Patents by Inventor Yusuke Takano

Yusuke Takano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140127630
    Abstract: The present invention provides a silicon oxynitride film formation method capable of reducing energy cost, and also provides a substrate equipped with a silicon oxynitride film formed thereby. This method comprises the steps of: casting a film-formable coating composition containing a polysilazane compound on a substrate surface to form a coat; drying the coat to remove excess of the solvent therein; and then irradiating the dried coat with UV light at a temperature lower than 150° C.
    Type: Application
    Filed: June 22, 2011
    Publication date: May 8, 2014
    Applicant: AZ Electronic Materials USA Corp.
    Inventors: Ninad Shinde, Tatsuro Nagahara, Yusuke Takano
  • Patent number: 8705354
    Abstract: A node on a core network, in accordance with a connection state of a terminal, releases a transmission path resource which is made unnecessary due to LIPA (Local IP access) or SIPTO (Selected IP traffic offload) connection configuration.
    Type: Grant
    Filed: September 17, 2010
    Date of Patent: April 22, 2014
    Assignee: NEC Corporation
    Inventors: Yusuke Takano, Toshiyuki Tamura
  • Publication number: 20130323904
    Abstract: [Problem] To provide a method capable of forming an insulating film having homogeneous and high bulk density and less suffering defects. [Means for solving] A substrate surface is coated with a silicon dioxide dispersion containing silicon dioxide fine particles, a polymer, a surfactant and a dispersion medium; and then further coated with a polysilazane composition; and thereafter heated to form an insulating film.
    Type: Application
    Filed: February 17, 2012
    Publication date: December 5, 2013
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Yusuke Takano, Tatsuro Nagahara, Shinde Ninad, Takafumi Iwata
  • Patent number: 8568955
    Abstract: Disclosed is a composition for forming a top antireflective film, which comprises at least one fluorine-containing compound and a quaternary ammonium compound represented by the formula (1) [wherein at least one of R1, R2, R3, and R4 represents a hydroxyl group or an alkanol group, and the others independently represent a hydrogen or an alkyl group having 1 to 10 carbon atoms; and X? represents a hydroxyl group, a halide ion or a sulfate ion], and optionally a water-soluble polymer, an acid, a surfactant and an aqueous solvent. The composition for forming a top antireflective film can exhibit the same levels of functions as those of conventional top antireflective film-forming compositions when applied in a smaller amount.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: October 29, 2013
    Assignee: Electronic Materials USA Corp.
    Inventors: Yasushi Akiyama, Go Noya, Katsutoshi Kuramoto, Yusuke Takano
  • Publication number: 20130272131
    Abstract: A gateway apparatus arranged between a base station and the backbone network monitors a communication signal transmitted from a terminal apparatus through the base station. In a case where specifying information is not included in the communication signal, the gateway apparatus outputs a user data signal from the terminal apparatus through the base station to the backbone network. In a case where the specifying information is included in the communication signal, the gateway apparatus forwards the user data signal from the terminal apparatus through the base station to an external network.
    Type: Application
    Filed: December 19, 2011
    Publication date: October 17, 2013
    Inventors: Yusuke Takano, Toshiyuki Tamura
  • Publication number: 20130225158
    Abstract: The present invention can provide a radio communication apparatus comprising an antenna which receives a restriction signal from a radio base station, a reception circuit which decodes the restriction signal received by said antenna, and a control circuit which controls the radio communication apparatus, in which the control circuit can be adapted to select appropriately a speech outgoing/incoming scheme for performing communication with the radio base station on the basis of the restriction signal from the radio base station. As the speech outgoing/incoming scheme, a domain scheme or a speech communication scheme is used. In addition, the present invention further provides a communication network control system using the radio communication apparatus, and a communication network control method.
    Type: Application
    Filed: April 12, 2013
    Publication date: August 29, 2013
    Applicant: NEC CORPORATION
    Inventors: Yusuke Takano, Toshiyuki Tamura
  • Patent number: 8501394
    Abstract: There is provided a method for forming a superfine pattern, which can simply produce a superfine pattern with high mass productivity. The method comprises the steps of forming a first convex pattern, on a film to be treated, forming a spacer formed of a silazane-containing resin composition on the side wall of the convexes constituting the first convex pattern, and forming a superfine pattern using as a mask the spacer or a resin layer disposed around the spacer. The spacer is formed by curing an evenly coated resin composition only in its part around the first convex pattern. According to this method for pattern formation, unlike the conventional method, a superfine pattern can be formed.
    Type: Grant
    Filed: January 27, 2009
    Date of Patent: August 6, 2013
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Yusuke Takano, Jin Li, Tomonori Ishikawa, Go Noya
  • Publication number: 20130164690
    Abstract: The present invention provides a silicon oxynitride film formation method capable of reducing energy cost, and also provides a substrate equipped with a silicon oxynitride film formed thereby. This method comprises the steps of: casting a film-formable coating composition containing a polysilazane compound on a substrate surface to form a coat; drying the coat to remove excess of the solvent therein; and then irradiating the dried coat with UV light at a temperature lower than 150° C.
