Patents by Inventor Yusuke Hatanaka

Yusuke Hatanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7648760
    Abstract: In a method of manufacturing a microstructure, an aluminum member having an aluminum substrate and a micropore-bearing anodized layer present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving 0.001 to 20 wt % of a material constituting the anodized layer and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized layer, thereby obtaining the microstructure having micropores formed on a surface thereof. This method enables a microstructure having an ordered array of pits to be obtained in a short period of time.
    Type: Grant
    Filed: February 5, 2007
    Date of Patent: January 19, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Publication number: 20090166079
    Abstract: A microstructure that comprises an insulating base material having through micropores filled with metal at a high filling ratio and that can be used as an anisotropically conductive member is provided. The microstructure comprises an insulating base material having through micropores with a pore size of from 10 to 500 nm at a density of from 1×106 to 1×1010 pores/mm2, a metal being filled into the through micropores at a filling ratio of at least 80%.
    Type: Application
    Filed: December 24, 2008
    Publication date: July 2, 2009
    Applicant: FUJIFILM Corporation
    Inventor: Yusuke HATANAKA
  • Publication number: 20090081411
    Abstract: A microstructure has an anodized film of aluminum bearing through micropores. The through micropores have a pore diameter variance of within 8% of an average diameter of the through micropores. A compound for improving hydrophilicity of the anodized film is incorporated in at least a part of the anodized film making up a surface of the microstructure.
    Type: Application
    Filed: September 8, 2008
    Publication date: March 26, 2009
    Applicant: FUJIFILM Corporation
    Inventor: Yusuke HATANAKA
  • Publication number: 20090050564
    Abstract: A method of cross-flow filtration using a membrane filter has a feeding a fluid to be filtered across a membrane surface of a porous alumina membrane filter serving as the membrane filter so that the fluid flows parallel to the membrane surface to separate material to be filtered with the porous alumina membrane filter. The porous alumina membrane filter is made of an aluminum anodized film and includes micropores having a degree of ordering as defined by formula (1): Degree of ordering (%)=B/A×100 ??(1) of at least 50%, a porosity as defined by formula (2): Porosity (%)=C/D×100 ??(2) of at least 40%, and a percentage of a pore size standard deviation to an average pore size of up to 10%.
    Type: Application
    Filed: August 21, 2008
    Publication date: February 26, 2009
    Applicant: FUJIFILM Corporation
    Inventor: Yusuke HATANAKA
  • Publication number: 20080284042
    Abstract: An anisotropically conductive member has an insulating base material, and conductive paths composed of a conductive material which pass in a mutually insulated state through the insulating base material in a thickness direction thereof and which are provided in such a way that a first end of each conductive path is exposed on a first side of the insulating base material and a second end of each conductive path is exposed on a second side of the insulating base material. The conductive paths have a density of at least 2 million paths/mm2 and the insulating base material is a structure composed of an anodized aluminum film having micropores therein.
    Type: Application
    Filed: March 27, 2008
    Publication date: November 20, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Yoshinori Hotta, Takashi Touma, Yusuke Hatanaka
  • Publication number: 20080152941
    Abstract: Disclosed is a method of manufacturing a microstructure, wherein an aluminum substrate is subjected to, in order, (1) a step of subjecting a surface of the aluminum substrate to a first anodizing treatment to form an anodized film having micropores on the surface of the aluminum substrate; (2) a step of partially dissolving the anodized film using an acid or alkali; (3) a step of performing a second anodizing treatment to grow the micropores in their depth direction; and (4) a step of removing a part of the anodized film above inflection points in cross section of the micropores, whereby the microstructure having the micropores formed at a surface of the anodized film is obtained and a microstructure manufactured by the method. The method is capable of obtaining in a short period of time a microstructure having an ordered array of pits without using highly toxic chromic (VI) acid.
    Type: Application
    Filed: December 21, 2007
    Publication date: June 26, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Yusuke Hatanaka, Yoshinori Hotta
  • Publication number: 20080081173
    Abstract: In a method of manufacturing a microstructure, an aluminum member having an aluminum substrate and a micropore-bearing anodized layer present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving 0.001 to 20 wt % of a material constituting the anodized layer and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized layer, thereby obtaining the microstructure having micropores formed on a surface thereof. This method enables a microstructure having an ordered array of pits to be obtained in a short period of time.
    Type: Application
    Filed: February 5, 2007
    Publication date: April 3, 2008
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Publication number: 20080070056
    Abstract: Disclosed is a microstructure comprising an aluminum anodized film bearing through micropores, wherein a surface of the microstructure is covered with a protective film for preventing hydration of the aluminum anodized film. The microstructure may be used as a porous alumina membrane filter excellent in filtration rate and its stability with time.
