Patents by Inventor Zachary Justin Reitmeier
Zachary Justin Reitmeier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8888251Abstract: A heater stuck includes first strata having a planar configuration supporting and forming a fluid heater element responsive to repetitive electrical activation and deactivation to produce repetitive cycles of fluid ejection from an ejection chamber above the heater element and second strata having a planar configuration coating the heater element of the first strata and being contiguous with the ejection chamber to protect the heater element. The first strata include a substrate and heater strata disposed on it and forming a cavity above the substrate and encompassed on three sides by the heater substrata. The heater substrata includes a pair of conductive layer portions constituting terminal leads disposed on the substrate at opposite sides of the cavity and a resistive layer disposed on the conductive layer portions and defining the fluid heater element that spans the top of the cavity.Type: GrantFiled: March 28, 2012Date of Patent: November 18, 2014Assignee: Funai Electric Co., Ltd.Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier
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Patent number: 8806752Abstract: A micro-fluid ejection device is assembled by wafer-to-wafer bonding at a temperature below about 150° C. a first silicon oxide layer of a first wafer, having flow features patterned in the first silicon oxide layer on an actuator chip in a first silicon substrate of the first wafer, to a second silicon oxide layer of a second wafer, defining a nozzle plate on a second silicon substrate of the second wafer. Nozzle holes are formed in the nozzle plate in alignment with actuator elements of the actuator chip of the first wafer either before or after bonding the first and second wafers together. The second silicon substrate of the second wafer is used as a handle and then removed from the silicon oxide layer of the second wafer after bonding the first and second wafers together.Type: GrantFiled: February 29, 2012Date of Patent: August 19, 2014Assignee: Funai Electric Co., Ltd.Inventor: Zachary Justin Reitmeier
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Patent number: 8414786Abstract: A heater stuck includes first strata having a planar configuration supporting and forming a fluid heater element responsive to repetitive electrical activation and deactivation to produce repetitive cycles of fluid ejection from an ejection chamber above the heater element and second strata having a planar configuration coating the heater element of the first strata and being contiguous with the ejection chamber to protect the heater element. The first strata include a substrate and heater strata disposed on it and forming a cavity above the substrate and encompassed on three sides by the heater substrata. The heater substrata includes a pair of conductive layer portions constituting terminal leads disposed on the substrate at opposite sides of the cavity and a resistive layer disposed on the conductive layer portions and defining the fluid heater element that spans the top of the cavity.Type: GrantFiled: November 5, 2008Date of Patent: April 9, 2013Assignee: Lexmark International, Inc.Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier
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Publication number: 20130076837Abstract: A heater stuck includes first strata having a planar configuration supporting and forming a fluid heater element responsive to repetitive electrical activation and deactivation to produce repetitive cycles of fluid ejection from an ejection chamber above the heater element and second strata having a planar configuration coating the heater element of the first strata and being contiguous with the ejection chamber to protect the heater element. The first strata include a substrate and heater strata disposed on it and forming a cavity above the substrate and encompassed on three sides by the heater substrata. The heater substrata includes a pair of conductive layer portions constituting terminal leads disposed on the substrate at opposite sides of the cavity and a resistive layer disposed on the conductive layer portions and defining the fluid heater element that spans the top of the cavity.Type: ApplicationFiled: March 28, 2012Publication date: March 28, 2013Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier
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Patent number: 8366245Abstract: A fin-shaped heater stack includes first strata configured to support and form fluid heater elements responsive to repetitive electrical activation and deactivation to produce repetitive cycles of ejection of a fluid, and second strata on the first strata to protect the fluid heater elements from adverse effects of the repetitive cycles of fluid ejection and of contact with the fluid. The first strata include a substrate having a front surface, and heater substrata supported on the front surface. The heater substrata have opposite facing side surfaces which extend approximately perpendicular to the front surface and an end surface interconnecting the side surfaces which extends approximately parallel to the front surface such that the heater substrata is provided in either an upright or inverted fin-shaped configuration on the substrate with the fluid heater elements forming the opposite facing side surfaces of the heat substrata.Type: GrantFiled: December 29, 2008Date of Patent: February 5, 2013Assignee: Lexmark International, Inc.Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier, Carl Edmond Sullivan
