher than that of the first Si-containing gas and containing silicon without containing carbon and a second C-containing gas having a thermal decomposition temperature lower than that of the first C-containing gas and containing carbon without containing silicon, as the raw material gas.
    Type: Application
    Filed: March 12, 2019
    Publication date: April 15, 2021
    Inventors: Masayuki HARASHIMA, Yukio SANO, Yoshimune MISAWA, Hirokatsu KOBAYASHI
  • Publication number: 20200157677
    Abstract: A cleaning method of cleaning a film-forming device, which includes a processing container having a substrate holder provided in the processing container so as to hold a SiC substrate, and which supplies a source gas to the processing container, an interior of which is depressurized, and heats the SiC substrate so as to perform a film formation on the SiC substrate, includes: a reaction product removal process of removing a reaction product, which is formed during the film formation and attached to portions other than the SiC substrate, by supplying a ClF3 gas into the processing container after the film formation; and a residue removal process of removing a substance, which remains after the reaction product removal process and serves as an unnecessary impurity or causes a defect during a subsequent film formation, by supplying air into the processing container.
    Type: Application
    Filed: December 20, 2017
    Publication date: May 21, 2020
    Inventors: Masayuki HARASHIMA, Yukio SANO
  • Patent number: 7130775
    Abstract: An integrated building production information system including design CAD (computer-aided-design) based on software of building, structure, and equipment, and databases built in the outside separately from the design CAD, the databases making an integrated DB (shared database)-CAD system of building, structure and equipment as an execution-linked system in DB-CAD's sharing of a standard database, wherein the integrated building production information system stores the information made compatible by three-dimensional superposition at the time of design into a shared database (DB) of the integrated DB-CAD system, and further receives and links information of this shared database to extemal systems such as a skeleton drawing CAD, a reinforcing bar and steel frame system and the like and produces execution information.
    Type: Grant
    Filed: November 5, 2002
    Date of Patent: October 31, 2006
    Assignee: Kajima Corporation
    Inventors: Tohru Takagaki, Shunsuke Tanaka, Hiroshi Tamai, Takerou Yasuzawa, Ayako Yasaka, Minoru Tsujimoto, Yukio Endou, Yasufumi Tani, Yukio Sano, Manabu Takagi, Taketoshi Takahashi, Shigehiko Ueno, Teturou Uenami, Kazuo Wakasugi
  • Publication number: 20040145614
    Abstract: According to the invention, by developing a function of linking pieces of information of CAD's with one another for improving design drawings in quality, the pieces of information can be unified, the compatibility of information can be obtained or the efficiency of a collating operation can be improved and thereby data being compatible and good in quality which are made at an execution design stage can be obtained and a work of taking the compatibility can be advanced and further can be performed easily in a short time, and, therefore, such effects lead to shortening of the whole process and furthermore make it possible to comprehensively improve the efficiency of building production by diverting and utilizing said data at estimation and execution stages after the execution design stage.
    Type: Application
    Filed: October 15, 2003
    Publication date: July 29, 2004
    Inventors: Tohru Takagaki, Shunsuke Tanaka, Hiroshi Tamai, Takerou Yasuzawa, Ayako Yasaka, Minoru Tsujimoto, Yukio Endou, Yasufumi Tani, Yukio Sano, Manabu Takagi, Taketoshi Takahashi, Shigehiko Ueno, Teturou Uenami, Kazuo Wakasugi
  • Patent number: 4996763
    Abstract: A work to be exposed to light beams in an exposing section is fitted to an alignment table in an automatic aligning apparatus under the effect of suction caused by a suction unit. Then, cameras for optically recognizing alignment marks in the form of images are displaced to positions where the alignment marks can optically be read through wide transparent windows on an alignment table so that positions representative of displacement of the cameras are taken into position representative of the alignment marks on the work within image receiving regions recognizable by the respective cameras. The alignment table is then displaced in such a manner that the positions assumed by the alignment marks on the work are located in correspondence to preset positions in the exposing section. The apparatus is preferably used for automatically aligning a copper-plated laminar plate to be exposed with a mask film when wiring patterns on a printed wiring board are to be exposed.
    Type: Grant
    Filed: August 30, 1990
    Date of Patent: March 5, 1991
    Assignee: ORC Manufacturing Co., Ltd.
    Inventors: Yukio Sano, Akira Morita, Shigenori Kobayashi
  • Patent number: 4978181
    Abstract: A sunshade composed of a transparent substrate, a first base and a second base which are provided on the both surfaces of the substrate, an infrared ray-reflecting layer which is provided on the first base and which reflects infrared rays, and a sun light-reflecting layer which is provided on the second base and which reflects a sun radiant energy with partly transmitting visible rays. The infrared ray-reflecting layer may optionally be coated with a protective layer. At least one of the protective layer, the first base and the second base has a rough surface which may diffusively reflect the light as reflected by the infrared ray-reflecting layer and the sun light-reflecting layer. In place of formation of the rough surface, a light-diffusing agent may be incorporated into the substrate, the both bases or the protective layer.
    Type: Grant
    Filed: June 24, 1988
    Date of Patent: December 18, 1990
    Assignees: Kajima Corp., Tachikawa Corp., Teijin Chemicals Ltd.
    Inventors: Minoru Inanuma, Shumpei Ohara, Yukio Sano, Akihiro Goto, Shinji Sasamoto, Eiji Kaneko, Takashi Miyao, Yukio Torii, Keijiro Umemoto, Ryo Hirako, Nobuo Suzuki, Tadashi Shingu
  • Patent number: D766850
    Type: Grant
    Filed: September 12, 2014
    Date of Patent: September 20, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Eisuke Morisaki, Wataru Machiyama, Hirokatsu Kobayashi, Masayuki Harashima, Yukio Sano