ELECTROMAGNETIC AND THERMAL SHIELDS WITH LOW-DIMENSIONAL MATERIALS
An electromagnetic interface (EMI) shielding material and method for producing the electromagnetic interface (EMI) shielding material. The EMI shielding material including a polymer matrix and a van der Waals material embedded in the polymer matrix and forming quasi-one-dimensional atomic threads, and wherein the van der Waals material is a trichalcogenide compound.
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This application claims priority to U.S. Application No. 63/114,883 filed on Nov. 17, 2020, which is incorporated herein by reference in its entirety.
TECHNICAL FIELDThe present disclosure generally relates to an electromagnetic interface (EMI) shielding material and method for producing an electromagnetic interface (EMI) shielding material.
BACKGROUNDRapid miniaturization and a consequent increase in the heat and electromagnetic wave (EM) emission in the densely packed electronic systems make the simultaneous heat management and electromagnetic interference (EMI) shielding crucially important. Any working electronic device is the source of EM radiation. For this reason, the electronic components have to be protected from the intra- and inter-system EM radiations in order to avoid fast degradation and failure. With the universal deployment of wireless communications, portable devices, high-power transmission lines, the environmental EM pollution has become a major concern for human health as well.
Evaluation of the performance of EMI shielding at high temperature is particularly important for certain high-power electronic systems operating in harsh environments. These concerns require development of novel multifunctional materials, which can serve concurrently as an excellent EM shields with the high thermal stability at elevated temperatures. The ability of such materials to act as the thermal interface materials (TIM), which can dissipate heat efficiently, becomes a necessity rather than an extra bonus feature.
SUMMARYAccordingly, it would be desirable to have multifunctional materials, which can perform both EMI shielding and TIM functions. For example, a low-weight, mechanical stability, resistance to oxidation, flexibility, and ease of manufacturing can be desirable parameters for multifunctional materials' applicability and cost-effective mass production.
In accordance with an aspect, an electromagnetic interface (EMI) shielding material is disclosed comprising a polymer matrix and a van der Waals material embedded in the polymer matrix and forming one-dimensional atomic threads, and wherein the van der Waals material is a trichalcogenide compound.
In accordance with another aspect, the EMI shielding material of further comprises: two-dimensional graphene embedded in the polymer matrix and mixed with the van der Waals material.
In accordance with an aspect, an electromagnetic interface (EMI) shielding material comprising: a polymer matrix and aligned metallic fillers composed of atomic chain bundles of a quasi-one-dimensional (1D) van der Waals material embedded in the polymer.
In accordance with a further aspect, a method is disclosed of producing an electromagnetic interface (EMI) shielding material comprising: embedding a van der Waals material in a polymer matrix, the van der Waals material being one-dimensional atomic threads.
The present disclosure relates to a design and methods of preparation of polymer-based composites and thin-film coatings with fillers implemented with the low-dimensional van der Waals materials, including graphene (two-dimensional material) and TaSe3 (one-dimensional material). The term van der Waals material can include all layered materials with week van der Waals bonds that can be chemically exfoliated into strongly covalently bonded atomic planes (like graphene) or atomic chains (like TaSe3). The design of the composites includes specific material selection for the composite base material and fillers, densities, loading fractions of the fillers, filler exfoliation and distribution, orientation, and thickness of the composite films. The design of the composites allows one to achieve electromagnetic interference (EMI) shielding over a wide frequency range, from MHz to hundreds of GHz, while simultaneously providing thermal shielding, e.g., removal of the absorbed EM energy converted to heat. In addition, the design of the composite allows one to achieve EMI shielding via mostly EM wave reflection or EM absorption. The reflection/absorption property can also be tuned for specific application. In addition, efficient EMI shielding can be achieved in the composite or coating, which by itself is electrically insulating, unlike commercially available EMI shields, which are electrically conductive.
In accordance with an embodiment, a polymeric film is disclosed with few-layer graphene (FLG) fillers, for example, of 25 micrometer lateral dimensions and nanometer thickness with the loading of 19.5 vol. %, and thickness of 1 mm, which provides 65 dB EMI shielding in the frequency range from 8.2 GHz to 12.4 GHz (X-band). The design of the composite allows, for example, for simultaneous thermal shielding owing to the high thermal conductivity of the composite. In accordance with an embodiment, the polymeric film can have a thickness, for example, from a few μm range to cm range. For example, the filler loading can be from approximately 1 vol. % to 50 vol. %. In addition, the thickness of the FLG filler can be, for example, from 0.35 nm (single layer graphene) to approximately 20 nm. In accordance with an embodiment, the FLG filler includes a mix of different thicknesses. For example, the lateral dimensions of the FLG filler can be, for example, 100 nm to 50 μm. In addition, it can be that a lateral dimension of the FLG filler is above the phonon mean free path (MFP), which is approximately 800 nm.
