Wafer-transferring pod capable of monitoring processing environment
A wafer-transferring pod capable of monitoring process environment comprises a body and a sampling mechanism positioned on a top surface, a back surface or one of two side surfaces of the body for adsorbing contamination. The sampling mechanism comprises an inner chamber filled with adsorbent such as glass wool and a plurality of openings positioned on sidewalls of the inner chamber. In addition, the sampling mechanism may comprise a movable door and an opening for a user to absorb the air from the body without opening a front cover of the wafer-transferring pod. Further, the sampling mechanism may comprise an inner member positioned on the body and an outer member buckled into the inner member, wherein the inner member and the outer member have an opening through which the user can absorb the air in the body without opening the front cover of the wafer-transferring pod.
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(A) Field of the Invention
The present invention relates to a wafer-transferring pod capable of monitoring the processing environment, and more particularly, to a wafer-transferring pod capable of monitoring the processing environment as a wafer is experiencing the processing.
(B) Description of the Related Art
The fabrication of an integrated circuit device on a wafer needs a plurality of processing apparatuses having a reaction chamber, and the wafer is transferred between these processing apparatuses by a wafer-transferring system. Presently, integrated circuit manufacturing companies locate the wafer in a wafer-transferring pod, and use a robot to move the wafer from the pod to the reaction chamber where the reaction process actually occurs. Consequently, it only needs to control the grade of clarity in a smaller internal space of the pod, rather than a larger space of the entire clean room, which can dramatically lower the cost on controlling the grade of clarity. The internal space of the pod possesses a higher grade of clarity; however, opening or closing the pod on transferring the wafer between the pod and the processing apparatus is likely to introduce some contaminations from the clean room having a lower grade of clarity into the pod having a higher grade of clarity and the reaction chamber of the processing apparatus, which is one of the pollution sources of the reaction chamber and the wafer in the pod.
To analyze the pollution source, the prior art uses a sampling accessory capable of sucking air from some dubious areas such as the reaction chamber of the processing apparatus, the internal space of the pod or a transferring interface between the processing apparatus and the pod. An adsorbent in the sampling accessory is then used in some chemical analysis procedures to characterize the composition of the sampled air so as to infer the pollution source based on the outcome of the chemical analysis. Particularly, the prior art needs to open a front cover of the pod before using the sampling accessory to suck air from the internal space of the pod, but opening the front cover of the pod itself generates some contaminations. In addition, using the sampling accessory to suck air in the open pod also pollutes the internal space of the pod. Consequently, there are several pollution sources, and it is quite difficult to discover the actual one.
Further, what the prior art does is a post-sampling, i.e., the prior art performs the sampling from the processing environment after the pollution occurs, and then infers reversely the generation mechanism of the pollution based on the result of the chemical analysis. Since the environment in which post-sampling is performed may be different from that in which the pollution actually occurs, the prior art analysis technique itself possesses a certain inaccuracy.
SUMMARY OF THE INVENTIONThe primary objective of the present invention is to provide a wafer-transferring pod, which is capable of monitoring the process environment as a wafer is experiencing the fabrication process and preventing the wafer from being polluted by inserting a sampling accessory into the wafer-transferring pod or by opening the wafer-transferring pod.
In order to achieve the above-mentioned objective and avoid the problems of the prior art, one embodiment of the present invention discloses a wafer-transferring pod that comprises a body capable of receiving a plurality of wafers and a sampling mechanism positioned on the body. The sampling mechanism can be positioned on a top surface, a back surface or one of two side surfaces of the body for adsorbing contaminations. One embodiment of the sampling mechanism comprises an inner chamber filled with adsorbent such as glass wool and a plurality of openings positioned on the sidewalls of the inner chamber. In another embodiment, the sampling mechanism may comprise a movable door and an opening positioned on the body for a user to absorb air from the body via the opening without opening a front cover of the wafer-transferring pod. In a further embodiment, the sampling mechanism may comprise an inner member positioned on the body and a outer member buckled into the inner member, wherein the inner member and the outer member have an opening through which the user can absorb the air from the body without opening the front cover of the wafer-transferring pod.
To do sampling, the prior art needs to perform actions such as opening the front cover of the wafer-transferring pod or inserting the sampling accessory into the wafer-transferring pod; however, these actions generate contaminations to cause pollution. On the contrary, the present invention disposes a sampling mechanism on the wafer-transferring pod, and the sampling of air in the wafer-transferring pod is performed via the sampling mechanism without inserting a sampling accessory into the wafer-transferring pod or opening the front cover of the wafer-transferring pod. Consequently, the present invention can prevent the wafer in the wafer-transferring pod from being polluted by inserting a sampling accessory into the wafer-transferring pod or opening the front cover of the wafer-transferring pod. In addition, the present invention allows the performing of the sampling during the fabrication process, i.e., achieves an on-line sampling instead of the post-sampling.
