Patents by Inventor Yuusuke ETOU
Yuusuke ETOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240076253Abstract: A fluoroalkyne compound can be efficiently synthesized from a fluoroalkane compound by a method for producing a fluoroalkyne compound represented by formula (1): R1C?CR2??(1) wherein R1 and R2 are the same or different and each is a fluorine atom or a fluoroalkyl group, the method comprising subjecting a fluoroalkane compound represented by formula (2): R1CHX1CFX2R2??(2) wherein R1 and R2 are as defined above; and X1 is a fluorine atom and X2 is a hydrogen atom, or X1 is a hydrogen atom and X2 is a fluorine atom, to a dehydrofluorination reaction in the presence of an ether solvent, the method satisfying at least one requirement selected from the group consisting of the following: (I) the fluoroalkyl group is a C1-C4 fluoroalkyl group, and (II) the ether solvent is a chain ether compound, and the dehydrofluorination reaction is performed in the presence of the solvent containing a chain ether and a base comprising a hydroxide and/or alkoxide of an alkali metal and/or alkaline earth metal.Type: ApplicationFiled: October 27, 2023Publication date: March 7, 2024Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Shingo NAKAMURA
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Publication number: 20240018081Abstract: An object of the present disclosure is to provide a method for producing a fluorinated organic compound, the method being capable of removing a sulfur-containing substance to a high degree, or provide a composition containing a fluorinated organic compound with a low content of a sulfur-containing substance. The present disclosure relates to a method for producing a fluorinated organic compound (pf), the method comprising: [A] reaction step A of fluorinating an organic sulfur compound (ss) with a fluorinating agent to obtain a composition (?) containing a fluorinated organic compound (pf); and [B] post-treatment step B of reacting the composition (?) with a nucleophile at a temperature of 40° C. or higher.Type: ApplicationFiled: September 25, 2023Publication date: January 18, 2024Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Atsushi SHIRAI, Yoshichika KUROKI, Yuusuke ETOU, Masayuki KISHIMOTO, Takashi NAMIKAWA, Sumi ISHIHARA, Makoto SUYAMA, Kenji ADACHI, Yosuke KISHIKAWA
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Publication number: 20230242466Abstract: A halogenated alkene compound and a fluorinated alkyne compound are obtained at a high conversion rate and high selectivity by employing any of the following methods (1) to (4): (1) a halogenated butane compound represented by CX1X2X3CHX4CFHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are the same or different and each is a halogen atom, to a dehydrofluorination reaction; (2) a halogenated butene compound represented by CX1X2X3CX4?CHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are as defined above, to a dehydrohalogenation reaction; (3) a halogenated alkane compound represented by CHX8A1CHX9A2, wherein A1 and A2 are each a fluorine atom or a perfluoroalkyl group, and X8 and X9 are the same or different and each is a halogen atom, to a dehydrohalogenation reaction in the presence of a catalyst in a gas phase; and (4) a halogenated alkene compound represented by CX8A1=CHA2, wherein A1, A2, and X8 are as defined above, to a dehydrohalogenation reaction in the presence of a catalyst.Type: ApplicationFiled: April 13, 2023Publication date: August 3, 2023Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Shingo NAKAMURA
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Patent number: 11655199Abstract: A halogenated alkene compound and a fluorinated alkyne compound are obtained at a high conversion rate and high selectivity by employing any of the following methods (1) to (4): (1) a halogenated butane compound represented by CX1X2X3CHX4CFHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are the same or different and each is a halogen atom, to a dehydrofluorination reaction; (2) a halogenated butene compound represented by CX1X2X3CX4?CHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are as defined above, to a dehydrohalogenation reaction; (3) a halogenated alkane compound represented by CHX8A1CHX9A2, wherein A1 and A2 are each a fluorine atom or a perfluoroalkyl group, and X8 and X9 are the same or different and each is a halogen atom, to a dehydrohalogenation reaction in the presence of a catalyst in a gas phase; and (4) a halogenated alkene compound represented by CX8A1=CHA2, wherein A1, A2, and X8 are as defined above, to a dehydrohalogenation reaction in the presence of a catalyst.Type: GrantFiled: August 20, 2021Date of Patent: May 23, 2023Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke Etou, Shingo Nakamura
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Publication number: 20220324883Abstract: According to the present invention, a fluorine-containing (cyclo)alkenyl zinc halide compound can be obtained in a high yield by reacting a halogenated olefin compound represented by formula (2): wherein R1, R2, and R3 are as defined above, X2 represents a halogen atom, and a single bond expressed with a wavy line indicates that the steric configuration with respect to a double bond to which the single bond is connected is E configuration, Z configuration, or a mixture of E configuration and Z configuration in any ratio, with a zinc halide compound represented by formula (3): ZnX1 (3), wherein X1 is as defined above, in the presence of a zerovalent alkali metal.Type: ApplicationFiled: June 23, 2022Publication date: October 13, 2022Applicants: DAIKIN INDUSTRIES, LTD., OSAKA UNIVERSITYInventors: Yuusuke ETOU, Kenji ADACHI, Sensuke OGOSHI
