Patents by Inventor Yuusuke ETOU

Yuusuke ETOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240076253
    Abstract: A fluoroalkyne compound can be efficiently synthesized from a fluoroalkane compound by a method for producing a fluoroalkyne compound represented by formula (1): R1C?CR2??(1) wherein R1 and R2 are the same or different and each is a fluorine atom or a fluoroalkyl group, the method comprising subjecting a fluoroalkane compound represented by formula (2): R1CHX1CFX2R2??(2) wherein R1 and R2 are as defined above; and X1 is a fluorine atom and X2 is a hydrogen atom, or X1 is a hydrogen atom and X2 is a fluorine atom, to a dehydrofluorination reaction in the presence of an ether solvent, the method satisfying at least one requirement selected from the group consisting of the following: (I) the fluoroalkyl group is a C1-C4 fluoroalkyl group, and (II) the ether solvent is a chain ether compound, and the dehydrofluorination reaction is performed in the presence of the solvent containing a chain ether and a base comprising a hydroxide and/or alkoxide of an alkali metal and/or alkaline earth metal.
    Type: Application
    Filed: October 27, 2023
    Publication date: March 7, 2024
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Shingo NAKAMURA
  • Publication number: 20240018081
    Abstract: An object of the present disclosure is to provide a method for producing a fluorinated organic compound, the method being capable of removing a sulfur-containing substance to a high degree, or provide a composition containing a fluorinated organic compound with a low content of a sulfur-containing substance. The present disclosure relates to a method for producing a fluorinated organic compound (pf), the method comprising: [A] reaction step A of fluorinating an organic sulfur compound (ss) with a fluorinating agent to obtain a composition (?) containing a fluorinated organic compound (pf); and [B] post-treatment step B of reacting the composition (?) with a nucleophile at a temperature of 40° C. or higher.
    Type: Application
    Filed: September 25, 2023
    Publication date: January 18, 2024
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Atsushi SHIRAI, Yoshichika KUROKI, Yuusuke ETOU, Masayuki KISHIMOTO, Takashi NAMIKAWA, Sumi ISHIHARA, Makoto SUYAMA, Kenji ADACHI, Yosuke KISHIKAWA
  • Publication number: 20230242466
    Abstract: A halogenated alkene compound and a fluorinated alkyne compound are obtained at a high conversion rate and high selectivity by employing any of the following methods (1) to (4): (1) a halogenated butane compound represented by CX1X2X3CHX4CFHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are the same or different and each is a halogen atom, to a dehydrofluorination reaction; (2) a halogenated butene compound represented by CX1X2X3CX4?CHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are as defined above, to a dehydrohalogenation reaction; (3) a halogenated alkane compound represented by CHX8A1CHX9A2, wherein A1 and A2 are each a fluorine atom or a perfluoroalkyl group, and X8 and X9 are the same or different and each is a halogen atom, to a dehydrohalogenation reaction in the presence of a catalyst in a gas phase; and (4) a halogenated alkene compound represented by CX8A1=CHA2, wherein A1, A2, and X8 are as defined above, to a dehydrohalogenation reaction in the presence of a catalyst.
    Type: Application
    Filed: April 13, 2023
    Publication date: August 3, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Shingo NAKAMURA
  • Patent number: 11655199
    Abstract: A halogenated alkene compound and a fluorinated alkyne compound are obtained at a high conversion rate and high selectivity by employing any of the following methods (1) to (4): (1) a halogenated butane compound represented by CX1X2X3CHX4CFHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are the same or different and each is a halogen atom, to a dehydrofluorination reaction; (2) a halogenated butene compound represented by CX1X2X3CX4?CHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are as defined above, to a dehydrohalogenation reaction; (3) a halogenated alkane compound represented by CHX8A1CHX9A2, wherein A1 and A2 are each a fluorine atom or a perfluoroalkyl group, and X8 and X9 are the same or different and each is a halogen atom, to a dehydrohalogenation reaction in the presence of a catalyst in a gas phase; and (4) a halogenated alkene compound represented by CX8A1=CHA2, wherein A1, A2, and X8 are as defined above, to a dehydrohalogenation reaction in the presence of a catalyst.
