Abstract: A scintillated CCD detector system for imaging x rays uses x-rays having a photon energy in the range of 1 to 20 keV. The detector differs from existing systems in that it provides extremely high resolution of better than a micrometer, and high detection quantum efficiency of up to 95%. The design of this detector also allows it to function as an energy filter to remove high-energy x-rays. This detector is useful in a wide range of applications including x-ray imaging, spectroscopy, and diffraction. The scintillator optical system has scintillator material with a lens system for collecting the light that is generated in the scintillator material. A substrate is used for spacing the scintillator material from the lens system.

Abstract: An x-ray imaging system uses a synchrotron radiation beam to acquire x-ray images and at least one integrated x-ray source. The system has an imaging system including sample stage controlled by linear translation stages, objective x-ray lens, and x-ray sensitive detector system, placed on a fixed optical table and a mechanical translation stage system to switch x-ray sources when synchrotron radiation beam is not available.

Abstract: Techniques and corresponding circuitry for deriving a supply a bias voltage for a memory cell array from a received reference voltage is presented. The circuit includes a voltage determination circuit, which is connected to receive the reference voltage and generate from it the bias voltage, a temperature sensing circuit, and a calibration circuit. The calibration circuit is connected to receive the bias voltage and to receive a temperature indication from the temperature sensing circuit and determine from the bias voltage and temperature indication a compensation factor that is supplied to the voltage determination circuit, which adjusts the bias voltage based upon the compensation factor.

Abstract: A circuit and corresponding method for providing a reference voltage are presented. The circuit includes a current source having a magnitude with positive temperature correlation connected to a node, and a diode element connected between the node and ground, where the reference voltage is provided from the node. The circuit also includes a variable resistance connected to receive an input indicative of the circuit temperature and through which the diode element is connected to the node. The value of the variable resistance is adjusted based upon the circuit temperature input. The circuit is useful for application as a peripheral circuitry, such as on a flash or other non-volatile memory and other circuits requiring an on-chip reference voltage source.

Abstract: A projection x-ray imaging system that possibly utilizes a laboratory-based micro-focused x-ray source is disclosed. Techniques for optimizing the system for high quality, three dimensional image formation with tomographic imaging with the potential for high resolution and high throughput are described. It also concerns ways to optimize the system design to obtain improved image quality.

Abstract: An imaging technology for fuel cells is based on x-ray microscopy. A metrology system images the electro-chemical interaction areas of solid-oxide fuel cells (SOFC) in-situ. This system takes advantage of both the penetrating power and elemental absorption contrast of hard x-ray radiation to image the internal interaction areas in a SOFC. The technology can further take advantage of the strong dependence of the x-ray absorption on material type and energy to distinguish the four major material types: cathode, electrolyte, air, and low-Z contaminants such as sulfur.

Abstract: CD-GISAXS achieves reduced measurement times by increasing throughput using longer wavelength radiation (˜12×, for example) such as x-rays in reflective geometry to increase both the collimation acceptance angle of the incident beams and the scattering signal strength, resulting in a substantial combined throughput gain. This wavelength selection and geometry can result in a dramatic reduction in measurement time. Furthermore, the capabilities of the CD-GISAXS can be extended to meet many of the metrology needs of future generations of semiconductor manufacturing and nanostructure characterization, for example.

Abstract: A projection x-ray imaging system that possibly utilizes a laboratory-based micro-focused x-ray source is disclosed. Techniques for optimizing the system for high quality, three dimensional image formation with tomographic imaging with the potential for high resolution and high throughput are described. It also concerns ways to optimize the system design to obtain improved image quality.

Abstract: A phase contrast x-ray microscope has a phase plate that is placed in proximity of and attached rigidly to the objective to form a composite optic. This enables easier initial and long-term maintenance of alignment of the microscope. In one example, they are fabricated on the same high-transmissive substrate. The use of this composite optic allows for lithographic-based alignment that will not change over the lifetime of the instrument. Also, in one configuration, the phase plate is located between the test object and the objective.

Abstract: A digital x-ray phase contrast soft tissue imaging and mammography system offers significant cancer detection sensitivity and a significant improvement in accurate detection and interpretation of mammograms. In addition, the proposed system produces digital mammograms and thus has the advantages of digital mammography. The system overcomes the limitation of the current approaches to mammography using phase contrast effects and offers substantially higher performance than the current mammography used in hospitals and clinics. The proposed system uses the phase contrast imaging, in a breast and other soft tissue structures, instead of absorption contrast employed in the current x-ray mammography, allowing detection of smaller disease structures with substantial reduction in radiation dose.

Abstract: An x-ray microscope uses a microfocus x-ray source with a focus spot of less than 10 micrometers and a Wolter condenser having a magnification of about four or more for concentrating x-rays from the source onto a sample. A detector is provided for detecting the x-rays after interaction with the sample, and an x-ray objective is used to form an image of the sample on the detector. The use of the Wolter optic addresses a problem with microfocus sources that arise when the size of the focal spot that must then be imaged onto the sample with the condenser is smaller than the field of view.