In accordance another embodiment, oriented fillers, for example, FLG with a predominantly vertical alignment can result in small reflection of EM energy back to the space. In addition, almost all EMI energy is absorbed after multiple reflections inside the composite. The same fillers remove generated heat due to their high thermal conductivity. The change in the degree of the filler orientation allows one to control the amount of reflected and absorbed EM energy. The horizontal alignment of the fillers results in the maximum reflection.
In accordance with a further embodiment, one-dimensional (1D) fillers, for example, van der Waals materials can be used to achieve efficient EMI shielding and heat conduction functionality. The 1D fillers, for example, can be made of transition metal trichalcogenides (MX3, where M=V, Nb, Ta, or other transition metal; X=S, Se, Te) and their alloys. The transition metal trichalcogenides differ substantially from both conventional metals such as Cu, Al and Co, and from 2D transition metal dichalcogenides, and can have an ultra-high current density with a low resistivity robust metallic materials that can be scaled to well below 10 nm wire widths. The wire width reduction comes from the monoclinic structure of MX3. For example, the trichalcogenide compound TaSe3 consists of Ta—Se3—Ta—Se3—Ta— . . . chains, in which the central Ta atoms form a conducting chain that is shielded by the Se-trimers from surrounding chains. The quasi-1D atomic threads are weakly bound in bundles by van der Waals forces; thus, there are no dangling or unsaturated bonds at the bundle surface. The 1D van der Waals (vdW) metals can be single crystal in the wire direction over μm to mm length scale. In addition, electrical transport experimental studies demonstrated the extraordinary current-carrying capacity of 1D vdW metals to be more than 10 times larger than that of Cu. It has also been shown that unlike in conventional Cu or Al interconnects the resistivity of 1D vdW metals does not increase with decreasing cross-sectional area. In accordance with one embodiment, 1D van der Waals materials can be used, for example, in strictly determined loading fractions, length and diameters, for EMI and thermal shielding. In accordance with an embodiment, the cross-sectional dimensions of the one-dimensional (1D) fillers can be, for example, from 1 nm×1 nm (individual atomic chain) to approximately 100 nm×100 nm. In accordance with another embodiment, the filler mix of the one-dimensional (1D) fillers can have cross-sectional dimensions, for example, from 1 nm×1 nm to approximately 10 nm×10 nm. In addition, the filler length of the one-dimensional (1D) fillers can be, for example, from approximately 1 μm to 1 cm, and, a length, for example, from approximately 10 μm to 1 mm.
In accordance with another embodiment, an EMI shielding material is disclosed that can consists of layers with different fillers. For example, a top layers can be optimized for better EMI shielding while the inside layer can be optimized for the maximum heat removal. In accordance with an embodiment, the thicknesses of the layers of the EMI shielding material can be, for example, from approximately 0.1 μm to 10 cm.
In accordance with a further embodiment, an EMI and thermal shield composite is disclosed where the 2D few-layer graphene fillers are mixed with 1D van der Waals fillers.
Graphene and FLG FillersThe materials synthesis processes and quality control steps for epoxy-based composites with graphene and FLG fillers are illustrated in
The quality of the samples was verified by the SEM inspection and Raman spectroscopy. Raman spectra of representative samples with different graphene loadings are shown in
To determine EMI characteristics, the scattering parameters, Sij, were measured using the two-port PNA system at RT and higher temperatures. The indices i and j represents the ports, which are receiving and emitting the EM waves. Each port can simultaneously emit and detect the EM waves and thus, the results of the measurements include four parameters of S11, S12, S21, and S22. Given that the samples are symmetrical, one can expect that |S11|=|S22| and |S12|=|S21|. The scattering parameters are related to the coefficients of reflection, R=|S11|2, and transmission, T=|S21|2. Knowing these two coefficients, one can obtain the coefficient of absorption, A, according to A=1−R−T. This is because for any EM wave incident on the sample, a fraction is reflected at the interface. A part of EM wave, which enters the composite, is absorbed and the rest is transmitted. The coefficient of absorption, which is defined as the power percentile of the absorbed EM way in the medium to the total power of incident wave, is not truly indicative of material's ability in absorbing the EM waves. This is because some part of the wave is reflected at the interface prior to entering the medium. For this reason, the effective absorption coefficient, Aeff, is defined as Aeff=1−R−T/1−R. After determining R, T, and Aeff, the shielding efficiency of the material can be calculated.
