Abstract: A computer readable medium comprising computer executable instructions for carrying out a method is disclosed. The method includes: generating a schematic of an integrated circuit including a plurality of components, each of the components associated with a format, the format indicating a matching group that represents a respective circuit functionality; merging a first device array layout, which corresponds to a first subset of the components that share a first matching group, and a second device array layout, which corresponds to a second subset of the components that share a second matching group, to form a third device array layout, in response to detecting that the first device array layout and the second device array layout share a same cell type; forming a first layer enclosing the third device array layout; inserting dummy patterns surrounding the first layer; and inserting a guard ring further surrounding the dummy patterns.

Abstract: A method includes coupling a first signal to an impedance; determining a first average current of the first signal through the impedance over a first time, the first average current corresponding to a duty cycle of the first signal; coupling a second signal to the impedance; determining a second average current of the second signal through the impedance over a second time, the second average current corresponding to a first duty cycle of the second signal; determining the first duty cycle from the first average current and the second average current; determining a third average current of the second signal through the impedance over a third time, the third average current corresponding to a second duty cycle of the second signal; determining the second duty cycle from the first average current and the third average current; and averaging the first duty cycle and the second duty cycle.

Abstract: A semiconductor device includes a plurality of transistors, a plurality of metal layers, and a resistor. The plurality of transistors are connected in series between a power terminal and a ground terminal, and gate terminals of the transistors being connected together. The plurality of metal layers are overlaid above the plurality of transistors. The resistor is implemented between two of the plurality of metal layers.

Abstract: Methods of designing integrated circuits incorporating an analog ECO flow are provided. An example method comprises receiving an initial design and performing an auto-marker process. The auto-marker process comprises performing a first auto-marker process to surround a first plurality of active cells of the design with first computer-aided design (CAD) layers corresponding to a first plurality of engineering change order (ECO) cells, performing an enhanced auto-marker process to cover irregular shapes of the design with second CAD layers corresponding to a second plurality of ECO cells, and performing a second auto-marker process to fill empty areas of the design with third CAD layers corresponding to a third plurality of ECO cells. The method further includes filling the design with the first plurality of ECO cells, the second plurality of ECO cells, and the third plurality of ECO cells.

Abstract: A method of manufacturing a semiconductor device includes forming M_1st segments in a first metallization layer including: forming first and second M_1st segments for which corresponding long axes extend in a first direction and are substantially collinear, the first and second M_1st segments being free from another instance of M_1st segment being between the first and second M_1st segments; and (A) where the first and second M_1st segments are designated for corresponding voltage values having a difference equal to or less than a reference value, separating the first and second M_1st segments by a first gap; or (B) where the first and second M_1st segments are designated for corresponding voltage values having a difference greater than the reference value, separating the first and second M_1st segments by a second gap, a second size of the second gap being greater than a first size of the first gap.

Abstract: An IC device includes a transistor including a gate structure between first and second active areas, a first S/D metal portion overlying the first active area, and a second S/D metal portion overlying the second active area. A load resistor including a third S/D metal portion is positioned on a dielectric layer and in a same layer as the first and second S/D metal portions. A first via overlies the first S/D metal portion, second and third vias overlie the third S/D metal portion, and a first conductive structure is configured to electrically connect the first via to the second via.

Abstract: A device including delay cells connected in series and in a feedback loop to provide a ring oscillator. At least one of the delay cells in the ring oscillator is a stacked gate delay cell that includes two or more PMOS transistors having first drain/source paths connected in series to each other and having first gates connected to each other and two or more NMOS transistors having second drain/source paths connected in series to each other and to the first drain/source paths and having second gates connected to each other and to the first gates.

Abstract: A delay measurement system and a measurement method are provided. The delay measurement system includes a delay control device and a comparator. The delay control device is configured to generate a second signal in response to a first signal, wherein a rising edge of the second signal delays a first delay time with respect to a rising edge of the first signal, and the first delay time is controlled in response to an output signal of a comparator. The comparator is configured to compare the first delay time with a second delay time and output the output signal, wherein a rising edge of a third signal delays the second delay time with respect to the rising edge of the first signal, and the third signal is generated by a device under test (DUT) in response to the first signal.

Abstract: Systems, methods, and devices are disclosed herein for developing a cell design. Operations of a plurality of electrical cells are simulated to collect a plurality of electrical parameters. A machine learning model is trained using the plurality of electrical parameters. The trained machine learning model receives data having cell layout design constraints. The trained machine learning model determines a cell layout for the received data based on the plurality of electrical parameters. The cell layout is provided for further characterization of electrical performance within the cell layout design constraints.

Abstract: A delay-locked loop (DLL) circuit includes a low pass filter coupled to a phase detector, and a digitally controlled delay line (DCDL) coupled to the low pass filter. The DCDL includes an input terminal, an output terminal coupled to an input terminal of the phase detector, and stages that propagate a signal along a first path from the input terminal to a selectable return stage and along a second path from the return stage to the output terminal. Each stage includes first and second inverters that selectively propagate the signal along the first and second paths, a third inverter that selectively propagates the signal from the first path to the second path, and either fourth and fifth inverters that selectively propagate the signal along the first and second paths, or a sixth inverter that selectively propagates the signal from the first path to the second path.

