Coarse Grid Design Methods and Structures

Abstract

A layer of a mask material is deposited on a substrate. A beam of energy is scanned across the mask material in a rasterized linear pattern and in accordance with a scan pitch that is based on a pitch of conductive structure segments to be formed on the substrate. The beam of energy is defined to transform the mask material upon which the beam of energy is incident into a removable state. During scanning the beam of energy across the mask material, the beam of energy is turned on at locations where a conductive structure is to be formed on the substrate, and the beam of energy is turned off at locations where a conductive structure is not to be formed on the substrate.

Description

CLAIM OF PRIORITY

This application is a continuation application under 35 U.S.C. 120 of prior U.S. application Ser. No. 15/150,152, filed May 9, 2016, and issued as U.S. Pat. No. 9,917,056, on Mar. 13, 2018, which is a continuation application under 35 U.S.C. 120 of prior U.S. application Ser. No. 14/187,088, filed Feb. 21, 2014, and issued as U.S. Pat. No. 9,336,344, on May 10, 2016, which is a continuation application under 35 U.S.C. 120 of prior U.S. application Ser. No. 13/473,439, filed May 16, 2012, and issued as U.S. Pat. No. 8,658,542, on Feb. 25, 2014, which:

1) claims priority under 35 U.S.C. 119(e) to U.S. Provisional Patent Application No. 61/487,247, filed May 17, 2011, and

2) is also a continuation-in-part application under 35 U.S.C. 120 of prior U.S. application Ser. No. 12/572,022, filed Oct. 1, 2009, issued as U.S. Pat. No. 8,253,173, on Aug. 28, 2012, which is a continuation application under 35 U.S.C. 120 of prior U.S. application Ser. No. 12/212,562, filed Sep. 17, 2008, issued as U.S. Pat. No. 7,842,975, on Nov. 30, 2010, which is a continuation application under 35 U.S.C. 120 of prior U.S. application Ser. No. 11/683,402, filed Mar. 7, 2007, issued as U.S. Pat. No. 7,446,352, on Nov. 4, 2008, which claims priority under 35 U.S.C. 119(e) to U.S. Provisional Patent Application No. 60/781,288, filed Mar. 9, 2006, and

3) is also a continuation-in-part application under 35 U.S.C. 120 of prior U.S. application Ser. No. 13/073,994, filed Mar. 28, 2011, issued as U.S. Pat. No. 8,356,268, on Jan. 15, 2013, which is a continuation application under 35 U.S.C. 120 of prior U.S. application Ser. No. 12/013,342, filed Jan. 11, 2008, issued as U.S. Pat. No. 7,917,879, on Mar. 29, 2011, which claims priority under 35 U.S.C. 119(e) to each of A) U.S. Provisional Patent Application No. 60/963,364, filed Aug. 2, 2007, and B) U.S. Provisional Patent Application No. 60/972,394, filed Sep. 14, 2007, and

4) is also a continuation-in-part application under 35 U.S.C. 120 of prior U.S. application Ser. No. 12/753,795, filed Apr. 2, 2010, issued as U.S. Pat. No. 8,258,581, on Sep. 4, 2012, which is a continuation application under 35 U.S.C. 120 of prior U.S. application Ser. No. 12/402,465, filed Mar. 11, 2009, issued as U.S. Pat. No. 7,956,421, on Jun. 7, 2011, which claims priority under 35 U.S.C. 119(e) to each of A) U.S. Provisional Patent Application No. 61/036,460, filed Mar. 13, 2008, and B) U.S. Provisional Patent Application No. 61/042,709, filed Apr. 4, 2008, and C) U.S. Provisional Patent Application No. 61/045,953, filed Apr. 17, 2008, and D) U.S. Provisional Patent Application No. 61/050,136, filed May 2, 2008.

Each of the above-identified patent applications and patents is incorporated herein by reference in its entirety.

BACKGROUND

Until recently, integrated circuit (IC) scaling has been enabled to a large extent by improvements in photolithography equipment resolution and overlay. The resolution capability of the photolithography equipment was such that random logical functions could be drawn with two-dimensional (2D) bent shapes, with few restrictions on shape dimensions or relationships between shapes.

Traditional 2D designs have layout shape edges which can fall on a very fine grid, such as on a 1 nm (nanometer) grid, by way of example. A direct writing tool using a raster pattern needs to write along the finest grid on each design/pattern layer of an integrated circuit device (sometimes called a mask layer) in order to correctly place all edges of the layout shapes. Also, 2D layout patterns need to be written completely in two directions, resulting in a large amount of data for each layer to be written. It is within this context that the present invention arises.

SUMMARY

In one embodiment, a method is disclosed for fabricating an integrated circuit. The method includes depositing a layer of a mask material on a substrate. The method also includes scanning a beam of energy across the mask material in a rasterized linear pattern and in accordance with a scan pitch that is based on a pitch of conductive structure segments to be formed on the substrate. The beam of energy is defined to transform the mask material upon which the beam of energy is incident into a removable state. During scanning the beam of energy across the mask material, the beam of energy is turned on at locations where a conductive structure is to be formed on the substrate, and the beam of energy is turned off at locations where a conductive structure is not to be formed on the substrate.

In one embodiment, a method is disclosed for fabricating an integrated circuit. The method includes depositing a layer of a mask material on a substrate. The method also includes scanning a beam of energy across the mask material in a rasterized linear pattern and in accordance with a scan pitch that is equal to at least a width of the beam of energy as measured in a direction perpendicular to a scan direction of the beam of energy. The beam of energy is defined to transform the mask material upon which the beam of energy is incident into a removable state. During scanning the beam of energy across the mask material, the beam of energy is turned on at locations where a conductive structure is to be formed on the substrate, and the beam of energy is turned off at locations where a conductive structure is not to be formed on the substrate.

Other aspects and advantages of the invention will become more apparent from the following detailed description, taken in conjunction with the accompanying drawings, illustrating by way of example the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a plan view of a portion of a gate electrode layer of an example logic circuit, in accordance with one embodiment of the present invention.

FIG. 2 shows a plan view of a possible scan pattern used to write “cuts” in the gate lines of the portion of the gate electrode layer of FIG. 1, in accordance with one embodiment of the present invention.