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Publication number: 20120152894Abstract: A micro-fluid ejection device is assembled by wafer-to-wafer bonding at a temperature below about 150° C. a first silicon oxide layer of a first wafer, having flow features patterned in the first silicon oxide layer on an actuator chip in a first silicon substrate of the first wafer, to a second silicon oxide layer of a second wafer, defining a nozzle plate on a second silicon substrate of the second wafer. Nozzle holes are formed in the nozzle plate in alignment with actuator elements of the actuator chip of the first wafer either before or after bonding the first and second wafers together. The second silicon substrate of the second wafer is used as a handle and then removed from the silicon oxide layer of the second wafer after bonding the first and second wafers together.Type: ApplicationFiled: February 29, 2012Publication date: June 21, 2012Inventor: Zachary Justin Reitmeier
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Patent number: 8172370Abstract: A heater stack includes first strata configured to form a fluid heater element responsive to energy from repetitive electrical activation and deactivation to fire repetitive cycles of heating and ejecting fluid from an ejection chamber above the fluid heater element and second strata overlying the first strata and contiguous with the ejection chamber to provide protection of the fluid heater element. The first strata includes a substrate and a heater substrata overlying the substrate and including a resistive layer having lateral portions spaced apart, a central portion extending between the lateral portions and defining the fluid heater element, and transitional portions interconnecting the central portion and lateral portions and elevating the central portion relative to the lateral portions and above the substrate to form a gap between the lateral portions and between the central portion and substrate insulating the substrate from the fluid heater element and a planar upper surface on the heater substrata.Type: GrantFiled: December 30, 2008Date of Patent: May 8, 2012Assignee: Lexmark International, Inc.Inventor: Zachary Justin Reitmeier
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Publication number: 20120091121Abstract: A heater stack for an inkjet printhead includes a first metallic layer. The heater stack further includes at least one heater carried by the first metallic layer and adapted to receive an electric current for heating ink prior to printing. Furthermore, the heater stack includes a dielectric layer disposed below the first metallic layer. Additionally, the heater stack includes a second metallic layer disposed below the dielectric layer, such that, the second metallic layer extends beneath the at least one heater. Moreover, the heater stack includes a substrate disposed below the second metallic layer and configured to support the first metallic layer, the at least one heater, the dielectric layer and the second metallic layer.Type: ApplicationFiled: October 19, 2010Publication date: April 19, 2012Inventor: ZACHARY JUSTIN REITMEIER
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Patent number: 8070265Abstract: A method for forming a floating heater element includes processing a silicon substrate to form a heater stack having the heater element on the substrate with peripheral edge portions, processing the heater stack by depositing and patterning a layer of photoresist or hard mask thereon to substantially mask the heater stack and form a trench through the photoresist or hard mask exposing a surface area of the substrate extending along the peripheral edge portions of the heater element, and processing the masked heater stack and exposed surface area of the substrate by sequentially removing the photoresist and portions of the substrate at the exposed surface area and that underlie the heater element so as to create a well in the substrate undercutting the heater element and open along the peripheral edge portions thereof, the well being capable of filling with a fluid so as to produce the floating heater element.Type: GrantFiled: December 30, 2008Date of Patent: December 6, 2011Assignee: Lexmark International, Inc.Inventors: Yimin Guan, Zachary Justin Reitmeier, Carl Edmond Sullivan
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Patent number: 8042912Abstract: A heater stack includes first strata configured to support and form a fluid heater element responsive to energy from repetitive electrical activation and deactivation to fire repetitive cycles of heating and ejecting fluid from an ejection chamber above the fluid heater element and second strata overlying the first strata and contiguous with the ejection chamber to provide protection of the fluid heater element. The first strata includes a substrate and a heater substrata overlying the substrate and including a resistive layer having lateral portions spaced apart, a central portion extending between the lateral portions and defining the fluid heater element, and transitional portions interconnecting the central portion and lateral portions and elevating the central portion relative to the lateral portions and above the substrate to form a gap between the lateral portions and between the central portion and substrate insulating the substrate from the fluid heater element.Type: GrantFiled: December 29, 2008Date of Patent: October 25, 2011Assignee: Lexmark International, Inc.Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier
