NASAL-PLUG FILTER DEVICE AND SET THEREOF
A nasal-plug filter device including a device body, a filter, a first actuator, a second actuator, and a gas sensor is provided. The device body has a ventilating channel, and the ventilating channel has an inlet end and an outlet end. The filter is disposed at the outlet end. The first actuator is disposed at the inlet end for being driven to transmit gas outside the device body into the device body. The second actuator is stacked on and bonded to the first actuator, and the second actuator is driven to transmit the gas transmitted by the first actuator to the filter to be filtered and purified. The gas sensor is disposed at the outlet end. A connection element may be provided for connecting two nasal-plug filter devices with each other.
This non-provisional application claims priority under 35 U.S.C. § 119(a) to Patent Application No. 109124838 filed in Taiwan, R.O.C. on Jul. 22, 2020, the entire contents of which are hereby incorporated by reference.
BACKGROUND Technical FieldThe present disclosure relates to a filter device, in particular, to a nasal-plug filter device that is capable of being inserted into a nostril of a user to enhance the gas introduction procedure, and the nasal-plug filter device is further combined with a gas detection function.
Related ArtNowadays people pay more and more attention to monitoring ambient air quality in daily life, such as carbon monoxide, carbon dioxide, volatile organic compounds (VOC), PM2.5, nitric oxide, and sulfur monoxide etc., and the particle suspended in the air, which can cause adverse health effects on the human body when exposure to these gases, and can even be life-threatening. Therefore, various countries have focused on the topic of how to monitor ambient air quality to avoid or escape from the health affecting effects and/or injuries in time.
Moreover, in order to avoid breathing harmful gases or particles into the human body, one kind of nasal-plug filter that can be inserted into a nostril to provide filtration and purification function for inhaled gases is provided now. However, the filter inside the nasal-plug filter might make the user suffer from the problem of insufficient inhaled volume and make him breathe difficulty, resulting in the discomfort condition of the user during using such nasal-plug filter.
In view of above disadvantages, how to provide a nasal-plug filter device that could solve above problems is an issue to be addressed.
SUMMARYOne object of the present disclosure is to provide a nasal-plug filter device inserted into a nostril of a user. Through the operation of the first actuator or the second actuator inside the nasal-plug filter device, the introduction flow of the gas can be increased, so that the gas with higher pressure or higher flow volume can be directed to the filter, thereby improving the gas introduction effect. The gas can pass through the filter more quickly, so that a filtered and purified gas can be provided to the user. Moreover, the gas sensor in the nasal-plug filter device can also detect the gas to be inhaled by the user, so that the user not only can breathe the filtered and purified gas but also can understand the quality of the gas to be inhaled.
Another object of the present disclosure is to provide a nasal-plug filter device inserted into a nostril of a user. With the combination of the first actuator and the second actuator in the nasal-plug filter device, the first actuator can provide the gas introduced into the nasal-plug filter device with high pressure, and the second actuator can provide a relatively larger volume of gas to the filter, whereby the gas introduction effect can be improved and the gas can pass through the filter more quickly, whereby a filtered and purified gas can be inhaled by the user. Moreover, the gas sensor in the nasal-plug filter device can also detect the inhaled gas, so that the user not only can breathe the filtered and purified gas, but also can understand the quality of the inhaled gas. In some embodiments, two nasal-plug filter devices are connected by a connection element, and the two nasal-plug filter devices can be inserted into two nostrils of a user respectively, so as to provide the user with filtered and purified gas.
In one general embodiment of the present disclosure, a nasal-plug filter device including a device body, a filter, a first actuator, a second actuator, a gas sensor, and a driving module is provided. The device body has a ventilating channel, and the ventilating channel has an inlet end and an outlet end. The filter is disposed in the ventilating channel. The first actuator fabricated by semiconductor manufacturing processes is disposed at the inlet end of the ventilating channel, and is driven to transmit gas outside the device body into the device body with a relatively higher pressure. The second actuator fabricated by semiconductor manufacturing processes is stacked on and bonded to the first actuator, and is driven to retransmit the gas transmitted by the first actuator to the filter to be filtered and purified. The gas sensor is disposed at the outlet end of the ventilating channel for detecting a gas quality data of the gas at the outlet end. The driving module is electrically connected to the first actuator, the second actuator, and the gas sensor, and has a microprocessor and a communication unit. The microprocessor is configured to drive the first actuator, the second actuator, and the gas sensor. The gas quality data obtained by the gas sensor is transmitted to an external device through the communication unit.