In accordance with an another embodiment, the attenuation of EM in a conductive medium is related to the skin depth, δ. In good conductors, δ=(πfμσ)1/2 wherein f, μ and σ are the EM wave frequency, medium's permeability and electrical conductivity, respectively. Graphene and FLG are good conductors of electricity. The sheet resistance of SLG and FLG vary from approximately 100Ω up to 30 kΩ depending on the number of layers and quality. Pristine epoxy, on the other hand, is an electrical insulator with the conductivity in the order of approximately 10−16 Sm−1. Addition of FLG to the epoxy, increases the composite's electrical conductivity after the establishment of the percolation network of the fillers. The results of the standard four-probe in-plane electrical conductivity measurements of the epoxy with FLG as a function of the filler loading are presented in FIG. 2(b). The abrupt change in conductivity observed at ϕ=2.5 vol. % indicates the onset of the electrical percolation where the large FLG fillers inside the insulating polymer matrix create an electrically conductive network. Electrical percolation is theoretically described by power scaling law, σ˜(ϕ-ϕth)t, where ϕth is the filler loading fraction at the electrical percolation threshold, and t is the “universal” critical exponent. The coincidence of the electrical percolation threshold shown in
In accordance with a further embodiment, the total shielding efficiency, SETt, describes the total attenuation of the incident EM wave as it hits and passes through the composite. This parameter determines the material's ability to block the EM waves and consists of two terms of reflection loss, or reflection shielding efficiency, ER, and absorption loss, or absorption shielding efficiency, SEA. These parameters can be calculated in terms of R, T, and Aeff as follows
SER=10 log[Pi/(Pi−Pr)]=−10 log(1−R) (1)
SEA=10 log[(Pi−Pr)/(Pi−PrRa)]=10 log(1−Aeff) (2)
SET=10 log(Pi/Pt)=SER+SEA (3)
where Pi, Pr, Pa, and Pt are the power of incident, reflected, absorbed, and transmitted EM wave, respectively.
In
Densely packed electronics, in addition to emitting undesirable EM waves to the environment, dissipate high amounts of heat, which leads to the increase in temperature of all components in the electronic package. A part of the EM wave, which turns into heat during the absorption process, can be described by the following equation:
P=½σ|E|2+πfε0εr″|E|2+πfμ0μr″|H|2 (4)
Here, P is the power, ε0 and εr″ the vacuum and imaginary part of medium's relative permeability, and μ0 and μr″ are the vacuum and imaginary part of the medium's relative permeability. The first, second, and the third terms in the right hand side correspond to the Joule heat loss, dielectric loss, and magnetic loss, where the latter is negligible for the epoxy composites with graphene. The temperature-rise in most cases adversely affect the ability of materials in blocking the EM waves. In this regard, the EM shield material must possess a high thermal stability, i.e. preserving its EM shielding characteristics even at elevated temperatures at least up to 500 K, and relatively high thermal conductivity in order to dissipate heat to the environment.
The high thermal stability of epoxy composites laden with FLG fillers provides several advantages over other types of EM shielding materials and fillers, e.g. ceramics, ferromagnets, or MXenes. Ceramic-based composites usually use SiC, which, although thermally stable, has rather poor absorption properties. The ferromagnetic fillers lose their magnetic properties as the temperature passes the Curie temperature, causing the drop in their magnetic shielding characteristics at elevated temperatures. The MXene fillers and films exhibit high shielding efficiencies but prone to formation of oxide layers and reveal poor thermal conductivity making them unsuitable for high-temperature EMI shielding applications.
Thermal CharacteristicsThe cross-plane thermal diffusivity and conductivity of the composites at RT and at elevated temperatures were measured using the “laser flash” analysis (LFA, 467 HyperFlash, NETZSCH, Germany). The thermal diffusivity, αα, was measured directly while the thermal conductivity, K, was calculated as K=pacp, where p and cp are the mass density and the specific heat.
In order to investigate the thermal stability of the composites, temperature dependent thermal diffusivity and conductivity experiments in the temperature range between RT to 460 K were conducted and the results of the measurements are presented in
The disclosed epoxy-graphene composites exhibit room temperature cross-plane thermal conductivity of 11.2±0.9 Wm−1K−1 and the total shielding efficiency of 65 dB at a thickness of t=1 mm at the filler loading of ϕ=19.5 vol. % in the X-band frequency range of f=8.2 GHZ-12.4 GHz. The EMI shielding and thermal properties of the samples were examined at the temperatures beyond 500 K. The results show that the graphene-epoxy samples preserve their excellent heat conduction properties at high temperatures while the EMI shielding efficiency even improves. The excellent EMI shielding and thermal properties of the multi-functional graphene composites at elevated temperatures along with their thermal stability and light-weight are important for electronic packaging and airborne systems where efficient EMI shielding, low cost, and low weight are required at high temperatures and high-power densities.