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Publication number: 20220289649Abstract: In the presence of a catalyst and a cycloalkane compound represented by formula (3): wherein R3, R4, R5, R6, R7, R8, R9, and R10 are the same or different and each is a halogen atom, an alkyl group, or a fluoroalkyl group; an alkene compound represented by formula (2): wherein X, X2, R1, and R2 are as defined above; is reacted with a hydrogen-containing gas to hydrogenate the alkene compound represented by formula (2), whereby an alkane compound represented by R1CHX1CHX2R2, wherein X1 and X2 are the same or different and each is a halogen atom, and R1 and R2 are the same or different and each is an alkyl group or a fluoroalkyl group; can he synthesized in such a manner that (S),(R)-isomer, (R),(R)-isomer, and (S),(S)-isomer are co-produced.Type: ApplicationFiled: May 26, 2022Publication date: September 15, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Shingo NAKAMURA
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Publication number: 20220281786Abstract: An object of the present disclosure is to provide a method for dehydrating a composition containing a fluorine-based hydrocarbon compound, such as HFC-134a. The dehydration method includes the step of bringing a composition containing a fluorine-based hydrocarbon compound into contact with a zeolite.Type: ApplicationFiled: May 25, 2022Publication date: September 8, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Shingo NAKAMURA
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Publication number: 20220119325Abstract: An object of the present disclosure is to provide a chlorinated alkane at a high conversion rate (yield) and with high selectivity. Provided is a method for producing an alkane, the method including the step of subjecting an alkene to a chlorination reaction, the chlorination reaction step being performed using zeolite as a catalyst.Type: ApplicationFiled: December 28, 2021Publication date: April 21, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Shingo NAKAMURA
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Publication number: 20220119327Abstract: An object of the present disclosure is to provide a chlorinated alkane at a high conversion rate (yield) and with high selectivity. Provided is a method for producing an alkane, the method including the step of subjecting an alkene to a chlorination reaction, the chlorination reaction step being performed by light irradiation using light having a wavelength in the visible light range.Type: ApplicationFiled: December 28, 2021Publication date: April 21, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Shingo NAKAMURA
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Patent number: 11225446Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.Type: GrantFiled: April 8, 2021Date of Patent: January 18, 2022Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke Etou, Atsushi Maruo, Katsuya Nakai, Kazuhiro Takahashi
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Publication number: 20220009858Abstract: A halogenated cycloalkane compound is obtained at a high conversion rate by reacting a halogenated cycloalkene compound and a hydrogen-containing gas in the presence of a hydrogenated catalyst or a catalyst having a hydrogen content of 0.1 to 1.5 mass %.Type: ApplicationFiled: September 23, 2021Publication date: January 13, 2022Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Shingo NAKAMURA
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Publication number: 20210380506Abstract: A halogenated alkene compound and a fluorinated alkyne compound are obtained at a high conversion rate and high selectivity by employing any of the following methods (1) to (4): (1) a halogenated butane compound represented by CX1X2X3CHX4CFHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are the same or different and each is a halogen atom, to a dehydrofluorination reaction; (2) a halogenated butene compound represented by CX1X2X3CX4?CHCX5X6X7, wherein X1, X2, X3, X4, X5, X6, and X7 are as defined above, to a dehydrohalogenation reaction; (3) a halogenated alkane compound represented by CHX8A1CHX9A2, wherein A1 and A2 are each a fluorine atom or a perfluoroalkyl group, and X8 and X9 are the same or different and each is a halogen atom, to a dehydrohalogenation reaction in the presence of a catalyst in a gas phase; and (4) a halogenated alkene compound represented by CX8A1=CHA2, wherein A1, A2, and X8 are as defined above, to a dehydrohalogenation reaction in the presence of a catalyst.Type: ApplicationFiled: August 20, 2021Publication date: December 9, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Shingo NAKAMURA
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Publication number: 20210221757Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.Type: ApplicationFiled: April 8, 2021Publication date: July 22, 2021Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Atsushi MARUO, Katsuya NAKAI, Kazuhiro TAKAHASHI