    Type: Grant
    Filed: August 20, 2021
    Date of Patent: May 23, 2023
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke Etou, Shingo Nakamura
  • Publication number: 20220324883
    Abstract: According to the present invention, a fluorine-containing (cyclo)alkenyl zinc halide compound can be obtained in a high yield by reacting a halogenated olefin compound represented by formula (2): wherein R1, R2, and R3 are as defined above, X2 represents a halogen atom, and a single bond expressed with a wavy line indicates that the steric configuration with respect to a double bond to which the single bond is connected is E configuration, Z configuration, or a mixture of E configuration and Z configuration in any ratio, with a zinc halide compound represented by formula (3): ZnX1 (3), wherein X1 is as defined above, in the presence of a zerovalent alkali metal.
    Type: Application
    Filed: June 23, 2022
    Publication date: October 13, 2022
    Applicants: DAIKIN INDUSTRIES, LTD., OSAKA UNIVERSITY
    Inventors: Yuusuke ETOU, Kenji ADACHI, Sensuke OGOSHI
  • Publication number: 20220289649
    Abstract: In the presence of a catalyst and a cycloalkane compound represented by formula (3): wherein R3, R4, R5, R6, R7, R8, R9, and R10 are the same or different and each is a halogen atom, an alkyl group, or a fluoroalkyl group; an alkene compound represented by formula (2): wherein X, X2, R1, and R2 are as defined above; is reacted with a hydrogen-containing gas to hydrogenate the alkene compound represented by formula (2), whereby an alkane compound represented by R1CHX1CHX2R2, wherein X1 and X2 are the same or different and each is a halogen atom, and R1 and R2 are the same or different and each is an alkyl group or a fluoroalkyl group; can he synthesized in such a manner that (S),(R)-isomer, (R),(R)-isomer, and (S),(S)-isomer are co-produced.
    Type: Application
    Filed: May 26, 2022
    Publication date: September 15, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Shingo NAKAMURA
  • Publication number: 20220281786
    Abstract: An object of the present disclosure is to provide a method for dehydrating a composition containing a fluorine-based hydrocarbon compound, such as HFC-134a. The dehydration method includes the step of bringing a composition containing a fluorine-based hydrocarbon compound into contact with a zeolite.
    Type: Application
    Filed: May 25, 2022
    Publication date: September 8, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Shingo NAKAMURA
  • Publication number: 20220119327
    Abstract: An object of the present disclosure is to provide a chlorinated alkane at a high conversion rate (yield) and with high selectivity. Provided is a method for producing an alkane, the method including the step of subjecting an alkene to a chlorination reaction, the chlorination reaction step being performed by light irradiation using light having a wavelength in the visible light range.
    Type: Application
    Filed: December 28, 2021
    Publication date: April 21, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Shingo NAKAMURA
  • Publication number: 20220119325
    Abstract: An object of the present disclosure is to provide a chlorinated alkane at a high conversion rate (yield) and with high selectivity. Provided is a method for producing an alkane, the method including the step of subjecting an alkene to a chlorination reaction, the chlorination reaction step being performed using zeolite as a catalyst.
    Type: Application
    Filed: December 28, 2021
    Publication date: April 21, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Shingo NAKAMURA
  • Patent number: 11225446
    Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.
    Type: Grant
    Filed: April 8, 2021
    Date of Patent: January 18, 2022
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke Etou, Atsushi Maruo, Katsuya Nakai, Kazuhiro Takahashi
  • Publication number: 20220009858
    Abstract: A halogenated cycloalkane compound is obtained at a high conversion rate by reacting a halogenated cycloalkene compound and a hydrogen-containing gas in the presence of a hydrogenated catalyst or a catalyst having a hydrogen content of 0.1 to 1.5 mass %.
    Type: Application
    Filed: September 23, 2021
    Publication date: January 13, 2022
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Shingo NAKAMURA
  • Publication number: 20210380506
    Abstract: A halogenated alkene compound and a fluorinated alkyne compound are obtained at a high conversion rate and high selectivity by employing any of the following methods (1) to (4): (1) a halogenated butane compound represented by CX1X2X3CHX4CFHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are the same or different and each is a halogen atom, to a dehydrofluorination reaction; (2) a halogenated butene compound represented by CX1X2X3CX4?CHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are as defined above, to a dehydrohalogenation reaction; (3) a halogenated alkane compound represented by CHX8A1CHX9A2, wherein A1 and A2 are each a fluorine atom or a perfluoroalkyl group, and X8 and X9 are the same or different and each is a halogen atom, to a dehydrohalogenation reaction in the presence of a catalyst in a gas phase; and (4) a halogenated alkene compound represented by CX8A1=CHA2, wherein A1, A2, and X8 are as defined above, to a dehydrohalogenation reaction in the presence of a catalyst.
    Type: Application
    Filed: August 20, 2021
    Publication date: December 9, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Shingo NAKAMURA
  • Publication number: 20210221757
    Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.
