Abstract: A film thickness measuring device includes: a stage on which a substrate is disposed; a light emitter/receiver configured to emit light for measuring a film thickness to the substrate disposed on the stage and receive a reflected light from the substrate disposed on the stage; a rotation mechanism configured to rotate the stage; an orientation detector configured to detect an orientation of the stage; and a controller. Based on a detection result by the orientation detector, the controller controls the rotation mechanism so that the orientation of the stage becomes a desired orientation when the substrate is disposed.

Abstract: According to one embodiment, a storage battery apparatus includes: a plurality of storage battery modules each including a battery module, which includes a plurality of battery cells, and a cell monitoring unit measuring voltages of the battery cells and a temperature of the battery module; and a battery management unit periodically receiving measurement values of the voltages of the battery cells and the temperature of the battery module. When there is interference in communication with the plurality of cell monitoring units, the battery management unit extends a communication cycle with the cell monitoring units, sets a value of a chargeable current and a value of a dischargeable current of the battery module, which correspond to at least the communication cycle.

Abstract: According to one embodiment, a storage battery apparatus including a wireless module transmitting and receiving a radio wave having a polarization plane in any one of first to third directions orthogonal to one another; and a battery management unit including a first wireless module transmitting and receiving a radio wave having the polarization plane in the first direction, and a second wireless module transmitting and receiving a radio wave having the polarization plane in the second direction, wherein the polarization plane in the first direction is less likely to have reception power of lowest receiving sensitivity than the polarization planes in other directions, and a number of the first wireless modules is larger than a number of the second wireless modules.

Abstract: Provided is a substrate processing apparatus comprising a processing chamber, a rotatable substrate support configured to hold a substrate in the processing chamber, a freezing device that is in contact with or separated from the substrate support and is configured to cool the substrate support, a mechanism configured to rotate the substrate support and raise and lower the freezing device, a power supply part configured to supply a radio frequency (RF) power, and a power supply line that penetrates through the freezing device, has a contact portion, and is configured to switch supply and stop of supply of the RF power by connecting the contact portion to a specific position of the substrate support or disconnecting the contact portion from the specific position of the substrate support.

Abstract: There is provided a substrate processing method for a substrate processing apparatus. The substrate processing apparatus comprises: a processing chamber; a placing stand provided inside the processing chamber, configured to place a substrate on a placing surface, and having a gas path; a freezing device having a contact surface to be in contact with or separated from a surface to be contacted of the placing stand and configured to cool the placing stand; a gas supply pipe connected to the gas path and configured to introduce a heat transfer gas; and a cooling part provided outside the processing chamber and connected to the gas supply pipe. The substrate processing method comprises: (a) cooling the heat transfer gas by the cooling part; and (b) supplying the cooled heat transfer gas between the placing surface and a back surface of the substrate from the gas path through the gas supply pipe.

Abstract: A film formation processing system includes a first and a second film formation processing chambers configured to perform, respectively, a first and a second substrate processing on a substrate, a transfer chamber between the two film formation processing chambers, a temperature adjustment chamber in the transfer chamber configured to perform a temperature adjustment processing of the substrate on which the first substrate processing has been performed before the second substrate processing is performed, and a controller, wherein the temperature adjustment chamber includes a first processing container, a first stage inside the first processing container configured to place the substrate on the first stage, a first refrigerator configured to cool the first stage, a radiation shield between the first processing container and the first stage, and a first gas supply configured to supply a gas into the first processing container.

Abstract: There is a placing table comprising: an electrostatic chuck having a chuck electrode, wherein the electrostatic chuck is configured to attract and hold a substrate on a placing surface and to be rotatable; a freezing device having a contact surface in contact with or separated from a surface of the electrostatic chuck opposite to the placing surface and configured to cool the electrostatic chuck; and a power controller configured to superimpose a radio frequency (RF) bias voltage applied to the electrostatic chuck on a chuck voltage applied to the chuck electrode.

Abstract: A film thickness measuring device includes: a stage on which a substrate is disposed; a light emitter/receiver configured to emit light for measuring a film thickness to the substrate disposed on the stage and receive a reflected light from the substrate disposed on the stage; a rotation mechanism configured to rotate the stage; an orientation detector configured to detect an orientation of the stage; and a controller. Based on a detection result by the orientation detector, the controller controls the rotation mechanism so that the orientation of the stage becomes a desired orientation when the substrate is disposed.

Abstract: According to one embodiment, a storage battery apparatus comprising: a plurality of storage battery modules, each of which includes a battery module and a first wireless communication module transmitting and receiving a radio wave based on a BLE standard; and a battery management unit which includes a plurality of second wireless communication modules transmitting and receiving a radio wave based on the BLE standard, and an arithmetic processing apparatus controlling operation of the second wireless communication modules, wherein the arithmetic processing apparatus establishes communication between the battery management unit and the storage battery modules in unit of groups each including at least one of the storage battery modules.

Abstract: A management device used in a mounting system including multiple mounting-related devices in which a member is attached to one or more attachment sections, and a moving work device that moves between the multiple mounting-related devices to automatically attach and detach the member to and from the attachment sections, the management device including, when acquiring prohibition information including information on the attachment sections to and from which the member is not attachable and detachable by the moving work device from the mounting-related device, a management control section that creates an instruction list based on the prohibition information, in which an attachment and detachment instruction of the member for the attachment sections other than the attachment sections to and from which the member is not attachable and detachable is registered, and causes the moving work device to execute attachment and detachment processing of the member based on the instruction list.

