Patents by Inventor Yuusuke ETOU

Yuusuke ETOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180141886
    Abstract: An object of the present invention is to provide a composition containing fluoromethane having high purity. A method for producing fluoromethane, comprising: pyrolyzing in a gas phase a fluorine-containing methyl ether represented by Formula (1): wherein R1 and R2 are the same or different, and each represents an optionally substituted linear or branched monovalent aliphatic hydrocarbon group, an optionally substituted monovalent aromatic hydrocarbon group, an optionally substituted monovalent cyclic aliphatic hydrocarbon group, hydrogen, or halogen, in the presence of an alumina catalyst to thereby obtain a mixed gas containing fluoromethane and acid fluoride, wherein: the alumina catalyst contains chlorine in an amount of 1.0 wt % or less.
    Type: Application
    Filed: June 3, 2016
    Publication date: May 24, 2018
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo NAKAMURA, Yuusuke ETOU, Seiji TAKUBO, Katsuya NAKAI
  • Patent number: 9919990
    Abstract: An object of the present invention is to provide a method for producing methane fluoride that is useful, for example, as a dry etching gas, the method being more suitable for industrial production. To achieve this object, the present invention provides a method including reacting (A) dimethyl sulfate and (B) at least one fluorocompound in a liquid phase, the fluorocompound (B) being at least one compound selected from the group consisting of hydrogen fluoride and hydrofluoric acid salts, or a metal fluoride, wherein when the fluoride compound (B) includes hydrogen fluoride or a hydrofluoric acid salt, the reaction is carried out without a solvent or using a polar solvent as a solvent, and when the fluoride compound (B) is a metal fluoride, the reaction is carried out using water as a solvent.
    Type: Grant
    Filed: August 7, 2014
    Date of Patent: March 20, 2018
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo Nakamura, Kanako Fukumoto, Yuusuke Etou, Tatsuya Ohtsuka, Masahiro Higashi
  • Publication number: 20180002257
    Abstract: A method for producing methyl fluoride, comprising the steps of: (1) pyrolyzing a starting compound in a gas phase to thereby obtain a mixed gas containing methyl fluoride and acid fluoride; and (2) rectifying the mixed gas obtained in step (1) to thereby obtain methyl fluoride.
    Type: Application
    Filed: February 5, 2016
    Publication date: January 4, 2018
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo NAKAMURA, Yuusuke ETOU, Keisuke TANO, Yoshinori TANAKA
  • Publication number: 20170334814
    Abstract: An object of the present invention is to extend the catalyst lifetime in a method for producing fluoromethane by pyrolyzing fluorine-containing methyl ether in the presence of a catalyst. The present invention provides a method for producing fluoromethane by pyrolyzing a fluorine-containing methyl ether represented by Formula (1) in a gas phase in the presence of a catalyst, the pyrolysis being conducted at a moisture concentration of 100 ppm or less, wherein R1 and R2 are identical or different, and each represents a substituted or unsubstituted straight or branched monovalent aliphatic hydrocarbon group, substituted or unsubstituted monovalent aromatic hydrocarbon group, substituted or unsubstituted monovalent cyclic aliphatic hydrocarbon group, hydrogen atom, or halogen atom.
    Type: Application
    Filed: October 22, 2015
    Publication date: November 23, 2017
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Yuusuke ETOU, Shingo NAKAMURA
  • Publication number: 20160168060
    Abstract: An object of the present invention is to provide a method for producing methane fluoride that is useful, for example, as a dry etching gas, the method being more suitable for industrial production. To achieve this object, the present invention provides a method including reacting (A) dimethyl sulfate and (B) at least one fluorocompound in a liquid phase, the fluorocompound (B) being at least one compound selected from the group consisting of hydrogen fluoride and hydrofluoric acid salts, or a metal fluoride, wherein when the fluoride compound (B) includes hydrogen fluoride or a hydrofluoric acid salt, the reaction is carried out without a solvent or using a polar solvent as a solvent, and when the fluoride compound (B) is a metal fluoride, the reaction is carried out using water as a solvent.
    Type: Application
    Filed: August 7, 2014
    Publication date: June 16, 2016
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shingo NAKAMURA, Kanako FUKUMOTO, Yuusuke ETOU, Tatsuya OHTSUKA, Masahiro HIGASHI
  • Publication number: 20150299088
    Abstract: Provided is a method for producing fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride ((CF3)2CHCOF), which are useful as dry etching gases etc., safely and inexpensively with high purity. According to the method in which 1,1,3,3,3-pentafluoro-2-trifluoromethylpropyl methyl ether is pyrolyzed in a gas phase in the presence of a catalyst, the desired fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride can be obtained with high selectivity and high conversion of the starting material by a simple process in which a pyrolysis reaction is performed in a gas phase using the inexpensive starting material.
    Type: Application
    Filed: November 12, 2013
    Publication date: October 22, 2015
    Inventors: Shingo NAKAMURA, Yuusuke ETOU, Tatsuya OHTSUKA, Kanako FUKUMOTO, Masato NAITOU