Patents by Inventor Yusuke Iizuka

Yusuke Iizuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230025023
    Abstract: In a business management system (1) according to an example embodiment of the present invention, a user PC (10) determines whether a position of an iris of a user being detected by analyzing an image is within a correspondent screen region, calculates viewpoint coordinates on a display screen when the position of the iris of the user is within the correspondent screen region, and uses coordinate information of an application screen being displayed on the display screen and the viewpoint coordinates to identify an application providing an application screen viewed by the user. Then, a management server (20) determines whether the identified application is a predetermined application used in a business, and calculates a usage time of an application determined to be the predetermined application.
    Type: Application
    Filed: November 25, 2020
    Publication date: January 26, 2023
    Applicant: NEC Platforms, Ltd.
    Inventor: Yusuke IIZUKA
  • Publication number: 20220278356
    Abstract: There is provided an inorganic solid electrolyte-containing composition containing an inorganic solid electrolyte, binder particles having an average particle diameter of 10 to 1,000 nm, and a dispersion medium, in which a block polymer is contained to constitute the binder particles, this block polymer contains a block polymerized chain which has a terminal block chain having a C Log P value of 2 or more and having a specific constitutional component and has a block chain having a C Log P value of 1 or less, the block chain being adjacent to this terminal block chain. There are also provided a sheet for an all-solid state secondary battery and an all-solid state secondary battery, and manufacturing methods for a sheet for an all-solid state secondary battery and an all-solid state secondary battery.
    Type: Application
    Filed: April 27, 2022
    Publication date: September 1, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Yusuke IIZUKA, Koji YASUDA, Tetsuya MATSUSHITA, Hiroaki MOCHIZUKI
  • Patent number: 10894871
    Abstract: A rubber composition comprises: per 100 parts by weight of a diene-based rubber, from 70 to 95 parts by weight of an inorganic filler containing two types of silicas, a silica X and a silica Y, and a carbon black. A compounded amount of the silica X is x parts by weight and a compounded amount of the silica Y is y parts by weight. A total amount of the silica X and the silica Y (x+y) is 85% by weight or greater of the inorganic filler, and a weight ratio of the silica X to the silica Y (x/y) is from 1/3 to 2/1. A nitrogen adsorption specific surface area of the silica X is 160 m2/g±10%, and a nitrogen adsorption specific surface area of the silica Y is 200 m2/g±10%.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: January 19, 2021
    Inventor: Yusuke Iizuka
  • Patent number: 10610833
    Abstract: A functional polymer membrane contains a polymer compound having a constitutional unit represented by Formula I as a constitutional unit A, a constitutional unit represented by Formula I? as a constitutional unit A?, and a constitutional unit derived from a polyfunctional monomer having a C log P value of equal to or greater than ?0.3 to less than 3.0 as a constitutional unit B.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: April 7, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Kazuomi Inoue, Yusuke Iizuka
  • Publication number: 20200023320
    Abstract: A separation composite membrane, including a porous support layer, and a separation layer provided on the porous support layer and contains the following polymer a1 and b1; a separation membrane module; a separator; and a composition for forming a membrane suitable for preparing the separation composite membrane. Polymer a1: A polymer whose ratio of a permeation rate of carbon dioxide to a permeation rate of methane is 15 or greater, and the permeation rate of the carbon dioxide is smaller than that in the polymer b1 and which has a solubility parameter of 21 or greater Polymer b1: A polymer whose permeation rate of carbon dioxide is 200 GPU or greater, and a ratio of the permeation rate of the carbon dioxide to methane is smaller than that in the polymer a1 and which has a solubility parameter of 16.
    Type: Application
    Filed: August 26, 2019
    Publication date: January 23, 2020
    Applicant: FUJIFILM Corporation
    Inventor: Yusuke IIZUKA
  • Patent number: 10537859
    Abstract: A gas separation membrane includes a gas separation layer containing a polyimide compound having a repeating unit represented by Formula (I), in Formula (I), RI represents a hydrogen atom, an alkyl group, or a halogen atom, Xa represents a sulfamoyl group, an alkoxysulfonyl group, a carboxy group, a hydroxy group, an acyloxy group, or a halogen atom, and R represents a mother nucleus having a specific structure.