    Type: Application
    Filed: August 10, 2011
    Publication date: June 27, 2013
    Applicant: AZ Electronic Materials USA Corp.
    Inventors: Ninad Shinde, Tatsuro Nagahara, Yusuke Takano
  • Publication number: 20120302237
    Abstract: A circuit switching user agent system includes a service processing device arranged in a home network of an IMS (IP Multimedia Subsystem)/MMD (Multi-Media Domain). The circuit switching user agent system also includes a communication device arranged in a visited network where a mobile terminal has visited, the communication device having a function of interconversion between a UNI (User-Network Interface) signal in a circuit switching network to which the mobile terminal is connected and a signal used in the IMS/MMD.
    Type: Application
    Filed: August 9, 2012
    Publication date: November 29, 2012
    Applicant: NEC CORPORATION
    Inventors: Yusuke Takano, Toshiyuki Tamura
  • Publication number: 20120302238
    Abstract: A circuit switching user agent system includes a service processing device arranged in a home network of an IMS (IP Multimedia Subsystem)/MMD (Multi-Media Domain). The circuit switching user agent system also includes a communication device arranged in a visited network where a mobile terminal has visited, the communication device having a function of interconversion between a UNI (User-Network Interface) signal in a circuit switching network to which the mobile terminal is connected and a signal used in the IMS/MMD.
    Type: Application
    Filed: August 9, 2012
    Publication date: November 29, 2012
    Applicant: NEC CORPORATION
    Inventors: Yusuke TAKANO, Toshiyuki Tamura
  • Patent number: 8317316
    Abstract: An ink jet recording apparatus is presented. The ink jet recording apparatus includes an apparatus casing comprising a discharge port which opens in a forward direction, a support member disposed within the apparatus casing in the rear of the discharge port and configured to support a recording medium, an ink head disposed within the apparatus casing and configured to eject ink which is curable with irradiation of ultraviolet light to the recording medium, an ultraviolet light irradiation device disposed within the apparatus casing and configured to irradiate ultraviolet light to the recording medium, and a first cover body configured to cover the discharge port in a freely openable and closeable manner, wherein the first cover body is opened upon discharging the recording medium via the discharge port.
    Type: Grant
    Filed: July 8, 2010
    Date of Patent: November 27, 2012
    Assignee: Roland DG Corporation
    Inventors: Ryo Baba, Yusuke Takano, Koji Owada
  • Publication number: 20120170454
    Abstract: A node on a core network, in accordance with a connection state of a terminal, releases a transmission path resource which is made unnecessary due to LIPA (Local IP access) or SIPTO (Selected IP traffic offload) connection configuration.
    Type: Application
    Filed: September 17, 2010
    Publication date: July 5, 2012
    Applicant: NEC CORPORATION
    Inventors: Yusuke Takano, Toshiyuki Tamura
  • Publication number: 20120160801
    Abstract: There are provided a composition for forming a superfine pattern and a method employing the same for forming a superfine pattern. The composition enables to simply produce a superfine pattern with high mass productivity. The composition comprises perhydropolysilazane (I), silicon-containing polymer (II) having a hydrocarbon group, and a solvent. The mixture of those polymers contains silicon-hydrogen bonds and silicon-hydrocarbon group bonds in such amounts that the number of the silicon-hydrocarbon group bonds is in a ratio of 1 to 44% based on the total number of the silicon-hydrogen bonds and the silicon-hydrocarbon group bonds. The composition is applied on a resist pattern to form a spacer formed of the composition on the side wall of the ridges in the pattern, and then the spacer or a resin layer disposed around the spacer is used as a mask to form a superfine pattern.
    Type: Application
    Filed: December 27, 2010
    Publication date: June 28, 2012
    Inventors: Munirathna Padmanaban, Jin Li, Toru Koike, Yusuke Takano, Kazunori Kurosawa
  • Publication number: 20120014365
    Abstract: A mobile communication network includes a radio communication device which is installed in a mobile communication network to carry out radio communication with a mobile terminal, a gateway which relays a communication from the terminal device from the radio communication device to the Internet, and a node which carries out an authentication process in response to a connection request from the mobile terminal. The gateway is installed in the radio communication device or in a carrier network. The node establishes a direct tunnel between the radio communication device and the gateway, so that the mobile terminal is connected to the Internet via the direct tunnel and via the mobile communication network. Thus, it is possible to reduce traffic simply passing through the carrier network.
