Abstract: A method for designing a protein capable of binding in an RNA base selective manner or RNA base sequence specific manner is provided.

Abstract: A method for designing a protein capable of binding in an RNA base selective manner or RNA base sequence specific manner is provided.

Abstract: Disclosed is a method for forming a multilayer coating film, including applying a first and second aqueous base coat, and a clear coat to an object, and thereafter simultaneously heating and curing the three-layer coating film. The first aqueous base coat includes a water-soluble or water-dispersible polyurethane resin having a glass transition temperature of ?20° C. or below and a weight average molecular weight of 30,000 to 500,000, and a crosslinkable resin having a weight average molecular weight of 600 or more. The first aqueous base coat-coated film has a breaking strength of 2050 N/cm2 or more and a loss tangent (tan ?) at ?20° C. of 0.075 or more. The migration amount of a melamine resin from the second aqueous base coat-coated film layer to the first aqueous base coat-coated film layer is within 3% by mass of a total resin solid content of the first aqueous base coat.

Abstract: A method for designing a protein capable of binding in an RNA base selective manner or RNA base sequence specific manner is provided.

Abstract: [Problem to be Solved] The object of the present invention is to develop a method of regulating a target RNA. [Solution] There is provided a fusion protein comprising a functional domain which improves the protein expression level from mRNA and a PPR protein which can bind to a target mRNA in an RNA base-selective or RNA base sequence-specific manner.

Abstract: A method for designing a protein capable of binding in an RNA base selective manner or RNA base sequence specific manner is provided.

Abstract: The object of the present invention is to generalize and improve DNA-binding proteins using PPR. There is provided a protein that contains one or more PPR motifs having a structure of the following formula 1, wherein one PPR motif (Mn) contained in the protein is a PPR motif having a specific combination of amino acids corresponding to a target DNA base or target DNA base sequence as the three amino acids of No. 1 A.A., No. 4 A.A., and No. “ii” (?2) A.A, and satisfies at least one selected from the group consisting of the following conditions (a) to (h): (a) No. 7 A.A. of the PPR motif (Mn) is isoleucine (I); (b) No. 9 A.A. of the PPR motif (Mn) is alanine (A); (c) No. 10 A.A. of the PPR motif (Mn) is tyrosine (Y); (d) No. 18 A.A. of the PPR motif (Mn) is lysine (K), arginine (R), or histidine (H); (e) No. 20 A.A. of the PPR motif (Mn) is glutamic acid (E), or aspartic acid (D); (f) No. 29 A.A. of the PPR motif (Mn) is glutamic acid (E), or aspartic acid (D); (g) No. 31 A.A.

Abstract: The object of the present invention is to, by analyzing PPR proteins that act to bind to DNA with a prediction that RNA recognition rules of PPR motifs can also be used for recognition of DNA, find a PPR protein showing such a characteristic. According to the present invention, it was revealed that, with a protein that can bind in a DNA base-selective manner or a DNA base sequence-specific manner, which contains one or more, preferably 2 to 30, more preferably 5 to 25, most preferably 9 to 15, of PPR motifs having a structure of the following formula 1 (wherein, in the formula 1, Helix A is a part that can form an ?-helix structure; X does not exist, or is a part consisting of 1 to 9 amino acids; Helix B is a part that can form an ?-helix structure; and L is a part consisting of 2 to 7 amino acids), and having a specific combination of amino acids corresponding to a DNA base or DNA base sequence as amino acids of three positions of No. 1 A.A., No. 4 A.A., in Helix A of the formula 1 and No. “ii” (?2) A.A.

Abstract: The object of the present invention is to, by analyzing PPR proteins that act to bind to DNA with a prediction that RNA recognition rules of PPR motifs can also be used for recognition of DNA, find a PPR protein showing such a characteristic. According to the present invention, it was revealed that, with a protein that can bind in a DNA base-selective manner or a DNA base sequence-specific manner, which contains one or more, preferably 2 to 30, more preferably 5 to 25, most preferably 9 to 15, of PPR motifs having a structure of the following formula 1 (wherein, in the formula 1, Helix A is a part that can form an ?-helix structure; X does not exist, or is a part consisting of 1 to 9 amino acids; Helix B is a part that can form an ?-helix structure; and L is a part consisting of 2 to 7 amino acids), and having a specific combination of amino acids corresponding to a DNA base or DNA base sequence as amino acids of three positions of No. 1 A.A., No. 4 A.A., in Helix A of the formula 1 and No. “ii” (?2) A. A.