Abstract: A projection-based x-ray imaging system combines projection magnification and optical magnification in order to ease constraints on source spot size, while improving imaging system footprint and efficiency. The system enables tomographic imaging of the sample especially in a proximity mode where the same is held in close proximity to the scintillator. In this case, a sample holder is provided that can rotate the sample. Further, a z-axis motion stage is also provided that is used to control distance between the sample and the scintillator.

Abstract: An imaging technology for fuel cells is based on x-ray microscopy. A metrology system images the electrochemical interaction areas of solid-oxide fuel cells (SOFC) in-situ. This system takes advantage of both the penetrating power and elemental absorption contrast of hard x-ray radiation to image the internal interaction areas in a SOFC. The technology can further take advantage of the strong dependence of the x-ray absorption on material type and energy to distinguish the four major material types: cathode, electrolyte, air, and low-Z contaminants such as sulfur.

Abstract: An x-ray imaging system uses particular emission lines that are optimized for imaging specific metallic structures in a semiconductor integrated circuit structures and optimized for the use with specific optical elements and scintillator materials. Such a system is distinguished from currently-existing x-ray imaging systems that primarily use the integral of all emission lines and the broad Bremstralung radiation. The disclosed system provides favorable imaging characteristics such as ability to enhance the contrast of certain materials in a sample, to use different contrast mechanisms in a single imaging system, and to increase the throughput of the system.

Abstract: A projection x-ray imaging system that possibly utilizes a laboratory-based micro-focused x-ray source is disclosed. Techniques for optimizing the system for high quality, three dimensional image formation with tomographic imaging with the potential for high resolution and high throughput are described. It also concerns ways to optimize the system design to obtain improved image quality.

Abstract: Methods for fabricating refractive element(s) and aligning the elements in a compound optic, typically to a zone plate element. The techniques are used for fabricating micro refractive, such as Fresnel, optics and compound optics including two or more optical elements for short wavelength radiation. One application is the fabrication of the Achromatic Fresnel Optic (AFO). Techniques for fabricating the refractive element generally include: 1) ultra-high precision mechanical machining, e.g,. diamond turning; 2) lithographic techniques including gray-scale lithography and multi-step lithographic processes; 3) high-energy beam machining, such as electron-beam, focused ion beam, laser, and plasma-beam machining; and 4) photo-induced chemical etching techniques. Also addressed are methods of aligning the two optical elements during fabrication and methods of maintaining the alignment during subsequent operation.

Abstract: Methods for fabricating refractive element(s) and aligning the elements in a compound optic, typically to a zone plate element. The techniques are used for fabricating micro refractive, such as Fresnel, optics and compound optics including two or more optical elements for short wavelength radiation. One application is the fabrication of the Achromatic Fresnel Optic (AFO). Techniques for fabricating the refractive element generally include: 1) ultra-high precision mechanical machining, e.g,. diamond turning; 2) lithographic techniques including gray-scale lithography and multi-step lithographic processes; 3) high-energy beam machining, such as electron-beam, focused ion beam, laser, and plasma-beam machining; and 4) photo-induced chemical etching techniques. Also addressed are methods of aligning the two optical elements during fabrication and methods of maintaining the alignment during subsequent operation.

Abstract: A scintillated CCD detector system for imaging x rays uses x-rays having a photon energy in the range of 1 to 20 keV. The detector differs from existing systems in that it provides extremely high resolution of better than a micrometer, and high detection quantum efficiency of up to 95%. The design of this detector also allows it to function as an energy filter to remove high-energy x-rays. This detector is useful in a wide range of applications including x-ray imaging, spectroscopy, and diffraction. The scintillator optical system has scintillator material with a lens system for collecting the light that is generated in the scintillator material. A substrate is used for spacing the scintillator material from the lens system.

Abstract: A digital dual-band detector functions as an imaging platform capable of extracting hard and soft tissue images, for example. The detector has a first detector system comprising a first scintillator for converting x-rays from a sample to an first optical signal, and a first detector for detecting the first optical signal in combination with a second detector system comprising a second scintillator for converting x-rays from the sample and passing through the first scintillator to a second optical signal, and a second detector for detecting the second optical signal. The detector can facilitate the implementation and deployment of recent developments and can permit low cost practical deployment in clinical applications as well as biomedical research applications where significant improvement in spatial resolution and image contrast is required.

Abstract: An extreme ultraviolet (EUV) AIM tool for both the EUV actinic lithography and high-resolution imaging or inspection is described. This tool can be extended to lithography nodes beyond the 32 nanometer (nm) node covering other short wavelength radiation such as soft X-rays. The metrology tool is preferably based on an imaging optic referred to as an Achromatic Fresnel Optic (AFO). The AFO is a transmissive optic that includes a diffractive Fresnel zone plate lens component and a dispersion-correcting refractive lens component. It retains all of the imaging properties of a Fresnel zone plate lens, including a demonstrated resolution capability of better than 25 nanometers and freedom from image distortion. It overcomes the chromatic aberration of the Fresnel zone plate lens and has a larger usable spectral bandwidth.