FIG. 3 shows a plan view of another possible scan pattern used to write the cuts in the gate lines of the portion of the gate electrode layer of FIG. 1, in accordance with one embodiment of the present invention.

FIG. 4 shows a plan view of a portion of a gate electrode layer of an example logic circuit block including three rows of logic cells in a column, in accordance with one embodiment of the present invention.

FIG. 5 shows a plan view of a possible scan pattern used to write the cuts in the portion of the gate electrode layer of FIG. 4, in accordance with one embodiment of the present invention.

FIG. 6 shows a plan view of a portion of a gate electrode layer and a corresponding portion of a contact layer of an example logic circuit, in accordance with one embodiment of the present invention.

FIG. 7 shows a plan view of a possible scan pattern used to write the diffusion and gate contacts in the example logic circuit of FIG. 6, in accordance with one embodiment of the present invention.

FIG. 8 shows a plan view of a portion of a gate electrode layer and a corresponding portion of a diffusion/active layer of an example circuit, in accordance with one embodiment of the present invention.

FIG. 9 shows a plan view of a possible scan pattern used to write the diffusion/active regions in the example circuit of FIG. 8, in accordance with one embodiment of the present invention.

FIG. 10 shows a plan view of another possible scan pattern used to write the diffusion/active regions in the example circuit of FIG. 8, in accordance with one embodiment of the present invention.

FIG. 11 shows a plan view of a portion of a gate electrode layer and a corresponding portion of a diffusion/active layer of an example circuit, in accordance with one embodiment of the present invention.

FIG. 12 shows a plan view of a possible scan pattern used to write the diffusion/active regions in the example circuit of FIG. 11, in accordance with one embodiment of the present invention.

FIG. 13 shows a plan view of a portion of a gate electrode layer of an example circuit that includes non-uniform gate line widths, in accordance with one embodiment of the present invention.

FIG. 14 shows a plan view of a possible scan pattern used to write the gate lines in the example circuit of FIG. 13, in accordance with one embodiment of the present invention.

FIG. 15 shows a plan view of a portion of a gate electrode layer of an example circuit that includes non-uniform gate line widths and a conductive line segment oriented perpendicular to the gate lines, in accordance with one embodiment of the present invention.

FIG. 16 shows a plan view of a possible scan pattern used to write the gate lines in the example circuit of FIG. 15, in accordance with one embodiment of the present invention.

FIG. 17 shows a flowchart of a method of fabricating an integrated circuit, in accordance with one embodiment of the present invention.

FIG. 18 shows a flowchart of a method of fabricating an integrated circuit, in accordance with one embodiment of the present invention.

DETAILED DESCRIPTION

In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without some or all of these specific details. In other instances, well known process operations have not been described in detail in order not to unnecessarily obscure the present invention.

As optical lithography has reached a cost-driven limit of the 193 nm ArF excimer laser light source and a lens numerical aperture of 0.93 (or 1.35 for water immersion systems), other approaches are required for fabrication of smaller IC feature sizes. One approach is spacer double patterning (SDP), in which the layout pattern is split into two parts, each of which can be processed with optical lithography equipment. With spacer double/triple/quadruple/etc. patterning, pitch division can extend line patterns to smaller and smaller feature sizes until some other limit is reached. The SDP approach uses the following sequence to reduce the pattern pitch by a factor of two:

• • 1. standard optical lithography to pattern a “core”
  • 2. etch the core and remove the resist
  • 3. deposit a different material which can be etched selectively relative to the core
  • 4. etch the deposited film, leaving sidewall material and the core
  • 5. etch the core, leaving only the sidewall material
  • 6. cut the sidewall material to create separate parts
  • 7. etch the underlying material using the sidewall material as the mask
  • 8. remove the sidewall material, leaving the underlying material with the desired pattern.

A method of chip design and fabrication is described herein which uses a coarse grid layout. The coarse grid methods described herein may be implemented with or without the multiple patterning approach discussed above. In the coarse grid method, lines, cuts, and holes are positioned on the coarse grid. The coarse grid has a granularity set by the requirements of a particular IC layer. Structures to be fabricated on a semiconductor wafer are specified by lines, cuts, holes, or any combination thereof, on a coarse grid. In one example embodiment, the layout pattern of the structures to be fabricated can include one-dimensional (1D) lines and cuts and holes, as needed. In another example embodiment, the layout pattern of the structures to be fabricated can include 1D line segments and holes, as needed. In another example embodiment, the layout pattern of the structures to be fabricated can be 1D and 2D coarse-grid line segments and holes, as needed. The coarse grid applied to cuts and holes is also extendable. With electron beams, a feature size limit is on the order of less than 10 nm.

FIG. 1 shows a plan view of a portion of a gate electrode layer of an example logic circuit, in accordance with one embodiment of the present invention. The portion of the gate electrode layer includes gate lines 101, 103, 105, 107, 109, 111, 113, 115. Each gate line 101, 103, 105, 107, 109, 111, 113, 115 is defined to extend lengthwise in a first direction (Y direction). It should be understood that the gate lines correspond to conductive structures formed within the portion of the gate electrode layer. The gate lines 101, 103, 105, 107, 109, 111, 113, 115 in the example of FIG. 1 are shown to have uniform gate line-widths W, as measured in a second direction (X direction) substantially perpendicular to the first direction (Y direction).

FIG. 2 shows a plan view of a possible scan pattern used to write “cuts” 213, 215 in the gate lines of the portion of the gate electrode layer of FIG. 1, in accordance with one embodiment of the present invention. Scan lines 201, 203, 205, 207, 209, 211 are centered and co-linear with a gate line pattern corresponding to the gate lines 101, 103, 105, 107, 109, 111, 113, 115. The scan pattern also includes retrace lines 202, 204, 206, 208, 210. The beam is turned on at the cut 213, 215 locations. The shape of the cuts 213, 215 as shown in FIG. 2 is provided by way of example. In various embodiments, the shape of the cuts 213, 215 can be rectangular or oval, among other shapes, as long as a size of the cut 213, 215 as measured in a direction perpendicular to the scan lines, i.e., X direction in FIG. 2, is large enough to overlap the line to be cut, even with worst-case layer-to-layer overlay misalignment. It should be understood that the flexibility in the shape of the cuts 213, 215 applies to other cuts discussed hereafter.

