Chemoreceptive semiconductor structure
A field effect transistor has a floating gate with an extended portion. A selectively chemoreceptive finger or layer is electrostatically coupled to the extended portion of the floating gate, and induces a voltage on the gate in response to selected chemicals or other conditions affecting the finger. The voltage on the gate modulates current flowing between a source and a drain of the transistor, effectively sensing the presence of the selected chemicals or conditions. In one embodiment, multiple chemoreceptive fingers are electrostatically coupled to the extended portion of the floating gate. In a further embodiment, an array of such field effect transistors provide a sensor for multiple conditions.
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This application is a divisional of U.S. patent application Ser. No. 10/695,432, filed Oct. 28, 2003, which application is incorporated herein by reference.
RELATED APPLICATIONSThis application claims priority from U.S. Provisional Application No. 60/422,014; filed on Oct. 29, 2002; which is incorporated herein by reference.
GOVERNMENT FUNDINGThe invention described herein was made with U.S. Government support under Grant Number ECS-0210743 awarded by Nanoscale Exploratory Research (NER) and Grant Number R830902 awarded by the National Center for Environmental Research (NCER). The United States Government has certain rights in the invention.
FIELD OF THE INVENTIONThe present invention relates to sensors, and in particular to a chemoreceptive semiconductor structure.
BACKGROUND OF THE INVENTIONChemical and molecular sensing with solid-state devices have involved various approaches including microelectrode, microcalorimeter, acoustic wave devices, chemiresistors, chemicapacitors, chemomechanical sensors, and field effect transistor (FET) based sensors. Many attempts of forming sensors with complementary metal-oxide-silicon (MOS) devices have also been made. Although sensitivity is high in a controlled environment, the devices are limited by sensing selectivity, contamination induced long-term drift in MOS characteristics, and system integration.
SUMMARY OF THE INVENTIONA field effect transistor has a floating gate with an extended portion. A selectively receptive finger is electrostatically coupled to the extended portion of the floating gate, and induces a voltage on the gate in response to selected chemicals or other conditions affecting the finger. The voltage on the gate modulates current flowing between a source and a drain of the transistor, effectively sensing the presence of the selected chemicals.
In one embodiment, multiple chemoreceptive fingers are electrostatically coupled to the extended portion of the floating gate. Each chemoreceptive finger is electrically isolated from the extended portion of the floating gate such as by a nitride plug. In one embodiment, the fingers are referred to as control gates. The floating gate voltage is established through charge sharing or capacitive voltage division, as a weighted sum of the voltages applied to the control gates. The weight on each control gate is proportional to the capacitance of the gate, and is normalized by the total capacitance of the floating gate.
In a further embodiment, and array of such field effect transistors forms a sensor for detecting one or more conditions. An optional independent power source and transmitter provide for remote location of such arrays.
BRIEF DESCRIPTION OF THE DRAWINGS
In the following description, reference is made to the accompanying drawings that form a part hereof, and in which is shown by way of illustration specific embodiments in which the invention may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention, and it is to be understood that other embodiments may be utilized and that structural, logical and electrical changes may be made without departing from the scope of the present invention. The following description is, therefore, not to be taken in a limited sense, and the scope of the present invention is defined by the appended claims.
A four-input neuron metal oxide semiconductor (MOS) (vMOS) transistor is shown in block schematic form at 100 in
In one embodiment, the control gates 130, 135 and 140 comprise fingers that are coated with a chemoreceptive material, while control gate 125 is a normal vMOS control gate. The chemoreceptive material is selective in one embodiment, such that one targeted chemicals as shown generally at 150 bond with the material, creating a charge on the control gate that is capacitively coupled to the floating gate 120.
A floating gate voltage is established through charge sharing or capacitive voltage division, as a weighted sum of the voltages applied to the control gates. The weight on each control gate is directly proportional to that control gate's capacitance and is normalized by the total capacitance of the floating gate.
In one embodiment fewer, or more control gates are provided, and the extended area of the floating gate is formed sufficient to capacitively couple to such number of control gates. Not all the control gates need have chemoreceptive fingers, and the chemicals 150 such fingers are receptive to may be varied on the same transistor 100.
Transconductance gains of each control gate are selected via the control gate capacitances. Because the control gates perform their voltage summation by capacitive voltage division, operation of the transistor may be performed with very little power consumption. Since only the control gate capacitances are charged, there is little or no static power consumption as there is in prior resistive voltage division based devices.