    Type: Grant
    Filed: November 8, 2017
    Date of Patent: January 21, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Koji Hironaka, Satoshi Sano, Yusuke Iizuka, Sotaro Inomata, Keisuke Kodama, Tetsu Kitamura
  • Patent number: 10407517
    Abstract: A rubber composition for tires of the present technology contains a diene rubber, silica, a silane coupling agent, a fatty acid metal salt, and a predetermined alkyltrialkoxysilane; the diene rubber containing 60 mass % or greater of a modified conjugated diene rubber and 30 mass % or greater of a particular conjugated diene rubber which corresponds to a part or all of the modified conjugated diene rubber; an average glass transition temperature of the diene rubber being from ?45 to ?20° C.; the particular conjugated diene rubber being a conjugated diene rubber produced by a particular production method and having predetermined ranges of aromatic vinyl unit content, vinyl bond content, and weight average molecular weight.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: September 10, 2019
    Assignee: The Yokohama Rubber Co., LTD.
    Inventors: Yusuke Iizuka, Hiroki Sugimoto, Makoto Ashiura
  • Patent number: 10087313
    Abstract: A rubber composition contains: a diene rubber; 1 to 25 parts by weight of aromatic modified terpene resin; 80 to 150 parts by weight of silica; 5 to 50 parts by weight of carbon black; an oil component; and 0.1 to 20 wt. % of the weight of the silica of alkyltriethoxysilane having an alkyl group having 3 to 20 carbons, the diene rubber containing 10 to 30 wt. % of natural rubber, 10 to 30 wt. % of solution polymerized styrene butadiene rubber having a styrene unit content of 30 to 40 wt. % and 80 to 40 wt. % of emulsion polymerized styrene butadiene rubber, and a ratio of a total amount of an oil-extending component in the solution polymerized styrene butadiene rubber and/or the emulsion polymerized styrene butadiene rubber, the aromatic modified terpene resin, and the oil component to a weight of the natural rubber being 3.0 to 4.0.
    Type: Grant
    Filed: December 2, 2015
    Date of Patent: October 2, 2018
    Assignee: The Yokohama Rubber Co., LTD.
    Inventor: Yusuke Iizuka
  • Publication number: 20180085716
    Abstract: A gas separation membrane includes a gas separation layer containing a polyimide compound having a repeating unit represented by Formula (I), in Formula (I), RI represents a hydrogen atom, an alkyl group, or a halogen atom, Xa represents a sulfamoyl group, an alkoxysulfonyl group, a carboxy group, a hydroxy group, an acyloxy group, or a halogen atom, and R represents a mother nucleus having a specific structure.
    Type: Application
    Filed: November 8, 2017
    Publication date: March 29, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Koji HIRONAKA, Satoshi SANO, Yusuke IIZUKA, Sotaro INOMATA, Keisuke KODAMA, Tetsu KITAMURA
  • Publication number: 20180036689
    Abstract: A functional polymer membrane contains a polymer compound having a constitutional unit represented by Formula I as a constitutional unit A, a constitutional unit represented by Formula I? as a constitutional unit A?, and a constitutional unit derived from a polyfunctional monomer having a C log P value of equal to or greater than ?0.3 to less than 3.0 as a constitutional unit B.
    Type: Application
    Filed: October 17, 2017
    Publication date: February 8, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Kazuomi INOUE, Yusuke IIZUKA
  • Publication number: 20170362415
    Abstract: A rubber composition contains: a diene rubber; 1 to 25 parts by weight of aromatic modified terpene resin; 80 to 150 parts by weight of silica; 5 to 50 parts by weight of carbon black; an oil component; and 0.1 to 20 wt. % of the weight of the silica of alkyltriethoxysilane having an alkyl group having 3 to 20 carbons, the diene rubber containing 10 to 30 wt. % of natural rubber, 10 to 30 wt. % of solution polymerized styrene butadiene rubber having a styrene unit content of 30 to 40 wt. % and 80 to 40 wt. % of emulsion polymerized styrene butadiene rubber, and a ratio of a total amount of an oil-extending component in the solution polymerized styrene butadiene rubber and/or the emulsion polymerized styrene butadiene rubber, the aromatic modified terpene resin, and the oil component to a weight of the natural rubber being 3.0 to 4.0.
    Type: Application
    Filed: December 2, 2015
    Publication date: December 21, 2017
    Inventor: Yusuke Iizuka
  • Publication number: 20170283519
    Abstract: A rubber composition for tires of the present technology contains a diene rubber, silica, a silane coupling agent, a fatty acid metal salt, and a predetermined alkyltrialkoxysilane; the diene rubber containing 60 mass % or greater of a modified conjugated diene rubber and 30 mass % or greater of a particular conjugated diene rubber which corresponds to a part or all of the modified conjugated diene rubber; an average glass transition temperature of the diene rubber being from ?45 to ?20° C.; the particular conjugated diene rubber being a conjugated diene rubber produced by a particular production method and having predetermined ranges of aromatic vinyl unit content, vinyl bond content, and weight average molecular weight.