FIG. 3 shows a plan view of another possible scan pattern used to write the cuts 213, 215 in the gate lines of the portion of the gate electrode layer of FIG. 1, in accordance with one embodiment of the present invention. Scan lines 301, 303, 305, 307, 309, 311 are centered and co-linear with the gate line pattern corresponding to the gate lines 101, 103, 105, 107, 109, 111, 113, 115. The scan pattern also includes retrace lines 302, 303, 306, 308, 310. The beam is turned on at the cut 213, 215 locations.

FIG. 4 shows a plan view of a portion of a gate electrode layer of an example logic circuit block including three rows of logic cells in a column, in accordance with one embodiment of the present invention. A first row 490 of logic cells includes gate lines 401, 402, 403, 404, 405, 406. A second row 491 of logic cells includes gate lines 411, 412, 413, 414, 415, 416, 417, 418. A third row 492 of logic cells includes gate lines 421, 422, 423, 424, 425, 426, 427, 428. Cuts 531A-536A, 531B-536B, 531C-536C, 531D-536D, 532E-534E, 534F are formed in the gate lines on a common coarse grid in the X direction. In one embodiment, Metal-1 horizontal lines 451-481 corresponding to Metal-1 conductive structures are shown by the dashed rectangles. In various embodiments, the cuts 531A-536A, 531B-536B, 531C-536C, 531D-536D, 532E-534E, 534F can be positioned either on the Y grid formed by the Metal-1 horizontal lines 451-481 or not, depending on the beam writer resolution along a raster line.

FIG. 5 shows a plan view of a possible scan pattern used to write the cuts 531A-536A, 531B-536B, 531C-536C, 531D-536D, 532E-534E, 534F in the portion of the gate electrode layer of FIG. 4, in accordance with one embodiment of the present invention. Scan lines 531, 532, 533, 534, 535, 536 are centered and co-linear with the gate line pattern corresponding to the gate lines 401, 402, 403, 404, 405, 406, 411, 412, 413, 414, 415, 416, 417, 418, 421, 422, 423, 424, 425, 426, 427, 428. The retrace lines are not shown in FIG. 5 to avoid cluttering the figure. However, it should be understood that the retrace lines in the example of FIG. 5 could be implemented as shown in the example embodiments of either FIG. 2 or FIG. 3. Also, it should be understood that the beam scan lines 531, 532, 533, 534, 535, 536 and initial lines of the gate electrodes may extend above and below the top and bottom rows of cuts.

FIG. 6 shows a plan view of a portion of a gate electrode layer and a corresponding portion of a contact layer of an example logic circuit, in accordance with one embodiment of the present invention. The portion of the gate electrode layer includes gate lines 601, 602, 603, 604, 605, 606, 607, 608 defined to extend lengthwise in a first direction Y. In one embodiment, Metal-1 horizontal lines 651-661 corresponding to Metal-1 conductive structures are shown by the dashed rectangles. In one embodiment, the Metal-1 horizontal lines 651-661 are centered on a fixed pitch (M1P) as measured in the Y direction. FIG. 6 also shows diffusion contacts 711, 712, 713, 714, 715 corresponding to conductive structures formed to physically contact a diffusion region, i.e., active region, underlying the portion of the gate electrode layer. For clarity, the diffusion/active regions are not shown in FIG. 6. FIG. 6 also shows gate contacts 721, 722, 723, 724, 725 corresponding to conductive structures formed to physically contact a conductive structure corresponding to gate lines 603, 604, 607, 602, 608, respectively.

FIG. 7 shows a plan view of a possible scan pattern used to write the diffusion and gate contacts (711-715, 721-725) in the example logic circuit of FIG. 6, in accordance with one embodiment of the present invention. The scan pattern includes scan lines 731-741. The retrace lines are not show in FIG. 7 to avoid cluttering the figure. However, it should be understood that the retrace lines in the example of FIG. 7 could be implemented in a manner similar to that shown in the example embodiments of either FIG. 2 or FIG. 3. The scan lines 731-741 may extend to the left and right of the logic cell or row of logic cells within which the example logic circuit resides. Also, it should be appreciated that the scan lines 731-741 are oriented in the horizontal direction, i.e., X direction, to reduce the number of scan lines needed.

For example, since there are both diffusion and gate contacts (711-715, 721-725) to be formed, the X pitch (CPX) of the contact scan is one-half of the gate pitch (P) as shown in FIG. 6. Also, since the diffusion and gate contacts (711-715, 721-725) are to be placed along a metal line, the Y pitch (CPY) of the contact scan is substantially equal to the Metal-1 pitch (M1P) as shown in FIG. 6. In one embodiment, a width (W) of the gate lines 601-608 is about 22 nm (nanometers). In this embodiment, the gate pitch (P) is about 90 nm, and the Metal-1 pitch (M1P) is about 70 nm. Because the Metal-1 pitch (M1P) of about 70 nm is larger than one-half of the gate pitch (P) (90 nm/2=45 nm), then a given area of the scan pattern can be covered with fewer scan lines using a scan pattern oriented in the horizontal direction (X direction), with a Y pitch (CPY) of the contact scan that is substantially equal to the Metal-1 pitch (M1P). Although the horizontal scan shown in FIG. 7 requires fewer scan lines, it should be understood that a vertical scan direction (Y direction) may be chosen if there are other constraints such as equipment hardware limitations.

FIG. 8 shows a plan view of a portion of a gate electrode layer and a corresponding portion of a diffusion/active layer of an example circuit, in accordance with one embodiment of the present invention. The example circuit of FIG. 8 may be either a logic circuit or a memory circuit. The portion of the gate electrode layer includes gate lines 801-808 defined to extend lengthwise in a first direction Y. The gate lines 801-808 are centered on a gate pitch (P) as measured in the X direction. In one embodiment, Metal-1 horizontal lines 851-859 corresponding to Metal-1 conductive structures are shown by the dashed rectangles. In one embodiment, the Metal-1 horizontal lines 851-859 are centered on a fixed pitch (M1P) as measured in the Y direction.

