Patents by Inventor Yuxing Zhang
Yuxing Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250058375Abstract: The present disclosure relates to the technical field of die casting machine devices, in particular to a digital die casting machine with mold temperature control, including: a die casting machine configured to die-cast a casting through a mold, a cooling flow control apparatus configured to control a mold temperature by controlling a cooling medium flow, a temperature collection apparatus configured to collect the mold temperature, a control cabinet configured to acquire and store data collected by the temperature collection apparatus and control operation of the die casting machine, the cooling flow control apparatus and an automatic control apparatus, an edge computer configured to execute a die casting temperature optimization strategy according to the collected data stored in the control cabinet, and the automatic control apparatus. The present disclosure improves the molding quality of castings by adjusting the mold temperature in a casting process.Type: ApplicationFiled: December 4, 2023Publication date: February 20, 2025Inventors: Zuo Xu, Zhihua Zhu, Yiming Li, Hongfeng Cui, Tianxiao Yuan, Shiwei Guo, Ji Wang, Shuangyong Liu, Xia Qiao, Shide Li, Weixin Wang, Donghui Zhang, Zhihua Li, Yuxing Li
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Publication number: 20250042866Abstract: The present disclosure relates to novel crystalline forms of Blarcamesine hydrocholoride (hereinafter referred to as “compound I”), a method for preparing same, a pharmaceutical composition comprising the crystalline forms, and use of the crystalline forms in preparing a Sigma-1 receptor agonist and a medicament for treating Rett syndrome, Alzheimer's disease, and Parkinson's disease dementia.Type: ApplicationFiled: October 23, 2024Publication date: February 6, 2025Applicant: CRYSTAL PHARMACEUTICAL (SUZHOU) CO., LTD.Inventors: Yuxing ZHANG, Hongyan ZHU, Liping MENG
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Publication number: 20240368756Abstract: The present disclosure relates to cleaning assemblies, components thereof, and methods associated therewith for substrate processing chambers. In one example, a method includes positioning a pedestal disposed in a substrate processing chamber in a first vertical position for a first time period, directing cleaning fluid into the internal volume of the substrate processing chamber located above the faceplate, diverting a portion of the cleaning fluid to the distribution ring and into the internal volume located below the faceplate by opening up the isolation valve, and positioning the pedestal in one or more additional vertical positions while the isolation valve is opened, the one or more additional vertical positions being different than the first vertical position.Type: ApplicationFiled: June 14, 2024Publication date: November 7, 2024Inventors: Yuxing ZHANG, Tuan Anh (Mike) NGUYEN, Amit Kumar BANSAL, Nitin PATHAK, Saket RATHI, Thomas RUBIO, Udit Suryakant KOTAGI, Badri N. RAMAMURTHI, Dharma Ratnam SRICHURNAM
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Publication number: 20240247371Abstract: A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner may define an internal volume in fluid communication with the processing volume via a plurality of apertures of the pumping liner circumferentially disposed about the processing volume. The processing chamber may further include a flow control mechanism operable to direct fluid flow from the internal volume of the pumping liner into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.Type: ApplicationFiled: April 3, 2024Publication date: July 25, 2024Applicant: Applied Materials, Inc.Inventors: Nitin Pathak, Yuxing Zhang, Tuan A. Nguyen, Kalyanjit Ghosh, Amit Bansal, Juan Carlos Rocha-Alvarez
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Patent number: 12012653Abstract: The present disclosure relates to a cleaning assemblies, components thereof, and methods associated therewith for substrate processing chambers. In one example, a cleaning assembly for a substrate processing chamber includes a distribution ring. The distribution ring comprises a body with an inlet and an outlet. The outlet is fluidly coupled to an internal volume of the substrate processing chamber via a sidewall of the substrate processing chamber. The cleaning assembly includes a cleaning conduit configured to fluidly couple a gas manifold to the distribution ring for diverting a first portion of cleaning fluid from the gas manifold to the distribution ring.Type: GrantFiled: March 23, 2021Date of Patent: June 18, 2024Assignee: Applied Materials, Inc.Inventors: Yuxing Zhang, Tuan Anh Nguyen, Amit Kumar Bansal, Nitin Pathak, Saket Rathi, Thomas Rubio, Udit S. Kotagi, Badri N. Ramamurthi, Dharma Ratnam Srichurnam
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Patent number: 12006068Abstract: A space launch system and method through electromagnetic pushing. The space launch system comprises an energy storage subsystem, an energy conversion subsystem, a linear motor subsystem, and a control maintenance subsystem. The space launch system converts the electric energy into an electromagnetic force. Through the electromagnetic force, a rocket is pushed to be accelerated to a certain speed along an electromagnetic launching track to realize the launching of the rocket.Type: GrantFiled: January 21, 2022Date of Patent: June 11, 2024Assignee: NAVAL UNIVERSITY OF ENGINEERINGInventors: Weiming Ma, Yuxing Zhang, Mingyuan Zhang, Xiangming Zhang, Weichao Li, Xinlin Long, Chen Deng
