SOLID-STATE IMAGE SENSOR AND AUTOMATIC-FOCUS CAMERA USING THE SAME
A solid-state image sensor for automatic focus with highly precise automatic focus performance is realized at low cost. In the solid-state image sensor for automatic focus which has paired linear sensors (L1 to L10) respectively provided with linear sensors for standard portion (L1-B to L10-B) and linear sensors for reference portion (L1-R to L10-R) for performing phase difference detection type focus detection, a linear sensor for standard portion L6-B of paired linear sensors L6 is arranged between a linear sensor for standard portion L5-B and a linear sensor for reference portion L5-R of paired linear sensors L5, and a linear sensor for reference portion L5-R of paired linear sensors L5 is arranged between a linear sensor for standard portion L6-B and a linear sensor for reference portion L6-R of paired linear sensors L6.
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1. Field of the Invention
The present invention relates to an improvement in the precision of a solid-state image sensor for automatic focus, and more particularly to a TTL-SIR (Through The Lens Secondary Imaged Registration) type automatic focus sensor and an automatic-focus camera using the TTL-SIR type automatic focus sensor.
2. Description of the Related Art
A conventional TTL-SIR type automatic focus sensor is disclosed by the present applicants in detail in “CMOS linear type automatic focus sensor for wide visual field seven point AF, Technical Report of the Institute of Image Formation and Television Engineers, Vol. 25, No. 28, and pp. 1-6 (2001)”.
In the recent several years, the number of range finding points tend to be increased.
In the above described prior art form, two methods of miniaturizing the pixel pitch and of extending the base line length are considered in order to improve the automatic focus precision. However, a microfabrication process essentially needs to be introduced in order to reduce the pixel pitch without lowering the sensitivity, and a long development period and tremendous development costs are needed to build up the microfabrication process. This makes it impossible to develop a low cost solid-state image sensor for automatic focus for a short period of time. Accordingly, it is preferred to make the pixel pitch the same as before by using the same conventional process. In this case, in order that the automatic focus precision is improved to be higher than before, it is necessary to extend the base line length, as described above. However, simply extending the base line length, (for example, extending the interval between line 5-standard portion and line 5-reference portion, and the interval between line 6-standard portion and line 6-reference portion, in order to extend the base line length in
An object of the present invention is to realize a solid-state image sensor for automatic focus having highly precise automatic focus performance at low cost.
In order to achieve the above described object, according to the present invention, there is provided a solid-state image sensor for automatic focus having at least a first and second paired linear sensors, each comprising a linear sensor for standard portion and a linear sensor for reference portion, for performing phase difference detection type focus detection, the linear sensor for standard portion of the second paired linear sensors being arranged between the linear sensor for standard portion and the linear sensor for reference portion of the first paired linear sensors, the linear sensor for reference portion of the first paired linear sensors being arranged between the linear sensor for standard portion and the linear sensor for reference portion of the second paired linear sensors, and a dummy pixel being provided for at least one of portions between the linear sensor for standard portion and the linear sensor for reference portion, which are adjacent to each other, between the plural linear sensors for standard portion, and between the plural linear sensors for reference portion.
In the above described configuration, since the base line length can be extended in the same chip size as before, a solid-state image sensor corresponding to high automatic focus precision can be realized without increasing the manufacturing cost of the chip, and the provision of the dummy pixel makes a layout pattern uniform (making wiring density and active areas arranged in a uniform manner), as a result of which the work precision of the process can be improved so as to increase the yield.
According to the present invention, it is possible to realize a solid-state image sensor for automatic focus which is low cost while having a high precision. In addition, a single lens reflex camera which is highly precise, small in size and low cost, can be realized by applying the solid-state image sensor for automatic focus according to the present invention to the digital single lens reflex camera.
In the following, preferred embodiments according to the present invention will be described in more detail with reference to the accompanying drawings.
First EmbodimentThe photodiode array 2 is divided into a linear sensor for standard portion and a linear sensor for reference portion, and paired linear sensors are constituted by the linear sensor for standard portion, the linear sensor for reference portion, the reading circuit 3, and the scanning circuit 10. In
In the arrangement shown in
In the eighth and the ninth linear sensor pairs L8, L9, linear sensors for standard portion and linear sensors for reference portion are also arranged in the same manner as those in the fifth and the sixth linear sensor pairs L5, L6.
Next, a specific circuit diagram of AF linear sensor circuit comprising the photodiode array 2 and the AF sensor reading circuit 3 is shown in
In
Reference numeral 23 denotes a clamp capacitance, 24 denoting a MOS switch for inputting a clamp potential into the clamp capacitance 23, the clamp capacitance 23 and the MOS switch 24 constituting a clamp circuit. Reference numerals 25 to 28 denote MOS transistors for switching, 29 denoting a differential amplifier for maximum value detection, 30 denoting a differential amplifier for minimum value detection which also operates as an AF signal output circuit, each differential amplifier constituting a voltage follower circuit. An output of the differential amplifier 22 is inputted into the maximum value detection circuit via the clamp circuit, and is also inputted into the minimum value detection circuit which also operates as the AF signal output circuit, via the clamp circuit.