    Type: Application
    Filed: August 24, 2015
    Publication date: October 5, 2017
    Inventors: Yusuke Iizuka, Hiroki Sugimoto, Makoto Ashiura
  • Publication number: 20170044349
    Abstract: A rubber composition comprises: per 100 parts by weight of a diene-based rubber, from 70 to 95 parts by weight of an inorganic filler containing two types of silicas, a silica X and a silica Y, and a carbon black. A compounded amount of the silica X is x parts by weight and a compounded amount of the silica Y is y parts by weight. A total amount of the silica X and the silica Y (x+y) is 85% by weight or greater of the inorganic filler, and a weight ratio of the silica X to the silica Y (x/y) is from 1/3 to 2/1. A nitrogen adsorption specific surface area of the silica X is 160 m2/g±10%, and a nitrogen adsorption specific surface area of the silica Y is 200 m2/g±10%.
    Type: Application
    Filed: April 28, 2015
    Publication date: February 16, 2017
    Inventor: Yusuke Iizuka
  • Patent number: 9152048
    Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes (A) a resin that when acted on by an acid, increases its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, and (C) a resin containing at least one group selected from among the following groups (x) to (z) and further containing at least either a fluorine atom or a silicon atom, in which three or more polymer chains are contained through at least one branch point, (x) an alkali-soluble group, (y) a group that when acted on by an alkali developer, is decomposed to thereby increase its solubility in the alkali developer, and (z) a group that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: October 6, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Hiroshi Saegusa, Kaoru Iwato, Yusuke Iizuka, Kousuke Koshijima
  • Patent number: 9034558
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.
    Type: Grant
    Filed: September 28, 2011
    Date of Patent: May 19, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Shuhei Yamaguchi, Akinori Shibuya, Yusuke Iizuka
  • Patent number: 8846293
    Abstract: The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains (A) a resin capable of increasing the solubility in an alkaline developer by the action of an acid, and (C) at least one selected from the group of compounds represented by the following formula (ZI-3), (ZI-4) or (ZI-5) and capable of generating an acid upon irradiation of actinic rays or radiation, wherein the resin (A) contains at least one repeating unit having a group capable of decomposing by the action of an acid to leave a leaving group having a ring structure, and the leaving group having a ring structure has at least one of a polar group as a substituent and a polar atom as a part of the ring structure, and a compound derived from the leaving group having a ring structure has a logP value of not less than 0 and less than 2.8.
    Type: Grant
    Filed: March 27, 2012
    Date of Patent: September 30, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yusuke Iizuka, Akinori Shibuya, Naohiro Tango, Shohei Kataoka
  • Patent number: 8841060
    Abstract: An actinic-ray-sensitive or radiation-sensitive resin composition which is capable of improving line edge roughness (LER) and inhibiting pattern collapse, a resist film and a pattern forming method each using the same, a method for preparing an electronic device, and an electronic device are provided. The actinic-ray-sensitive or radiation-sensitive resin composition contains: (A) a resin having repeating units having a structure represented by any one of the following general formulae (I-1) to (I-3), and repeating units containing at least one selected from the group consisting of a lactone structure, a sultone structure, and a cyano group; and (B) a compound that generates an acid by irradiation with actinic rays or radiations.
    Type: Grant
    Filed: June 29, 2012
    Date of Patent: September 23, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Shohei Kataoka, Yusuke Iizuka, Akinori Shibuya, Tomoki Matsuda, Naohiro Tango
  • Patent number: 8802349
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing (a) a repeating unit represented by the following formula (AN-01), (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin that contains at least either a fluorine atom or a silicon atom and contains a repeating unit having a group capable of decomposing by the action of an alkali developer to increase the solubility in an alkali developer: wherein the variables in formula (AN-01) are defined in the description.
    Type: Grant
    Filed: March 31, 2010
    Date of Patent: August 12, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Masahiro Yoshidome, Shuji Hirano, Hiroshi Saegusa, Kaoru Iwato, Yusuke Iizuka
  • Patent number: 8795944
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: August 5, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Hiroshi Saegusa, Kaoru Iwato, Shuji Hirano, Yusuke Iizuka
  • Patent number: 8771916
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a resin capable of increasing the solubility of the resin (A) in an alkali developer by the action of an acid; and (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: July 8, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Shuji Hirano, Kaoru Iwato, Hiroshi Saegusa, Yusuke Iizuka