Patents by Inventor Yusuke Mochizuki
Yusuke Mochizuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10816434Abstract: It is an object of the present invention to provide same results of leak judgments even if conditions such as temperature and pressure vary as long as sizes of sealing defects are same. A leak device 5 that generates regular leakage under regular temperature and pressure is made communicable with a test path 19 through which a test pressure is provided. A device actual measurement leak value of the leak device 5 is actually measured by a leakage measuring instrument 33. An object actual measurement leak value of a test object 9 is actually measured by the leakage measuring instrument 33. The object actual measurement leak value is converted into a regular-conditions-converted leak value based on the device actual measurement leak value and a leakage is judged based on the regular-conditions-converted leak value.Type: GrantFiled: December 13, 2016Date of Patent: October 27, 2020Assignee: FUKUDA CO., LTD.Inventors: Satsuo Fukushima, Yusuke Mochizuki, Masakazu Ito
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Publication number: 20200246760Abstract: An object of the present invention is to provide a cell transplant device having an ability to induce angiogenesis around the cell transplant device, and a method for manufacturing the same. According to the present invention, a cell transplant device including a cell structure (A) that includes a plurality of biocompatible polymer blocks and a plurality of cells of at least one type, and in which at least one of the biocompatible polymer blocks is disposed in gaps between the plurality of cells; and an immunoisolation membrane (B) that encloses the cell structure is provided.Type: ApplicationFiled: February 28, 2020Publication date: August 6, 2020Applicant: FUJIFILM CorporationInventors: Kentaro NAKAMURA, Ryo KOGAWA, Yusuke MOCHIZUKI, Ryuta TAKEGAMI
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Publication number: 20200138011Abstract: According to the present invention, there are provided a chamber for transplantation, including a membrane for immunoisolation including a porous membrane at at least part of a boundary between an inside and an outside of the chamber for transplantation, in which the porous membrane contains a polymer and has a layered compact portion where a pore diameter is the smallest within the membrane, a pore diameter continuously increases in a thickness direction from the compact portion toward both one surface A and the other surface B of the porous membrane, a porosity in a vicinity of the surface B is 65% or more, an average pore diameter of the surface B is larger than an average pore diameter of the surface A, the surface B is disposed on the inside of the chamber for transplantation, and a joint portion at which the porous membranes are joined to each other while the surface B's face each other is provided; and a device for transplantation including the chamber for transplantation enclosing a biological constitType: ApplicationFiled: December 27, 2019Publication date: May 7, 2020Applicant: FUJIFILM CorporationInventors: Kazuhiro HASEGAWA, Ryuta TAKEGAMI, Kuniyuki KAMINAGA, Yusuke MOCHIZUKI
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Publication number: 20200138010Abstract: According to the present invention, there are provided a chamber for transplantation which has a high durability, and in which an enclosed biological constituent can be maintained for a long period of time because an interior space thereof is efficiently secured; and a method for manufacturing the chamber for transplantation. The chamber for transplantation includes one or more membranes for immunoisolation at a boundary between an inside and an outside of the chamber for transplantation, in which all of the membranes for immunoisolation include a porous membrane containing a polymer, and a joint portion at which the porous membranes are directly fusion welded to each other is provided.Type: ApplicationFiled: December 27, 2019Publication date: May 7, 2020Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Kuniyuki KAMINAGA, Kazuhiro HASEGAWA, Ryuta TAKEGAMI