    Type: Application
    Filed: March 19, 2010
    Publication date: January 19, 2012
    Applicant: NEC CORPORATION
    Inventors: Yusuke Takano, Toshiyuki Tamura
  • Patent number: 8084186
    Abstract: The present invention relates to a process for forming an reverse tone image on a device comprising; a) forming an optional absorbing organic underlayer on a substrate; b) forming a coating of a photoresist over the underlayer; c) forming a photoresist pattern; d) forming a polysilazane coating over the photoresist pattern from a polysilazane coating composition, where the polysilazane coating is thicker than the photoresist pattern, and further where the polysilazane coating composition comprises a silicon/nitrogen polymer and an organic coating solvent; e) etching the polysilazane coating to remove the polysilazane coating at least up to a level of the top of the photoresist such that the photoresist pattern is revealed; and, f) dry etching to remove the photoresist and the underlayer which is beneath the photoresist, thereby forming an opening beneath where the photoresist pattern was present.
    Type: Grant
    Filed: February 10, 2009
    Date of Patent: December 27, 2011
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: David Abdallah, Ralph R. Dammel, Yusuke Takano, Jin Li, Kazunori Kurosawa
  • Publication number: 20110029770
    Abstract: The present invention applies to a radio communication system that has a subscriber authentication server provided with a plurality of authentication processors and first and second authentication verification apparatuses that carry out each of authentication requests for first and second authentications to the subscriber authentication server for the same subscriber. In this radio communication system, the subscriber authentication server, upon success of the first authentication, reports to the first authentication verification apparatus identification information of the authentication processor that carried out the first authentication, and the first authentication verification apparatus reports to the second authentication verification apparatus the identification information that was reported from the subscriber authentication server.
    Type: Application
    Filed: March 4, 2009
    Publication date: February 3, 2011
    Applicant: NEC CORPORATION
    Inventor: Yusuke Takano
  • Publication number: 20110007119
    Abstract: An ink jet recording apparatus is presented. The ink jet recording apparatus includes an apparatus casing comprising a discharge port which opens in a forward direction, a support member disposed within the apparatus casing in the rear of the discharge port and configured to support a recording medium, an ink head disposed within the apparatus casing and configured to eject ink which is curable with irradiation of ultraviolet light to the recording medium, an ultraviolet light irradiation device disposed within the apparatus casing and configured to irradiate ultraviolet light to the recording medium, and a first cover body configured to cover the discharge port in a freely openable and closeable manner, wherein the first cover body is opened upon discharging the recording medium via the discharge port.
    Type: Application
    Filed: July 8, 2010
    Publication date: January 13, 2011
    Inventors: Ryo Baba, Yusuke Takano, Koji Owada
  • Publication number: 20110007633
    Abstract: The present invention can provide a radio communication apparatus comprising an antenna which receives a restriction signal from a radio base station, a reception circuit which decodes the restriction signal received by said antenna, and a control circuit which controls the radio communication apparatus, in which the control circuit can be adapted to select appropriately a speech outgoing/incoming scheme for performing communication with the radio base station on the basis of the restriction signal from the radio base station. As the speech outgoing/incoming scheme, a domain scheme or a speech communication scheme is used. In addition, the present invention further provides a communication network control system using the radio communication apparatus, and a communication network control method.
    Type: Application
    Filed: September 21, 2010
    Publication date: January 13, 2011
    Applicant: NEC Corporation
    Inventors: Yusuke Takano, Toshiyuki Tamura
  • Publication number: 20100324330
    Abstract: The composition for preventing development-defects containing (1) an ammonium salt, a tetraalkylammonium salt or a C1 to C4 alkanolamine salt of C4 to C15 perfluoroalkylcarboxylic acid, C4 to C10 perfluoroalkylsulfonic acid and perfluoroadipic acid, or (2) a fluorinated alkyl quaternary ammonium salt of inorganic acid, wherein said surfactant is formed at the equivalent ratio of acid to base of 1:1-1:3 is applied on a chemically amplified photoresist coating on a substrate having a diameter of 8 inches or more. The chemically amplified photoresist coating is baked before and/or after applying the composition for preventing development-defects described above. Then, the baked coating with the development-defect preventing composition coating is exposed to light, post-exposure-baked, and developed.
    Type: Application
    Filed: August 10, 2010
    Publication date: December 23, 2010
    Inventors: Yasushi Akiyama, Yusuke Takano, Kiyohisa Takahashi, Sung-Eun Hong, Tetsuo Okayasu
  • Publication number: 20100308015
    Abstract: There is provided a method for forming a superfine pattern, which can simply produce a superfine pattern with high mass productivity. The method comprises the steps of forming a first convex pattern, on a film to be treated, forming a spacer formed of a silazane-containing resin composition on the side wall of the convexes constituting the first convex pattern, and forming a superfine pattern using as a mask the spacer or a resin layer disposed around the spacer. The spacer is formed by curing an evenly coated resin composition only in its part around the first convex pattern. According to this method for pattern formation, unlike the conventional method, a superfine pattern can be formed.
    Type: Application
    Filed: January 27, 2009
    Publication date: December 9, 2010
    Inventors: Yusuke Takano, Jin Li, Tomonori Ishikawa, Go Noya