Patents by Inventor Zhang Lin
Zhang Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250083087Abstract: A harmless and resourceful treatment method for antibiotic residue includes steps as follows. The antibiotic residue is dried and crushed to obtain a dry powder of antibiotic residue. The dry powder of antibiotic residue is heated to a temperature of 400-800° C. to perform an isothermal pyrolysis treatment under an inert atmosphere. Condensable gas in the volatile substances released during the pyrolysis treatment is collected using a condensing device to obtain a condensable bio-oil product, non-condensable gas in the volatile substances is collected using a gas bag to obtain pyrolysis gas, and the residual substances obtained after the pyrolysis treatment are as a biochar product. The treatment method addresses the issues of incomplete degradation of the antibiotic residue, complex processes, high difficulty in resource utilization, and resource wastage in traditional treatments of the antibiotic residue, thereby achieving the goals of harmlessness and resource utilization of the antibiotic residue.Type: ApplicationFiled: July 23, 2024Publication date: March 13, 2025Inventors: Weizhen Liu, Shaoyuan Liu, Hongyi Huang, Zhang Lin, Minlin Mao
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Patent number: 12202992Abstract: The present disclosure includes a white ink composition including a liquid vehicle with water and organic co-solvent, from 0.5 wt % to 15 wt % white metal oxide particles dispersed in the liquid vehicle, and from 0.1 wt % to 30 wt % of polyurethane particles dispersed in the liquid vehicle. The polyurethane particles include a polyurethane polymer with polymerized sulfonated-diamines, polymerized nonionic diamines, and isocyanate-generated self-crosslinked amines.Type: GrantFiled: October 3, 2019Date of Patent: January 21, 2025Assignee: Hewlett-Packard Development Company, L.P.Inventors: Zhang-Lin Zhou, Jie Zheng, Dennis Z. Guo
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Patent number: 12159691Abstract: The present invention provides a method for analysis and determination of the heavy metal occurrence key mineral phases in industrial solid waste, by performing N concentration gradients dissociation determination of the heavy metal solid waste to be tested under the same dissociation conditions, to give the dissociation degrees of the heavy metal elements to be tested at N different concentration gradients; the dissociated solid residues after dissociation being quantitatively analyzed for the mineral phase, to give the relative content of each mineral phase in the M mineral phases of the heavy metal solid waste to be tested; then calculating to give the occurrence distribution proportion of the heavy metal elements in the mineral phase, which are accumulated from high to low; the occurrence key mineral phase whose cumulative occurrence proportion exceeds the preset cumulative threshold value is determined to be the key mineral phase of the heavy metal elements.Type: GrantFiled: November 18, 2022Date of Patent: December 3, 2024Assignee: Central South UniversityInventors: Zhang Lin, Le Lin, Yanjie Liang, Xueming Liu, Yong Ke, Xu Yan, Chen Tian, Zhangbin Liu
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Publication number: 20240383144Abstract: An apparatus including computer program code configured to cause the apparatus to: receive a command defining a desired pose of an end effector of a robotic instrument; determine, based on the command, joint parameters for each joint of the robotic instrument using an inverse kinematics algorithm to enable the end effector to mimic the desired pose as closely as possible, wherein the algorithm is configured to reiteratively calculate a pose of the end effector and identify the calculated pose with the smallest tracking error as a global solution if the tracking error is smaller than that associated with a current pose of the end effector, otherwise identify the current pose as the global solution; and wherein the apparatus is configured to generate a motor command to reconfigure the joints according to the global solution if the calculated pose with the smallest tracking error is identified as the global solution.Type: ApplicationFiled: April 12, 2022Publication date: November 21, 2024Inventors: Malgorzata Kamedula, Zhang Lin, Jindong Liu
