Patents by Inventor Zen Komiya
Zen Komiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10370557Abstract: A radiation curable secondary coating composition for optical fiber is described and claimed. This radiation curable secondary coating composition includes component (A) which is a urethane (meth)acrylate and component (B) which is a (meth)acrylate compound with two or more ethylenically unsaturated groups and one or more bisphenol structures; wherein the content of component (B) in the composition is 60-300 mass parts per 100 mass parts of component (A). The liquid secondary coating has a viscosity at 25° C. of from about 0.1 Pa·s to about 15 Pa·s. Films obtained by curing the liquid radiation curable secondary coating composition of the present invention have a Young's modulus of from about 600 MPa to about 500 MPa and the breaking elongation of the cured film is from about to 5% to about 50%.Type: GrantFiled: November 18, 2015Date of Patent: August 6, 2019Assignee: DSM IP Assets B.V.Inventors: Hirofumi Uchida, Zen Komiya
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Publication number: 20170355874Abstract: A radiation curable secondary coating composition for optical fiber is described and claimed. This radiation curable secondary coating composition includes component (A) which is a urethane (meth)acrylate and component (B) which is a (meth)acrylate compound with two or more ethylenically unsaturated groups and one or more bisphenol structures; wherein the content of component (B) in the composition is 60-300 mass parts per 100 mass parts of component (A). The liquid secondary coating has a viscosity at 25° C. of from about 0.1 Pa·s to about 15 Pa·s. Films obtained by curing the liquid radiation curable secondary coating composition of the present invention have a Young's modulus of from about 600 MPa to about 500 MPa and the breaking elongation of the cured film is from about to 5% to about 50%.Type: ApplicationFiled: November 18, 2015Publication date: December 14, 2017Inventors: Hirofumi UCHIDA, Zen KOMIYA
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Publication number: 20160326410Abstract: A wire sealer having sufficient sealing properties and satisfactory workability of sealing treatment is provided. The wire sealer is radiation-curable, and contains the following components (A) to (C): (A) urethane (meth)acrylate; (B) a compound having one ethylenically unsaturated group and not having an anion dissociative group; and (C) a radiation polymerization initiator, wherein a cured film obtained from the radiation-curable wire sealer shows an oil absorptivity of 7% by mass or more, a water absorptivity of 10% by mass or less, and a Young's modulus of 2 to 500 MPa.Type: ApplicationFiled: December 12, 2014Publication date: November 10, 2016Applicant: JSR CORPORATIONInventors: Hiroshi YAMAGUCHI, Kazuyuki KONDOU, Takahiko KUROSAWA, Hirokazu IMAI, Zen KOMIYA
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Patent number: 8367204Abstract: A curable resin composition comprising an antioxidant, a UV absorber, and a (meth)acrylate oligomer comprising polyether units. Cured products made from the liquid curable resin composition of the present invention have excellent light stability. The resin composition is suitable as a coating material for optical fibers.Type: GrantFiled: October 23, 2001Date of Patent: February 5, 2013Assignees: DSM IP Assets B.V., JSR CorporationInventors: Hirofumi Uchida, Zen Komiya, Takashi Ukachi
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Patent number: 8242202Abstract: The invention relates to a curable liquid resin composition comprising the following components (A), (B), and (C): (A) a urethane (meth)acrylate oligomer, (B) a monomer shown by the following formula (1), CH2?CR1COOR2 (1) wherein R1 represents a hydrogen atom or a methyl group and R2 represents a monovalent organic group, 40 wt % or more of the total amount of the component (B) being a monomer in which the R2 group in the formula (1) is a nonpolar organic group, and the monomer in the component (B) in which the R2 group in the formula (1) is a nonpolar organic group being hereinafter referred to as “nonpolar (meth)acrylate-containing monomer”, and (C) a polymerization initiator.Type: GrantFiled: March 15, 2005Date of Patent: August 14, 2012Assignees: DSM IP Assets B.V., JSR CorporationInventors: Hiroshi Yamaguchi, Satoshi Kamo, Takeo Shigemoto, Zen Komiya
