MEMS Structure and Method of Forming Same
A microelectromechanical system (MEMS) device includes a substrate and a movable element at least partially suspended above the substrate and having at least one degree of freedom. The MEMS device further includes a protrusion extending from the substrate and configured to contact the movable element when the movable element moves in the at least one degree of freedom, wherein the protrusion comprises a surface having a water contact angle of higher than about 15° measured in air.
This application is a divisional of U.S. patent application Ser. No. 16/668,660, filed on Oct. 30, 2019, which is a continuation of U.S. patent application Ser. No. 15/859,130, filed on Dec. 29, 2017, now U.S. Pat. No. 10,541,627, issued on Jan. 21, 2020, which application is a divisional of U.S. patent application Ser. No. 14/745,696, filed on Jun. 22, 2015, now U.S. Pat. No. 9,859,819, issued on Jan. 2, 2018, which application is a divisional of U.S. patent application Ser. No. 13/219,927, filed Aug. 29, 2011, now U.S. Pat. No. 9,065,358 issued on Jun. 23, 2015, which application claims the benefit of U.S. Provisional Application No. 61/506,526, filed on Jul. 11, 2011, entitled “MEMS Structure and Method of Forming Same,” which applications are hereby incorporated herein by reference in their entirety.
BACKGROUNDMicroelectromechanical systems (MEMS) come in a variety of forms and are used for a host of different applications. Many MEMS include a movable element, such as a flexible membrane (e.g., in a deformable mirror device), a cantilevered beam (e.g., in a motion sensor), a series of fingers in a comb structure (e.g., in an accelerometer), and the like. MEMS frequently suffer from the phenomenon known as stiction. Stiction, which is derived from the words static and friction, refers to the undesirable consequence of a movable element in a MEMS device contacting and becoming stuck to a surrounding feature.
The phenomenon of stiction can arise during operation of the MEMS device and/or during manufacture of the device. Various environmental factors and processes that take place during the manufacture of a MEMS device can give rise to stiction. Wet processes, such as photoresist strips, water rinses, solvent cleans, and the like and dry processes such as plasma etch and plasma clean steps, in particular, can create circumstances wherein friction is likely to occur. This phenomenon can impede or even prevent the proper operation of the MEMS device.
What is needed, then, is a MEMS structure that can overcome the above described shortcomings in the prior art.
For a more complete understanding of the present invention, and the advantages thereof, reference is now made to the following descriptions taken in conjunction with the accompanying drawings, in which:
A first illustrative embodiment MEMS device 1 is illustrated in
One skilled in the art will recognize that substrate 6 comprises a stack of dielectric layers 8 formed atop a wafer 12. Embedded within the stack of dielectric layers are various metal interconnect features 10. Dielectric layers 8 and metal interconnects 10 are formed using known back-end-of-line (BEOL) techniques common to the semiconductor industry and are not repeated herein. As illustrated, three layers of metal interconnects are embedded within three dielectric layers, although other numbers of layers and arrangements are also within the contemplated scope of this disclosure.
Wafer 12 may comprises a bulk silicon wafer. In other embodiments, wafer 12 may comprise any semiconductor substrate, ceramic substrate, quartz substrate, or the like. In some embodiments, wafer 12 comprises a silicon-on-insulator (SOI) or other composite wafer. Active and passive components, such as transistors, diodes, resistors and the like (not shown) may be formed in and on substrate 12.
In the embodiment illustrated in
A second wafer 14 is then placed atop top dielectric layer 9. In one embodiment, wafer 14 is a silicon wafer and top dielectric layer 9 is a silicon oxide layer. Fusion bonding is employed to ensure a strong bond between wafer silicon wafer 14 and silicon oxide top dielectric layer 9. As those skilled in the art will appreciate, wafer 14 can be thinned and patterned to form movable elements 2. Electrical contact to MEMS device 1 and/or to components formed in and on wafer 12 can be made through contacts 11. The resulting structure is a MEMS device 1 having a movable element 2 that may be, but is not required to be, formed over a cavity 4, to allow for free movement in at least one axis (the z axis in the case illustrated in
MEMS device 1 further includes protrusions 16 in cavity 4. Protrusions 16 are designed and positioned such that a movable element 2 will contact one or more of protrusions 16 when the movable element 2 is deflected downward into the cavity, i.e. in the z direction. In
Protrusions 16 are formed by patterning and removing portions of top dielectric layer 9. This can be accomplished by, e.g., well known photolithography and etching steps. In some embodiments, protrusions 16 have a height sufficient to extend above any sensing electrodes which the movable element might otherwise contact. In one embodiment, the protrusions 16 have a height of about 1,000 Å.