FIG. 8 also shows diffusion/active regions 821 and 823. As shown in FIG. 8, the diffusion/active regions can be divided into strips which each have a width as measured in the Y direction that is a fraction of the Metal-1 pitch (M1P). For example, in some embodiments, the strips into which the diffusion/active regions 821, 823 are divided have a width as measured in the Y direction that is either one-fourth (¼) or one-eighth (⅛) of the Metal-1 pitch (M1P). In the example of FIG. 8, the centers of the diffusion/active regions 821, 823 are vertically aligned, such that a single line extending in the Y direction passes through the centers of the diffusion/active regions 821, 823. However, it should be understood that in other embodiments the diffusion/active regions 821, 823 may not be vertically aligned.

FIG. 9 shows a plan view of a possible scan pattern used to write the diffusion/active regions 821, 823 in the example circuit of FIG. 8, in accordance with one embodiment of the present invention. The scan pattern includes scan lines 901-934. The retrace lines are not show in FIG. 9 to avoid cluttering the figure. However, it should be understood that the retrace lines in the example of FIG. 9 could be implemented in a manner similar to that shown in the example embodiments of either FIG. 2 or FIG. 3. The scan lines 901-934 are oriented in the horizontal direction (X direction) and may extend to the left and/or right of the logic/memory cell or row of logic/memory cells in which the example circuit is formed. In this example embodiment, the scan direction is perpendicular to a length direction of the gate lines 801-808. The example scan pattern shown in FIG. 9 has a scan pitch (DSP) as measured in the Y direction that is one-fourth (¼) of the Metal-1 pitch (M1P) as measured in the Y direction. A scan beam cross-section 940 size as measured in the Y direction is equal to a width of a scan line plus some small extension (e.g., 1 nm to 5 nm, by way of example) to account for overlay as the beam is scanned side-to-side.

As shown in FIG. 9, scan lines 908-913 and 922-927 require switching of the beam (“on” for negative photoresist, “off” for positive photoresist) to produce strips of the diffusion/active regions 823 and 821, respectively. Also, scan lines 901-907, 914-921, 928-934 do not require switching of the beam. It should be appreciated that the scan pitch (DSP), i.e., raster size, of one-fourth of the Metal-1 pitch (M1P) is still relatively coarse as compared to a 1 nm or finer scan pitch that is required to draw/form conventional diffusion/active regions.

FIG. 10 shows a plan view of another possible scan pattern used to write the diffusion/active regions 821, 823 in the example circuit of FIG. 8, in accordance with one embodiment of the present invention. The scan pattern includes scan lines 1001-1008. The scan lines 1001-1008 are oriented in the vertical direction (Y direction) and may extend above and/or below the logic/memory cell or row of logic/memory cells in which the example circuit is formed. In this example embodiment, the scan direction is parallel to a length direction of the gate lines 801-808. The retrace lines are not shown in FIG. 10 to avoid cluttering the figure. However, it should be understood that the retrace lines in the example of FIG. 10 could be implemented in a manner similar to that shown in the example embodiments of either FIG. 2 or FIG. 3.

The example scan pattern shown in FIG. 10 has a scan pitch (DSP1) as measured in the X direction that is substantially equal to a pitch (P) of the gate lines 801-808 as measured in the X direction as shown in FIG. 8. In one embodiment, a scan beam cross-section 1011 size as measured in the X direction is substantially equal to the pitch (P) of the gate lines 801-808 plus some small extension (e.g., 1 nm to 5 nm, by way of example) to account for overlay as the beam is scanned vertically in the Y direction.

As shown in FIG. 10, scan lines 1002-1007 require switching of the beam (“on” for negative photoresist, “off” for positive photoresist) to produce strips of the diffusion/active regions 821 and 823. Also, scan lines 1001 and 1008 do not require switching of the beam. It should be appreciated that the scan pitch (DSP1), i.e., raster size, which is substantially equal to the gate pitch (P) is very coarse as compared to a 1 nm or finer scan pitch that is required to draw/form conventional diffusion/active regions. It should also be appreciated that for vertical scanning in the Y direction (parallel to the length direction of the gate lines 801-808), the diffusion/active region 821, 823 edge placement depends on the timing accuracy of the beam switching (i.e., beam turning on or off depending on the type of photoresist used) and is not necessarily tied to a fraction of the Metal-1 pitch, such as discussed above with regard to the example scan pattern of FIG. 9.

FIG. 11 shows a plan view of a portion of a gate electrode layer and a corresponding portion of a diffusion/active layer of an example circuit, in accordance with one embodiment of the present invention. The example circuit of FIG. 11 may be either a logic circuit or a memory circuit. The portion of the gate electrode layer includes gate lines 1101-1108 defined to extend lengthwise in a first direction (Y direction). The gate lines 1101-1108 are centered on a gate pitch (P) as measured in the X direction. In one embodiment, Metal-1 horizontal lines 1151-1159 corresponding to Metal-1 conductive structures are shown by the dashed rectangles. In one embodiment, the Metal-1 horizontal lines 1151-1159 are centered on a fixed pitch (M1P) as measured in the Y direction.

FIG. 11 also shows diffusion/active regions 1121, 1123, 1125, 1127. In the example of FIG. 11, the centers of the diffusion/active regions 1125 and 1127 are vertically aligned and the centers of diffusion/active regions 1121 and 1123 are vertically aligned, such that a single line extending in the Y direction passes through the centers of the diffusion/active regions 1125 and 1127, and such that another single line extending in the Y direction passes through the centers of the diffusion/active regions 1121 and 1123. However, it should be understood that in other embodiments the diffusion/active regions 1125 and 1127 and/or 1121 and 1123 may not be vertically aligned so long as their respective vertical edges are positioned according to a coarse grid of the scan pattern.

For horizontal scanning in the X direction (perpendicular to the gate lines 1101-1108), the diffusion/active regions 1121, 1123, 1125, 1127 can be divided into strips which each have a width as measured in the Y direction that is a fraction of the Metal-1 pitch (M1P). For example, in some embodiments, the strips into which the diffusion/active regions 1121, 1123, 1125, 1127 are divided have a width as measured in the Y direction that is either one-fourth (¼) or one-eighth (⅛) of the Metal-1 pitch (M1P). For vertical scanning in the Y direction (parallel to the gate lines 1101-1108) the horizontal edge placement of the diffusion/active regions 1121, 1123, 1125, 1127 depends on the timing accuracy of the beam switching (i.e., beam turning on or off depending on the type of photoresist used) and is not necessarily tied to a fraction of the Metal-1 pitch, such as discussed above with regard to the example scan pattern of FIG. 9.