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Patent number: 11952660Abstract: A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner may define an internal volume in fluid communication with the processing volume via a plurality of apertures of the pumping liner circumferentially disposed about the processing volume. The processing chamber may further include a flow control mechanism operable to direct fluid flow from the internal volume of the pumping liner into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.Type: GrantFiled: July 22, 2020Date of Patent: April 9, 2024Assignee: Applied Materials, Inc.Inventors: Nitin Pathak, Yuxing Zhang, Tuan A. Nguyen, Kalyanjit Ghosh, Amit Bansal, Juan Carlos Rocha-Alvarez
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Publication number: 20230402261Abstract: Exemplary semiconductor processing systems may include an output manifold that defines at least one plasma outlet. The systems may include a gasbox disposed beneath the output manifold. The gasbox may include an inlet side facing the output manifold and an outlet side opposite the inlet side. The gasbox may include an inner wall that defines a central fluid lumen. The inner wall may taper outward from the inlet side to the outlet side. The systems may include an annular spacer disposed below the gasbox. An inner diameter of the annular spacer may be greater than a largest inner diameter of the central fluid lumen. The systems may include a faceplate disposed beneath the annular spacer. The faceplate may define a plurality of apertures extending through a thickness of the faceplate.Type: ApplicationFiled: August 28, 2023Publication date: December 14, 2023Applicant: Applied Materials, Inc.Inventors: Saket Rathi, Tuan A. Nguyen, Amit Bansal, Yuxing Zhang, Badri N. Ramamurthi, Nitin Pathak, Abdul Aziz Khaja, Sarah Michelle Bobek
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Patent number: 11742185Abstract: Exemplary semiconductor processing systems may include an output manifold that defines at least one plasma outlet. The systems may include a gasbox disposed beneath the output manifold. The gasbox may include an inlet side facing the output manifold and an outlet side opposite the inlet side. The gasbox may include an inner wall that defines a central fluid lumen. The inner wall may taper outward from the inlet side to the outlet side. The systems may include an annular spacer disposed below the gasbox. An inner diameter of the annular spacer may be greater than a largest inner diameter of the central fluid lumen. The systems may include a faceplate disposed beneath the annular spacer. The faceplate may define a plurality of apertures extending through a thickness of the faceplate.Type: GrantFiled: March 26, 2021Date of Patent: August 29, 2023Assignee: Applied Materials, Inc.Inventors: Saket Rathi, Tuan A. Nguyen, Amit Bansal, Yuxing Zhang, Badri N. Ramamurthi, Nitin Pathak, Abdul Aziz Khaja, Sarah Michelle Bobek
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Publication number: 20220307129Abstract: The present disclosure relates to a cleaning assemblies, components thereof, and methods associated therewith for substrate processing chambers. In one example, a cleaning assembly for a substrate processing chamber includes a distribution ring. The distribution ring comprises a body with an inlet and an outlet. The outlet is fluidly coupled to an internal volume of the substrate processing chamber via a sidewall of the substrate processing chamber. The cleaning assembly includes a cleaning conduit configured to fluidly couple a gas manifold to the distribution ring for diverting a first portion of cleaning fluid from the gas manifold to the distribution ring.Type: ApplicationFiled: March 23, 2021Publication date: September 29, 2022Inventors: Yuxing Zhang, Tuan Anh Nguyen, Amit Kumar Bansal, Nitin Pathak, Saket Rathi, Thomas Rubio, Udit S. Kotagi, Badri N. Ramamurthi, Dharma Ratnam Srichurnam
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Publication number: 20220310360Abstract: Exemplary semiconductor processing systems may include an output manifold that defines at least one plasma outlet. The systems may include a gasbox disposed beneath the output manifold. The gasbox may include an inlet side facing the output manifold and an outlet side opposite the inlet side. The gasbox may include an inner wall that defines a central fluid lumen. The inner wall may taper outward from the inlet side to the outlet side. The systems may include an annular spacer disposed below the gasbox. An inner diameter of the annular spacer may be greater than a largest inner diameter of the central fluid lumen. The systems may include a faceplate disposed beneath the annular spacer. The faceplate may define a plurality of apertures extending through a thickness of the faceplate.Type: ApplicationFiled: March 26, 2021Publication date: September 29, 2022Applicant: Applied Materials, Inc.Inventors: Saket Rathi, Tuan A. Nguyen, Amit Bansal, Yuxing Zhang, Badri N. Ramamurthi, Nitin Pathak, Abdul Aziz Khaja, Sarah Michelle Bobek
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Publication number: 20220144456Abstract: A space launch system and method through electromagnetic pushing. The space launch system comprises an energy storage subsystem, an energy conversion subsystem, a linear motor subsystem, and a control maintenance subsystem. The space launch system converts the electric energy into an electromagnetic force. Through the electromagnetic force, a rocket is pushed to be accelerated to a certain speed along an electromagnetic launching track to realize the launching of the rocket.Type: ApplicationFiled: January 21, 2022Publication date: May 12, 2022Inventors: Weiming MA, Yuxing ZHANG, Mingyuan ZHANG, Xiangming ZHANG, Weichao LI, Xinlin LONG, Chen DENG