In another general embodiment of the present disclosure, a nasal-plug filter device including a device body, a filter, a first actuator, a gas sensor, and a driving module is provided. The device body has a ventilating channel, and the ventilating channel has an inlet end and an outlet end. The filter is disposed in the ventilating channel. The first actuator fabricated by semiconductor manufacturing processes is disposed at the ventilating channel, and is driven to transmit gas outside the device body into the device body with a relatively higher pressure and then to the filter to be filtered and purified. The gas is then discharged out from the outlet end. The gas sensor is disposed at the outlet end of the ventilating channel for detecting a gas quality data of the gas at the outlet end. The driving module is electrically connected to the first actuator, the second actuator, and the gas sensor, and has a microprocessor and a communication unit. The microprocessor is configured to drive the first actuator, the second actuator, and the gas sensor. The gas quality data obtained by the gas sensor is transmitted to an external device through the communication unit.
In yet another general embodiment of the present disclosure, a nasal-plug filter device including a device body, a filter, a second actuator, a gas sensor, and a driving module is provided. The device body has a ventilating channel, and the ventilating channel has an inlet end and an outlet end. The filter is disposed in the ventilating channel. The second actuator fabricated by semiconductor manufacturing processes is disposed at the ventilating channel, and is driven to transmit gas outside the device body into the device body with a relatively higher flow volume and then to the filter to be filtered and purified. The gas is then discharged out from the outlet end. The gas sensor is disposed at the outlet end of the ventilating channel for detecting a gas quality data of the gas at the outlet end. The driving module is electrically connected to the first actuator, the second actuator, and the gas sensor, and has a microprocessor and a communication unit. The microprocessor is configured to drive the first actuator, the second actuator, and the gas sensor. The gas quality data obtained by the gas sensor is transmitted to an external device through the communication unit.
The disclosure will become more fully understood from the detailed description given herein below, for illustration only and thus not limitative of the disclosure, wherein:
The present disclosure will now be described more specifically with reference to the following embodiments. It is to be noted that the following descriptions of different embodiments of this disclosure are presented herein for purpose of illustration and description only, and it is not intended to limit the scope of the present disclosure.
As shown in
The driving module 6 is electrically connected to the first actuator 2, the second actuator 3, and the gas sensor 5. The driving module 6 includes a microprocessor 61 and a communication unit 62. The microprocessor 61 electrically connected to the first actuator 2, the second actuator 3, and the gas sensor 5 is configured to drive the first actuator 2 and the second actuator 3. The microprocessor 61 receives, processes and analyzes the gas quality data obtained by the gas sensor 5. The communication unit 62 is electrically connected to the microprocessor 61, and the microprocessor 61 transmits the processed gas quality data to an external device 9 through the communication unit 62.
Please still refer to
In some embodiments, as shown in
In some other embodiments, as shown in
Further, as shown in
Further, as shown in
In this embodiment, the gas sensor 5 may be a volatile organic compound sensor for detecting the quality data of the gas including formaldehyde, ammonia, carbon monoxide, carbon dioxide, oxygen, ozone gas, or other volatile organic compounds. Alternatively, the gas sensor 5 may be a virus sensor for detecting a detection data of viruses.
As for the structure and the operation steps of guiding gas in/out of the above-mentioned first actuator 2 and the second actuator 3 will be described as follows.