Reference numeral 31 denotes a MOS switch for maximum value output, 32 denoting a MOS switch for minimum value output, 33 denoting an OR circuit, 10 denoting a scanning circuit, 34 denoting a NMOS transistor for constant current, and 35 denoting a PMOS transistor for constant current. As shown in
Details of the operation of this circuit are explained in Japanese Patent Application Laid-Open No. 2000-180706, and hence are explained roughly here.
The MOS transistor 21 for resetting is turned on by a signal φRES to reset the photodiode. The MOS transistors 26, 27 for switching are turned on by signals φN1 and φN2, so as to make an output of the differential amplifier 22 held in the clamp capacitance 23 via the MOS transistor 25 for switching, the maximum value detection circuit (the minimum value detection circuit), and the MOS transistor 27 for switching. The signal held in the clamp capacitance contains offset components of the differential amplifiers constituting the maximum value detection circuit and the minimum value detection circuit. Accordingly, when the signal from the differential amplifier 22 is inputted into the clamp circuit and outputted via the maximum value detection circuit and the minimum value detection circuit, the signal whose offset components of the differential amplifiers are eliminated can be outputted. The maximum value output is outputted to the AGC circuit by turning on all of the MOS switches 31 for maximum value output by φPEAK. The minimum value output is outputted to the common output line 36 by turning on all of the MOS switches 32 for minimum value output via the OR circuits 33 by φBTM. The AF signal is also outputted to the common output line 36 by turning on the MOS switches 32 for minimum value output successively by the scanning circuit via the OR circuits 33 (at this time, the minimum value detection circuit is operated as the AF output circuit). When the minimum value detection circuit 30 outputs a minimum value, the MOS 38 of constant current in
In the above described circuit configuration, a feedback type noise clamp circuit which is provided for a preceding stage of each of the maximum value detection circuit and the minimum value detection circuit, makes it possible to eliminate the reset noise generated in the photodiode and the FPN generated in the sensor amplifier, the maximum value detection circuit, and the minimum value detection circuit. Also, a voltage follower circuit whose final output stage is constituted in the source follower form, is provided for each pixel, and at the time of minimum value output, a constant current source for the output stage of each voltage follower is turned off, and each voltage follower is commonly connected to the output line connected to a constant current source, as a result of which the minimum value of the AF sensor signal can be obtained. When the AF sensor signal is outputted, the constant current source connected to the output stage of each voltage follower is turned on, so as to make each voltage follower circuit successively connected to the output line, as a result of which serial AF sensor signals can be obtained. With the above described operation, the minimum value detection circuit can be operated as the signal output circuit, as a result of which the chip size can be reduced.
Next, an effect of the arrangement of the linear sensor for standard portion and the linear sensor for reference portion of the fifth and the sixth paired linear sensors L5, L6, is explained.
In the comparative example shown in
In this way, when the base lines are made to overlap with each other, the base line length B′ becomes doubled (B′=2×B), in spite of the same area as the comparative example.
In the case where AGC (automatic gain control) is performed to linear sensors provided for a same range finding point in driving the AF sensor, the followings are considered when one of the paired linear sensors is arranged between the other paired linear sensors, as in the present embodiment. That is, in the case where a CCD is used as the photoelectric conversion element, there is a possibility that the layout of charge transfer path becomes complicated so as to increase the chip size. However, the use of CMOS linear sensor enables the output line to be freely laid out with metallic wiring, and hence the overlap wiring for connecting the reading circuits to the AGC circuits 6-5, 6-6 can also be laid out easily, as shown in
In general, there is an adverse effect that an increase in the number of the paired linear sensors causes the AF sensor to become slow in operation speed. However, in the present embodiment, as shown in
All of the photodiode arrays 2 constituting the linear sensors are preferably made to have a same size, which makes it possible to reduce the development load, the development period and the development cost. In addition, the photoelectric conversion characteristics of the photodiode arrays 2 are also made to be uniform, so that a compensation system (for sensibility variation, shading, and the like) can also be simplified.
In present embodiment, the solid-state image sensor for automatic focus having a highly precise automatic focus capability can be realized, even by using the manufacturing process and design rules which are the same as before. In addition, the fact that the chip size need not be enlarged, is also advantageous for reducing the cost.
Of course, the present invention is also applicable for VMIS (Threshold Voltage Modulation Image Sensor), BCAST (Buried Charge Accumulator and Sensing Transistor array), LBCAST (Lateral Buried Charge Accumulator and Sensing Transistor array), and the like. In particular, the present invention can be implemented for the BCAST and the LBCAST by replacing the MOS transistors for amplification with JFET transistors, without any substantial modification.