EMI Shielding Material with Quasi-1D Van Der Waals MaterialsTo demonstrate the function of the EMI shields with quasi-1D van der Waals materials, the composites were prepared using sodium alginate (SA), epoxy, and a UV-light cured polymer (UV-polymer) as the base matrix and monoclinic TaSe3 as the filler. TaSe3 belongs to the class of the transition metal tri-chalcogenide materials (MX3) where M is a transition metal and X is a chalcogenide. These materials exhibit quasi-1D crystalline structure. The crystal structure of the monoclinic TaSe3 is shown schematically in
An optical picture of the resultant dispersion at various concentrations is shown in
As seen in
To assess the performance of the polymeric composites with fillers, the figure-of-merit ZB=SE/(ρ×tϕmf) was defined by introducing normalization by the mass fraction of the fillers mf=MF/(MB+MF), where MF and MB are the masses of the filler and base polymer, respectively. It is interesting to note that the physical meaning of the ZB figure-of-merit is the total shielding efficiency of the films per the areal density of the fillers, i.e. ZB=SE/(MF/A), here A=V/t is the area of the sample of the volume V and thickness t (see Supplemental for the details of the derivation). The defined metric put more emphasis on the material performance, and specifically the filler performance.
The EMI shielding effectiveness of the composite with the low loading of quasi-1D TaSe3 fillers (1.3 vol. %) and 1 mm thickness in UHF band were examined. The measurements were performed using the quasi-optical free space method. The coefficients of reflection, absorption, effective absorption, and transmission presented in
In accordance with one embodiment, quasi-1D van der Waals materials can be used as fillers in flexible polymer films providing excellent EMI shielding capability in the X-band and UHF-band. Polymer composites films (77 μm thickness) with only 2.8 vol. % of quasi-1D TaSe3 exfoliated atomic thread fillers delivered 15 dB of total EMI shielding in the practically important X-band GHz frequency range. The EMI shielding efficiency of the developed materials expressed via the total shielding efficiency normalized by the mass density, thickness and filler loading fraction, ZB˜220 dB/cm2g, exceeds that of other polymers with various metallic, carbon nanotube or graphene fillers. The EMI shielding performance of the films with the quasi-1D fillers in UHF-band of sub-THz frequencies was particularly impressive. Total shielding efficiency SET changed from 60 dB to above 70 dB as the frequency varied from 240 GHz to 320 GHz. This performance was achieved in composite films with only 1.3 vol. % loading of exfoliated quasi-1D fillers of TaSe3 and the film thickness of 1 mm. Interestingly, the efficient EMI shielding was achieved in polymer films, which retained their DC electrically insulating properties, essential for many applications. The developed polymer films with quasi-1D fillers can be used, for example, for 5G-and-beyond communication technologies, which can require electromagnetic shielding films, are relatively flexible, light-weight, corrosion resistive, electrically insulating and relatively inexpensive.
Preparation of TaSe31.7315 g (9.57 mmol) of tantalum (STREM 99.98% purity) and 2.2718 g (28.8 mmol) of selenium (STREM 99.99% purity) were ground together gently with an agate mortar/pestle. This mixture was added to a 17.78 x 1 cm fused quartz ampule along with 62.3 mg iodine, (J. T. Baker, 99.9% purity). The ampule was evacuated and backfilled with Ar three times while submerged in an acetonitrile/dry ice bath, then flame sealed under vacuum. The ampule was placed in a Carbolite EZS 12/450B three-zone horizontal tube furnace and heated to 750-650° C. (source zone-growth zone) for 336 h. After the ampule had cooled to room temperature and was opened, the isolated shiny black crystals were left to sit in a fume hood for 1-2 h to allow excess iodine to sublime.
Polymer Composite PreparationThe bulk TaSe3 crystals were filled into acetone with starting concentration of 0.5 mg/ml in 10 ml cylindrical vials and sonicated in a low power sonic bath (Branson 5510) for several hours. The vials were inspected visually every 2 hours to verify the quality of the dispersion. The resultant dispersion was centrifuged (Eppendorf Centrifuge 5810) at 7000 rpm for 5 to 10 minutes. The supernatant of the dispersion was collected and poured in a Peltier dish to dry for characterization purposes. The precipitant part of the dispersion as well as some part of the material which were sticked to the side walls of the vial after centrifugation were collected and left in the ambient air so the remaining part of the solvent evaporates. The result is dark brown exfoliated TaSe3 threads with different aspect ratios. The variation in aspect ratio of the TaSe3 fillers is beneficial in EMI shielding applications and has been discussed in the text. The obtained fillers were mixed in precalculated proportions with three different off-the-shelf base polymeric matrices of UVP, SA, and epoxy. The UVP was mixed with low volume fraction of TaSe3 at 500 rpm for 10 minutes using a high-shear speed mixer (Flacktek Inc.). The prepared mixture was sandwiched between two pieces of nylons and pressed gently until a thin film is formed in between. The sandwich was left under the UV light for 2 minutes to cure. After that, the nylons were separated rather easily and a flexible film of UVP-TaSe3 remained. In case of SA-based flexible films, the SA powder was added to the DI water, sealed and stirred for 2 hours on top of a hot plate with temperature set to 50° C. Then, the TaSe3 filler was added to the solution at low concentrations. The mixture was stirred and sonicated for 30 minutes and drop casted on a Peltier dish. The dish was placed on a hot plate at 50° C. for almost 1 hour. The resultant was a dark brown flexible film. The epoxy composites were made by mixing the epoxy resin (bisphenol-A-(epichlorhydrin), molecular weight≤700, Allied High-Tech Products, Inc.) and hardener (triethylenetetramine, Allied High Tech Products, Inc.) with the mass ratio of 100 to 12, respectively. The TaSe3 filler was added afterwards and mixed with the high-shear speed mixer at 500 rpm for 10 minutes. The compound was vacuumed for 10 minutes to remove the possible trapped air bubbles. The compound was mixed one more time at 300 rpm for 10 minutes, vacuumed, and then poured into especial molds to cure.