In one embodiment, a normal MOS transistor is constructed. Instead of placing a second-level polysilicon electrode above an area of the floating gate, an opening in the oxide over the gate is constructed, extending through a passivation later all the way down to the floating gate. A thin layer of insulator is formed over the opening. On top of the insulator, a variety of thin films may be deposited to form a chemoreceptive control gate. The properties of the thin films determine a molecular/chemoreceptive property for the chemoreceptive control gate. Any CMOS technology may be used, as the chemoreceptive control gates are added using postprocessing steps following fabrication of the CMOS circuitry.
Each transistor can have any number of normal control gates and chemoreceptive control gates, and the molecular/chemoreceptive properties of each such gate is separately tailorable. In operation, the chemoreceptive control gates are exposed to a fluid, such as a liquid or gas. The molecules present in such fluid adhere to the various chemoreceptive control gates, and charged groups on the molecules capacitively induce a charge on the floating gate. In further embodiments, the chemoreceptive control gates are replaced with photoreceptive control gates, or other sensor control gates having sensors with the capability of modifying capacitance in response to a sensed condition.
The extended gate structure 210 is formed with three further extensions 217, 218, and 219 extending beyond broken line 205. An isolation area is formed at the end of each of the further extensions as indicated at 223, 224, and 225. In one embodiment, the isolation areas comprise nitride plugs. The nitride plugs serve as a dielectric between the further extensions, and corresponding fingers 227, 228 and 229. Each of the fingers is coated with a chemoreceptive layer 232, 233, and 234. The further extensions and corresponding fingers form electrodes of respective capacitors.
The fingers 227, 228, 229 are coupled to fluid by means of microfluidic channels 242, 243, and 244 to provide molecular and chemical samples in liquid or gas phase. The liquid phase involves the use of a buffer solution. The microfluidic channels deliver controlled sample molecules 250 with or without a buffer to the floating gate fingers with dielectric isolation and chemoreceptive coating that forms compact double layers (Helmholtz planes) with fluids. The channels may be independent for each finger, or may be coupled to form a chamber in one embodiment, such that multiple fingers are coupled to the same chamber. The areas and wall characteristics of the floating gate fingers determines the response signature for sensing selectivity. In one embodiment, different subthreshold slopes are used for different chemoreceptive coatings.
Si diffused resistors 252, 253, and 254 are provided with contacts in the channels for providing a reference potential to the microfluidic channels. The resistors can be coupled to further circuitry for processing. The sensor can perform selectivity analysis at the chip level without resorting to A/D conversion and further digital processing, and hence can have low power operations.
Further detail of finger 227 is shown in
In one embodiment, the extended floating gate 530 is formed of highly doped poly. A second highly doped poly layer 531 is separated from the first poly layer 530 by an inter-poly dielectric, such as an oxide 533. Oxide 533 is formed by chemical vapor deposition (CVD) of SiO2 in one embodiment to a thickness of approximately between 10 and 40 nm. Other thicknesses may also be used.
In one embodiment, second poly layer 531 is referred to as a sensing gate. It may be covered with an oxide, and selected portions of the sensing gate are then exposed through an oxide etch. The exposed areas are then coated with a chemoreceptive material 532, while control gate 520 is a normal vMOS control gate. They chemoreceptive material 532 may be formed as a layer by dipping the floating gate in a poly solution. The chemoreceptive material is selective in one embodiment, such that a targeted chemical will bond with the material, creating a charge on the material that is capacitively coupled to the extended floating gate 530, thus affecting current flow through the transistor 500.
In one embodiment, an insulating structure 535 formed of oxide or other insulative material is positioned between the chemoreceptive surface 532 and the source 510 and drain 515. Source 510 is coated with a protective oxide 540 in one embodiment to keep the area physically and electrically isolated. Oxide that was formed on the floating gate is removed prior to coating the gate with the chemoreceptive material.
In a further embodiment, a further poly coating is applied over the chemoreceptive material and is pattered with microfluidic channels. Such channels are patterned as desired to provide fluid to the chemoreceptive material. Examples of such channels are shown in
Upon exposure of the extended floating gate polysilicon surface after the oxide etch on the sensing gates, four types of polymers are respectively used for the sensing-gate coating, as listed in Table 1, to enhance selective responses and provide versatile comparisons with the uncoated polysilicon surface.