    Type: Application
    Filed: September 17, 2007
    Publication date: March 20, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Yusuke HATANAKA, Tadabumi TOMITA, Yoshinori HOTTA, Akio UESUGI
  • Publication number: 20080057293
    Abstract: A microstructure includes an anodized aluminum layer that has on a surface thereof micropores, at least some of which contain a catalyst, in a micropore array with a degree of ordering of at least 40%. A method of manufacturing the microstructure includes anodizing an aluminum member to form on its surface an anodized layer having micropores, removing the aluminum member, and supporting a catalyst on at least part of the anodized layer. The microstructure is excellent in heat resistance.
    Type: Application
    Filed: January 30, 2007
    Publication date: March 6, 2008
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Publication number: 20070289945
    Abstract: A method of manufacturing a microstructure wherein an aluminum member having an aluminum substrate and a micropore-bearing anodized film present on a surface of the aluminum substrate is subjected at least to, in order, a pore-ordering treatment which involves performing one or more cycles of a step that includes a first film dissolution treatment for dissolving the anodized film until a barrier layer has a thickness of 3 to 50 nm, and an anodizing treatment which follows the first film dissolution treatment; and a second film dissolution treatment for dissolving the anodized film so that a ratio of a diameter of a micropore opening “a” to a micropore diameter at a height “a/2” from a micropore bottom “b” (a/b) is in a range of 0.9 to 1.1, whereby the microstructure having micropores formed on a surface thereof is obtained. The manufacturing method enables microstructures having an ordered array of pits to be obtained in a short period of time.
    Type: Application
    Filed: June 11, 2007
    Publication date: December 20, 2007
    Inventors: Yusuke Hatanaka, Tadabumi Tomita, Yoshinori Hotta, Akio Uesugi
  • Publication number: 20070219092
    Abstract: There is provided a catalyst supporting body including a porous alumina support and a catalyst supported on the porous alumina support in which the surface of the porous alumina support has at least one selected from the group consisting of irregularities having an average wavelength of 5 to 100 ?m, irregularities having an average wavelength of 0.5 to 5 ?m, and irregularities having an average wavelength of 0.01 to 0.5 ?m. The catalyst supporting body has an excellent catalytic function.
    Type: Application
    Filed: March 19, 2007
    Publication date: September 20, 2007
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke Hatanaka, Yoshinori Hotta, Hirokazu Sawada, Akio Uesugi
  • Publication number: 20050214675
    Abstract: The positive-type photosensitive composition according to the present invention contains a novolak resin (A), an alkali-soluble resin (B) selected from the group consisting of resins prepared by addition polymerization of a vinyl compound and condensation polymers such as imide, amide, urethane, urea, ester, and resol resins, an infrared absorbing agent (C), and a sulfonium salt (D). The positive-type photosensitive composition is superior in sensitivity, greater in layer strength, and readily dissociates by infrared ray exposure, and thus is useful as the recording layer for positive-type planographic printing plate precursors.
    Type: Application
    Filed: March 16, 2005
    Publication date: September 29, 2005
    Inventors: Kotaro Watanabe, Ikuo Kawauchi, Yusuke Hatanaka
  • Publication number: 20050142485
    Abstract: An infrared laser-sensitive positive type image recording material comprises a support; an alkali-developer-soluble first layer formed over the support; and a second layer formed over the first layer, the solubility of the second layer in alkali-developer being improved by exposure of the second layer to an infrared laser. The first layer comprises a polymer having a structural unit represented by formula (I): wherein R1 represents a hydrogen atom or a methyl group; R2 represents a hydrocarbon group having (n+1) valences and having an aliphatic ring structure having 3 to 30 carbon atoms; A represents an oxygen atom or —NR3— wherein R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n is an integer of from 1 to 5.
    Type: Application
    Filed: December 27, 2004
    Publication date: June 30, 2005
    Inventors: Ippei Nakamura, Kazuto Kunita, Yusuke Hatanaka
  • Publication number: 20050014093
    Abstract: The present invention relates to a positive-type planographic printing plate precursor comprising: a hydrophilic substrate; an image recording layer including a novolak resin (A) and a light-to-heat conversion agent (B), disposed on the substrate, the image recording layer increasing in solubility in an aqueous alkali solution when exposed to light emitted from an infrared laser, wherein the weight average molecular weight (Mw) of the novolak resin (A) is in a range of 500 to 10000 based on polystyrene, the molecular weight being found by a gel permeation chromatographic (GPC) method using monodispersion polystyrene as a standard, and the degree of dispersion (Mw/Mn) is 1.7 or less when the weight average molecular weight (Mw) is 500 to 3000, the degree of dispersion (Mw/Mn) is 2.
    Type: Application
    Filed: July 15, 2004
    Publication date: January 20, 2005
    Inventors: Kotaro Watanabe, Ippei Nakamura, Ikuo Kawauchi, Yusuke Hatanaka