Mass Density MeasurementsUsing an electronic scale (Mettler Toledo), the weight of the samples was measured in air (wa) and in DI water (ww). In case of SA flexible films, the weights of the films were measured in air and ethanol (we) since SA is soluble in DI water. The mass density of the samples were calculated according to Archimedes principle ρc=(wa/(wa−ww,e))×(ρw,e−ρa)+ρa where p is the density and subscripts “a”, “w”, and “e” corresponds to air, water, and ethanol, respectively. The volume fraction, ϕ, of the TaSe3 filler was calculated according to the rule of mixtures as ϕ=(ρc−ρp)/(ρf−ρp) where ρp and ρf are the density of the base polymer and TaSe3 filler, respectively. The density values of each sample with its constituents are listed in Supplementary Information.
Electromagnetic Interference Shielding Measurements in X-BandTo determine EMI characteristics, the measured the scattering parameters, Sij were measured using the two-port PNA system. The indices i and j represents the ports, which are receiving and emitting the EM waves. Each port can simultaneously emit and detect the EM waves and thus, the results of the measurements include four parameters of S11, S12, S21, and S22. Owing to the symmetry of the samples, one can expect that |S11|=|S22| and |S12|=|S21|. The scattering parameters are related to the coefficients of reflection, R=|S11|2, and transmission, T=|S21|2. The measurements were performed in the X-Band frequency range (8.2-12.4 GHz) with the frequency resolution of 3 MHz. A Programmable Network Analyzer (PNA) Keysight N5221A was used. The PNA was calibrated for 2-port measurements of scattering parameters Sij at input power Pin=3 dBm. A WR-90 commercial grade straight waveguide with two adapters at both ends with SMA coaxial ports was used as a sample holder. Special cables were used for high temperature RF measurements. The samples were a bit larger than the rectangular cross section (22.8×10.1 mm2) of the central hollow part of the waveguide in order to prevent the leakage of EM waves from the sender to receiver antenna. The scattering parameters, Sij, were directly measured and used to extract the reflection and absorption shielding efficiency of the composites.
Electromagnetic Interference Shielding Measurements in UHF-BandThe EMI shielding efficiency of the composite films in UHF-band was determined from the scattering parameters measured using the quasi-optic free space method. The measurement setup consisted of a vector network analyzer with a pair of frequency extenders—two high gain horn antennas and two double convex lenses. The measurements were performed in the range of frequencies from 220 GHz to 320 GHz. In order to obtain the reflection, R, and transmission, T, coefficients three measurements were performed. The first measurement was conducted with the sample, the second one was without the sample, and the third measurement was with a reference plane metal reflector. Two last measurements were used as the references to calculate the transmission and reflection coefficients, respectively. The reference measurements allow one to compensate for the transmission losses in the measurement path. The transmission and reflection coefficients are calculated according to the standard equations
Here S11s and S21s are the results for the measurements with the sample, S21e is the result for the measurement with an empty optical path, S11m is the result for the measurement with a metal plate. In the case of multiple reflections in the quasi-optical path, the measurement data can be affected. To account for this possibility, an additional data processing step was applied. It consisted of the time domain gating. The latter was possible owing to the broad frequency range and a large number of the measurement points (up to 32000). The measured complex scattering parameters were transformed to the time domain. After that an appropriate time domain window was applied. Finally, the time gated data were transformed back to the frequency domain. This approach helps improve the accuracy and reliability of the obtained data for the transmission and reflection coefficients. The obtained R and T coefficients were used for calculation of the absorption coefficient, A, and the effective absorption coefficient, Aeff, which are given as
Both parameters define the EM absorption characteristics of the shielding material. One should note that Aeff describes the actual absorption properties of the material since part of the EM energy is reflected from the surface of the material.