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Publication number: 20200138014Abstract: According to the present invention, there are provided a chamber for transplantation, as a planar chamber for transplantation which has a structure in which membranes for immunoisolation face each other, and which is capable of stably enclosing a biological constituent, including a membrane for immunoisolation at a boundary between an inside and an outside of the chamber for transplantation, in which the membranes for immunoisolation which face each other have joint portions that are joined to each other, an interior space includes a point at a distance of 10 mm or longer from any position of the joint portion, and the membrane for immunoisolation has flexibility that allows a distance of 1 mm to 13 mm as the following distance: in a case where a portion of 10 mm from a side surface of one short side of a 10 mm×30 mm rectangular test piece of the membrane for immunoisolation is vertically sandwiched between flat plates, and the flat plates are placed horizontally, a distance between a horizontal plane includiType: ApplicationFiled: December 27, 2019Publication date: May 7, 2020Applicant: FUJIFILM CorporationInventors: Kuniyuki KAMINAGA, Ryuta TAKEGAMI, Kazuhiro HASEGAWA, Yusuke MOCHIZUKI
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Publication number: 20200129664Abstract: According to the present invention, there are provided a chamber for transplantation, including a membrane for immunoisolation at a boundary between an inside and an outside of the chamber for transplantation, in which the membrane for immunoisolation includes a porous membrane, and in the porous membrane, a maximum heat shrinkage ratio among heat shrinkage ratios in a membrane surface direction after immersion in water at 90° C. for 3 hours is 0.00% to 5.00%, and a difference between the maximum heat shrinkage ratio and a minimum heat shrinkage ratio among the heat shrinkage ratios in the membrane surface direction is 0.00% to 1.30%; and a device for transplantation including the chamber for transplantation enclosing a biological constituent therein. The chamber for transplantation of the present invention has a high durability and is capable of maintaining an enclosed biological constituent for a long period of time.Type: ApplicationFiled: December 27, 2019Publication date: April 30, 2020Applicant: FUJIFILM CorporationInventors: Kuniyuki KAMINAGA, Ryuta TAKEGAMI, Kazuhiro HASEGAWA, Yusuke MOCHIZUKI
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Publication number: 20200128814Abstract: According to the present invention, there are provided a chamber for transplantation, including a membrane for immunoisolation including a porous membrane at at least part of a boundary between an inside and an outside of the chamber for transplantation, in which the porous membrane contains a polymer and has a layered compact portion where a pore diameter is the smallest within the membrane, a pore diameter continuously increases in a thickness direction from the compact portion toward both one surface A and the other surface B of the porous membrane, a porosity in a vicinity of the surface A is 65% or more, an average pore diameter of the surface A is larger than an average pore diameter of the surface B, and the surface B is disposed on the inside of the chamber for transplantation; and a device for transplantation including the chamber for transplantation enclosing a biological constituent therein.Type: ApplicationFiled: December 26, 2019Publication date: April 30, 2020Applicant: FUJIFILM CorporationInventors: Kazuhiro HASEGAWA, Ryuta TAKEGAMI, Kuniyuki KAMINAGA, Yusuke MOCHIZUKI
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Patent number: 10486101Abstract: A gas separation membrane, the gas separation membrane module, and the gas separation device include a first separation layer, and a second separation layer, the first separation layer has an Si/C ratio of 0.3 or less, the Si/C ratio being a ratio of the number of silicon atoms to the number of carbon atoms at the interface of the first separation layer on the second separation layer side, the second separation layer has a maximum value of an F/C ratio of 0.20 or more, the F/C ratio being a ratio of the number of fluorine atoms to the number of carbon atoms, and an Si/C ratio of 0.3 or less in a portion where the F/C ratio is maximum.Type: GrantFiled: November 12, 2018Date of Patent: November 26, 2019Assignee: FUJIFILM CorporationInventors: Yusuke Mochizuki, Atsushi Mukai, Motoi Harada, Makoto Sawada
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Patent number: 10427111Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.55??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: GrantFiled: March 14, 2017Date of Patent: October 1, 2019Assignee: FUJIFILM CorporationInventors: Yusuke Mochizuki, Makoto Sawada, Takeshi Narita, Shigehide Itou, Hiroyuki Noda, Atsushi Mukai
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Publication number: 20190291060Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.63??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: ApplicationFiled: June 14, 2019Publication date: September 26, 2019Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Makoto SAWADA, Takeshi NARITA, Shigehide ITOU, Hiroyuki NODA, Atsushi MUKAI