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Patent number: 12129566Abstract: A method for preparing hydrogen sulfide from sulfur dioxide by electrochemical reduction includes electrochemically reducing sulfur dioxide absorbed in an aqueous solution into gaseous hydrogen sulfide with a membrane electrode, resulting in efficient and selective conversion of the sulfur dioxide absorbed in the aqueous solution into the hydrogen sulfide to avoid a deactivation of a cathode due to colloidal sulfur produced on the cathode and adhesion onto a surface of the cathode, wherein the method is carried out at ambient temperature and normal pressure without addition of a reducing agent, having no waste salts produced, and is simple in operation, and is convenient for large-scale application.Type: GrantFiled: March 29, 2022Date of Patent: October 29, 2024Assignee: CENTRAL SOUTH UNIVERSITYInventors: Hui Liu, Kaisong Xiang, Liyuan Chai, Fenghua Shen, Xudong Liu, Fangfang Zhu, Lin Wu, Huimin Yi, Xiaobo Min, Zhang Lin, Qingzhu Li, Qingwei Wang, Haiying Wang, Weichun Yang
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Publication number: 20240355388Abstract: Disclosed herein are related to a memory cell including one or more programmable resistors and a control transistor. In one aspect, a programmable resistor includes a gate structure and one or more source/drain structures for forming a transistor. A resistance of the programmable resistor may be set by applying a voltage to the gate structure, while the control transistor is enabled. Data stored by the programmable resistor can be read by sensing current through the programmable resistor, while the control transistor is disabled. In one aspect, the one or more programmable resistors and the control transistor are implemented by same type of components, allowing the memory cell to be formed in a compact manner through a simplified the fabrication process.Type: ApplicationFiled: June 28, 2024Publication date: October 24, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yu-Der Chih, Jonathan Tsung-Yung Chang, Yun-Sheng Chen, Maybe Chen, Ya-Chin King, Wen Zhang Lin, Chrong Jung Lin, Hsin-Yuan Yu
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Publication number: 20240324474Abstract: A resistive memory device includes a bottom electrode, a top electrode and a resistance changing element. The top electrode is disposed above and spaced apart from the bottom electrode, and has a downward protrusion aligned with the bottom electrode. The resistance changing element covers side and bottom surfaces of the downward protrusion.Type: ApplicationFiled: June 6, 2024Publication date: September 26, 2024Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yu-Der CHIH, Wen-Zhang LIN, Yun-Sheng CHEN, Jonathan Tsung-Yung CHANG, Chrong-Jung LIN, Ya-Chin KING, Cheng-Jun LIN, Wang-Yi LEE
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Publication number: 20240287348Abstract: The present disclosure describes coating compositions containing halogenated polyurethanes, coated fabric media, and methods of making coated fabric media. In one example, a coating composition incudes an aqueous liquid vehicle, a cross-linkable polymeric binder, and a halogenated polyurethane dispersion. The halogenated polyurethane dispersion includes a polyurethane polymer strand having a halogen atom covalently bonded to the polyurethane polymer strand.Type: ApplicationFiled: June 25, 2021Publication date: August 29, 2024Inventors: Xiaoqi Zhou, Xulong Fu, Zhang-Lin Zhou
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Patent number: 12051466Abstract: Disclosed herein are related to a memory cell including one or more programmable resistors and a control transistor. In one aspect, a programmable resistor includes a gate structure and one or more source/drain structures for forming a transistor. A resistance of the programmable resistor may be set by applying a voltage to the gate structure, while the control transistor is enabled. Data stored by the programmable resistor can be read by sensing current through the programmable resistor, while the control transistor is disabled. In one aspect, the one or more programmable resistors and the control transistor are implemented by same type of components, allowing the memory cell to be formed in a compact manner through a simplified the fabrication process.Type: GrantFiled: April 17, 2023Date of Patent: July 30, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yu-Der Chih, Jonathan Tsung-Yung Chang, Yun-Sheng Chen, Maybe Chen, Ya-chin King, Wen Zhang Lin, Chrong Jung Lin, Hsin-Yuan Yu