Abstract: An object is to provide a metal-resin bonded member that is easy to manufacture and has high bonding strength. The metal-resin bonded member includes a metal body having an iron oxide layer on the surface and a resin body bonded to the metal body via the iron oxide layer. The iron oxide layer has a thickness of 50 nm to 10 ?m. The iron oxide layer comprises 60-40 at % Fe and 40-60 at % O at the outermost surface side. The iron oxide layer contains magnetite (Fe3O4). The iron oxide layer is formed by heating the surface of an iron-based substrate at 200-850° C. in an oxidation atmosphere. The resin body is composed of polyphenylene sulfide (PPS). The bonding of the metal body and the resin body via the iron oxide layer can be carried out by insert molding, thermal adhesion utilizing friction heating, etc.

Abstract: A method for designing a protein capable of binding in an RNA base selective manner or RNA base sequence specific manner is provided.

Abstract: A method for designing a protein capable of binding in an RNA base selective manner or RNA base sequence specific manner is provided.

Abstract: A method for designing a protein capable of binding in an RNA base selective manner or RNA base sequence specific manner is provided.

Abstract: A method for designing a protein capable of binding in an RNA base selective manner or RNA base sequence specific manner is provided.

Abstract: The object of the present invention is to, by analyzing PPR proteins that act to bind to DNA with a prediction that RNA recognition rules of PPR motifs can also be used for recognition of DNA, find a PPR protein showing such a characteristic. According to the present invention, it was revealed that, with a protein that can bind in a DNA base-selective manner or a DNA base sequence-specific manner, which contains one or more, preferably 2 to 30, more preferably 5 to 25, most preferably 9 to 15, of PPR motifs having a structure of the following formula 1 (wherein, in the formula 1, Helix A is a part that can form an ?-helix structure; X does not exist, or is a part consisting of 1 to 9 amino acids; Helix B is a part that can form an ?-helix structure; and L is a part consisting of 2 to 7 amino acids), and having a specific combination of amino acids corresponding to a DNA base or DNA base sequence as amino acids of three positions of No. 1 A.A., No. 4 A.A., in Helix A of the formula 1 and No. “ii” (-2) A.A.

Abstract: A method for designing a protein capable of binding in an RNA base selective manner or RNA base sequence specific manner is provided.

Abstract: In the case of the ordinary Move function, the original content is erased and when normal move cannot be performed, the content is lost. This problem can be solved without departing from the Move concept of copy once. Unique IDs are acquired from at least two recording device and a mutual ID having the unique ID and a mutual encryption key as elements is created. Here, it is assumed that when the mutual ID is copied together with the encrypted content to another recording device, the original mutual ID is deleted. In a recording device where the mutual ID and the encrypted content are both recorded, reproduction and decryption is enabled when one of the unique IDs in the mutual ID is matched with the unique ID of the recording device.

Abstract: A method is used for forming a low relative permittivity dielectric film by a vacuum ultraviolet CVD. The film is a silicon organic film (e.g., SiOCH, SiC, SiCH, and SiOF films) that has a controlled relative permittivity and is formed at temperatures below 350° C. The method can control the content of carbon in the film to achieve a desired relative permittivity. A desired relative permittivity can be achieved by: {circle around (1)} controlling the type and flow rate of added gas (O2, N2O) that contains oxygen atoms; {circle around (2)} controlling the flow rate of TEOS; {circle around (3)} controlling the intensity of light emitted from the excimer lamp; {circle around (4)} elevating the temperatures of the synthetic quartz window and the gas flowing in the vacuum chamber, and controlling the distance between the synthetic quartz window and the wafer; and {circle around (5)} controlling the temperature of the wafer.

Abstract: A method of manufacturing an interlayer dielectric film by vacuum ultraviolet CVD including the steps of placing a wafer in a vacuum chamber having a window; causing a first gas that contains silicon atoms to flow through the vacuum chamber; exposing the wafer to light emitted from a Xe2 excimer lamp through the window; and maintaining an atmosphere in the chamber at a first temperature which is less than 350° C. to form an insulating film on the wafer which substantially fills stepped portions of the wafer to provide step coverage and which has a substantially flat top surface.

Abstract: A method is used for forming an SIOCH film on a wafer by a vacuum ultraviolet CVD. The film has a flat top surface and a good step coverage effect. The wafer is placed in TEOS and is exposed to ultraviolet. The chamber is maintained below 350° C. Oxygen may be added to TEOS. After formation of the film, the temperature of the chamber is elevated, oxygen may be stopped and then the film is further processed in TEOS alone, or the film in the chamber is exposed to vacuum ultraviolet.