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Publication number: 20190262509Abstract: According to the present invention, there is provided a membrane for immunoisolation, including a porous membrane that contains a polymer, in which Formulas (I) and (II) are satisfied for at least one surface of the porous membrane, B/A?0.7 (I) and A?0.015 (II) (in the formula, A represents a ratio of an N element to a C element on a surface of the membrane, and B represents a ratio of the N element to the C element at a depth of 30 nm from the surface of the membrane); a chamber for transplantation for enclosing a biological constituent therein, including the above-described membrane for immunoisolation on at least a part of a surface forming an inside and an outside of the chamber for transplantation; and a device for transplantation includes the above-described chamber for transplantation enclosing the above-described biological constituent therein. The membrane for immunoisolation of the present invention has a high bioaffinity.Type: ApplicationFiled: May 10, 2019Publication date: August 29, 2019Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Kentaro NAKAMURA, Shigeaki OHTANI, Naohiro MATSUNAGA, Ryuta TAKEGAMI
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Publication number: 20190262122Abstract: According to the present invention, there are provided a membrane for immunoisolation, including: a porous membrane that contains a polymer, in which the porous membrane includes a layered compact portion where a pore diameter is the smallest within the membrane, and a pore diameter continuously increases in a thickness direction from the compact portion toward at least one surface of the porous membrane; a chamber for transplantation for enclosing a biological constituent therein, including the above-described membrane for immunoisolation on at least a part of a surface forming an inside and an outside of the chamber for transplantation; and a device for transplantation, including the above-described chamber for transplantation enclosing the biological constituent therein. In the membrane for immunoisolation of the present invention which can be manufactured at low costs, a deterioration in substance permeability is unlikely to occur.Type: ApplicationFiled: May 10, 2019Publication date: August 29, 2019Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Kentaro NAKAMURA, Shigeaki OHTANI, Naohiro MATSUNAGA, Ryuta TAKEGAMI
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Publication number: 20190091635Abstract: A gas separation membrane, the gas separation membrane module, and the gas separation device each have a support, a resin layer, a separation layer, and a protective layer in this order, in which the resin layer includes a compound having a siloxane bond, the protective layer is in direct contact with the separation layer, a composition of the protective layer is different from a composition of the resin layer, the composition of the protective layer is different from a composition of the separation layer, and the separation layer has a maximum value of a silicon atom content of 2 atomic % or less in a composition of a half area on a side of the protective layer in a thickness direction.Type: ApplicationFiled: November 28, 2018Publication date: March 28, 2019Applicant: FUJIFILM CorporationInventors: Atsushi MUKAI, Yusuke MOCHIZUKI
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Publication number: 20190076777Abstract: A gas separation membrane, the gas separation membrane module, and the gas separation device include a first separation layer, and a second separation layer, the first separation layer has an Si/C ratio of 0.3 or less, the Si/C ratio being a ratio of the number of silicon atoms to the number of carbon atoms at the interface of the first separation layer on the second separation layer side, the second separation layer has a maximum value of an F/C ratio of 0.20 or more, the F/C ratio being a ratio of the number of fluorine atoms to the number of carbon atoms, and an Si/C ratio of 0.3 or less in a portion where the F/C ratio is maximum.Type: ApplicationFiled: November 12, 2018Publication date: March 14, 2019Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Atsushi MUKAI, Motoi HARADA, Makoto SAWADA
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Publication number: 20180328812Abstract: It is an object of the present invention to provide same results of leak judgments even if conditions such as temperature and pressure vary as long as sizes of sealing defects are same. A leak device 5 that generates regular leakage under regular temperature and pressure is made communicable with a test path 19 through which a test pressure is provided. A device actual measurement leak value of the leak device 5 is actually measured by a leakage measuring instrument 33. An object actual measurement leak value of a test object 9 is actually measured by the leakage measuring instrument 33. The object actual measurement leak value is converted into a regular-conditions-converted leak value based on the device actual measurement leak value and a leakage is judged based on the regular-conditions-converted leak value.Type: ApplicationFiled: December 13, 2016Publication date: November 15, 2018Inventors: Satsuo Fukushima, Yusuke Mochizuki, Masakazu Ito