Electromagnetic-Polarization Selective Composites with Quasi-1D Van Der Waals Metallic FillersIn accordance with another embodiment, the preparation of flexible polymer composite films with aligned metallic fillers comprised of atomic chain bundles of the quasi-one-dimensional (1D) van der Waals material tantalum triselenide, TaSe3 is disclosed. The material functionality, embedded at the nanoscale level, can beachieved by mimicking the design of an electromagnetic aperture grid antenna. The processed composites employ chemically exfoliated TaSe3 nanowires as the grid building blocks incorporated within the thin film. Filler alignment is achieved using the “blade coating” method. Measurements conducted in the X-band frequency range demonstrate that the electromagnetic transmission through such films can be varied significantly by changing the relative orientations of the quasi-1D fillers and the polarization of the electromagnetic wave, and wherein such polarization-sensitive polymer films with quasi-1D fillers can be applicable to advanced electromagnetic interference shielding in communication systems.
Commonly, one selects functional materials with known characteristics to build a device or a system. In more elaborate approaches, one can engineer and synthesize materials with the required properties for specific applications. The inspiration for material selection, composition, and assembly can come from diverse sources. In one well-known approach, biomimetics, the models and elements of nature are applied to the design of synthetic systems. In an analogous approach, well-developed design solutions for macroscopic objects are translated into micro-, nano-, or atomic-scale structures. In accordance with one embodiment, a polymer composite is disclosed with polarization-sensitive electromagnetic interference (EMI) shielding characteristics by emulating the macroscopic structure and, to some degree, the functionality of an electromagnetic (EM) grid aperture antenna at the nanoscale level. A polarization-selective grid antenna is a set of parallel metal grid lines that allow transmission or reflection of radio-frequency (RF) radiation depending on the polarization of the radiation. This design allows a single structure to act as a mirror for RF radiation or become transparent to such radiation. When the polarization of the electric field is parallel to the grid lines, the electric field induces a current in the grid lines, which reflects the EM wave. In the alternate case, with the polarization of the electric field perpendicular to the grid lines, no current is induced, and the EM radiation passes through the grid. Polarization selection grids are often manufactured with metal wire tracks, usually copper, on a dielectric substrate. The spacings between grid lines must be small relative to the wavelength of the linear polarized EM waves. Here, a similar antenna design can be used, albeit at the nanometer scale, to create a “grid-antenna film.”
The grid antenna design in nano-composites is mimicked by employing chemically-exfoliated bundles of a quasi-one-dimensional (1D) van der Waals material, tantalum triselenide (TaSe3). The potential of TaSe3 for extremely high current density and effective EMI shielding, even with random filler distribution and low filler loading fractions. The quasi-1D van der Waals materials include the transition metal trichalcogenides (TMTs) with formula MX3 (M=transition metal, X=S, Se, Te), such as TiS3, NbS3, TaSe3, and ZrTe3, as well as other materials containing 1D structural motifs. As opposed to TMDs, TMTs exfoliate into nanowire-type structures or nanoribbon-type structures, which stem from their unique chain-based crystal structures, illustrated for TaSe3 in
In accordance with one embodiment, TaSe3 crystals were prepared by chemical vapor transport (CVT). In contrast to typical CVT reactions, where the goal is the growth of a relatively small number of larger crystals, reaction conditions were varied to yield 0.7-1.5 g batches of TaSe3 crystals for composite preparation. Transport can be achieved using iodine as the transport agent and/or by using a 625° C.-600° C. temperature gradient. As can be seen in
These CVT grown TaSe3 crystals were subjected to the liquid phase exfoliated (LPE) process.