FIG. 12 shows a plan view of a possible scan pattern used to write the diffusion/active regions 1121, 1123, 1125, 1127 in the example circuit of FIG. 11, in accordance with one embodiment of the present invention. The scan pattern includes scan lines 1201-1214. The scan lines 1201-1214 are oriented in the vertical direction (Y direction) and may extend above and/or below the logic/memory cell or row of logic/memory cells in which the example circuit is formed. In this example embodiment, the scan direction is parallel to a length direction of the gate lines 1101-1108. The retrace lines are not shown in FIG. 12 to avoid cluttering the figure. However, it should be understood that the retrace lines in the example of FIG. 12 could be implemented in a manner similar to that shown in the example embodiments of either FIG. 2 or FIG. 3.

The example scan pattern shown in FIG. 12 has a scan pitch (DSP2) as measured in the X direction that is substantially equal to one-half (½) of the gate pitch (P) of the gate lines 1101-1108 as measured in the X direction as shown in FIG. 11. Therefore, each of the scan lines 1201-1214 is substantially aligned with either a lengthwise centerline of one of the gate lines 1101-1108, or one of the midpoint locations between the lengthwise centerlines of a neighboring pair of the gate lines 1101-1108.

In one embodiment, a scan beam cross-section 1231 size as measured in the X direction is substantially equal to one-half (½) of the gate pitch (P) of the gate lines 801-808 plus some small extension (e.g., 1 nm to 5 nm, by way of example) to account for overlay as the beam is scanned vertically in the Y direction. As shown in FIG. 12, scan lines 1202-1210 and 1212 require switching of the beam (“on” for negative photoresist, “off” for positive photoresist) to produce strips of the diffusion/active regions 1121, 1123, 1125, 1127. Also, scan lines 1201, 1211, 1214 do not require switching of the beam.

It should be appreciated that the scan pitch (DSP2), i.e., raster size, which is substantially equal to one-half (½) of the gate pitch (P) is very coarse as compared to a 1 nm or finer scan pitch that is required to draw/form conventional diffusion/active regions. It should also be appreciated that for vertical scanning in the Y direction (parallel to the length direction of the gate lines 1101-1108), the edge placement of the diffusion/active regions 1121, 1123, 1125, 1127 depends on the timing accuracy of the beam switching (i.e., beam turning on or off depending on the type of photoresist used) and is not necessarily tied to a fraction of the Metal-1 pitch, such as discussed above with regard to the example scan pattern of FIG. 9. Therefore, the final vertical sizes of the diffusion/active regions 1121, 1123, 1125, 1127 are determined by the accuracy of the beam switching.

FIG. 13 shows a plan view of a portion of a gate electrode layer of an example circuit that includes non-uniform gate line widths, in accordance with one embodiment of the present invention. The example circuit of FIG. 13 may be either a logic circuit or a memory circuit. The portion of the gate electrode layer includes gate lines 1301-1308. It should be understood that the gate lines 1301-1308 correspond to conductive structures formed within the portion of the gate electrode layer. Each gate line 1301-1308 is defined to extend lengthwise in a first direction Y. Gate lines 1301, 1302, 1304, 1306, 1308 have a first width (W1) as measured in the X direction. Gate lines 1303, 1305, 1307 have a second width (W2) as measured in the X direction. The second width (W2) is different than the first width (W1). In one embodiment, Metal-1 horizontal lines 1351-1361 corresponding to Metal-1 conductive structures are shown by the dashed rectangles. In one embodiment, the Metal-1 horizontal lines 1351-1361 are centered on a fixed pitch (M1P) as measured in the Y direction.

FIG. 14 shows a plan view of a possible scan pattern used to write the gate lines 1301-1308 in the example circuit of FIG. 13, in accordance with one embodiment of the present invention. The scan pattern includes scan lines 1401-1421. The retrace lines are not shown in FIG. 14 to avoid cluttering the figure. However, it should be understood that the retrace lines in the example of FIG. 14 could be implemented in a manner similar to that shown in the example embodiments of either FIG. 2 or FIG. 3. The scan lines 1401-1421 are oriented in the horizontal direction (X direction) and may extend to the left and/or right of the logic/memory cell or row of logic/memory cells in which the example circuit is formed. In this example embodiment, the scan direction is perpendicular to a length direction of the gate lines 1301-1308.

The example scan pattern shown in FIG. 14 has a scan pitch (SP2) as measured in the Y direction that is one-half (½) of the Metal-1 pitch (M1P) as measured in the Y direction. A scan beam cross-section 1441 size as measured in the Y direction is equal to a width of a scan line (about one-half (½) of the Metal-1 pitch (M1P)) plus some small extension (e.g., 1 nm to 5 nm, by way of example) to account for overlay as the beam is scanned side-to-side.

As shown in FIG. 14, scan lines 1402-1419 require switching of the beam (“on” for negative photoresist, “off” for positive photoresist) to produce portions of the gate lines 1301-1308. Also, scan lines 1401 and 1421 do not require switching of the beam. Each of scan lines 1402-1420 is switched to create portions of the gate lines 1301-1308 of the different widths W1, W2. Also, each of scan lines 1411 and 1415 is switched to create end gaps 1451 and 1452, respectively. In this embodiment, the beam switching has a sufficient temporal resolution to allow for writing/creating the portions of the gate lines 1301-1308 of different widths W1, W2.

It should be appreciated that the scan pitch (SP2), i.e., raster size, of one-half (½) of the Metal-1 pitch (M1P) (e.g., SP2=35 nm for 22 nm CMOS node) is still relatively coarse as compared to a 1 nm or finer scan pitch that is required to draw/form conventional gate lines. It should also be appreciated that while the scan pitch (SP2) is not as large, i.e., coarse, as the scan pitch shown in the examples of FIG. 2 or 3, the scan pitch (SP2) and corresponding scan pattern of FIG. 14 allow for writing/creating lines of different widths, as measured in the scan direction, which can be important in forming gate lines and/or diffusion/active regions. In one embodiment, in order to control the beam switching precisely enough to provide sufficient critical dimension (CD) control as required for gate electrode formation, the beam scanning may be performed in a uni-directional manner, as opposed to the bi-directional manner shown in FIG. 14.