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Publication number: 20180280892Abstract: The gas separation membrane includes a separation layer containing a silsesquioxane compound, and a protective layer, in which a composition of the separation layer in a thickness direction is uniform.Type: ApplicationFiled: June 7, 2018Publication date: October 4, 2018Applicant: FUJIFILM CorporationInventors: Motoi HARADA, Yusuke MOCHIZUKI
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Publication number: 20180272291Abstract: A protective-layer-covered gas separation membrane has a gas separation membrane that satisfies specific conditions such as having a resin layer containing a compound having a siloxane bond, a protective layer located on the resin layer containing a compound having a siloxane bond of the gas separation membrane, and a porous layer on the protective layer. The protective-layer-covered gas separation membrane is produced. A gas separation membrane module and a gas separation apparatus have the protective-layer-covered gas separation membrane.Type: ApplicationFiled: May 31, 2018Publication date: September 27, 2018Applicant: FUJIFILM CorporationInventors: Makoto SAWADA, Satoshi YONEYAMA, Yusuke MOCHIZUKI
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Publication number: 20180272292Abstract: A method for producing a protective-layer-covered gas separation membrane includes forming a gas separation membrane having a resin layer containing a compound having a siloxane bond and satisfying a particular condition by surface oxidation treatment of a resin layer precursor containing a siloxane bond; and providing a protective layer on the resin layer before winding. A protective-layer-covered gas separation membrane is produced by the method for producing a protective-layer-covered gas separation membrane. A gas separation membrane module and a gas separation apparatus are produced by the method for producing a protective-layer-covered gas separation membrane.Type: ApplicationFiled: June 4, 2018Publication date: September 27, 2018Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Satoshi YONEYAMA, Makoto SAWADA
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Patent number: 9808772Abstract: Provided is a gas separation membrane including a support, a separation layer, and a protective layer in this order, in which the separation layer contains inorganic particles, the protective layer contains a resin and inorganic particles having an average particle diameter of 10 nm or greater which is less than 0.34 times the film thickness of the protective layer, and the content of the inorganic particles contained in the protective layer is 40% by mass or less with respect to the content of the resin contained in the protective layer, the gas separation membrane being capable of being made into a spiral type gas separation membrane module while maintaining high permeability; and a gas separation membrane module which uses the gas separation membrane.Type: GrantFiled: August 23, 2016Date of Patent: November 7, 2017Assignee: FUJIFILM CorporationInventor: Yusuke Mochizuki
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Publication number: 20170182469Abstract: Provided are a gas separation membrane which has a resin layer containing a compound having a siloxane bond, in which the resin layer containing a compound having a siloxane bond satisfies Expressions 1 and 2, and at least one of gas permeability or gas separation selectivity is high under high pressure; a method of producing a gas separation membrane; a gas separation membrane module; and a gas separator. 0.9?A/B?0.55??Expression 1 B?1.7??Expression 2 In the expressions, A represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms contained in the resin layer containing a compound having a siloxane bond at a depth of 10 nm from the surface of the resin layer containing a compound having a siloxane bond, and B represents an O/Si ratio that is a ratio of the number of oxygen atoms relative to the number of silicon atoms in the surface of the resin layer containing a compound having a siloxane bond.Type: ApplicationFiled: March 14, 2017Publication date: June 29, 2017Applicant: FUJIFILM CorporationInventors: Yusuke MOCHIZUKI, Makoto SAWADA, Takeshi NARITA, Shigehide ITOU, Hiroyuki NODA, Atsushi MUKAI