As shown in
In some embodiments, the aforementioned outlet base 21 is formed with an outlet chamber 211 and a compression chamber 212 through a silicon substrate etching process. A penetration hole 213 is formed by etching between the outlet chamber 211 and the compression chamber 212. The first oxide layer 22 is formed and stacked on the outlet base 21 by deposition. The portion of the first oxide layer 22 corresponding to the compression chamber 212 is removed by etching. The nozzle resonance layer 23 is formed and stacked on the first oxide layer 22 by deposition. A plurality of inlet holes 231 is formed at the portion of the nozzle resonance layer 23 corresponding to the compression chamber 212 by etching. A portion of the nozzle resonance layer 23 corresponding to the central portion of the compression chamber 212 is etched to form a nozzle hole 232, so that a suspension area 233 capable of being vibrated is formed between the inlet holes 231 and the nozzle hole 232. The second oxide layer 24 is formed and stacked on the suspension area 233 of the nozzle resonance layer 23 by deposition, and a portion of the second oxide layer 24 is etched to form a resonance chamber area 241 in communication with the nozzle hole 232. A resonance chamber 251 is formed on the resonance chamber layer 25 by a silicon substrate etching process, and the resonance chamber layer 25 is correspondingly stacked on and bonded to the second oxide layer 24, so that the resonance chamber 251 is corresponding to the resonance chamber area 241 of the second oxide layer 24. The first piezoelectric component 26 formed and stacked on the resonance chamber layer 25 by deposition includes a first lower electrode layer 261, a first piezoelectric layer 262, a first insulation layer 263, and a first upper electrode layer 264. The first lower electrode layer 261 is formed and stacked on the resonance chamber layer 25 by deposition, and the first piezoelectric layer 262 is formed and stacked on a portion of a surface of the first lower electrode layer 261 by deposition. The first insulation layer 263 is formed and stacked on a portion of a surface of the first piezoelectric layer 262 by deposition. The first upper electrode layer 264 is formed and stacked on the surface of the first insulation layer 263 and the remaining portion of the surface of the first piezoelectric layer 262 which is not covered by the first insulation layer 263 for being electrically connected to the first piezoelectric layer 262.
The structure of the first actuator 2 can be appreciated from above description. Next, the operation of gas introduction implemented by the first actuator 2 is elaborated below accompanied with
As shown in
In some embodiments, the aforementioned inlet base 31 is formed with at least one inlet hole 311 by a silicon substrate etching process. The third oxide layer 32 is formed and stacked on the inlet base 31 by deposition, and the third oxide layer 32 is formed with a plurality of convergence channels 321 and a convergence chamber 322 by etching. The convergence channels 321 are in communication between the at least one inlet hole 311 of the inlet base 31 and the convergence chamber 322. The resonance layer 33 formed and stacked on the third oxide layer 32 through a silicon substrate deposition process is formed with a through hole 331, a vibration area 332, and a fixed area 333 by etching. The through hole 331 is formed at a center portion of the resonance layer 33. The vibration area 332 is formed on a periphery of the through hole 331. The fixed area 333 is formed on a periphery of the resonance layer 33. The fourth oxide layer 34 is formed and stacked on the resonance layer 33 by deposition, and the fourth oxide layer 34 is formed with a compression chamber area 341 by partially etching. The vibration layer 35 formed and stacked on the fourth oxide layer 34 by a silicon substrate deposition process is formed with an actuation area 351, an outer peripheral area 352, and a plurality of ventilation holes 353 by etching. The actuation area 351 is formed at a center portion of the vibration layer 35. The outer peripheral area 352 is formed around a periphery of the actuation area 351. The ventilation holes 353 are respectively formed between the actuation area 351 and the outer peripheral area 352. Accordingly, a compression chamber is formed by the vibration layer 35 and the compression chamber area 341 of the fourth oxide layer 34. The second piezoelectric component 36 formed and stacked on the actuation area 351 of the vibration layer 35 by deposition includes a second lower electrode layer 361, a second piezoelectric layer 362, a second insulation layer 363, and a second upper electrode layer 364. The second lower electrode layer 361 is formed and stacked on the actuation area 351 of the vibration layer 35 by deposition, and the second piezoelectric layer 362 is formed and stacked on a portion of a surface of the second lower electrode layer 361 by deposition. The second insulation layer 363 is formed and stacked on a portion of a surface of the second piezoelectric layer 362 by deposition. The second upper electrode layer 364 is formed and stacked on the surface of the second insulation layer 363 and the remaining portion of the surface of the second piezoelectric layer 362 which is not covered by the second insulation layer 363 for being electrically connected to the second piezoelectric layer 362.