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Publication number: 20110174772Abstract: A micro-fluid ejection device is assembled by wafer-to-wafer bonding at a temperature below about 150° C. a first silicon oxide layer of a first wafer, having flow features patterned in the first silicon oxide layer on an actuator chip in a first silicon substrate of the first wafer, to a second silicon oxide layer of a second wafer, defining a nozzle plate on a second silicon substrate of the second wafer. Nozzle holes are formed in the nozzle plate in alignment with actuator elements of the actuator chip of the first wafer either before or after bonding the first and second wafers together. The second silicon substrate of the second wafer is used as a handle and then removed from the silicon oxide layer of the second wafer after bonding the first and second wafers together.Type: ApplicationFiled: March 28, 2011Publication date: July 21, 2011Inventor: Zachary Justin Reitmeier
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Publication number: 20110123932Abstract: Methods are described for forming a fluid ejection device on a substrate having a first surface and a second surface, the first surface having plurality of electrical heater elements. A sacrificial polymer layer is added over the first surface, a conformal material over the sacrificial polymer layer forms a nozzle layer, the sacrificial polymer is then removed to form ink ejection chambers, the nozzle layer is removed to form nozzle holes, a mask layer is used to form an exposed region and an unexposed region, the exposed region defining a central ink via, which is then etched to form the central ink via.Type: ApplicationFiled: November 20, 2009Publication date: May 26, 2011Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier
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Patent number: 7841702Abstract: A heater stack includes first strata configured to support and form a fluid heater element responsive to repetitive electrical activation and deactivation to produce cycles of fluid ejection and second strata overlying the first strata to protect the heater element. A decomposed sacrificial layer of a preselected polymer between the substrate and a heater substrata containing the heater element provides a decoupled relationship between them which, during a heat-up period of each cycle, results in the heater element buckling out of physical contact with substrate enabling the heater element to transfer heat energy for producing fluid ejection into the fluid without transferring any into the substrate whereas the decoupled relationship, during the next following cool-down period of each cycle, results in the heater element de-buckling back into physical contact with the substrate enabling the heater element transfer residual heat energy to the substrate.Type: GrantFiled: November 5, 2008Date of Patent: November 30, 2010Assignee: Lexmark International, Inc.Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier
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Publication number: 20100165055Abstract: A heater stack includes first strata configured to form a fluid heater element responsive to energy from repetitive electrical activation and deactivation to fire repetitive cycles of heating and ejecting fluid from an ejection chamber above the fluid heater element and second strata overlying the first strata and contiguous with the ejection chamber to provide protection of the fluid heater element. The first strata includes a substrate and a heater substrata overlying the substrate and including a resistive layer having lateral portions spaced apart, a central portion extending between the lateral portions and defining the fluid heater element, and transitional portions interconnecting the central portion and lateral portions and elevating the central portion relative to the lateral portions and above the substrate to form a gap between the lateral portions and between the central portion and substrate insulating the substrate from the fluid heater element and a planar upper surface on the heater substrata.Type: ApplicationFiled: December 30, 2008Publication date: July 1, 2010Inventor: Zachary Justin Reitmeier
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Publication number: 20100165056Abstract: A method for forming a floating heater element includes processing a silicon substrate to form a heater stack having the heater element on the substrate with peripheral edge portions, processing the heater stack by depositing and patterning a layer of photoresist or hard mask thereon to substantially mask the heater stack and form a trench through the photoresist or hard mask exposing a surface area of the substrate extending along the peripheral edge portions of the heater element, and processing the masked heater stack and exposed surface area of the substrate by sequentially removing the photoresist and portions of the substrate at the exposed surface area and that underlie the heater element so as to create a well in the substrate undercutting the heater element and open along the peripheral edge portions thereof, the well being capable of filling with a fluid so as to produce the floating heater element.Type: ApplicationFiled: December 30, 2008Publication date: July 1, 2010Inventors: Yimin Guan, Zachary Justin Reitmeier, Carl Edmond Sullivan