FIG. 15 shows a plan view of a portion of a gate electrode layer of an example circuit that includes non-uniform gate line widths and a conductive line segment oriented perpendicular to the gate lines, in accordance with one embodiment of the present invention. The portion of the gate electrode layer includes gate lines 1501-1508. It should be understood that the gate lines 1501-1508 correspond to conductive structures formed within the portion of the gate electrode layer. Each gate line 1501-1508 is defined to extend lengthwise in a first direction Y. Gate lines 1501, 1502, 1504, 1506, 1508 have a first width (W1) as measured in the X direction. Gate lines 1503, 1505, 1507 have a second width (W2) as measured in the X direction. The second width (W2) is different than the first width (W1). The portion of the gate electrode layer also includes the conductive line segment 1511 oriented in the X direction perpendicular to the gate lines 1501-1508, so as to extend between and contact gate lines 1504 and 1507. It should be understood that the conductive line segment 1511 corresponds to a conductive structure formed within the portion of the gate electrode layer. In one embodiment, Metal-1 horizontal lines 1551-1561 corresponding to Metal-1 conductive structures are shown by the dashed rectangles. In one embodiment, the Metal-1 horizontal lines 1551-1561 are centered on a fixed pitch (M1P) as measured in the Y direction.

FIG. 16 shows a plan view of a possible scan pattern used to write the gate lines 1301-1308 in the example circuit of FIG. 15, in accordance with one embodiment of the present invention. The scan pattern includes scan lines 1601-1621. The retrace lines are not shown in FIG. 16 to avoid cluttering the figure. However, it should be understood that the retrace lines in the example of FIG. 16 could be implemented in a manner similar to that shown in the example embodiments of either FIG. 2 or FIG. 3. The scan lines 1601-1621 are oriented in the horizontal direction (X direction) and may extend to the left and/or right of the logic/memory cell or row of logic/memory cells in which the example circuit is formed. In this example embodiment, the scan direction is perpendicular to a length direction of the gate lines 1501-1508.

The example scan pattern shown in FIG. 16 has a scan pitch (SP2) as measured in the Y direction that is one-half (½) of the Metal-1 pitch (M1P) as measured in the Y direction. In one embodiment, a scan beam cross-section 1641 size as measured in the Y direction is equal to a width of a scan line (about one-half (½) of the Metal-1 pitch (M1P)) plus some small extension (e.g., 1 nm to 5 nm, by way of example) to account for overlay as the beam is scanned side-to-side.

As shown in FIG. 16, scan lines 1602-1619 require switching of the beam (“on” for negative photoresist, “off” for positive photoresist) to produce portions of the gate lines 1501-1508 and the conductive line segment 1511. Also, scan lines 1601 and 1621 do not require switching of the beam. Each of scan lines 1602-1620 is switched to create portions of the gate lines 1501-1508 of the different widths W1, W2. Also, each of scan lines 1611 and 1613 is switched to create end gaps 1651 and 1652, respectively. Also, scan line 1612 is switched to create the conductive line segment 1511. It should be appreciated that in this manner the beam can be switched to create line segments that extend in a lengthwise direction perpendicular to the gate lines 1501-1508.

In one embodiment, the line-width of the conductive line segment 1511 as measured in the Y direction is determined by the beam cross-section size as measured in the Y direction. In this embodiment, the line-width of the conductive line segment 1511 as measured in the Y direction is substantially equal to one-half (½) of the Metal-1 pitch (M1P), since the line-width of the conductive line segment 1511 is defined by the width of the beam as measured in the Y direction, as opposed to the temporal accuracy of the beam switching. However, in this embodiment, it should be understood that the beam switching has a sufficient temporal resolution to allow for writing/creating the portions of the gate lines 1501-1508 of different widths W1, W2, the end gaps 1651, 1652, and the perpendicularly oriented (in the X direction) conductive line segment 1511.

It should be appreciated that the scan pitch (SP2), i.e., raster size, of one-half (½) of the Metal-1 pitch (M1P) (e.g., SP2=35 nm for 22 nm CMOS node) is still relatively coarse as compared to a 1 nm or finer scan pitch that is required to draw/form conventional gate lines. It should also be appreciated that while the scan pitch (SP2) is not as large, i.e., coarse, as the scan pitch shown in the examples of FIG. 2 or 3, the scan pitch (SP2) and corresponding scan pattern of FIG. 16 allows for writing/creating lines of different widths, as measured in the scan direction, which can be important in forming gate lines and/or diffusion/active regions. Also, the scan pitch (SP2) allows for writing/creating line segments that are oriented perpendicular to the gate lines 1501-1508, i.e., that are oriented parallel to the scan direction. Additionally, the scan pitch (SP2) allows for cutting of gate lines to form end gaps, such as end gaps 1651 and 1652. In one embodiment, in order to control the beam switching precisely enough to provide sufficient critical dimension (CD) control as required for gate electrode formation, the beam scanning may be performed in a uni-directional manner, as opposed to the bi-directional manner shown in FIG. 16.

The Dynamic Array Architecture developed by Tela Innovations, Inc., is described in part in U.S. Pat. No. 7,446,352, entitled “Dynamic Array Architecture,” and in part in U.S. Pat. No. 7,917,879, entitled “Semiconductor Device with Dynamic Array Section,” each of which is incorporated herein by reference in its entirety. Use of the Dynamic Array Architecture implemented with “lines” and “cuts,” as discussed herein, can force all features onto a “coarse grid.” For example, all gate electrode cuts can be on a gate pitch, so a beam writer (laser or electron) would only need to make one pass along the direction of a gate line to write the cuts. Since the gate pitch is about 80 nm for the 22 nm CMOS node, an improvement in write time by a factor of 80 or more can be realized as compared to a 1 nm grid. Further improvements in write time can be achieved with parallel or multiple beams. Also, worse-case layers like the diffusion/active layer could be designed with granular widths and locations such that it could be written with a relatively coarse grid. For example, using a grid of one-eighth (⅛) of the Metal-1 pitch would allow writing the pattern about 10 times faster than with a 1 nm fine grid. Also, “hole” patterns such as contact and via-N can be placed on a coarse grid layout within the Dynamic Array Architecture.