BRIEF DESCRIPTION OF THE DRAWINGSThe objectives and advantages of the present invention will become apparent upon reading the following description and upon reference to the accompanying drawings in which:
When the wafer 12 in the wafer-transferring pod 10 is transferred into a reaction chamber to experience a semiconductor fabrication process such as the deposition process, the etching process or the lithographic process, the adsorbent 44 can adsorb contaminations from air in the interior of the wafer-transferring pod 10 as the wafer 12 is transferred from the reaction chamber back to the wafer-transferring pod 10, i.e., sampling in an on-line manner. Particularly, the contaminations in the wafer-transferring pod 10 are discharged from the wafer 12 into air in the interior of the wafer-transferring pod 10 as the wafer 12 is transferred back to the wafer-transferring pod 10 after the fabrication process is completed in the reaction chamber. Subsequently, one can open the top cover 48 of the sampling mechanism 40 and take out the adsorbent 44 from the inner chamber 42 to identify the contamination by a certain chemical analysis technique.
To do sampling, the prior art needs to perform actions such as opening the front cover of the wafer-transferring pod or inserting the sampling accessory into the wafer-transferring pod; however, these actions generate contaminations to cause pollution. On the contrary, the present invention disposes a sampling mechanism on the wafer-transferring pod, and the sampling of air in the wafer-transferring pod is performed via the sampling mechanism without inserting a sampling accessory into the wafer-transferring pod or opening the front cover of the wafer-transferring pod. Consequently, the present invention can prevent the wafer in the wafer-transferring pod from being polluted by inserting a sampling accessory into the wafer-transferring pod or opening the front cover of the wafer-transferring pod. In addition, the present invention allows the performing of the sampling during the fabrication process, i.e., achieves an on-line sampling instead of the post-sampling.
The above-described embodiments of the present invention are intended to be illustrative only. Numerous alternative embodiments may be devised by those skilled in the art without departing from the scope of the following claims.
Claims
1. A wafer-transferring pod, comprising:
- a body configured to receive a plurality of wafers; and
- a sampling mechanism positioned on the body for adsorbing contaminations from an interior of the body.
2. The wafer-transferring pod of claim 1, wherein the body has a back surface, and the sampling mechanism is positioned on the back surface.
3. The wafer-transferring pod of claim 1, wherein the body has two side surfaces, and the sampling mechanism is positioned on one of the two side surfaces.
4. The wafer-transferring pod of claim 1, wherein the body has a top surface, and the sampling mechanism is positioned on the top surface.
5. The wafer-transferring pod of claim 1, wherein the sampling mechanism includes a chamber having adsorbents therein.
6. The wafer-transferring pod of claim 5, wherein the adsorbents include glass wool.
7. The wafer-transferring pod of claim 5, wherein the chamber includes a plurality of openings, and the interior of the body communicates with that of the chamber via the openings.
8. A wafer-transferring pod, comprising:
- a body configured to receive a plurality of wafers; and
- a sampling mechanism positioned on the body for a user to adsorb air from an interior of the body.
9. The wafer-transferring pod of claim 8, wherein the body has a back surface, and the sampling mechanism is positioned on the back surface.
10. The wafer-transferring pod of claim 8, wherein the body has two side surfaces, and the sampling mechanism is positioned on one of the two side surfaces.
11. The wafer-transferring pod of claim 8, wherein the body has a top surface, and the sampling mechanism is positioned on the top surface.
12. The wafer-transferring pod of claim 8, wherein the sampling mechanism includes a movable door.
13. The wafer-transferring pod of claim 12, wherein the movable door is made of polyetherimide.
14. The wafer-transferring pod of claim 8, wherein the sampling mechanism is an opening.
15. The wafer-transferring pod of claim 8, wherein the sampling mechanism includes:
- an inner member positioned on the body; and
- an outer member configured to engage with the inner member;
- wherein the inner member and the outer member have an opening through which the user can absorb the air from the body.
16. The wafer-transferring pod of claim 15, wherein the sampling mechanism further includes adsorbent sheet positioned between the inner member and the outer member.
17. The wafer-transferring pod of claim 16, wherein the adsorbent sheet is made of glass wool.
18. The wafer-transferring pod of claim 15, wherein the sampling mechanism further includes a plug for sealing up the opening.
Type: Application
Filed: Apr 12, 2006
Publication Date: Jul 26, 2007
Applicant: PROMOS TECHNOLOGIES INC. (HSINCHU)
Inventors: Ya Po (Hsinchu), Ting Wang (Hsinchu)
Application Number: 11/401,835
International Classification: B65D 85/00 (20060101); B65D 81/24 (20060101); B65D 90/22 (20060101);