Abstract: A photovoltaic module and a method for manufacturing the same are provided. The photovoltaic module includes a plurality of cell strings; a first encapsulating adhesive film and a second encapsulating adhesive film, where the photovoltaic module has a central region and a peripheral region, where the first encapsulating adhesive film defines at least one first hole and the second encapsulating adhesive film defines at least one second hole, and each first hole directly faces a corresponding second hole; and at least one filling structure, where the at least one filling structure includes a material having a crosslinking curing speed that is faster than a crosslinking curing speed of a material in the first encapsulating adhesive film and is faster than a crosslinking curing speed of a material in the second encapsulating adhesive film.

Abstract: The present disclosure provides a blending method of high-quality and dual-purpose flour for bread and noodles, belonging to the technical field of flour processing. The method includes: selecting flour of a high-quality and dual-purpose wheat variety for bread and noodles as a high-quality basic flour for blending; according to a large gradient experimental design, selecting a gradient range ratio with a sedimentation value ?46.0 mL and a dough development time ?9.6 min, followed by subdividing for small gradient experiments; selecting a ratio with flour sedimentation value and dough development time that reach an ideal value to blend a large amount of flour; and making bread and noodles for scoring, followed by determining a blending ratio if a scoring result reaches an ideal value.

Abstract: The present discloses a predicting method of transcription factor binding sites based on weighted multi-granularity scanning, which belongs to the field of site prediction. The method comprises: using an inverse sequence, a complementary sequence and a complementary inverse sequence to augment an initial data set; carrying out feature representation on the DNA sequence by combining one-hot coding and multi-base feature coding; dividing a training set and a test set; calculating weight vectors of the features; carrying out weighted multi-granularity scanning; performing model training through a cascade forest to obtain a classification prediction model of transcription factor binding sites; inputting the test set into the classification prediction model to obtain a classification prediction result; and constructing an evaluation index to evaluate the performance of the method.

Abstract: The present invention provides a method for preparing a transparent free-standing titanium dioxide nanotube array film. In the method, with the titanium foil as a substrate, the titanium dioxide nanotube array film is obtained by anode oxidation on the surface of the titanium foil. Upon high temperature annealing, the titanium dioxide nanotube array film naturally falls off to obtain the transparent free-standing titanium dioxide nanotube array film. The method according to the present invention features simple operations, saves time and cost. With the method, a completely strippable titanium dioxide nanotube array film may be prepared, and in addition, morphology of the titanium dioxide nanotube is not damaged. The free-standing and complete titanium dioxide nanotube array film facilitates transfer and post-treatment, has the feature of transparency and may be in favor of the applications to the studies such as photocatalysis and the like.

Abstract: Disclosed is a coated rubber particle, preparation thereof and its application as a plugging material in drilling fluids. The coated rubber particle comprises a rubber core and a coating layer, wherein the core has a fluorine content (at %) of 0-15%, the coating layer has a fluorine content (at %) of 30-80%, and the coated rubber particle has a 24-hour oil absorption rate of 4% or less. The coated rubber particle has good oil resistance, and is particularly suitable for use as a plugging material in drilling fluids, particularly oil-based drilling fluids.

Abstract: A predicting method of cell deconvolution based on a convolutional neural network is provided. The convolutional neural network technology is used to speculate the cell type composition proportion of a tissue from single-cell RNA sequencing data. Compared with a traditional cell deconvolution algorithm, the predicting method of cell deconvolution based on a convolutional neural network overcomes the defects that the traditional cell deconvolution algorithm needs to carry out complex data preprocessing and needs to design a mathematical algorithm to standardize the single-cell sequencing data. According to the convolutional neural network designed by the present disclosure, hidden features can be extracted from the single-cell RNA sequencing data, network nodes have very high robustness to noise and errors of the data, and internal relations among various genes are fully mined, so that the cell deconvolution performance is improved.

Abstract: Embodiments of this application provide an information processing method, a device, a system, a storage medium, and a computer program product, and relate to a web conferencing technology. In the method, when a plurality of users join a web conference by using a plurality of participating terminal devices, at least two users may use their own participating terminal devices. In addition, screen sharing is performed by using a web conferencing system. Therefore, the plurality of participating terminal devices in the conference may display, on screens of the plurality of participating terminal devices, information shared by the at least two sharing terminal devices. In this manner, the web conferencing system supports screen sharing performed by a plurality of sharing terminal devices at a same moment, and each sharing terminal device can control the screen sharing. This facilitates information sharing between the pluralities of users, and improves communication efficiency between the users.

Abstract: The present disclosure relates generally to a support material for three-dimensional printing comprising a blend of at least two cellulose ethers or a blend of at least one cellulose ether and at least one vinyl pyrrolidone polymer. Additionally, the present disclosure relates to a shaped material and a three-dimensionally printed object comprising the support material. Furthermore, a process for producing a three-dimensional object using the support material is also disclosed.

Abstract: Embodiments of the invention generally provide a processing chamber used to perform a physical vapor deposition (PVD) process and methods of depositing multi-compositional films. The processing chamber may include: an improved RF feed configuration to reduce any standing wave effects; an improved magnetron design to enhance RF plasma uniformity, deposited film composition and thickness uniformity; an improved substrate biasing configuration to improve process control; and an improved process kit design to improve RF field uniformity near the critical surfaces of the substrate. The method includes forming a plasma in a processing region of a chamber using an RF supply coupled to a multi-compositional target, translating a magnetron relative to the multi-compositional target, wherein the magnetron is positioned in a first position relative to a center point of the multi-compositional target while the magnetron is translating and the plasma is formed, and depositing a multi-compositional film on a substrate.