The structure of the second actuator 3 can be appreciated from above description. Next, the operation of gas introduction implemented by the second actuator 3 is elaborated below accompanied with
To sum up, the present disclosure provides different kinds of nasal-plug filter devices capable of being inserted in the nostril of a human. In one embodiment of the present disclosure, a nasal-plug filter device with a first actuator or a second actuator is provided. Through the first actuator or the second actuator inside the nasal-plug filter device, the introduction flow of the gas can be increased, so that the gas with higher pressure or higher volume can be directed to the filter, and thus the gas introduction effect can be improved. In another embodiment of the present disclosure provides a nasal-plug filter device with a first actuator and a second actuator in combination. The first actuator can provide gas with higher pressure for being introduced into the nostrils, and the second actuator can provide a relatively larger volume of the gas to the filter, whereby the gas introduction effect can be improved. These nasal-plug filter devices can drive the gas to pass through the filter more quickly, so that a filtered and purified gas is provided. Moreover, the gas sensor in the nasal-plug filter devices also can detect the introduced gas, so that the user not only can breathe the filtered and purified gas, but also can understand the quality of the gas to be inhaled.
The foregoing outlines features of several embodiments so that those skilled in the art may better understand the aspects of the present disclosure. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions, and alterations herein without departing from the spirit and scope of the present disclosure.
Claims
1. A nasal-plug filter device, comprising:
- a device body having a ventilating channel, wherein the ventilating channel has an inlet end and an outlet end;
- a filter disposed at the outlet end;
- a first actuator fabricated by semiconductor manufacturing processes, wherein the first actuator is disposed at the inlet end for being driven to transmit gas outside the device body into the device body with a relatively higher pressure;
- a second actuator fabricated by semiconductor manufacturing processes, wherein the second actuator is stacked on and bonded to the first actuator for being driven to retransmit the gas transmitted by the first actuator to the filter to be filtered and purified;
- a gas sensor disposed at the outlet end for detecting a gas quality data of the gas at the outlet end; and
- a driving module electrically connected to the first actuator, the second actuator, and the gas sensor, wherein the driving module has a microprocessor and a communication unit;
- wherein the microprocessor is configured to drive the first actuator, the second actuator, and the gas sensor, and the microprocessor is configured to transmit the gas quality data obtained by the gas sensor to an external device through the communication unit.
2. The nasal-plug filter device according to claim 1, wherein the first actuator comprises:
- an outlet base formed with an outlet chamber and a compression chamber by a silicon substrate etching process, wherein a penetration hole is formed by etching between the outlet chamber and the compression chamber;
- a first oxide layer formed and stacked on the outlet base by deposition, wherein a portion of the first oxide layer corresponding to the compression chamber is removed by etching;
- a nozzle resonance layer formed and stacked on the first oxide layer by deposition, wherein a plurality of inlet holes is formed at a portion of the nozzle resonance layer corresponding to the compression chamber by etching, and wherein a portion of the nozzle resonance layer corresponding to a central portion of the compression chamber is etched to form a nozzle hole, thereby forming a suspension area capable of being vibrated between the plurality of inlet holes and the nozzle hole;
- a second oxide layer formed and stacked on the suspension area of the nozzle resonance layer by deposition, wherein a portion of the second oxide layer is etched to form a resonance chamber area in communication with the nozzle hole;
- a resonance chamber layer, wherein a resonance chamber is formed on the resonance chamber layer by a silicon substrate etching process, and wherein the resonance chamber layer is correspondingly stacked on and bonded to the second oxide layer, so that the resonance chamber corresponds to the resonance chamber area of the second oxide layer;
- a first piezoelectric component formed and stacked on the resonance chamber layer by deposition, wherein the first piezoelectric component comprises a first lower electrode layer, a first piezoelectric layer, a first insulation layer, and a first upper electrode layer, wherein the first lower electrode layer is formed and stacked on the resonance chamber layer by deposition, the first piezoelectric layer is formed and stacked on a portion of a surface of the first lower electrode layer by deposition, and the first insulation layer is formed and stacked on a portion of a surface of the first piezoelectric layer by deposition, and wherein the first upper electrode layer is formed and stacked on the surface of the first insulation layer and the remaining portion of the surface of the first piezoelectric layer which is not covered by the first insulation layer for being electrically connected to the first piezoelectric layer; and
- wherein the first piezoelectric component is capable of driving the nozzle resonance layer to resonate with the first piezoelectric component, and thus the suspension area of the nozzle resonance layer vibrates in a reciprocating manner, and then draws the gas outside the first actuator into the compression chamber through the plurality of inlet holes, the gas is further directed to the resonance chamber through the nozzle hole, passes through the penetration hole, and discharged out from the outlet chamber with the relatively higher pressure, thereby achieving transmission of the gas.