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Publication number: 20100165052Abstract: A heater stack includes first strata configured to support and form a fluid heater element responsive to energy from repetitive electrical activation and deactivation to fire repetitive cycles of heating and ejecting fluid from an ejection chamber above the fluid heater element and second strata overlying the first strata and contiguous with the ejection chamber to provide protection of the fluid heater element. The first strata includes a substrate and a heater substrata overlying the substrate and including a resistive layer having lateral portions spaced apart, a central portion extending between the lateral portions and defining the fluid heater element, and transitional portions interconnecting the central portion and lateral portions and elevating the central portion relative to the lateral portions and above the substrate to form a gap between the lateral portions and between the central portion and substrate insulating the substrate from the fluid heater element.Type: ApplicationFiled: December 29, 2008Publication date: July 1, 2010Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier
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Publication number: 20100165054Abstract: A fin-shaped heater stack includes first strata configured to support and form fluid heater elements responsive to repetitive electrical activation and deactivation to produce repetitive cycles of ejection of a fluid, and second strata on the first strata to protect the fluid heater elements from adverse effects of the repetitive cycles of fluid ejection and of contact with the fluid. The first strata include a substrate having a front surface, and heater substrata supported on the front surface. The heater substrata have opposite facing side surfaces which extend approximately perpendicular to the front surface and an end surface interconnecting the side surfaces which extends approximately parallel to the front surface such that the heater substrata is provided in either an upright or inverted fin-shaped configuration on the substrate with the fluid heater elements forming the opposite facing side surfaces of the heat substrata.Type: ApplicationFiled: December 29, 2008Publication date: July 1, 2010Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier, Carl Edmond Sullivan
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Publication number: 20100116423Abstract: A micro-fluid ejection device is assembled by wafer-to-wafer bonding at a temperature below about 150° C. a first silicon oxide layer of a first wafer, having flow features patterned in the first silicon oxide layer on an actuator chip in a first silicon substrate of the first wafer, to a second silicon oxide layer of a second wafer, defining a nozzle plate on a second silicon substrate of the second wafer. Nozzle holes are formed in the nozzle plate in alignment with actuator elements of the actuator chip of the first wafer either before or after bonding the first and second wafers together. The second silicon substrate of the second wafer is used as a handle and then removed from the silicon oxide layer of the second wafer after bonding the first and second wafers together.Type: ApplicationFiled: November 7, 2008Publication date: May 13, 2010Inventor: Zachary Justin Reitmeier
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Publication number: 20100111509Abstract: A heater stuck includes first strata having a planar configuration supporting and forming a fluid heater element responsive to repetitive electrical activation and deactivation to produce repetitive cycles of fluid ejection from an ejection chamber above the heater element and second strata having a planar configuration coating the heater element of the first strata and being contiguous with the ejection chamber to protect the heater element. The first strata include a substrate and heater strata disposed on it and forming a cavity above the substrate and encompassed on three sides by the heater substrata. The heater substrata includes a pair of conductive layer portions constituting terminal leads disposed on the substrate at opposite sides of the cavity and a resistive layer disposed on the conductive layer portions and defining the fluid heater element that spans the top of the cavity.Type: ApplicationFiled: November 5, 2008Publication date: May 6, 2010Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier
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Publication number: 20100110145Abstract: A heater stack includes first strata configured to support and form a fluid heater element responsive to repetitive electrical activation and deactivation to produce cycles of fluid ejection and second strata overlying the first strata to protect the heater element. A decomposed sacrificial layer of a preselected polymer between the substrate and a heater substrata containing the heater element provides a decoupled relationship between them which, during a heat-up period of each cycle, results in the heater element buckling out of physical contact with substrate enabling the heater element to transfer heat energy for producing fluid ejection into the fluid without transferring any into the substrate whereas the decoupled relationship, during the next following cool-down period of each cycle, results in the heater element de-buckling back into physical contact with the substrate enabling the heater element transfer residual heat energy to the substrate.Type: ApplicationFiled: November 5, 2008Publication date: May 6, 2010Inventors: Yimin Guan, Burton Lee Joyner, II, Zachary Justin Reitmeier