Second EmbodimentIn the first embodiment, spaces between each of the photodiode arrays serve as an element isolation area (for example, LOCOS area), but in the present embodiment, dummy pixels are provided for the spaces. The provision of the dummy pixels 11 makes the layout pattern uniform (making the wiring density and active areas formed in a uniform manner), so that the working precision of the process can be improved so as to increase the yield. According to the present embodiment, a solid-state image sensor for automatic focus with an increased yield can be provided.
Third EmbodimentAs shown in
In present embodiment, the linear sensors for standard portion (the line 6-standard portion, the line 7-standard portion) of the sixth and the seventh paired linear sensors are arranged between the linear sensor for standard portion (the line 5-standard portion) and the linear sensor for reference portion (the line 5-reference portion) of the fifth paired linear sensors. Further, the linear sensor for standard portion (the line 7-standard portion) of the seventh paired linear sensors and the linear sensor for reference portion (the line 5-reference portion) of the fifth paired linear sensors are arranged between the linear sensor for standard portion (the line 6-standard portion) and the linear sensor for reference portion (the line 6-reference portion) of the sixth paired linear sensors. Further, the linear sensors for reference portion (line 5-reference portion, line 6-reference portion) of the fifth and the sixth paired linear sensors are arranged between the linear sensor for standard portion (line 7-standard portion) and the linear sensor for reference portion (line 7-reference portion) of the seventh paired linear sensors.
In the arrangement shown in
In the tenth to twelfth paired linear sensors, the linear sensor for standard portion and the linear sensor for reference portion are also arranged in the same manner as those in the fifth to the seventh paired linear sensors.
In the present embodiment, it is possible to make the base line length 3 times the conventional one, by making the baselines of three linear sensors overlap with each other. Of course, four or more linear sensors may also be made to overlap with each other. In addition, as shown in
In the present embodiment, it is possible to realize a single lens reflex camera having a higher automatic focus precision than the conventional one, by using the solid-state image sensor for automatic focus as described in the first to the third embodiments, without increasing the cost. It is obvious that the present invention is applicable for any TTL-SIR type AF camera, regardless of whether the camera is an analog camera or a digital camera.
The present invention can be used for a device provided with a TTL-SIR (Through The Lens Secondary Imaged Registration) type automatic focus sensor, for example, an automatic-focus camera, and the like.
This application claims priority from Japanese Patent Application No. 2004-246797 filed on Aug. 26, 2004, which is hereby incorporated by reference herein.
Claims
1. (canceled)
2. The sensor for automatic focus according to claim 10, wherein said linear sensors for standard portion and said linear sensors for reference portion of said first and second paired linear sensors are arranged on a same straight line.
3. The sensor for automatic focus according to claim 10, wherein an area in which said linear sensor for standard portion is arranged and an area in which said linear sensor for reference portion is arranged are adjacent to each other.
4. The sensor for automatic focus according to claim 10, wherein each of the linear sensors comprises a pixel of a same size.
5. The sensor for automatic focus according to claim 10, wherein a storage period of photoelectric charge of each photoelectric conversion element in said first and second paired linear sensors is independently controlled.
6. The sensor for automatic focus according to claim 5, wherein said photoelectric conversion element is an amplification type photoelectric conversion element, and wherein the storage period control is performed in real time by using the amplification type photoelectric conversion element.
7. The sensor for automatic focus according to claim 6, comprising a CMOS solid-state image sensor which can be manufactured by a CMOS process.
8. An automatic focus camera comprising the sensor according to claim 10.
9. The sensor for automatic focus according to claim 2, wherein an area in which said linear sensor for standard portion is arranged and an area in which said linear sensor for reference portion is arranged are adjacent to each other.
10. A sensor for automatic focus having at least first and second paired linear sensors, each comprising a linear sensor for standard portion and a linear sensor for reference portion for performing phase difference detection type focus detection, the linear sensor for standard portion of said second paired linear sensors being arranged between the linear sensor for standard portion and the linear sensor for reference portion of said first paired linear sensors, the linear sensor for reference portion of said first paired linear sensors being arranged between the linear sensor for standard portion and the linear sensor for reference portion of said second paired linear sensors, and a photodiode of a dummy pixel being provided for at least one of portions between said linear sensor for standard portion and said linear sensor for reference portion, which are adjacent to each other, between said plural linear sensors for standard portion, and between said plural linear sensors for reference portion.
11. The sensor for automatic focus according to claim 10, wherein the sensor is a solid-state image sensor.
Type: Application
Filed: Sep 22, 2008
Publication Date: Jan 29, 2009
Applicant: CANON KABUSHIKI KAISHA (Tokyo)
Inventor: Hidekazu Takahashi (Zama-shi)
Application Number: 12/234,787
International Classification: G03B 13/32 (20060101);