EM testing of the prepared films was conducted in the X-band frequency range (f=8.2 GHz-12.4 GHz), which is pertinent, for example, to communication technologies. To determine the polarization selectivity, the measurement protocols used in EMI shielding testing were followed. The scattering parameters, Sij, were measured with the two-port programmable network analyzer (PNA; Keysight N5221A). The scattering parameters are related to the coefficients of reflection, R=|S11|2, and transmission, T=|S21|2. The measurements can be carried out in a WR-90 commercial grade straight waveguide with two adapters at both ends with SMA coaxial ports. The samples were made a bit larger than the rectangular cross-section (a=22.8 mm, b=10.1 mm) of the central hollow part of the waveguide to prevent the leakage of the EM waves from the sender to the receiver antenna. The cut-off frequency for different fundamental transverse electric (TE) modes in rectangular shaped waveguides
[Hz] where m and n are positive integer numbers. Therefore, the dominant EM mode in WR-90 waveguide is TE10 mode with electrical field (E) oscillating in the vertical direction perpendicular to the larger side of the inlet aperture (see
To investigate the effect of the filler alignment on the EM characteristics of the composites, measurements were carried out at different sample orientation angles (α) by rotating the sample about the guide axis. Note that α is the angle between the aligned filler chains in the composite with respect to the larger side of the guide's aperture. Therefore, at α=0°, the fillers are parallel to the larger side and E is perpendicular to them. The front-view schematic of the WR-90 waveguide, the electric field configuration of TE10 mode, and its mutual orientation with respect to the quasi-1D fillers of the composites are shown in
The angular dependence of SET of all four samples were measured at the constant frequency of f=8.2 GHz to elucidate the effect of the filler alignment on EM shielding properties of the composites. The results of these measurements are presented in
The periodic EM shielding characteristics observed in the composites originate from two different effects: (i) the prolate ellipsoidic needle-like geometry of the fillers, assuming semi axes of ax>ay=az; and (ii) the anisotropic complex permittivity properties of the quasi-1D TaSe3 fillers. Because the filler inclusion is low in all the samples, the Maxwell-Garnett (M-G) effective medium theory can be used to explain the observed characteristics. For composites with aligned dielectric fillers, the M-G effective complex permittivity of the composite along the x direction, εc,x, can be described as:
In this equation, εp and εf are the permittivity of the polymer and filler and ϕf is the filler volume fraction. For ellipsoidal fillers, the depolarization factor,
in which the eccentricity is e=√{square root over (1−ay2/ax2)}. Considering the large aspect ratio of the exfoliated fillers (ax»ay), it can be rather easily inferred that the effective permittivity of the composites would be largely different along different directions, i.e. parallel with and perpendicular to the aligned atomic chains. Note that to obtain the effective permittivity along other directions, y and z, the depolarization factor should be replaced by Ny and Nz and calculated accordingly.
The special geometrical shape of the aligned fillers is not the only parameter causing anisotropic behavior of composites with quasi-1D fillers. Owing to the monoclinic crystal structure of TaSe3, the EM properties of the fillers can be highly directional. The polarized reflectance data of TaSe3 exhibits metallic characteristic in the infrared region. Since there is no data on the dielectric properties of TaSe3 in the microwave region, the complex dielectric parameter of TaSe3 can be described as a function of EM frequency, ω, by the Lorentz-Drude model,
In this model, ε∞ is the permittivity of the material when the frequency goes to infinity, m is the number of the oscillators with the frequency of ω0,n and the lifetime of 1/Γn, respectively. The plasma frequency, ωp=√{square root over (Nq2/m*ε0)}, depends on the electron density, N, electron absolute charge, q, and the effective mass of electrons, m*. The second and third terms are associated with the interaction of EM waves with the intra-band, or free-electrons, and inter-band, or bound-electrons, respectively. The ℏωp in TaSe3 along the crystallographic “a” (perpendicular to the chains) and “b” (along the chains) axes are 0.42 eV and 0.68 eV.[32]. Therefore, one would expect an anisotropic frequency-dependent reflectance (R) and conductance (σ) along with and perpendicular to the atomic chains in the microwave region, with both parameters being larger in the direction along the atomic chains. Such strong, anisotropic reflectance properties have been reported for TaSe3 in the EM energy range between 0.05 eV to 5 eV, previously.
The preparation and properties of flexible polymer composite films with aligned metallic fillers made of bundles of quasi-one-dimensional (1D) van der Waals metal are disclosed, characterized by high current density. The material functionality, embedded at the nanoscale level, was achieved by mimicking the design of an electromagnetic aperture grid antenna. The synthesized composites use the quasi-1D van der Waals nanowires as the grid building block incorporated within the thin-film structure. The measurements conducted in the X-band frequency range demonstrated that the electromagnetic transmission through such films could be varied by changing the mutual orientation of the quasi-1D fillers and polarization of the electromagnetic wave. The films with low loading of the quasi-1D fillers (<2 vol. %) and only partial alignment of the fillers can already produce ˜5 dB variation in the transmitted signal. In addition, such polarization-sensitive polymer films with quasi-1D fillers can be used for advanced electromagnetic interference shielding, for example, in communication systems.
Composites with Aligned Fillers Made out of Chemically Exfoliated Quasi-1D Van Der Waals MaterialsIn this method, a small amount of polymer-filler solution is drop cast on a rigid substrate with a smooth surface. A blade with an adjustable distance from the top surface of the substrate is gradually run over the mixture and spread the compound over the substrate (see
During the tests, the measurements conducted in the X-band frequency range demonstrate that the electromagnetic transmission through such films can be varied significantly by changing the relative orientations of the quasi-1D fillers and the polarization of the electromagnetic wave. The developed polarization-sensitive polymer films with quasi-1D fillers are applicable to advanced electromagnetic interference shielding, for example, in communication systems.
