Patents by Inventor Yutaka Miyahara

Yutaka Miyahara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5974355
    Abstract: The present invention relates to the creating of an aircrew flight scheduling pattern as a time series pattern, and aims at facilitating the effective crew flight scheduling pattern creation by applying a genetic algorithm. A plurality of flight strings are created based on link relations among flights regarded as elements for one day which is defined as a first time span. A genetic algorithm is executed for each flight string, and daily crew flight scheduling patterns are created based on the most suitable evaluation value flight strings. For one month which is defined as a second time span, a monthly crew flight scheduling pattern is created based on the most suitable evaluation value daily pattern strings in the same way by regarding the daily crew flight patterns for 30 days as elements.
    Type: Grant
    Filed: March 31, 1997
    Date of Patent: October 26, 1999
    Assignee: Fujitsu Limited
    Inventors: Shunji Matsumoto, Yutaka Miyahara
  • Patent number: 4789611
    Abstract: A method for amending a defective mask pattern of a photomask. A pattern component of a normal mask pattern having the same pattern layout as that of the defective mask pattern to be amended is irradiated by a spotlight. The shape of the spotlight is aligned with the shape of the pattern component which is the same pattern as the component of the defective mask pattern to be amended. At least one base mark is aligned with at least another pattern component near the irradiated portion. Then, the position of the base mark relative to the position of the irradiated portion is fixed. After that, the normal mask pattern is replaced by the defective mask pattern. The base mark is aligned with a pattern component near the defective pattern component in the same manner as the alignment of the normal mask pattern. After that, the spotlight irradiates the defective mask pattern, the luminous intensity of said spotlight being intensified so that it can amend the defective pattern component.
    Type: Grant
    Filed: December 11, 1986
    Date of Patent: December 6, 1988
    Assignee: Fujitsu Limited
    Inventor: Yutaka Miyahara