Patents by Inventor Zhibiao Mao

Zhibiao Mao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etch resistant antireflective coating compositions
    Publication number: 20020028408
    Abstract: The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention are etch resistant and that exhibit increased etch rates in standard plasma etchants. Preferred ARCs of the invention have significantly increased oxygen content relative to prior compositions.
    Type: Application
    Filed: August 17, 2001
    Publication date: March 7, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Zhibiao Mao, Suzanne Coley, Timothy G. Adams