It should be further appreciated that the coarse grid methods described herein are scalable through use of multiple patterning. For example, lines can be created using “Spacer Double Patterning” once or multiple times to achieve pitch division by 2 (PD2), 4 (PD4), 8 (PD8), etc., and achieve line pitches of 30 nm and below. In one example, at the 22 nm CMOS technology node, the Metal-1 pitch is about 70 nm, with a Metal-1 width of about 36 nm and a Metal-1 -to-Metal-1 spacing of about 34 nm. This Metal-1 pitch and sizing cannot be directly patterned with 193 immersion lithography, but can be patterned using PD2 spacer double patterning.

In one embodiment, a relaxed version the Dynamic Array Architecture can be implemented in which all lines and holes are written with a coarse beam which makes two passes per pitch. This will allow the beam to write lines or cuts in either the normal line channel or the normal space channel. This embodiment may cause a reduction in throughput, but may be useful for special layout cases.

As mentioned above, the invention described herein can use the Tela Innovations, Inc., Dynamic Array Architecture (i.e., gridded design style). However, it should be understood that the invention is not limited to the Dynamic Array Architecture design style. Also, while CMOS transistors may be formed in accordance with the examples described herein, it should be understood that other components can be formed in an analogous fashion. It should also be noted that the Dynamic Array Architecture can be implemented with a coarse grid in the X and Y directions to facilitate identification of the locations of objects like transistors, contacts, and gaps in lines, i.e., linear conductive structures. The linear conductive structures can be positioned on and/or according to the grids.

FIG. 17 shows a flowchart of a method of fabricating an integrated circuit, in accordance with one embodiment of the present invention. The method includes an operation 1701 for depositing a layer of a mask material on a substrate. In one embodiment, the mask material is a photoresist material. The method also includes an operation 1703 for scanning a beam of energy across the mask material in a rasterized linear pattern and in accordance with a scan pitch that is based on a pitch of conductive structure segments to be formed on the substrate. In one embodiment, the beam of energy is defined to transform the mask material upon which the beam of energy is incident into a removable state. In various embodiments, the beam of energy is either an electron beam or a laser beam. The method further includes an operation 1705 for turning the beam of energy on at locations where a conductive structure is to be formed on the substrate during scanning the beam of energy across the mask material. Also, in operation 1705, the beam of energy is turned off at locations where a conductive structure is not to be formed on the substrate.

In one embodiment, the scan pitch is equal to and aligned with the pitch of conductive structure segments to be formed on the substrate. In one instance of this embodiment, the conductive structure segments to be formed on the substrate are gate level conductive structure segments. Also, some of the gate level conductive structure segments form one or more transistor gate electrodes.

In one embodiment, the scan pitch is one-half of a gate electrode pitch, and the scan pitch is aligned with the gate electrode pitch. In one instance of this embodiment, the conductive structure segments to be formed on the substrate are contact structures. The contact structures can include at least one gate contact and at least one diffusion contact.

In one embodiment, the scan pitch is equal to and aligned with an interconnect level conductive structure pitch. In one instance of this embodiment, the conductive structure segments to be formed on the substrate are interconnect level conductive structures. In another instance of this embodiment, the conductive structure segments to be formed on the substrate are via structures.

FIG. 18 shows a flowchart of a method of fabricating an integrated circuit, in accordance with one embodiment of the present invention. The method includes an operation 1801 for depositing a layer of a mask material on a substrate. In one embodiment, the mask material is a photoresist material. The method also includes an operation 1803 for scanning a beam of energy across the mask material in a rasterized linear pattern and in accordance with a scan pitch that is equal to at least a width of the beam of energy as measured in a direction perpendicular to a scan direction of the beam of energy. In various embodiments, the beam of energy is either an electron beam or a laser beam. In one embodiment, the scan pitch is substantially equal to the width of the beam of energy. In one embodiment, the beam of energy is defined to transform the mask material upon which the beam of energy is incident into a removable state. The method further includes an operation 1805 for turning the beam of energy on at locations where a conductive structure is to be formed on the substrate during scanning the beam of energy across the mask material. The operation 1805 also includes turning the beam of energy off at locations where a conductive structure is not to be formed on the substrate.

In one embodiment, the beam of energy is turned on as the beam of energy is scanned perpendicularly across locations corresponding to a pitch of conductive structure segments to be formed on the substrate. The method can also include an operation for controlling a time period during which the beam of energy is turned on at each location corresponding to the pitch of conductive structure segments to be formed on the substrate, so as to control a width of the conductive structure segments to be formed on the substrate. Also, the method can include an operation for turning the beam of energy on between one or more locations corresponding to the pitch of conductive structure segments to be formed on the substrate, so as to transform the mask material between the one or more locations to provide for formation of a conductive structure that extends between the one or more locations.

It should be understood that in one embodiment the invention described herein can be embodied as computer readable code on a computer readable medium. For example, the computer readable code can include computer executable program instructions for operating the energy beam scanner. The computer readable medium mentioned herein is any data storage device that can store data which can thereafter be read by a computer system. Examples of the computer readable medium include hard drives, network attached storage (NAS), read-only memory, random-access memory, CD-ROMs, CD-Rs, CD-RWs, magnetic tapes, and other optical and non-optical data storage devices. The computer readable medium can also be distributed over a network of coupled computer systems so that the computer readable code is stored and executed in a distributed fashion.

Any of the operations described herein that form part of the invention are useful machine operations. The invention also relates to a device or an apparatus for performing these operations. The apparatus may be specially constructed for the required purpose, such as a special purpose computer. When defined as a special purpose computer, the computer can also perform other processing, program execution or routines that are not part of the special purpose, while still being capable of operating for the special purpose. Alternatively, the operations may be processed by a general purpose computer selectively activated or configured by one or more computer programs stored in the computer memory, cache, or obtained over a network. When data is obtained over a network the data maybe processed by other computers on the network, e.g., a cloud of computing resources.

The embodiments of the present invention can also be defined as a machine that transforms data from one state to another state. The data may represent an article, that can be represented as an electronic signal and electronically manipulate data. The transformed data can, in some cases, be visually depicted on a display, representing the physical object that results from the transformation of data. The transformed data can be saved to storage generally, or in particular formats that enable the construction or depiction of a physical and tangible object. In some embodiments, the manipulation can be performed by a processor. In such an example, the processor thus transforms the data from one thing to another. Still further, the methods can be processed by one or more machines or processors that can be connected over a network. Each machine can transform data from one state or thing to another, and can also process data, save data to storage, transmit data over a network, display the result, or communicate the result to another machine.

