Abstract: A solid-state image sensor is provided. The solid-state image sensor includes a semiconductor substrate having photoelectric conversion elements. The solid-state image sensor also includes an isolation structure disposed between the photoelectric conversion elements. The solid-state image sensor further includes a color filter layer disposed above the semiconductor substrate and having color filter segments that correspond to the photoelectric conversion elements. Moreover, the solid-state image sensor includes an organic film disposed above the color filter layer. The solid-state image sensor also includes an upper electrode and a lower electrode respectively disposed on the upper side and the lower side of the organic film. The solid-state image sensor further includes nano-structures disposed on the upper side or the lower side of the organic film.

Abstract: A solid-state image sensor is provided. The solid-state image sensor includes a plurality of photoelectric conversion elements. The solid-state image sensor also includes a color filter layer disposed above the photoelectric conversion elements. The color filter layer has a plurality of color filter segments. The solid-state image sensor further includes a partition grid disposed between the color filter segments. Moreover, the solid-state image sensor includes a patterned structure disposed on the color filter layer. The patterned structure has a plurality of patterned segments. The solid-state image sensor also includes a transparent layer disposed on the color filter layer and the partition grid. The transparent layer surrounds the patterned segments. At least one patterned segment is disposed on the partition grid.

Abstract: A solid-state image sensor having a first region and a second region adjacent to the first region along a first direction is provided. The solid-state image sensor includes a first unit pattern disposed in the first region. The solid-state image sensor also includes a second unit pattern disposed in the second region and corresponding to the first unit pattern. The first unit pattern and the second unit pattern each includes normal pixels and an auto-focus pixel array. The normal pixels and the auto-focus pixel array in the first unit pattern form a first arrangement, the normal pixels and the auto-focus pixel array in the second unit pattern form a second arrangement, and the first arrangement and the second arrangement are symmetric with respect to the first axis of symmetry.

Abstract: A solid-state image sensor having a first region and a second region adjacent to the first region along a first direction is provided. The solid-state image sensor includes a first unit pattern disposed in the first region. The solid-state image sensor also includes a second unit pattern disposed in the second region and corresponding to the first unit pattern. The first unit pattern and the second unit pattern each includes normal pixels and an auto-focus pixel array. The normal pixels and the auto-focus pixel array in the first unit pattern form a first arrangement, the normal pixels and the auto-focus pixel array in the second unit pattern form a second arrangement, and the first arrangement and the second arrangement are symmetric with respect to the first axis of symmetry.

Abstract: An optical device is provided. The optical device includes a substrate and a plurality of optical structures. The substrate includes a plurality of photoelectric conversion elements. The optical structures are disposed above the substrate. Each optical structure corresponds to one photoelectric conversion element. Each optical structure includes a first portion and a second portion. The first portion has a first glass transition temperature. The second portion has a second glass transition temperature. The second portion guides the incident light into the photoelectric conversion element. The first glass transition temperature is higher than the second glass transition temperature.

Abstract: An optical device is provided. The optical device includes a plurality of IR-cut pixels, a plurality of IR-pass pixels, and a plurality of grids. The grids surround the IR-cut pixels and the IR-pass pixels. Each IR-cut pixel includes a first grating structure. A method for fabricating the optical device is also provided.

Abstract: The solid-state image sensor includes a semiconductor substrate having first and second photoelectric conversion elements, a color filter layer, and a hybrid layer. The isolation structure is disposed between the first and second photoelectric conversion elements. The color filter layer is disposed above the semiconductor substrate. The hybrid layer is disposed between the semiconductor substrate and the color filter layer. The hybrid layer includes a first partition structure, a second partition structure, and a transparent layer. The first partition structure is disposed to correspond to the isolation structure. The second partition structure is surrounded by the first partition structure. The transparent layer is between the first partition structure and the second partition structure. The refractive index of the first partition structure and the refractive index of the second partition structure are lower than the refractive index of the transparent layer.

Abstract: A solid-state image sensor is provided. The solid-state image sensor includes a semiconductor substrate having photoelectric conversion elements. The photoelectric conversion elements form an N×N pixel array, where N is a positive integer larger than or equal to 3. The solid-state image sensor also includes a modulation layer disposed above the photoelectric conversion elements. The solid-state image sensor further includes a light-adjusting structure disposed on the modulation layer and corresponding to the N×N pixel array. The N×N pixel array includes a first pixel region having at least one first pixel. The N×N pixel array also includes a second pixel region adjacent to the first pixel region in a first direction and in a second direction different from the first direction and having second pixels. The aperture ratio of the first pixel and the aperture ratio of the second pixel are different.

Abstract: A solid-state image sensor is provided. The solid-state image sensor includes a plurality of photoelectric conversion elements. The solid-state image sensor also includes a first color filter layer disposed above the photoelectric conversion elements and a second color filter layer disposed adjacent to the first color filter layer, which respectively have a plurality of first color filter segments and a plurality of second color filter segments. Moreover, the solid-state image sensor includes a first metal grid structure disposed between the first color filter layer and the second color filter layer. The solid-state image sensor also includes a second metal grid structure disposed between the first color filter segments and between the second color filter segments. The bottom of the first metal grid structure has a first grid width, and the bottom of the second metal grid structure has a second grid width narrower than the first grid width.