Coating solutions may be prepared at the room temperature. For poly(ethylene-co-vinyl acetate), 100 mg of the co-polymer is dissolved in 10 mL of benzene. For poly(vinyl acetate), poly(vinyl butyral), and poly(vinyl chloride), 20 mg of the polymer is dissolved in 10 mL of tetrahydrofuran (THF). After 10 to 15 minutes of mild agitation, the solution is visually inspected to ensure a proper mixture quality. The sensing area is then dipped into the solution to form a coating layer. After the solvent evaporates, a thin polymer layer is deposited on the sensing area. Other methods of applying the chemoreceptive layers may be utilized.
Two different sensing gates are used in one embodiment to facilitate comparison, as illustrated in
The individual thickness and roughness of example polymer coatings may be measured with a stylus-based surface profiler and are listed in Table 2. The arithmetical-mean roughness (Ra) and root-mean-square roughness (Rq) are calculated over about 100 μm on the wide sensing gate. Both Ra and Rq for the bare polysilicon surface are about 1 nm.
Fluid provided by the channels interacts with the chemoreceptive surface through the formation of the electrical double layer at the solid-liquid interface. The capacitive load and static charges introduced onto the floating gate cause specific changes in both subthreshold slopes (S) and threshold voltages (Vt). Normalization may be used to eliminate parasitic deviations between devices. Measurements taken by measuring responses in deionized water or other desired fluids may be used to obtain information used to normalize the responses.
To rapidly extract the information encoded in the form of subthreshold-slope variations on the sensing gates of the chemically receptive MOS (CvMOS) transistor, a simple circuit 800 of common-source amplification is used in one embodiment as shown in
The extended floating-gate structure capacitively monitors solid-liquid interaction at the sensing area, and also enables EEPROM electron tunneling operations, which provide additional degrees of freedom for the sensing mechanism. Comparisons of subthreshold-slope responses between the bare polysilicon surface and four different types of polymer coatings on the sensing gates indicate the selectivity of such devices can be significantly enhanced through a sensory array with versatile surface coatings, along with the charge control in the floating gate through electron-tunneling operations. Through the high transconductance gain of the MOS transistors, a high sensitivity can be derived, and the extraction of measured data can be realized by straightforward common-source amplifier circuitry.
I-V characteristics of the structure allow further utilization of specific adsorption to collect digitized information from multiple sensing gates. The multiple-input sensing structure may substantially reduce the need for digital-to-
Claims
1-4. (canceled)
5. A sensor comprising:
- a field effect transistor having a source, drain and floating gate, wherein the floating gate has an extended portion; and
- multiple selectively chemoreceptive fingers electrostatically coupled to the extended portion of the floating gate.
6. The sensor of claim 5 wherein the selectively chemoreceptive fingers are electrically isolated from the extended portion of the floating gate.
7. The sensor of claim 6 wherein the electrical isolation is provided by a nitride plug.
8. The sensor of claim 5 and further comprising a microfluidic channel coupled to at least one of the chemoreceptive fingers for selectively exposing such chemoreceptive fingers to fluid.
9. The sensor of claim 8 and further comprising a separate microfluidic channel for each chemoreceptive finger for selectively exposing such chemoreceptive fingers to different fluids.
10-15. (canceled)
16. A sensor comprising:
- a field effect transistor having a source, drain and floating gate, wherein the floating gate has an extended portion;
- a chemoreceptive layer capacitively coupled to the extended portion of the floating gate; and
- a microfluidic channel coupled to the chemoreceptive layer.
17. The sensor of claim 16 and further comprising one or more resistors coupled to the microfluidic channels.
18. The sensor of claim 17, wherein the resistors provide a reference potential to the microfluidic channels.
19. A sensor comprising:
- an array of field effect transistors, each having a source, drain and floating gate, wherein the floating gate has an extended portion with a chemoreceptive layer electrostatically coupled to the extended portion of the floating gate.
20. The sensor of claim 19 and further comprising a controller coupled to the field effect transistors to measure current flowing between the source and drain of each transistor.
21. The sensor of claim 20 and further comprising a transponder coupled to the controller for communicating with other devices.
22. A method of sensing chemicals comprising:
- providing a sample to a chemoreceptive layer supported by an extended electrostatically coupled gate;
- inducing a voltage on the extended gate; and
- modulating current through a source and drain based on the induced voltage on the floating gate.
23-25. (canceled)
Type: Application
Filed: Oct 11, 2005
Publication Date: Feb 23, 2006
Applicant:
Inventors: Edwin Kan (Ithaca, NY), Bradley Minch (Ithaca, NY)
Application Number: 11/247,035
International Classification: H01L 29/788 (20060101);