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Publication number: 20220144827Abstract: A class of five-membered fused with six-membered heterocyclic compounds represented by formula I and a pharmaceutical composition, preparation, and an application thereof are disclosed. These compounds have TRK kinase inhibitory activity and can treat diseases related to TRK dysfunction.Type: ApplicationFiled: November 13, 2019Publication date: May 12, 2022Inventors: Lei JIANG, Zhiyong FENG, Xian JIN, Zhi QIAO, Jianyong SHOU, Ke SHANG, Danyi WU, Lingling XU, Yuan XU, Shuyun ZHANG, Yi ZHANG, Yuxing ZHANG
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Publication number: 20220067605Abstract: A transportation management system determines trip defects associated with trip access points based on historical trip data. The transportation management system aggregates historical trip data in a spatial index. The transportation management system represents the spatial index using a geographic grid including grid cells at various resolutions. The transportation management system determines a defect score for individual grid cells at a given resolution based on the trip data in the spatial index corresponding to the grid cell. The transportation management system uses the defect scores for grid cells to provide a dynamic user experience to users of the transportation management system (e.g., riders or drivers) on their respective client devices.Type: ApplicationFiled: August 20, 2021Publication date: March 3, 2022Inventors: Yuxing Zhang, Adnan Akil, Sina Kashuk, Gabriel Durkin, Shivendra Pratap Singh, Zheng Li
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Publication number: 20220017512Abstract: Provided are a preparation and applications of a six-membered fused with six-membered heterocyclic compound, specifically, provided in the present invention is a compound as represented by formula I as follows, where the definitions of the groups are as described in the description. The compound has TRK kinase inhibiting activity and can serve as a pharmaceutical composition for treating TRK dysfunction-related diseases.Type: ApplicationFiled: November 13, 2019Publication date: January 20, 2022Inventors: Lei JIANG, Zhiyong FENG, Xian JIN, Zhi QIAO, Jianyong SHOU, Ke SHANG, Danyi WU, Lingling XU, Yuan XU, Shuyun ZHANG, Yi ZHANG, Yuxing ZHANG
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Publication number: 20210398041Abstract: A coordination server receives a request from a client device of a rider for transportation from a first location. The coordination server identifies a frequent spot based on the first location. The frequent spot is associated with a particular location and represents a plurality of historic first locations within a threshold distance from the frequent spot. The coordination server identifies a closest road segment with respect to the frequent spot. The closest road segment is a road segment of a plurality of road segments of an electronic map representing a geographic area around the first location. The coordination server determines a pickup side of the closest road segment based on the first location and the closest road segment. The coordination server sends, to a client device of a driver, a route to the first location such that the driver arrives on the pickup side of the closest road segment.Type: ApplicationFiled: June 21, 2021Publication date: December 23, 2021Inventors: Shivendra Pratap Singh, Krishna Aditya Gabbita, Yuxing Zhang, Konstantin Stulov, Pranav Deepak Agrawal, Vivek Sankaravadivel, Saandeep Depatla, Zehao Hu, Wenqi Hu, Andrew Irish, Anand Karthik Tumuluru, Henri Lapierre, Pranit Arora
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Publication number: 20210159094Abstract: A gas distribution apparatus is disclosed. The apparatus includes a faceplate and a blocker plate. An adjustment mechanism is coupled to the blocker plate and is operable to position the blocker plate relative to the faceplate in order to modify a flow profile of a gas flowing therethrough. A method of processing a substrate using the gas distribution is also disclosed.Type: ApplicationFiled: April 3, 2019Publication date: May 27, 2021Inventors: Yuxing ZHANG, Sanjeev BALUJA, Amit Kumar BANSAL, Tuan Anh NGUYEN, Tejas ULAVI, Gopu KRISHNA
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Patent number: 11000889Abstract: A method for preparing an alternating arrangement silver-copper lateral composite ingot, including: using a concave roller set; manufacturing a copper frame having a fixed width according to a negative tolerance of a width of the grooves of the concave roller, and corresponding copper bars and silver bars, and performing a surface treatment on the copper frame, the copper bars, and the silver bars; and then arranging different number of copper bars and silver bars at internals as needed and tightly placing into the copper frame to form a composite blank, i.e., a composite ingot. A method for preparing an alternating arrangement silver-copper lateral composite strip is further provided, and the silver-copper lateral composite ingot prepared by the method for preparing the alternating arrangement silver-copper lateral composite ingot is used to prepare the silver-copper lateral composite strip.Type: GrantFiled: November 14, 2018Date of Patent: May 11, 2021Assignee: WENZHOU HONGFENG ELECTRICAL ALLOY CO., LTDInventors: Xiao Chen, Yuxing Zhang, Zhoulei Zhang, Xinhe Wu, Chuan Qin, Gengxin Qi
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Patent number: D1008887Type: GrantFiled: May 10, 2022Date of Patent: December 26, 2023Inventor: Yuxing Zhang
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Patent number: D1016677Type: GrantFiled: July 18, 2022Date of Patent: March 5, 2024Assignee: Kingsong Intell Co., LTDInventor: Yuxing Zhang