Abstract: An operation state display device displays an operation state of a board production facility in which a board is sequentially conveyed to multiple board work machines, which perform predetermined board work on the board, and the board work is sequentially performed to produce a board product, and includes an acquisition section and a display section. The acquisition section acquires an execution time zone in which setup changing work required for switching a type of the board product to be produced is performed, for each board work machine, based on production information acquired by the board production facility during production of the board product. The display section graphically displays at least one of the execution time zone for each of the multiple board work machines and the execution time zone for a predetermined board work machine of the board production facility in time series.

Abstract: Provided is a substrate processing apparatus that has an improved cooling performance. This substrate processing apparatus comprises: a placing table which is provided in a processing container and on which a substrate is to be placed; a refrigerator that has a contacting surface that makes contact with or is separated from a contact target surface of the placing table, and cools the placing table; and a lifting/lowering device that lifts or lowers the refrigerator and generates a pressing force for pressing the refrigerator against the placing table.

Abstract: An actual measurement value calculation unit of a growth information providing apparatus calculates an actual measurement value representing a growth situation of a crop in a farm field. An acquisition unit acquires weather information in the farm field where the crop is planted. A trial calculation unit calculates a trial calculation growth curve representing the transition of the growth situation in calculation by making a trial calculation of the transition of the growth situation of the crop toward the target yield using the environment information including the weather information after the crop is planted in the farm field and the information about the target yield of the crop. A display control unit performs display control of displaying both the actual measurement value of the growth situation of the crop and the trial calculation growth curve.

Abstract: A fertilization assistance apparatus estimates estimation soil nitrogen distribution in a farm field by analyzing color of soil of the farm field in a captured image in which the farm field before planting is imaged. The fertilization assistance apparatus determines whether there is a correlation between the color of soil and growth situation of a crop in the farm field. In a case where there is a correlation between the color of soil and the growth situation of the crop in the farm field, the fertilization assistance apparatus generates basal fertilizer variable fertilization information using the information about the estimation soil nitrogen distribution. The basal fertilizer variable fertilization information indicates a relationship between the position in the farm field and the amount of applied fertilizer at the position in a case where the variable fertilization of basal fertilizer is performed.

Abstract: The present disclosure provides an information input device in a miniaturized size allowing both rotation operation and tilt operation. In the information input device, viewed from the direction orthogonal to the rotation axis of a rotation operation member, the rotation operation member includes a second sloping surface extending from the end of a first sloping surface nearer a rotation detection unit and approaching the rotation axis of the rotation operation member as the second sloping surface extends from the rotation detection unit in the rotation axis direction.

Abstract: The present technology relates to an imaging element and an electronic apparatus capable of expanding a saturation signal electric charge amount. A first P-type impurity region, a capacitance expanding portion that forms a PN junction surface with a second P-type impurity region and a first N-type impurity region, and the first N-type impurity region are sequentially provided in a depth direction from a surface side where a wiring layer of a semiconductor substrate is laminated. The second P-type impurity region is formed in a stripe on a plane of the capacitance expanding portion that perpendicularly intersects with the depth direction. The stripe is formed, on the plane of the capacitance expanding portion that perpendicularly intersects with the depth direction, in a direction perpendicular to a side where an electrode that reads accumulated electric charge is formed. The present technology can be applied to an imaging element.

Abstract: Provided is a substrate processing apparatus comprising a processing chamber, a rotatable substrate support configured to hold a substrate in the processing chamber, a freezing device that is in contact with or separated from the substrate support and is configured to cool the substrate support, a mechanism configured to rotate the substrate support and raise and lower the freezing device, a power supply part configured to supply a radio frequency (RF) power, and a power supply line that penetrates through the freezing device, has a contact portion, and is configured to switch supply and stop of supply of the RF power by connecting the contact portion to a specific position of the substrate support or disconnecting the contact portion from the specific position of the substrate support.

Abstract: A substrate processing apparatus includes a processing container, a stage having an electrostatic chuck that attracts and holds a substrate inside the processing container, the stage being configured to be rotatable, a refrigeration device arranged at a lower side of the stage and configured to cool the electrostatic chuck while being in contact with or be separated from the stage, a lift device configured to vertically move the refrigeration device, and a peripheral member provided around the refrigeration device and coated with a material having lower emissivity than a base material of the peripheral member.

Abstract: There is a placing table comprising: an electrostatic chuck having a chuck electrode, wherein the electrostatic chuck is configured to attract and hold a substrate on a placing surface and to be rotatable; a freezing device having a contact surface in contact with or separated from a surface of the electrostatic chuck opposite to the placing surface and configured to cool the electrostatic chuck; and a power controller configured to superimpose a radio frequency (RF) bias voltage applied to the electrostatic chuck on a chuck voltage applied to the chuck electrode.

Abstract: A magnetron sputtering apparatus is provided. The apparatus comprises: a vacuum chamber storing a substrate; a plurality of sputtering mechanisms, each including a target having one surface facing the inside of the vacuum chamber, a magnet array, and a moving mechanism for reciprocating the magnet array between a first position and a second position on the other surface of the target; a power supply for forming plasma by supplying power to targets of selected sputtering mechanisms for film formation; a gas supplier for supplying a gas for plasma formation into the vacuum chamber; and a controller for outputting a control signal, in performing the film formation, such that magnet arrays of selected and unselected sputtering mechanisms, extension lines of moving paths of the magnet arrays thereof intersecting each other in plan view, move synchronously or are located at certain positions so as to be distinct from each other.