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Patent number: 11001545Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.Type: GrantFiled: February 2, 2018Date of Patent: May 11, 2021Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke Etou, Atsushi Maruo, Katsuya Nakai, Kazuhiro Takahashi
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Publication number: 20200172456Abstract: An object of the present invention is to provide a composition containing fluoromethane having high purity. A method for producing fluoromethane, comprising: pyrolyzing in a gas phase a fluorine-containing methyl ether represented by Formula (1): wherein R1 and R2 are the same or different, and each represents an optionally substituted linear or branched monovalent aliphatic hydrocarbon group, an optionally substituted monovalent aromatic hydrocarbon group, an optionally substituted monovalent cyclic aliphatic hydrocarbon group, hydrogen, or halogen, in the presence of an alumina catalyst to thereby obtain a mixed gas containing fluoromethane and acid fluoride, wherein: the alumina catalyst contains chlorine in an amount of 1.0 wt % or less.Type: ApplicationFiled: February 7, 2020Publication date: June 4, 2020Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Shingo NAKAMURA, Yuusuke ETOU, Seiji TAKUBO, Katsuya NAKAI
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Patent number: 10597343Abstract: An object of the present invention is to provide a composition containing fluoromethane having high purity. A method for producing fluoromethane, comprising: pyrolyzing in a gas phase a fluorine-containing methyl ether represented by Formula (1): wherein R1 and R2 are the same or different, and each represents an optionally substituted linear or branched monovalent aliphatic hydrocarbon group, an optionally substituted monovalent aromatic hydrocarbon group, an optionally substituted monovalent cyclic aliphatic hydrocarbon group, hydrogen, or halogen, in the presence of an alumina catalyst to thereby obtain a mixed gas containing fluoromethane and acid fluoride, wherein: the alumina catalyst contains chlorine in an amount of 1.0 wt % or less.Type: GrantFiled: June 3, 2016Date of Patent: March 24, 2020Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Shingo Nakamura, Yuusuke Etou, Seiji Takubo, Katsuya Nakai
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Publication number: 20200010389Abstract: According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2?CF—(CF2)n-4—CF?CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.Type: ApplicationFiled: February 2, 2018Publication date: January 9, 2020Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke ETOU, Atsushi MARUO, Katsuya NAKAI, Kazuhiro TAKAHASHI
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Patent number: 10392327Abstract: A method for producing methyl fluoride, comprising the steps of: (1) pyrolyzing a starting compound in a gas phase to thereby obtain a mixed gas containing methyl fluoride and acid fluoride; and (2) rectifying the mixed gas obtained in step (1) to thereby obtain methyl fluoride.Type: GrantFiled: February 5, 2016Date of Patent: August 27, 2019Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Shingo Nakamura, Yuusuke Etou, Keisuke Tano, Yoshinori Tanaka
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Patent number: 10011553Abstract: Provided is a method for producing fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride ((CF3)2CHCOF), which are useful as dry etching gases etc., safely and inexpensively with high purity. According to the method in which 1,1,3,3,3-pentafluoro-2-trifluoromethylpropyl methyl ether is pyrolyzed in a gas phase in the presence of a catalyst, the desired fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride can be obtained with high selectivity and high conversion of the starting material by a simple process in which a pyrolysis reaction is performed in a gas phase using the inexpensive starting material.Type: GrantFiled: November 12, 2013Date of Patent: July 3, 2018Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Shingo Nakamura, Yuusuke Etou, Tatsuya Ohtsuka, Kanako Fukumoto, Masato Naitou
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Patent number: 9988328Abstract: An object of the present invention is to extend the catalyst lifetime in a method for producing fluoromethane by pyrolyzing fluorine-containing methyl ether in the presence of a catalyst. The present invention provides a method for producing fluoromethane by pyrolyzing a fluorine-containing methyl ether represented by Formula (1) in a gas phase in the presence of a catalyst, the pyrolysis being conducted at a moisture concentration of 100 ppm or less, wherein R1 and R2 are identical or different, and each represents a substituted or unsubstituted straight or branched monovalent aliphatic hydrocarbon group, substituted or unsubstituted monovalent aromatic hydrocarbon group, substituted or unsubstituted monovalent cyclic aliphatic hydrocarbon group, hydrogen atom, or halogen atom.Type: GrantFiled: October 22, 2015Date of Patent: June 5, 2018Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Yuusuke Etou, Shingo Nakamura