    Type: Application
    Filed: April 8, 2021
    Publication date: July 22, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Atsushi MARUO, Katsuya NAKAI, Kazuhiro TAKAHASHI
  • Patent number: 11001545
    Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.
    Type: Grant
    Filed: February 2, 2018
    Date of Patent: May 11, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke Etou, Atsushi Maruo, Katsuya Nakai, Kazuhiro Takahashi
  • Publication number: 20200172456
    Abstract: An object of the present invention is to provide a composition containing fluoromethane having high purity. A method for producing fluoromethane, comprising: pyrolyzing in a gas phase a fluorine-containing methyl ether represented by Formula (1): wherein R1 and R2 are the same or different, and each represents an optionally substituted linear or branched monovalent aliphatic hydrocarbon group, an optionally substituted monovalent aromatic hydrocarbon group, an optionally substituted monovalent cyclic aliphatic hydrocarbon group, hydrogen, or halogen, in the presence of an alumina catalyst to thereby obtain a mixed gas containing fluoromethane and acid fluoride, wherein: the alumina catalyst contains chlorine in an amount of 1.0 wt % or less.
    Type: Application
    Filed: February 7, 2020
    Publication date: June 4, 2020
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo NAKAMURA, Yuusuke ETOU, Seiji TAKUBO, Katsuya NAKAI
  • Patent number: 10597343
    Abstract: An object of the present invention is to provide a composition containing fluoromethane having high purity. A method for producing fluoromethane, comprising: pyrolyzing in a gas phase a fluorine-containing methyl ether represented by Formula (1): wherein R1 and R2 are the same or different, and each represents an optionally substituted linear or branched monovalent aliphatic hydrocarbon group, an optionally substituted monovalent aromatic hydrocarbon group, an optionally substituted monovalent cyclic aliphatic hydrocarbon group, hydrogen, or halogen, in the presence of an alumina catalyst to thereby obtain a mixed gas containing fluoromethane and acid fluoride, wherein: the alumina catalyst contains chlorine in an amount of 1.0 wt % or less.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: March 24, 2020
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo Nakamura, Yuusuke Etou, Seiji Takubo, Katsuya Nakai
  • Publication number: 20200010389
    Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.
    Type: Application
    Filed: February 2, 2018
    Publication date: January 9, 2020
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Atsushi MARUO, Katsuya NAKAI, Kazuhiro TAKAHASHI
  • Patent number: 10392327
    Abstract: A method for producing methyl fluoride, comprising the steps of: (1) pyrolyzing a starting compound in a gas phase to thereby obtain a mixed gas containing methyl fluoride and acid fluoride; and (2) rectifying the mixed gas obtained in step (1) to thereby obtain methyl fluoride.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: August 27, 2019
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo Nakamura, Yuusuke Etou, Keisuke Tano, Yoshinori Tanaka
  • Patent number: 10011553
    Abstract: Provided is a method for producing fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride ((CF3)2CHCOF), which are useful as dry etching gases etc., safely and inexpensively with high purity. According to the method in which 1,1,3,3,3-pentafluoro-2-trifluoromethylpropyl methyl ether is pyrolyzed in a gas phase in the presence of a catalyst, the desired fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride can be obtained with high selectivity and high conversion of the starting material by a simple process in which a pyrolysis reaction is performed in a gas phase using the inexpensive starting material.
    Type: Grant
    Filed: November 12, 2013
    Date of Patent: July 3, 2018
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo Nakamura, Yuusuke Etou, Tatsuya Ohtsuka, Kanako Fukumoto, Masato Naitou
  • Patent number: 9988328
    Abstract: An object of the present invention is to extend the catalyst lifetime in a method for producing fluoromethane by pyrolyzing fluorine-containing methyl ether in the presence of a catalyst. The present invention provides a method for producing fluoromethane by pyrolyzing a fluorine-containing methyl ether represented by Formula (1) in a gas phase in the presence of a catalyst, the pyrolysis being conducted at a moisture concentration of 100 ppm or less, wherein R1 and R2 are identical or different, and each represents a substituted or unsubstituted straight or branched monovalent aliphatic hydrocarbon group, substituted or unsubstituted monovalent aromatic hydrocarbon group, substituted or unsubstituted monovalent cyclic aliphatic hydrocarbon group, hydrogen atom, or halogen atom.
    Type: Grant
    Filed: October 22, 2015
    Date of Patent: June 5, 2018
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke Etou, Shingo Nakamura