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Patent number: 7906566Abstract: The invention relates to a curable liquid resin composition comprising: (A) a urethane(meth)acrylate having a structure originating from a polyol and a number average molecular weight of 800 g/mol or more, but less than 6,000 g/mol, and (B) a urethane(meth)acrylate having a structure originating from a polyol and a number average molecular weight of 6,000 g/mol or more, but less than 20,000 g/mol, wherein the total amount of the component (A) and component (B) is 20-95 wt % of the curable liquid resin composition and the content of the component (B) is 0.1-30 wt % of the total of the component (A) and component (B).Type: GrantFiled: September 17, 2004Date of Patent: March 15, 2011Assignee: DSM IP Assets B.V.Inventors: Masanobu Sugimoto, Satoshi Kamo, Takeo Shigemoto, Zen Komiya, Paulus Antonius Maria Steeman
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Patent number: 7740944Abstract: The present invention relates to a multilayer coating in which a plurality of photocurable resin cured films are layered on a substrate, wherein at least two adjacent layers comprise the same hindered phenol-type antioxidant. The multilayer coating can be applied onto a substrate, such as glass fibers, vinyl chloride sheets, polycarbonate sheets, glass plates, polyethylene films, wood, acrylic sheets, metal plates, and the like.Type: GrantFiled: March 1, 2002Date of Patent: June 22, 2010Assignee: DSM IP Assets B.V.Inventors: Zen Komiya, Masahito Mase, Junji Yoshizawa, Takashi Ukachi
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Publication number: 20090191404Abstract: The object of the invention is to provide a curate liquid composition excelling in storage stability and curability and capable of forming a coat (film) which excels in antistatic properties, hardness, scratch resistance, and transparency on the surface of various substrates, a cured film of the composition, and an anti static laminate. This object is achieved by providing a curate liquid composition comprising the following components (A), (B), (C), and (D): (A) particles comprising an oxide of at least one element selected from the group consisting of indium, antimony, zinc, and tin as a major component, (B) a compound having two or more polymerizable unsaturated groups in the molecule, (C) a silicon-containing surfactant, and (D) a solvent.Type: ApplicationFiled: March 15, 2005Publication date: July 30, 2009Applicants: DSM IP Assets B.V., JSR CorporationInventors: Shingo Itai, Yoshikazu Yamaguchi, Zen Komiya
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Patent number: 7532795Abstract: The invention relates to a radiation-curable liquid resin composition comprising: (A) 20-90 wt % of a urethane(meth)acrylate oligomer, and (B) 1-35 wt % of a monomer shown by the following formula (1), wherein R1 represents a hydrogen atom or a methyl group, R2 and R3 individually represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, R4 represents a hydrogen atom or a methyl group, and n represents an integer of 1-6, or a monomer including a hydroxyl group.Type: GrantFiled: August 20, 2004Date of Patent: May 12, 2009Assignees: DSM IP Assets B.V., JSR CorporationInventors: Atsuya Takahashi, Takeo Shigemoto, Zen Komiya, Hiroki Ohara
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Publication number: 20080254288Abstract: The invention relates to a curable liquid resin composition comprising the following components (A), (B), and (C): (A) a urethane (meth)acrylate oligomer, (B) a monomer shown by the following formula (1), CH2?CR1COOR2 (1) wherein R1 represents a hydrogen atom or a methyl group and R2 represents a monovalent organic group, 40 wt % or more of the total amount of the component (B) being a monomer in which the R2 group in the formula (1) is a nonpolar organic group, and the monomer in the component (B) in which the R2 group in the formula (1) is a nonpolar organic group being hereinafter referred to as “nonpolar (meth)acrylate-containing monomer”, and (C) a polymerization initiator.Type: ApplicationFiled: March 15, 2005Publication date: October 16, 2008Inventors: Hiroshi Yamaguchi, Satoshi Kamo, Takeo Shigemoto, Zen Komiya