3. The nasal-plug filter device according to claim 1, wherein the second actuator comprises:
- an inlet base formed with at least one inlet hole by a silicon substrate etching process;
- a third oxide layer formed and stacked on the inlet base by deposition, wherein the third oxide layer is formed with a plurality of convergence channels and a convergence chamber by etching, and wherein the convergence channels are in communication between the at least one inlet holes of the inlet base and the convergence chamber;
- a resonance layer formed and stacked on the third oxide layer through a silicon substrate deposition process having a through hole, a vibration area, and a fixed area formed by etching, wherein the through hole is formed at a center portion of the resonance layer, the vibration area is formed on a periphery of the through hole, and the fixed area is formed on a periphery of the resonance layer;
- a fourth oxide layer formed and stacked on the resonance layer by deposition, wherein the fourth oxide layer is formed with a compression chamber area by etching;
- a vibration layer formed and stacked on the fourth oxide layer by a silicon substrate deposition process having an actuation area, an outer peripheral area, and a plurality of ventilation holes formed by etching, wherein the actuation area is formed at a center portion of the vibration layer, the outer peripheral area is formed around a periphery of the actuation area, the ventilation holes are respectively formed between the actuation area and the outer peripheral area, and a compression chamber is defined between the vibration layer and the compression chamber area of the fourth oxide layer; and
- a second piezoelectric component formed and stacked on the actuation area of the vibration layer by deposition having a second lower electrode layer, a second piezoelectric layer, a second insulation layer, and a second upper electrode layer, wherein the second lower electrode layer is formed and stacked on the actuation area of the vibration layer by deposition, the second piezoelectric layer is formed and stacked on a portion of a surface of the second lower electrode layer by deposition, the second insulation layer is formed and stacked on a portion of a surface of the second piezoelectric layer by deposition, and wherein the second upper electrode layer is formed and stacked on the surface of the second insulation layer and the remaining portion of the surface of the second piezoelectric layer which is not covered by the second insulation layer for being electrically connected to the second piezoelectric layer; and
- wherein the second piezoelectric component is capable of driving the vibration layer and the resonance layer to resonate with the second piezoelectric component, the gas outside the second actuator is then drawn into the second actuator through the at least one inlet hole, passes through the convergence channels, and then converges at the convergence chamber; and the gas further passes through the through hole of the resonance layer, and then is discharged out from the plurality of ventilation holes of the vibration layer, thereby achieving transmission of the gas.
4. The nasal-plug filter device according to claim 1, further comprising a battery electrically connected to the driving module, wherein the battery provides operation power for the driving module, so that the driving module is capable of driving the first actuator and the second actuator.
5. The nasal-plug filter device according to claim 1, wherein the external device is a cloud device having an artificial intelligence algorithm unit.
6. The nasal-plug filter device according to claim 1, wherein the gas sensor is a volatile organic compound sensor capable of providing the gas quality data of the gas selected from the group consisting of formaldehyde, ammonia, carbon monoxide, carbon dioxide, oxygen, and ozone gas.
7. The nasal-plug filter device according to claim 1, wherein the gas sensor is a virus sensor, so as to provide a detection data of viruses.
8. The nasal-plug filter device according to claim 1, wherein the gas sensor is a particulate sensor for detecting particulate matters of PM1, PM2, or PM10.
9. The nasal-plug filter device according to claim 1, wherein the filter is a high-efficiency particulate air (HEPA) filter.
10. The nasal-plug filter device according to claim 1, wherein the filter is coated with a cleansing element containing chlorine dioxide for suppressing viruses and bacteria in the gas.
11. The nasal-plug filter device according to claim 1, wherein the filer is coated with a herbal protection coating layer comprising extracts of Rhus chinensis Mill and extracts of Ginkgo biloba to form a herbal protection anti-allergy filter which can efficiently perform anti-allergy function and destroy cell surface proteins of influenza viruses passing through the herbal protection anti-allergy filter.