The detailed description above describes an electromagnetic interface (EMI) shielding material and method for producing an electromagnetic interface (EMI) shielding material. The invention is not limited, however, to the precise embodiments and variations described. Various changes, modifications and equivalents can effected by one skilled in the art without departing from the spirit and scope of the invention as defined in the accompanying claims. It is expressly intended that all such changes, modifications and equivalents which fall within the scope of the claims are embraced by the claims.
Claims
1. An electromagnetic interface (EMI) shielding material comprising:
- a polymer matrix and a van der Waals material embedded in the polymer matrix and forming quasi-one-dimensional atomic threads; and
- wherein the van der Waals material is a trichalcogenide compound.
2. The EMI shielding material of claim 1, further comprising:
- two-dimensional graphene embedded in the polymer matrix and mixed with the van der Waals material.
3. The EMI shielding material of claim 2, wherein the two-dimensional graphene is few-layer graphene filler having a thickness of 0.35 nm (single layer graphene) to 20 nm.
4. The EMI shielding material of claim 3, wherein the two-dimensional graphene is a graphene filler having a two or more different thicknesses, the two or more different thicknesses being 100 nm to 50 μm.
5. The EMI shielding material of claim 1, wherein the van der Waals material includes TaSe3.
6. The EMI shielding material of claim 5, wherein the TaSe3 is monoclinic TaSe3.
7. The EMI shielding material of claim 5, wherein the quasi-one-dimensional atomic threads have a length of 1 mm to 10 cm and a diameter of 10 μm to 200 μm in a bulk form.
8. The EMI shielding material of claim 5, wherein the quasi-one-dimensional atomic threads have a length of 100 μm to 500 μm and a diameter of 50 nm to 100 nm in an exfoliated state.
9. The EMI shielding material of claim 1, wherein the trichalcogenide compound includes transition metal trichalcogenides and alloys of the transition metal trichalcogenides.
10. The EMI shielding material of claim 9, wherein the transition metal trichalcogenides having a chemical formula of MX3, where M=V, Nb, Ta, or other transition metals, and X is S, Se, Te.
11. The EMI shielding material of claim 1, wherein the polymer matrix includes an epoxy resin, a UV-cured polymer, or sodium alginate.
12. The EMI shielding material of claim 1, comprising:
- two or more layers of EMI shielding materials, the two or more layers of EMI shielding material including a first layer optimized for EMI shielding and a second layer optimized for heat removal.
13. The EMI shielding material of claim 2, wherein the polymer matrix includes an epoxy resin and the two-dimensional graphene embedded in the polymer matrix and mixed with the van der Waals material is 1.0 vol. % to 50 vol. % of the EMI shielding material.
14. The EMI shielding material of claim 13, wherein the van der Waals material is 2.5 vol. % to 19.5 vol. % of the EMI shielding material.
15. The EMI shielding material of claim 14, further comprising:
- a hardener added to the epoxy resin.
16. The EMI shielding material of claim 1, wherein the polymer matrix includes an epoxy resin, a UV-polymer, or sodium alginate, and the van der Waals material embedded in the polymer matrix is TaSe3.
17. The EMI shielding material of claim 16, wherein of the TaSe3 is less than 3 vol. % of the EMI shielding material.
18. The EMI shielding material of claim 16, wherein of the TaSe3 is 1.14 vol. % to 2.8 vol. % of the EMI shielding material.
19. An electronic device including the EMI shielding material of claim 1.
20. An electromagnetic interface (EMI) shielding material comprising:
- a polymer matrix and aligned metallic fillers composed of atomic chain bundles of a quasi-one-dimensional (1D) van der Waals material embedded in the polymer.
21. The EMI shielding material of claim 20, wherein the quasi-one-dimensional (1D) van der Waals material embedded in the polymer is a transition metal dichalcogenide or other chemical group with a quasi-1D crystal structure.
22. The EMI shielding material of claim 20, wherein the aligned metallic fillers each have a cross-section from 1 nm by 1 nm to 1 μm by 1 μm, and a length from 1 μm to 1 mm.
23. A method of producing an electromagnetic interface (EMI) shielding material comprising:
- embedding a van der Waals material in a polymer matrix, the van der Waals material being quasi-one-dimensional atomic threads.
24. The method according to claim 23, further comprising:
- embedding two-dimensional graphene in the polymer matrix and mixed with the van der Waals material.
25. The method according to claim 23, wherein the polymer matrix includes an epoxy resin, a UV-polymer, or sodium alginate, and the van der Waals material embedded in the polymer matrix is TaSe3, and wherein of the TaSe3 is less than 3 vol. % of the EMI shielding material.
Type: Application
Filed: Nov 17, 2021
Publication Date: Aug 18, 2022
Patent Grant number: 12137546
Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (Oakland, CA)
Inventors: Alexander A. BALANDIN (Riverside, CA), Fariborz KARGAR (Riverside, CA)
Application Number: 17/455,280