Patents by Inventor Zhongwei Chen

Zhongwei Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200152412
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Application
    Filed: August 26, 2019
    Publication date: May 14, 2020
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN
  • Publication number: 20200152421
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Application
    Filed: January 3, 2020
    Publication date: May 14, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Shuai Li, Weiming Ren, Xuedong Liu, Juying Dou, Xuerang Hu, Zhongwei Chen
  • Patent number: 10643820
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: April 29, 2019
    Date of Patent: May 5, 2020
    Assignee: HERMES MICROVISION INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Patent number: 10586681
    Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: March 10, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Zhongwei Chen, Jack Jau, Weiming Ren
  • Patent number: 10573487
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Grant
    Filed: October 29, 2018
    Date of Patent: February 25, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Xuedong Liu, Weiming Ren, Shuai Li, Zhongwei Chen
  • Publication number: 20200027694
    Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.
    Type: Application
    Filed: February 1, 2018
    Publication date: January 23, 2020
    Inventors: Yongxin WANG, Weiming REN, Zhonghua DONG, Zhongwei CHEN
  • Patent number: 10541110
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: January 21, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Shuai Li, Weiming Ren, Xuedong Liu, Juying Dou, Xuerang Hu, Zhongwei Chen
  • Publication number: 20200021113
    Abstract: An inverter includes a transformer configured to electrically connect an energy storage power source and generate induced ACs, first and second rectifier modules, first and second inverter modules, and first and second photovoltaic interfaces configured to receive DC from a photovoltaic module. The first and second rectifier modules are respectively electrically connected to the transformer and configured to convert the induced ACs into DCs. The first inverter module is electrically connected to the first rectifier module and the first photovoltaic interface for receiving the DC from the first rectifier module and the DC from the photovoltaic module, and converting the received DCs into an AC. The second inverter module is electrically connected to the second rectifier module and the second photovoltaic interface for receiving the DC from the second rectifier module and the DC from the photovoltaic module, and converting the received DC into AC.
    Type: Application
    Filed: September 28, 2018
    Publication date: January 16, 2020
    Inventors: Junfeng Chen, Ting Chu, Zhongwei Sun
  • Publication number: 20200003870
    Abstract: Provided are a depth information camera module and a base assembly, a projection assembly, an electronic device and a manufacturing method thereof. The depth information camera module includes: a projection assembly to project a laser to a to-be-detected object; a receiving assembly, including a photosensitive element for receiving the laser reflected from the to-be-detected object; and a base assembly, the base assembly including a circuit board and a base body, the base body being supported by the circuit board, where the photosensitive element is electrically connected to the circuit board, the projection assembly circuit board is supported on a top side of the base body such that the circuit board and the projection assembly circuit board are respectively at different heights of the base assembly. Here, the projection assembly has an integral structure to facilitate assembly of the projection assembly.
    Type: Application
    Filed: June 3, 2019
    Publication date: January 2, 2020
    Inventors: Feifan CHEN, Zhongwei WANG, Qi RONG, Junjie ZENG, Hangang WEI, Beibei DAI, Minjie PAN
  • Publication number: 20190352740
    Abstract: The present invention relates to the field of ore smelting technology, and particularly provides a method and system for comprehensive recovery and utilization of copper-nickel sulfide ore. Under normal pressure, the method can be used to directly leach copper-nickel sulfide ore concentrate or low-grade nickel matte obtained by matte smelting of copper-nickel sulfide ore. In the leaching process, the leaching rate of nickel, cobalt and iron is up to 99% or more, and copper is hardly leached, whereby the deep separation of copper from elements such as nickel and cobalt is directly realized, and the huge system for copper-nickel separation in the conventional process is omitted. Moreover, noble metals are not leached, and almost all of them remain in the leaching slag with copper, so the destiny is simple.
    Type: Application
    Filed: August 1, 2019
    Publication date: November 21, 2019
    Applicant: CENTRAL SOUTH UNIVERSITY
    Inventors: Zhongwei ZHAO, Yongli LI, Xuheng LIU, Wanhai XIAO, Xingyu CHEN, Jiangtao LI
  • Publication number: 20190355108
    Abstract: This application provides an imaging method. The imaging method is applied to an imaging apparatus including a color camera and a black-and-white camera, and resolution of the black-and-white camera is higher than resolution of the color camera; and the imaging method includes: obtaining a zoom magnification; simultaneously capturing a color image and a black-and-white image of a target scene, where resolution of the black-and-white image is higher than resolution of the color image; performing cropping processing on the black-and-white image and the color image separately based on the zoom magnification, where the cropped black-and-white image and the cropped color image have a same field of view; and merging the cropped color image and the cropped black-and-white image to obtain an output image of the target scene. Therefore, according to the optical imaging method provided by embodiments of this application, the obtained output image can have a better optical zoom capability.
    Type: Application
    Filed: December 22, 2016
    Publication date: November 21, 2019
    Inventors: Gang Chen, Zhongwei Tang, Wei Luo
  • Publication number: 20190279842
    Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
    Type: Application
    Filed: March 18, 2019
    Publication date: September 12, 2019
    Inventors: Weiming REN, Shuai LI, Xuedong LIU, Zhongwei CHEN, Jack JAU
  • Patent number: 10395886
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Grant
    Filed: July 21, 2016
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Publication number: 20190259573
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Application
    Filed: April 29, 2019
    Publication date: August 22, 2019
    Inventors: Weiming REN, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Publication number: 20190172677
    Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.
    Type: Application
    Filed: November 26, 2018
    Publication date: June 6, 2019
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN
  • Patent number: 10276347
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: April 30, 2019
    Assignee: HERMES MICROVISION INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Publication number: 20190096628
    Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).
    Type: Application
    Filed: June 25, 2018
    Publication date: March 28, 2019
    Inventors: Shuai LI, Zhongwei Chen
  • Patent number: 10236156
    Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: March 19, 2019
    Assignee: HERMES MICROVISION INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen, Jack Jau
  • Publication number: 20190074157
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Application
    Filed: October 29, 2018
    Publication date: March 7, 2019
    Inventors: Xuedong LIU, Weiming REN, Shuai LI, Zhongwei CHEN
  • Publication number: 20190057837
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Application
    Filed: October 22, 2018
    Publication date: February 21, 2019
    Inventors: Weiming REN, Shuai Li, Xuedong Liu, Zhongwei Chen