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Publication number: 20080167432Abstract: The invention aims to provide a curable liquid resin composition which produces a cured product having excellent surface slip characteristics and printability and has excellent liquid resin stability. This problem is solved by providing a curable liquid resin composition, comprising a silicone including an alkyl-modified siloxane unit and a polyether-modified siloxane unit.Type: ApplicationFiled: March 15, 2005Publication date: July 10, 2008Applicants: DSMIP ASSETS B.V., JSR CORPORATIONInventors: Hiroki Ohara, Tsuyoshi Furukawa, Takeo Shigemoto, Zen Komiya
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Publication number: 20070258687Abstract: A radiation-curable resin composition comprising (A) 0.1-10 wt % of a compound including a phosphite group and a phenolic hydroxyl group was found to have excellent storage stability, produces a cured product which excels in durability and generates only a small amount of hydrogen gas, and is useful for coating optical fiber.Type: ApplicationFiled: December 12, 2003Publication date: November 8, 2007Applicants: DSM IP ASSETS B.V., JSR CORPORATIONInventors: Keiichi Yamamoto, Zen Komiya
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Publication number: 20070232713Abstract: Provided is a radiation curing liquid resin composition for optical three-dimensional modeling, which has a small step on the side face and excellent surface smoothness, and allows forming a high accuracy optically modeled article, is composed of the components (A) through (F). The content of (A) component in the total quantity of the composition is 0.1 to 10% by mass, and the content of (F) polyether polyol compound is 1 to 35% by mass. (A) A compound having phenolic hydroxyl group and/or phosphite group, (B) A cationic polymerizable compound, (C) A cationic polymerization initiator, (D) A radical polymerizable compound, (E) A radical polymerization initiator, and (F) A polyether polyol compound.Type: ApplicationFiled: May 26, 2005Publication date: October 4, 2007Applicants: JSR Corporation, Japan Fine Coatings Co., Ltd., DSM IP Assets B.V.Inventors: Katsuyuki Takase, Ryouji Tatara, Masanobu Sugimoto, Zen Komiya
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Publication number: 20070203258Abstract: The invention relates to a curable liquid resin composition comprising: (A) a urethane(meth)acrylate having a structure originating from a polyol and a number average molecular weight of 800 g/mol or more, but less than 6,000 g/mol, and (B) a urethane(meth)acrylate having a structure originating from a polyol and a number average molecular weight of 6,000 g/mol or more, but less than 20,000 g/mol, wherein the total amount of the component (A) and component (B) is 20-95 wt % of the curable liquid resin composition and the content of the component (B) is 0.1-30 wt % of the total of the component (A) and component (B).Type: ApplicationFiled: September 17, 2004Publication date: August 30, 2007Inventors: Masanobu Sugimoto, Satoshi Kamo, Takeo Shigemoto, Zen Komiya, Paulus Steeman
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Publication number: 20070191505Abstract: The invention relates to a radiation-curable liquid resin composition comprising: (A) 20-90 wt % of a urethane (meth)acrylate oligomer, and (B) 1-35 wt % of a monomer shown by the following formula (1), wherein R1 represents a hydrogen atom or a methyl group, R2 and R3 individually represent a hydrogen atom or an alkyl group having 1-4 carbon atoms, R4 represents a hydrogen atom or a methyl group, and n represents an integer of 1-6, or a monomer including a hydroxyl group.Type: ApplicationFiled: August 20, 2004Publication date: August 16, 2007Inventors: Atsuya Takahashi, Takeo Shigemoto, Zen Komiya, Hiroki Ohara