Abstract: Techniques for generating one or more non-final layouts for an analog integrated circuit are disclosed. The techniques include generating a non-final layout of an analog integrated circuit based on device specifications, partitioning the non-final layout into a plurality of subcells, merging the verified sub-cells to form a merged layout of the analog integrated circuit, and performing quality control checks on the merged layout. Additionally or alternatively, generating the non-final layout can include determining an allowable spacing between adjacent cells of different cell types or inserting one or more filler cells into a filler zone in the non-final layout.

Abstract: A method of generating a layout design of an integrated circuit includes forming an active zone and partitioning the active zone into a center portion between a first side portion and a second side portion. The method also includes forming a plurality of gate-strips and forming a routing line. The plurality of gate-strips includes a first group of gate-strips intersecting the active zone over first channel regions in the center portion, a second group of gate-strips intersecting the active zone over second channel regions in the center portion, a third group of gate-strips intersecting the active zone over third channel regions in the first side portion, and a fourth group of gate-strips intersecting the active zone over fourth channel regions in the second side portion.

Abstract: Techniques for generating one or more non-final layouts for an analog integrated circuit are disclosed. The techniques include generating a non-final layout of an analog integrated circuit based on device specifications, partitioning the non-final layout into a plurality of subcells, merging the verified sub-cells to form a merged layout of the analog integrated circuit, and performing quality control checks on the merged layout. Additionally or alternatively, generating the non-final layout can include determining an allowable spacing between adjacent cells of different cell types or inserting one or more filler cells into a filler zone in the non-final layout.

Abstract: A delay measurement system and a measurement method are provided. The delay measurement system includes a delay control device and a comparator. The delay control device is configured to generate a second signal in response to a first signal, wherein a rising edge of the second signal delays a first delay time with respect to a rising edge of the first signal, and the first delay time is controlled in response to an output signal of a comparator. The comparator is configured to compare the first delay time with a second delay time and output the output signal, wherein a rising edge of a third signal delays the second delay time with respect to the rising edge of the first signal, and the third signal is generated by a device under test (DUT) in response to the first signal.

Abstract: Disclosed herein are related to a system and a method of amplifying an input voltage based on cascaded charge pump boosting. In one aspect, first electrical charges are stored at a first capacitor according to the input voltage to obtain a second voltage. In one aspect, the second voltage is amplified according to the first electrical charges stored by the first capacitor to obtain a third voltage. In one aspect, second electrical charges are stored at the second capacitor according to the third voltage. In one aspect, the third voltage is amplified according to the second electrical charges stored by the second capacitor to obtain a fourth voltage.

Abstract: A semiconductor device includes an active region over a substrate extending along a first lateral direction. The semiconductor device includes a number of first conductive structures operatively coupled to the active region. The first conductive structures extend along a second lateral direction. The semiconductor device includes a number of second conductive structures disposed above the plurality of first conductive structures. The second conductive structures extend along the first lateral direction. The semiconductor device includes a first capacitor having a first electrode and a second electrode. The first electrode includes one of the first conductive structures and the active region, and the second electrode includes a first one of the second conductive structures. Each of the active region and the first conductive structures is electrically coupled to a power rail structure configured to carry a supply voltage.

Abstract: A method includes forming an array of metal conducting lines and an array of metal segment lineups in a metal layer. A first length of a first metal conducting line is equal to a second length of a second metal conducting line. The array of metal segment lineups is interlaced with the array of metal conducting lines, and a metal segment lineup in the array of metal segment lineups includes multiple metal segments.

Abstract: Disclosed herein are related to a method of amplifying an input voltage based on cascaded charge pump boosting. The method includes storing, by a first capacitor, first electrical charges corresponding to an input voltage to obtain a second voltage. The method further includes amplifying, by a voltage amplifier, the second voltage according to the first electrical charges stored by the first capacitor to obtain a third voltage. The method further includes storing, by a second capacitor, second electrical charges according to the third voltage. The method further includes amplifying, by the voltage amplifier, the third voltage according to the second electrical charges stored by the second capacitor to obtain a fourth voltage.

Abstract: A device including an inverter circuit, a hysteresis control circuit, and a high-side input level shifter. The inverter circuit having an output and including at least two series connected PMOS transistors connected, at the output, in series to at least two series connected NMOS transistors. The hysteresis control circuit coupled to the output to provide feedback to the at least two series connected PMOS transistors and to the at least two series connected NMOS transistors. The high-side input level shifter connected to gates of the at least two PMOS transistors and configured to shift a low level of an input signal to a higher level and provide the higher level to one or more of the gates of the at least two PMOS transistors.

Abstract: Systems, methods, and devices are disclosed herein for developing a cell design. Operations of a plurality of electrical cells are simulated to collect a plurality of electrical parameters. A machine learning model is trained using the plurality of electrical parameters. The trained machine learning model receives data having cell layout design constraints. The trained machine learning model determines a cell layout for the received data based on the plurality of electrical parameters. The cell layout is provided for further characterization of electrical performance within the cell layout design constraints.