Patents by Inventor Yuko Sasaki

Yuko Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240122988
    Abstract: The present invention relates to a synapse formation promoter and a brain plasticity promoter comprising CD24-negative mesenchymal stem cells prepared from a patient's own bone marrow aspirate and treatment of dementia, chronic-phase cerebral infarction, chronic-phase spinal cord injury, mental diseases, and the like using the synapse formation promoter and brain plasticity promoter.
    Type: Application
    Filed: April 26, 2023
    Publication date: April 18, 2024
    Applicants: Sapporo Medical University, Nipro Corporation
    Inventors: Osamu Honmou, Masanori Sasaki, Rie Maezawa, Shinichi Oka, Yuko Sasaki, Masahito Nakazaki, Toshihiko Yamashita
  • Patent number: 11927558
    Abstract: Provided is a microelectrode having a layered structure, including a layer containing a polymer compound having an aromatic ring (polymer compound layer) and a layer containing a conductive material (conductive layer), wherein a thickness of the polymer compound layer is 10 to 900 nm, a thickness of the conductive layer is 0.3 to 10 nm, and the microelectrode has a three-dimensional curved shape.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: March 12, 2024
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Tetsuhiko Teshima, Yuko Ueno, Yui Ogawa, Yoshiaki Kashimura, Satoshi Sasaki, Shengnan Wang, Makoto Takamura, Hiroshi Nakashima
  • Patent number: 11918396
    Abstract: According to one embodiment, a medical imaging apparatus includes a gantry, a carriage, a screen, a reflector, and a frame. The gantry has a bore formed therein. The bore is formed to accept a subject to be imaged by the medical imaging apparatus. The carriage moves through the bore. The screen is provided on the carriage. An image is projected on the screen by a projector from a rear. The rear is opposite to a side of which a top plate is inserted into the bore. The reflector reflects the image projected on the screen. The reflector includes prisms arranged in a same line. The frame supports the reflector. The frame is provided on the carriage.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: March 5, 2024
    Assignee: Canon Medical Systems Corporation
    Inventors: Aira Hotta, Takashi Sasaki, Yuko Kizu, Shinichi Uehara
  • Patent number: 11898968
    Abstract: Disclosed is a solution for quickly specifying an optical condition of a wafer to be inspected, and in particular, accelerating optical condition setting after obtaining a customer wafer.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: February 13, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventors: Taichi Maeda, Yuko Sasaki
  • Publication number: 20230377837
    Abstract: Charged particle beam apparatus includes: a charged particle optical system to irradiate a sample with a pulsed charged particle beam; an optical system to irradiate the sample with light; a detector configured to detect a secondary charged particle emitted by irradiating the sample with the pulsed charged particle beam; a control unit configured to control the charged particle optical system to irradiate the sample with the pulsed charged particle beam under a predetermined electron beam pulse condition, and control the optical system to irradiate the sample with the light under a predetermined light irradiation condition; and a computation device configured to set the predetermined light irradiation condition based on a difference between a secondary charged particle signal amount detected under a first electron beam pulse condition and a secondary charged particle signal amount detected under a second electron beam pulse condition different from the first electron beam pulse condition.
    Type: Application
    Filed: October 26, 2020
    Publication date: November 23, 2023
    Inventors: Yohei NAKAMURA, Natsuki TSUNO, Yasuhiro SHIRASAKI, Minami SHOUJI, Shota MITSUGI, Yuko SASAKI
  • Patent number: 11666601
    Abstract: The present invention relates to a synapse formation promoter and a brain plasticity promoter comprising CD24-negative mesenchymal stem cells prepared from a patient's own bone marrow aspirate and treatment of dementia, chronic-phase cerebral infarction, chronic-phase spinal cord injury, mental diseases, and the like using the synapse formation promoter and brain plasticity promoter.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: June 6, 2023
    Assignees: Sapporo Medical University, Nipro Corporation
    Inventors: Osamu Honmou, Masanori Sasaki, Rie Maezawa, Shinichi Oka, Yuko Sasaki, Masahito Nakazaki, Toshihiko Yamashita
  • Publication number: 20220359149
    Abstract: To provide a charged particle beam device including a booster electrode and an object lens that generates a magnetic field in a vicinity of a sample, and capable of preventing ion discharge, an insulator is disposed between a magnetic field lens and the booster electrode. A tip of the insulator protrudes to a tip side of an upper magnetic path from a tip of a lower magnetic path of the magnetic field lens. The tip on a lower side of the insulator is above the lower magnetic path, and a non-magnetic metal electrode is embedded between the upper magnetic path and the lower magnetic path.
    Type: Application
    Filed: July 2, 2019
    Publication date: November 10, 2022
    Applicant: Hitachi High-Tech Corporation
    Inventors: Makoto SAKAKIBARA, Momoyo ENYAMA, Hajime KAWANO, Makoto SUZUKI, Kenji TANIMOTO, Yuko SASAKI
  • Publication number: 20220252525
    Abstract: The present invention addresses the problem of quickly specifying an optical condition of a wafer to be inspected, and in particular, accelerating optical condition setting after obtaining a customer wafer.