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Publication number: 20070178298Abstract: To provide a curable composition having excellent applicability and capable of forming a coat (film) having high hardness and high refractive index and excelling in scratch resistance and adhesion to a substrate and a low-refractive-index layer on the surface of various types of substrates, a cured product of the curable composition, and a laminate having a low reflectance and excelling in antistatic property. A curate e composition comprising particles (A) prepared by bonding oxide particles of at least one element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, and cerium with an organic compound having a polymerizable unsaturated group, a compound (B) having a urethane bond and two or more polymerizable unsaturated groups in the molecule, and a photoinitiator (C).Type: ApplicationFiled: March 25, 2005Publication date: August 2, 2007Applicants: DSM IP ASSETS B.V., JSR CORPORATION, JAPAN FINE COATINGS CO., LTDInventors: Yasunobu Suzuki, Ryousuke Iinuma, Noriyasu Shinohara, Zen Komiya
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Patent number: 7214431Abstract: The invention relates to a liquid curable resin composition capable of forming a ribbon matrix material which can be completely removed from a coloring layer when separating the optical fiber ribbon. A liquid curable resin composition comprising: (1) 30–80 wt. % of a urethane (meth)acrylate produced by reacting (A) a polyol compound, (B) a polyisocyanate compound, and (C) a (meth)acrylate compound containing a hydroxyl group, (2) 0.01–10 wt % of 2-methly-1-[4-(methylthio)phenyl]-2-morpholino-propan-1-one, and (3) 10–70 wt. % of a polymerizable diluent comprising a polymerizable monofunctional vinyl monomer which is copolymerizable with the component (1), wherein a two-layer film, which is obtained by applying the composition to a cured film of a UV-curable resin comprising the compound shown by the above formula (1) and curing the composition, has a T-peel strength of about 1.8 g/cm or less.Type: GrantFiled: April 3, 2001Date of Patent: May 8, 2007Assignee: DSM IP Assets B.V.Inventors: Zen Komiya, Takashi Ukachi
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Publication number: 20060128856Abstract: Provided is a liquid curing resin composition exhibiting excellent adhesion to PET-PET, MS-PET and the like, having excellent processability, heat resistance and water resistance, and having a high-cure rate. A liquid curing resin composition containing the following components (A) and (B): (A) 30 to 70 wt. % of a urethane (meth)acrylate having a number-average molecular weight of from 10000 to 40000, and (B) 30 to 60 wt. % of an ethylenically unsaturated monomer having a glass transition point, in the form of a homopolymer, of 60° C. or greater.Type: ApplicationFiled: September 29, 2003Publication date: June 15, 2006Applicants: JRS Corporation, JAPAN FINE COATINGS CO., LTD., DSM IP ASSETS B.V.Inventors: Atsuya Takahashi, Junji Yoshizawa, Masakatsu Ukon, Zen Komiya
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Publication number: 20050282938Abstract: The invention relates to a curable liquid resin composition which exhibits excellent curability, can be applied at high speed, and produces a cured product having a Young's modulus appropriate for the upjacket layer and excellent coating removal properties of the upjacket layer. The curable liquid resin composition according to the invention comprises: (A) a urethane (meth)acrylate, (B) a reactive diluent, (C) a polymerization initiator, and (D) particles with a number average particle size of 0.1-100 ?m.Type: ApplicationFiled: March 15, 2005Publication date: December 22, 2005Applicants: DSM IP Assets B.V., Japan Synthetic Rubber CorporationInventors: Hiroshi Yamaguchi, Masanobu Sugimoto, Satoshi Kamo, Zen Komiya
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Publication number: 20050272829Abstract: This invention relates to a curable liquid resin composition comprising: (a) 5-94 parts by weight of a urethane (meth)acrylate comprising a polyether backbone, at least one urethane group and at least one (meth)acrylate end group (b) 5-94 parts by weight of a polymerizable monomer, and; (c) 0.01-10 parts by weight of a photoinitiator, in 100 parts by weight of the curable liquid resin composition, wherein the cured product of the composition has a glass transition temperature between 30 and 85° C. or less and a stress relaxation time of 30 minutes or less.Type: ApplicationFiled: March 27, 2003Publication date: December 8, 2005Inventors: Masanobu Sugimoto, Hideki Sugimoto, Takeo Shigemoto, Zen Komiya, Takashi Ukachi