Abstract: A solid-state image sensor is provided. The solid-state image sensor includes a plurality of photoelectric conversion elements. The solid-state image sensor also includes a color filter layer disposed above the photoelectric conversion elements. The color filter layer has a plurality of color filter segments. The solid-state image sensor further includes a partition grid disposed between the color filter segments. Moreover, the solid-state image sensor includes a patterned structure disposed on the color filter layer. The patterned structure has a plurality of patterned segments. The solid-state image sensor also includes a transparent layer disposed on the color filter layer and the partition grid. The transparent layer surrounds the patterned segments. At least one patterned segment is disposed on the partition grid.

Abstract: An image sensing device is provided. The image sensing device includes: a micro lens, a first optical layer, a second optical layer, and an anti-reflection layer. The first optical layer is formed on the micro lens. The second optical layer is formed on the first optical layer. An interface is formed between the first optical layer and the second optical layer, and the interface is beveled. The anti-reflection layer is formed on the second optical layer.

Abstract: A solid-state image sensor is provided. The solid-state image sensor includes a plurality of photoelectric conversion elements. The solid-state image sensor also includes a modulation layer disposed above the photoelectric conversion elements, and the modulation layer has a plurality of modulation segments. The modulation layer includes a plurality of first sub-layers and a plurality of second sub-layers having different refractive indexes. From the top view of the modulation layer, the modulation segments form a first group and a second group, and the second group is adjacent to the first group. The arrangement of the first sub-layers and the second sub-layers in the first group is different from the arrangement of the first sub-layers and the second sub-layers in the second group.

Abstract: An optical device is provided. The optical device includes a substrate, a central color filter, a first color filter and a second color filter sequentially disposed on the substrate from the center to the edge of the substrate, and a central hollow member, a first hollow member and a second hollow member respectively disposed on the central color filter, the first color filter and the second color filter. There is no distance between a center of the central color filter and a center of the central hollow member. There is a first distance between a center of the first color filter and a center of the first hollow member. There is a second distance between a center of the second color filter and a center of the second hollow member. The first distance is greater than zero. The second distance is greater than the first distance.

Abstract: An optical device is provided. The optical device includes a substrate, a central color filter, a first color filter and a second color filter sequentially disposed on the substrate from the center to the edge of the substrate, and a central hollow member, a first hollow member and a second hollow member respectively disposed on the central color filter, the first color filter and the second color filter. There is no distance between a center of the central color filter and a center of the central hollow member. There is a first distance between a center of the first color filter and a center of the first hollow member. There is a second distance between a center of the second color filter and a center of the second hollow member. The first distance is greater than zero. The second distance is greater than the first distance.

Abstract: An optical element is provided. The optical element includes a substrate, a plurality of metal grids formed on the substrate, a patterned organic layer formed on the plurality of metal grids, a color filter surrounded by the patterned organic layer, and a light collection layer formed between the color filter and the substrate, and surrounded by the patterned organic layer. The refractive index of the light collection layer is greater than that of the patterned organic layer.

Abstract: An optical device is provided. The optical device includes a central region having a plurality of central pixels, a first region having a plurality of first pixels, a second region having a plurality of second pixels, an organic layer formed in the central region, the first region and the second region, a light collection layer surrounded by the organic layer formed in the first region and the second region, a first light collection element of the light collection layer formed in the first pixel, and a second light collection element of the light collection layer formed in the second pixel. The central region, the first region and the second region are spaced from each other along an arrangement direction, and the first region is closer to the central region than the second region. The first light collection element is different from the second light collection element.

Abstract: An optical device is provided. The optical device includes a central region having a plurality of central pixels, a first region having a plurality of first pixels, a second region having a plurality of second pixels, an organic layer formed in the central region, the first region and the second region, a light collection layer surrounded by the organic layer formed in the first region and the second region, a first light collection element of the light collection layer formed in the first pixel, and a second light collection element of the light collection layer formed in the second pixel. The central region, the first region and the second region are spaced from each other along an arrangement direction, and the first region is closer to the central region than the second region. The first light collection element is different from the second light collection element.

Abstract: An optical element is provided. The optical element includes a substrate, a plurality of metal grids formed on the substrate, a patterned first organic layer formed on the plurality of metal grids, a color filter surrounded by the patterned first organic layer, a second organic layer formed on the patterned first organic layer and the color filter, and a light collection layer surrounded by the second organic layer and corresponding to the color filter. The refractive index of the light collection layer is greater than that of the second organic layer. A method for fabricating the optical element is also provided.

Abstract: A solid-state imaging device includes multiple photoelectric conversion elements arrayed in a pixel array. The solid-state imaging device also includes a color filter layer having multiple color filter segments above the photoelectric conversion elements. Each of the color filter segments is disposed in a respective pixel of the pixel array. The solid-state imaging device further includes an optical waveguide layer over the color filter layer. The optical waveguide layer includes a waveguide partition grid and a waveguide material in the spaces of the waveguide partition grid. The waveguide material has a refractive index that is higher than the refractive index of the waveguide partition grid. The waveguide material provides the same refractive index for each pixel of the pixel array.

Abstract: An image sensor includes a sensing layer, a first microlens, and a number of second microlenses. The first microlens is disposed on the sensing layer. The second microlenses are disposed on the sensing layer adjacent to the first microlens. The diameter of the first microlens is greater than the diameter of each of the second microlenses.