    Type: Application
    Filed: May 15, 2019
    Publication date: August 11, 2022
    Inventors: Taichi MAEDA, Yuko SASAKI
  • Publication number: 20220133805
    Abstract: The present invention relates to a pharmaceutical composition for treating amyotrophic lateral sclerosis. More specifically, the present invention relates to a pharmaceutical composition for treating amyotrophic lateral sclerosis, wherein the pharmaceutical composition comprises mesenchymal stem cells and is intravenously administered.
    Type: Application
    Filed: March 13, 2020
    Publication date: May 5, 2022
    Applicants: Sapporo Medical University, Nipro Corporation
    Inventors: Osamu HONMOU, Masanori SASAKI, Yuko SASAKI, Shinichi OKA, Masahito NAKAZAKI, Rie MAEZAWA
  • Publication number: 20220125850
    Abstract: The present invention relates to a pharmaceutical composition containing mesenchymal stem cells administered to a patient subjected to stenting. The present invention relates specifically to: a pharmaceutical composition for repairing and regenerating tissue, comprising mesenchymal stem cells, wherein the pharmaceutical composition is administered to a patient subjected to stenting; and the prevention of in-stent neointimal hyperplasia or in-stent restenosis with the pharmaceutical composition.
    Type: Application
    Filed: February 7, 2020
    Publication date: April 28, 2022
    Applicants: Sapporo Medical University, Nipro Corporation
    Inventors: Osamu HONMOU, Masanori SASAKI, Yuko SASAKI, Shinichi OKA, Masahito NAKAZAKI, Rie MAEZAWA
  • Patent number: 11152186
    Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: October 19, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Wataru Yamane, Minoru Yamazaki, Yuko Sasaki, Wataru Mori, Takashi Doi
  • Patent number: 10991542
    Abstract: The purpose of the present invention is to provide a charged particle beam device which adjusts brightness and contrast or adjusts focus and the like appropriately in a short time even if there are few detected signals. Proposed as an aspect for achieving this purpose is a charged particle beam device provided with: a detector for detecting charged particles obtained on the basis of irradiation of a specimen with a charged particle beam emitted from a charged particle source; and a control unit for processing a signal obtained on the basis of the output of the detector, wherein the control unit performs statistical processing on gray level values in a predetermined region of an image generated on the basis of the output of the detector, and executes signal processing for correcting a difference between a statistical value obtained by the statistical processing and reference data relating to the gray level values of the image.
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: April 27, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Ryota Watanabe, Yuko Sasaki, Kazunari Asao, Makoto Suzuki, Wataru Mori, Minoru Yamazaki
  • Patent number: 10770266
    Abstract: A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.
    Type: Grant
    Filed: June 10, 2019
    Date of Patent: September 8, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Tomohito Nakano, Toshiyuki Yokosuka, Yuko Sasaki, Minoru Yamazaki, Yuzuru Mochizuki
  • Patent number: 10707047
    Abstract: A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: July 7, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Noritsugu Takahashi, Makoto Sakakibara, Wataru Mori, Hajime Kawano, Yuko Sasaki
  • Patent number: 10692687
    Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: June 23, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Wen Li, Shinichi Murakami, Hiroyuki Takahashi, Yuko Sasaki, Minoru Yamazaki, Hajime Kawano
  • Patent number: 10566172
    Abstract: A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.
    Type: Grant
    Filed: November 8, 2018
    Date of Patent: February 18, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tomohito Nakano, Toshiyuki Yokosuka, Yuko Sasaki, Minoru Yamazaki, Yuzuru Mochizuki
  • Publication number: 20200035449
    Abstract: A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.
    Type: Application
    Filed: June 10, 2019
    Publication date: January 30, 2020
    Inventors: Tomohito NAKANO, Toshiyuki YOKOSUKA, Yuko SASAKI, Minoru YAMAZAKI, Yuzuru MOCHIZUKI
  • Publication number: 20190362931
    Abstract: The purpose of the present invention is to provide a charged particle beam device which adjusts brightness and contrast or adjusts focus and the like appropriately in a short time even if there are few detected signals. Proposed as an aspect for achieving this purpose is a charged particle beam device provided with: a detector for detecting charged particles obtained on the basis of irradiation of a specimen with a charged particle beam emitted from a charged particle source; and a control unit for processing a signal obtained on the basis of the output of the detector, wherein the control unit performs statistical processing on gray level values in a predetermined region of an image generated on the basis of the output of the detector, and executes signal processing for correcting a difference between a statistical value obtained by the statistical processing and reference data relating to the gray level values of the image.
    Type: Application
    Filed: January 27, 2017
    Publication date: November 28, 2019
    Inventors: Ryota WATANABE, Yuko SASAKI, Kazunari ASAO, Makoto SUZUKI, Wataru MORI, Minoru YAMAZAKI
  • Publication number: 20190318906
    Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.
    Type: Application
    Filed: January 18, 2019
    Publication date: October 17, 2019
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Wen LI, Shinichi MURAKAMI, Hiroyuki TAKAHASHI, Yuko SASAKI, Minoru YAMAZAKI, Hajime KAWANO
  • Publication number: 20190311875
    Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.
    Type: Application
    Filed: March 15, 2019
    Publication date: October 10, 2019
    Inventors: Wataru YAMANE, Minoru YAMAZAKI, Yuko SASAKI, Wataru MORI, Takashi DOI