Abstract: Embodiments of the invention generally provide a processing chamber used to perform a physical vapor deposition (PVD) process and methods of depositing multi-compositional films. The processing chamber may include: an improved RF feed configuration to reduce any standing wave effects; an improved magnetron design to enhance RF plasma uniformity, deposited film composition and thickness uniformity; an improved substrate biasing configuration to improve process control; and an improved process kit design to improve RF field uniformity near the critical surfaces of the substrate.

Abstract: Apparatus for improved particle reduction are provided herein. In some embodiments, an apparatus may include a process kit shield comprising a one-piece metal body having an upper portion and a lower portion and having an opening disposed through the one-piece metal body, wherein the upper portion includes an opening-facing surface configured to be disposed about and spaced apart from a target of a physical vapor deposition chamber and wherein the opening-facing surface is configured to limit particle deposition on an upper surface of the upper portion of the one-piece metal body during sputtering of a target material from the target of the physical vapor deposition chamber.

Abstract: Provided is a method for continuous production of zeolite in which a starting material is continuously supplied to a tubular reactor to produce an aluminophosphate zeolite that contains, in the framework structure, at least aluminum atoms and phosphorus atoms or an aluminosilicate zeolite having 5?SiO2/Al2O3?2000. The tubular reactor is heated using a heat medium; a ratio (volume)/(lateral surface area) of the volume (inner capacity) to the lateral surface area of the tubular reactor is 0.75 cm or smaller; and seed crystals are added to the starting material. Through using a small-diameter tubular reactor and heating with a heat medium, it becomes possible to heat sufficiently the entirety of a starting material (zeolite precursor gel) in a short time, and to allow reaction to proceed at a high rate. The occurrence of irregular pressure fluctuations during continuous production of the zeolite can be prevented by adding seed crystals.

Abstract: Target assemblies and PVD chambers including target assemblies are disclosed. The target assembly includes a target that has a concave shaped target. When used in a PVD chamber, the concave target provides more radially uniform deposition on a substrate disposed in the sputtering chamber.

Abstract: Apparatus for improved particle reduction are provided herein. In some embodiments, an apparatus may include a process kit shield comprising a one-piece metal body having an upper portion and a lower portion and having an opening disposed through the one-piece metal body, wherein the upper portion includes an opening-facing surface configured to be disposed about and spaced apart from a target of a physical vapor deposition chamber and wherein the opening-facing surface is configured to limit particle deposition on an upper surface of the upper portion of the one-piece metal body during sputtering of a target material from the target of the physical vapor deposition chamber.

Abstract: The present invention concerns a composition and method of using non-molybdate corrosion inhibitors in sterilizing and pasteurizing applications. The composition is a blend of one or more components including corrosion inhibitors, surfactants, hydrotropes, polymer dispersants, pH adjusting agents and water. The composition may include two or more of a) alkyl-dicarboxylic acid; b) phosphono-carboxylic acid; c) tri(amino-carboxylic acid); d) anionic polymer dispersant; e) non-ionic surfactant; f) inorganic phosphate; g) phosphonotricarboxylic acid; and h) hydrotrope. Specifically, the composition may comprise sebacic acid, hydroxyphosphonoacetic acid, and 6,6?,6?-(1,3,5-triazine-2,4,6-triyltriimino)tris-hexanoic acid. Optionally, the composition can further comprise a co-polymer of acrylic acid and allyl-2-hydroxy-propyl-sulfonate ether (AA/AHPSE), 2-phosphono-1,2,4-butane-tricarboxylic acid, sodium phosphate monobasic or phosphoric acid, ?-decyl-?-hydroxy-poly(oxy-1,2ethanediyl), and sodium cumenesulfonate.

Abstract: Target assemblies and PVD chambers including target assemblies are disclosed. The target assembly includes a target that has a concave shaped target. When used in a PVD chamber, the concave target provides more radially uniform deposition on a substrate disposed in the sputtering chamber.

Abstract: Apparatus for improved particle reduction are provided herein. In some embodiments, an apparatus may include a process kit shield comprising a one-piece metal body having an upper portion and a lower portion and having an opening disposed through the one-piece metal body, wherein the upper portion includes an opening-facing surface configured to be disposed about and spaced apart from a target of a physical vapor deposition chamber and wherein the opening-facing surface is configured to limit particle deposition on an upper surface of the upper portion of the one-piece metal body during sputtering of a target material from the target of the physical vapor deposition chamber.

Abstract: Target assemblies and PVD chambers including target assemblies are disclosed. The target assembly includes a target that has a concave shaped target. When used in a PVD chamber, the concave target provides more radially uniform deposition on a substrate disposed in the sputtering chamber.

Abstract: Implementations of the present disclosure relate to an improved shield for use in a processing chamber. In one implementation, the shield includes a hollow body having a cylindrical shape that is substantially symmetric about a central axis of the body, and a coating layer formed on an inner surface of the body. The coating layer is formed the same material as a sputtering target used in the processing chamber. The shield advantageously reduces particle contamination in films deposited using RF-PVD by reducing arcing between the shield and the sputtering target. Arcing is reduced by the presence of a coating layer on the interior surfaces of the shield.

Abstract: Semiconductor devices, methods and apparatus for forming the same are provided. The semiconductor device includes a substrate having a source and drain region and a gate electrode stack on the substrate between the source and drain regions. The gate electrode stack includes a conductive film layer on a gate dielectric layer, a refractory metal silicon nitride film layer on the conductive film layer, and a tungsten film layer on the refractory metal silicon nitride film layer. In one embodiment, the method includes positioning a substrate within a processing chamber, wherein the substrate includes a source and drain region, a gate dielectric layer between the source and drain regions, and a conductive film layer on the gate dielectric layer. The method also includes depositing a refractory metal silicon nitride film layer on the conductive film layer and depositing a tungsten film layer on the refractory metal silicon nitride film layer.