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Patent number: 12041860Abstract: A resistive memory device includes a bottom electrode, a top electrode and a resistance changing element. The top electrode is disposed above and spaced apart from the bottom electrode, and has a downward protrusion aligned with the bottom electrode. The resistance changing element covers side and bottom surfaces of the downward protrusion.Type: GrantFiled: January 21, 2022Date of Patent: July 16, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yu-Der Chih, Wen-Zhang Lin, Yun-Sheng Chen, Jonathan Tsung-Yung Chang, Chrong-Jung Lin, Ya-Chin King, Cheng-Jun Lin, Wang-Yi Lee
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Publication number: 20240189052Abstract: An apparatus including: at least one processor; and at least one memory including computer program code, the at least one memory and computer program code configured to, with the at least one processor, cause the apparatus to: receive a recalibration command from a passive controller configured to remotely control a robotic instrument, wherein the passive controller and robotic instrument have freedom of movement within respective control and instrument workspaces, and wherein the control workspace is mapped to the instrument workspace to allow the position of the robotic instrument to track the position of the passive controller as the passive controller moves within the control workspace; and recalibrate the mapping of the control workspace to the instrument workspace in response to the recalibration command such that the current position of the passive controller corresponds to the current position of the robotic instrument.Type: ApplicationFiled: April 12, 2022Publication date: June 13, 2024Inventors: Malgorzata Kamedula, Zhang Lin, Jindong Liu
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Patent number: 11987928Abstract: A fabric coating composition can include water, from 3 wt % to 95 wt % oxazoline reactive compound by dry weight including an oxazoline group, and from 3 wt % to 70 wt % cationic charging agent by dry weight. The fabric coating composition can have a pH from pH 2 to pH 6.Type: GrantFiled: July 22, 2019Date of Patent: May 21, 2024Assignee: Hewlett-Packard Development Company, L.P.Inventors: Xiaoqi Zhou, Zhang-Lin Zhou
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Publication number: 20240157078Abstract: The present invention discloses a functional powder delivery device for precise locating and quantifying when delivering the functional powder to a site in need in a patient. Meanwhile, the device avoids negative pressure effect in the output catheter when airflow is switched, and thus prevents pollution or jam in the output catheter due to splash or back flow of body fluid. The device ensures tube clearance of the output catheter by maintaining continuous airflow, and a special design of airflow switch allows switching to airflow of large volume to carry the powder when required. Through continuous positive airflow in the tube system, the functional powder can be delivered to the site in need by a continuous powder flow, which overcomes drawbacks of the delivery devices in prior arts. In addition, the design of foot pedal can help endoscopist for a solo operation. The serial connecting parts can adapt for various size of bottles of various types of functional powder.Type: ApplicationFiled: November 16, 2022Publication date: May 16, 2024Inventors: Xi-Zhang LIN, Ya-Wen SHIH, Sheng-Jye HWANG
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Publication number: 20240124740Abstract: A printable medium that comprises a base substrate with an image-side and a back-side. An ink-receiving layer comprising water and, at least, two polymeric networks with the first polymeric network being a polyurethane-based polymer and the second polymeric network being a reactive polyaziridine polymer is applied to the image-side of the fabric base substrate. Also described herein are a method for forming the printable medium and a printing method that includes ejecting an ink composition onto the print medium described herein.Type: ApplicationFiled: January 22, 2021Publication date: April 18, 2024Applicant: Hewlett-Packard Development Company, L.P.Inventors: Xiaoqi ZHOU, Zhang-Lin ZHOU
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Patent number: 11939229Abstract: The present invention provides a method for treating a copper-containing waste etching solution, which includes: preparing basic copper chloride nanometer seed crystals and synthesizing basic copper chloride mono-crystals; making an acidic waste etching solution subjected to agglomeration reaction with an ammonium-containing solution and slurry containing the basic copper chloride mono-crystals to obtain basic copper chloride crystal particles and copper-removed waste solution; making an alkaline waste etching solution react with sulfuric acid to obtain a copper sulfate mixed solution; and then evaporating, concentrating, cooling and crystallizing the copper sulfate mixed solution obtained by the reaction of the alkaline waste etching solution and the sulfuric acid in sequence to obtain copper sulfate pentahydrate solids.Type: GrantFiled: November 18, 2022Date of Patent: March 26, 2024Assignee: Central South UniversityInventors: Zhang Lin, Xu Yan, Xueming Liu, Fandongkun Meng, Yanjie Liang