12. The nasal-plug filter device according to claim 1, further comprising a waterproof gas-permeable membrane attached to the outlet end.
13. A nasal-plug filter device set, comprising:
- two nasal-plug filter devices according to claim 1; and
- a connection element connected between the two nasal-plug filter devices, wherein the two nasal-plug filter devices is capable of being inserted into two nostrils of a user respectively so as to provide a filtered and purified gas for the user.
14. A nasal-plug filter device, comprising:
- a device body having a ventilating channel, wherein the ventilating channel has an inlet end and an outlet end;
- a filter disposed at the inlet end;
- a first actuator fabricated by semiconductor manufacturing processes, and wherein the first actuator is disposed at the inlet end for being driven to transmit gas outside the device body to pass through the filter and then into the device body with a relatively higher pressure;
- a second actuator fabricated by semiconductor manufacturing processes, and wherein the second actuator is stacked on and bonded to the first actuator, and the second actuator is driven to retransmit the gas transmitted by the first actuator to be filtered and purified, and the gas is discharged out from the outlet end; and
- a gas sensor disposed at the outlet end for detecting a gas quality of the gas at the outlet end; and
- a driving module electrically connected to the first actuator, the second actuator, and the gas sensor, wherein the driving module has a microprocessor and a communication unit;
- wherein the microprocessor is configured to drive the first actuator, the second actuator, and the gas sensor, and the microprocessor is configured to transmit the gas quality data obtained by the gas sensor to an external device through the communication unit.
15. A nasal-plug filter device, comprising:
- a device body having a ventilating channel, and wherein the ventilating channel has an inlet end and an outlet end;
- a filter disposed in the ventilating channel;
- a first actuator fabricated by semiconductor manufacturing processes, and wherein the first actuator is disposed at the ventilating channel for being driven to transmit gas outside the device body into the device body with a relatively higher pressure and to the filter to be filtered and purified, and the gas is then discharged out from the outlet end;
- a gas sensor disposed at the outlet end for detecting a gas quality of the gas at the outlet end; and
- a driving module electrically connected to the first actuator, the second actuator, and the gas sensor, wherein the driving module has a microprocessor and a communication unit;
- wherein the microprocessor is configured to drive the first actuator, the second actuator, and the gas sensor, and the microprocessor is configured to transmit the gas quality data obtained by the gas sensor to an external device through the communication unit.
16. The nasal-plug filter device according to claim 15, wherein the first actuator comprises:
- an outlet base formed with an outlet chamber and a compression chamber through a silicon substrate etching process, wherein a penetration hole is formed by etching between the outlet chamber and the compression chamber;
- a first oxide layer formed and stacked on the outlet base by deposition, wherein a portion of the first oxide layer corresponding to the compression chamber is removed by etching;
- a nozzle resonance layer formed and stacked on the first oxide layer by deposition, wherein a plurality of inlet holes is formed at a portion of the nozzle resonance layer corresponding to the compression chamber by etching, and wherein a portion of the nozzle resonance layer corresponding to a central portion of the compression chamber is etched to form a nozzle hole, thereby forming a suspension area capable of being vibrated between the plurality of inlet holes and the nozzle hole;
- a second oxide layer formed and stacked on the suspension area of the nozzle resonance layer by deposition, wherein a portion of the second oxide layer is etched to form a resonance chamber area in communication with the nozzle hole;
- a resonance chamber layer formed on the resonance chamber layer by a silicon substrate etching process is correspondingly stacked on and bonded to the second oxide layer, so that the resonance chamber is corresponding to the resonance chamber area of the second oxide layer;
- a first piezoelectric component formed and stacked on the resonance chamber layer by deposition, wherein the first piezoelectric component comprises a first lower electrode layer, a first piezoelectric layer, a first insulation layer, and a first upper electrode layer, wherein the first lower electrode layer is formed and stacked on the resonance chamber layer by deposition, the first piezoelectric layer is formed and stacked on a portion of a surface of the first lower electrode layer by deposition, and the first insulation layer is formed and stacked on a portion of a surface of the first piezoelectric layer by deposition, and wherein the first upper electrode layer is formed and stacked on the surface of the first insulation layer and the remaining portion of the surface of the first piezoelectric layer which is not covered by the first insulation layer for being electrically connected to the first piezoelectric layer; and
- wherein the first piezoelectric component is capable of driving the nozzle resonance layer to resonate with the first piezoelectric component, and thus the suspension area of the nozzle resonance layer vibrates in a reciprocating manner, gas outside the first actuator then is drawn into the compression chamber through the plurality of inlet holes, the gas is further directed to the resonance chamber through the nozzle hole, and the gas further passes through the penetration hole and is discharged out from the outlet chamber with the relatively higher pressure, thereby achieving transmission of the gas.