It should be further understood that the methods disclosed herein can be used to manufacture part of a semiconductor device or chip. In the fabrication of semiconductor devices such as integrated circuits, memory cells, and the like, a series of manufacturing operations are performed to define features on a semiconductor wafer, i.e., substrate. The wafer includes integrated circuit devices in the form of multi-level structures defined on a silicon substrate. At a substrate level, transistor devices with diffusion regions are formed. In subsequent levels, interconnect metallization lines are patterned and electrically connected to the transistor devices to define a desired integrated circuit device. Also, patterned conductive layers are insulated from other conductive layers by dielectric materials.

While this invention has been described in terms of several embodiments, it will be appreciated that those skilled in the art upon reading the preceding specifications and studying the drawings will realize various alterations, additions, permutations and equivalents thereof. Therefore, it is intended that the present invention includes all such alterations, additions, permutations, and equivalents as fall within the true spirit and scope of the invention.

Claims

1. A semiconductor device, comprising:

a first gate line formed to extend lengthwise in a first direction, the first gate line having a first width measured in a second direction perpendicular to the first direction;

a second gate line formed to extend lengthwise in the first direction, the second gate line having a second width measured in the second direction perpendicular to the first direction, the second width different than the first width; and

a third gate line formed to extend lengthwise in the first direction, the third gate line having a third width measured in the second direction perpendicular to the first direction, the third width substantially equal to the first width,

wherein the second gate line is positioned between the first gate line and the third gate line, wherein the second gate line is separated from the first gate line by a first separation distance as measured in the second direction, and wherein the second gate line is separated from the third gate line by a second separation distance as measured in the second direction, wherein the second separation distance is substantially equal to the first separation distance.

2. The semiconductor device as recited in claim 1, wherein the first gate line has a first overall length as measured in the first direction, wherein the second gate line has a second overall length as measured in the first direction, wherein the second overall length is less than the first overall length.

3. The semiconductor device as recited in claim 2, wherein the second overall length is less than one-half of the first overall length.

4. The semiconductor device as recited in claim 2, wherein the third gate line has a third overall length as measured in the first direction, wherein the third overall length is less than the second overall length.

5. The semiconductor device as recited in claim 4, wherein a difference between the third overall length and the second overall length is at least as large as a metal-1 pitch.

6. The semiconductor device as recited in claim 2, further comprising:

a fourth gate line formed to extend lengthwise in the first direction, the fourth gate line having a fourth width measured in the second direction perpendicular to the first direction, the fourth width substantially equal to the first width, wherein a lengthwise centerline of the fourth gate line is substantially aligned with a lengthwise centerline of the third gate line.

7. The semiconductor device as recited in claim 6, wherein a spacing between the third gate line and the fourth gate line as measured in the first direction is substantially equal to one-half of a metal-1 pitch.

8. The semiconductor device as recited in claim 6, wherein a first end of the second gate line is substantially aligned with a first end of the fourth gate line in the second direction.

9. The semiconductor device as recited in claim 6, further comprising:

a fifth gate line formed to extend lengthwise in the second direction, the fifth gate line physically connected to the second gate line, the fifth gate line physically connected to the fourth gate line.

10. The semiconductor device as recited in claim 9, wherein the fifth gate line has a fifth width measured in the first direction perpendicular to the second direction, wherein the fifth width is substantially equal to a spacing between the third gate line and the fourth gate line as measured in the first direction.

11. The semiconductor device as recited in claim 10, wherein the fifth width is substantially equal to one-half of a metal-1 pitch.

12. The semiconductor device as recited in claim 10, wherein the fifth width is less than the fourth width.

13. The semiconductor device as recited in claim 9, wherein a first end of the fifth gate line is substantially aligned with a first side of the second gate line in the first direction.

14. The semiconductor device as recited in claim 13, wherein a first side of the fifth gate line is substantially aligned with a first end of the fourth gate line in the second direction.

15. The semiconductor device as recited in claim 9, further comprising:

a sixth gate line formed to extend lengthwise in the first direction, the sixth gate line having a sixth width measured in the second direction perpendicular to the first direction, the sixth width substantially equal to the second width.

16. The semiconductor device as recited in claim 15, wherein a lengthwise centerline of the sixth gate line is substantially aligned with a lengthwise centerline of the second gate line.

17. The semiconductor device as recited in claim 16, wherein the sixth gate line is positioned between the first gate line and the fourth gate line.

18. The semiconductor device as recited in claim 17, wherein a spacing between the sixth gate line and the fifth gate line as measured in the first direction is substantially equal to one-half of a metal-1 pitch.

19. The semiconductor device as recited in claim 17, wherein the sixth gate line is separated from the first gate line by a third separation distance as measured in the second direction, wherein the sixth gate line is separated from the fourth gate line by a fourth separation distance as measured in the second direction, wherein the third separation distance is substantially equal to the first separation distance, wherein the fourth separation distance is substantially equal to the first separation distance.

20. The semiconductor device as recited in claim 19, further comprising:

a seventh gate line formed to extend lengthwise in the first direction, the seventh gate line having a seventh width measured in the second direction perpendicular to the first direction, the seventh width less than the first width of the first gate line, the seventh gate line separated from the first gate line by a fifth separation distance as measured in the second direction, the fifth separation distance substantially equal to the first separation distance.

21. The semiconductor device as recited in claim 20, further comprising:

an eighth gate line formed to extend lengthwise in the first direction, the eighth gate line having an eighth width measured in the second direction perpendicular to the first direction, the eighth width less than each of the third width of the third gate line and the fourth width of the fourth gate line, the eighth gate line separated from the third gate line by a sixth separation distance as measured in the second direction, the eighth gate line separated from the fourth gate line by the sixth separation distance as measured in the second direction, the sixth separation distance substantially equal to the first separation distance.

22. The semiconductor device as recited in claim 21, further comprising:

a ninth gate line formed to extend lengthwise in the first direction, the ninth gate line having a ninth width measured in the second direction perpendicular to the first direction, the ninth width substantially equal to the eighth width of the eighth gate line, the ninth gate line separated from the eighth gate line by a seventh separation distance as measured in the second direction, the seventh separation distance substantially equal to the first separation distance.