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Patent number: 11943936Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a first transistor, a first resistive random access memory (RRAM) resistor, and a second RRAM resistor. The first resistor includes a first resistive material layer, a first electrode shared by the second resistor, and a second electrode. The second resistor includes the first electrode, a second resistive material layer, and a third electrode. The first electrode is electrically coupled to the first transistor.Type: GrantFiled: August 12, 2021Date of Patent: March 26, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Yu-Der Chih, May-Be Chen, Yun-Sheng Chen, Jonathan Tsung-Yung Chang, Wen Zhang Lin, Chrong Jung Lin, Ya-Chin King, Chieh Lee, Wang-Yi Lee
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Patent number: 11794506Abstract: A coating composition comprising water and polyurethane particles including cationic triphenyl-phosphonium salt functional groups. Also disclosed is a coated printable medium, with an image-side and a back-side, comprising a base substrate and the coating composition, such as described herein, that is applied over, at least, one side of the base substrate, forming an image-receiving layer. Also disclosed is the method for making such printable medium.Type: GrantFiled: August 27, 2019Date of Patent: October 24, 2023Assignee: Hewlett-Packard Development Company, L.P.Inventors: Xiaoqi Zhou, Zhang-Lin Zhou
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Publication number: 20230272241Abstract: The present disclosure describes phosphonium-containing polyurethane compositions, coating compositions, and coated fabric media. In one example, a phosphonium-containing polyurethane composition can include an aqueous liquid vehicle and polyurethane particles. The polyurethane particles can include a polyurethane polymer devoid of end cap groups, the polyurethane polymer also including a polyurethane backbone having side chain groups along the polyurethane backbone. The side chain groups can collectively include aliphatic phosphonium salts and polyalkylene oxide groups.Type: ApplicationFiled: August 28, 2020Publication date: August 31, 2023Applicant: Hewlett-Packard Development Company, L.P.Inventors: Zhang-Lin Zhou, Xiaoqi Zhou
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Publication number: 20230253040Abstract: Disclosed herein are related to a memory cell including one or more programmable resistors and a control transistor. In one aspect, a programmable resistor includes a gate structure and one or more source/drain structures for forming a transistor. A resistance of the programmable resistor may be set by applying a voltage to the gate structure, while the control transistor is enabled. Data stored by the programmable resistor can be read by sensing current through the programmable resistor, while the control transistor is disabled. In one aspect, the one or more programmable resistors and the control transistor are implemented by same type of components, allowing the memory cell to be formed in a compact manner through a simplified the fabrication process.Type: ApplicationFiled: April 17, 2023Publication date: August 10, 2023Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yu-Der Chih, Jonathan Tsung-Yung Chang, Yun-Sheng Chen, May-Be Chen, Ya-Chin King, Wen Zhang Lin, Chrong Lin, Hsin-Yuan Yu
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Publication number: 20230240156Abstract: A resistive memory device includes a bottom electrode, a top electrode and a resistance changing element. The top electrode is disposed above and spaced apart from the bottom electrode, and has a downward protrusion aligned with the bottom electrode. The resistance changing element covers side and bottom surfaces of the downward protrusion.Type: ApplicationFiled: January 21, 2022Publication date: July 27, 2023Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Yu-Der CHIH, Wen-Zhang LIN, Yun-Sheng CHEN, Jonathan Tsung-Yung CHANG, Chrong-Jung LIN, Ya-Chin KING, Cheng-Jun LIN, Wang-Yi LEE