17. A nasal-plug filter device, comprising:
- a device body having a ventilating channel, wherein the ventilating channel has an inlet end and an outlet end;
- a filter disposed in the ventilating channel;
- a second actuator fabricated by semiconductor manufacturing processes is disposed at the ventilating channel for being driven to transmit gas outside the device body into the device body with a relatively higher volume and to the filter to be filtered and purified, and the gas is then discharged out from the outlet end;
- a gas sensor disposed at the outlet end for detecting a gas quality of the gas at the outlet end; and
- a driving module electrically connected to the first actuator, the second actuator, and the gas sensor, wherein the driving module has a microprocessor and a communication unit;
- wherein the microprocessor is configured to drive the first actuator, the second actuator, and the gas sensor, and the microprocessor is configured to transmit the gas quality data obtained by the gas sensor to an external device through the communication unit.
18. The nasal-plug filter device according to claim 17, wherein the second actuator comprises:
- an inlet base formed with at least one inlet hole by a silicon substrate etching process;
- a third oxide layer formed and stacked on the inlet base by deposition, wherein the third oxide layer is formed with a plurality of convergence channels and a convergence chamber by etching, and wherein the convergence channels are in communication between the at least one inlet holes of the inlet base and the convergence chamber;
- a resonance layer formed and stacked on the third oxide layer through a silicon substrate deposition process having a through hole, a vibration area, and a fixed area formed by etching, wherein the through hole is formed at a center portion of the resonance layer, the vibration area is formed on a periphery of the through hole, and the fixed area is formed on a periphery of the resonance layer;
- a fourth oxide layer formed and stacked on the resonance layer by deposition, wherein the fourth oxide layer is formed with a compression chamber area by etching;
- a vibration layer formed and stacked on the fourth oxide layer by a silicon substrate deposition process having an actuation area, an outer peripheral area, and a plurality of ventilation holes formed by etching, wherein the actuation area is formed at a center portion of the vibration layer, the outer peripheral area is formed around a periphery of the actuation area, the ventilation holes are respectively formed between the actuation area and the outer peripheral area, and a compression chamber is defined between the vibration layer and the compression chamber area of the fourth oxide layer; and
- a second piezoelectric component formed and stacked on the actuation area of the vibration layer by deposition having a second lower electrode layer, a second piezoelectric layer, a second insulation layer, and a second upper electrode layer, wherein the second lower electrode layer is formed and stacked on the actuation area of the vibration layer by deposition, the second piezoelectric layer is formed and stacked on a portion of a surface of the second lower electrode layer by deposition, the second insulation layer is formed and stacked on a portion of a surface of the second piezoelectric layer by deposition, and wherein the second upper electrode layer is formed and stacked on the surface of the second insulation layer and the remaining portion of the surface of the second piezoelectric layer which is not covered by the second insulation layer for being electrically connected to the second piezoelectric layer; and
- wherein the second piezoelectric component is capable of driving the vibration layer and the resonance layer to resonate with the second piezoelectric component, the gas outside the second actuator is then drawn into the second actuator through the at least one inlet hole, passes through the convergence channels, and then converges at the convergence chamber; and the gas further passes through the through hole of the resonance layer, and then is discharged out from the plurality of ventilation holes of the vibration layer, thereby achieving transmission of the gas.
Type: Application
Filed: Jul 14, 2021
Publication Date: Nov 24, 2022
Inventors: Hao-Jan MOU (Hsinchu City), Chi-Feng HUANG (Hsinchu City), Yung-Lung HAN (Hsinchu City), Chun-Yi KUO (Hsinchu City), Chin-Wen HSIEH (Hsinchu City), Tsung-I LIN (Hsinchu City), Yang KU (Hsinchu City)
Application Number: 17/375,446