As further illustrated in
Returning attention now to
Various alternative approaches will be apparent to those skilled in the art, informed by the present disclosure. For instance, one could introduce a switching mechanism, whereby protrusions 16/film 18 could be switchably coupled to ground, to the movable element, or to some other potential voltage. Alternatively, some protrusions could be coupled to ground, whereas other protrusions are coupled to other potentials. Whereas film 18 is illustrated as a continuous film covering (and hence electrically coupling) all protrusions within a given cavity, as a matter of design choice, film 18 could be patterned to provide different electrical paths for different protrusions. In yet another embodiment, film 18 could couple one or more protrusions 16 to a potential voltage source (not shown). This potential voltage source could be configured to provide a voltage of the opposite polarity to that voltage on movable elements 2. In this way, protrusions 16 could be configured to have an electrostatic force that repulses movable elements 2 and hence counter-acts any electrostatic attraction that otherwise exists or that is induced between movable elements 2 and protrusions 16.
The illustrated embodiments also provide advantageous features during so-called wet processes involving rinse and immersion in liquids such as water, solvents, and the like, as schematically illustrated by reference number 26 in
An illustrative method for forming illustrative MEMS device 1 is now presented with reference to
As illustrated in
As illustrated in
Film 18 is next patterned using photolithography and etching techniques to remove film 18 from much of the workpiece, but leaving film 18 coating protrusions 16. In the illustrated embodiments, film 18 also extends over to and covers contacts 11, thus electrically coupling one or more protrusions 16 to one or more contacts 11. As addressed above, in this way protrusions 16 can be electrically coupled to a desired voltage potential. In other embodiments, film 18 can be deposited or otherwise formed over protrusions 16.
Manufacture of the MEMS device continues with the process illustrated in
Next, as illustrated by
Processing then continues, as shown in
Continuing with
Generally speaking embodiments include microelectromechanical system (MEMS) device having a substrate and a movable element at least partially suspended above the substrate and having at least one degree of freedom. A protrusion extends from the substrate and is configured to contact the movable element when the movable element moves in the at least one degree of freedom. The protrusion comprises a surface having a low surface energy relative a silicon oxide surface.
Other embodiments provide for a MEMS device having a first substrate with a plurality of interconnect layers embedded in a respective plurality of stacked dielectric layers. A second substrate is mounted atop the first substrate and bonded to a topmost one of the dielectric layers. The second substrate comprises a movable element at least partially suspended above the first substrate. A protrusion extends from the first substrate and is configured so as to engage the movable element when the movable element is deflected. The protrusion comprises a conductive element electrically coupled to one of the interconnect layers.
Some aspects of the present disclosure relate to a method of forming a MEMS device. The method includes forming an interconnect layer on a first substrate and forming a dielectric layer over the interconnect layer. A protrusion is formed on a top surface of the dielectric layer, the protrusion having a low surface energy relative the surface energy of the dielectric layer. The method further includes forming an electrical path between the protrusion and a voltage potential node. The method yet further includes bonding a MEMS wafer to the dielectric layer, and patterning the MEMS wafer to form a movable element. The protrusion is in a path of movement of the movable element when the movable element is deflected in a first direction.
One general aspect of embodiments disclosed herein includes a microelectromechanical system (MEMS) device including: a substrate; a movable element at least partially suspended above the substrate and having at least one degree of freedom; and a protrusion extending from the substrate and configured to contact the movable element when the movable element moves in the at least one degree of freedom, where the protrusion includes a surface having a water contact angle of higher than about 15° measured in air.
Another general aspect of embodiments disclosed herein includes a method of forming a mems device, the method including: forming in a substrate a cavity; forming extending a floor of the cavity a protrusion, the protrusion having a surface having a water contact angle of higher than about 15° measured in air; and suspending above the cavity a movable element, the movable element having at least one degree of freedom and configured to contact the protrusion when moved in the one degree of freedom direction.
Yet another general aspect of embodiments disclosed herein includes a microelectromechanical system (MEMS) device including: a first substrate; a plurality of dielectric layers atop the first substrate, a topmost of the plurality of dielectric layers including a bonding layer having a top surface and having a cavity formed therein; a plurality of interconnect layers embedded in respective ones of the plurality of dielectric layers; a second substrate bonded to the bonding layer; a movable element formed at least in part in the second substrate and having at least one degree of freedom defining a motion path; a protrusion extending from a floor of the cavity and located in the motion path of the movable element, the protrusion having a surface having a water contact angle of higher than about 15° measured in air; and an electrical path between the protrusion and at least one of the interconnect layers.
Although embodiments of the present disclosure and their advantages have been described in detail, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the disclosure as defined by the appended claims. For example, it will be readily understood by those skilled in the art that many of the features, functions, processes, and materials described herein may be varied while remaining within the scope of the present disclosure. Moreover, the scope of the present application is not intended to be limited to the particular embodiments of the process, machine, manufacture, composition of matter, means, methods and steps described in the specification. As one of ordinary skill in the art will readily appreciate from the disclosure of the present disclosure, processes, machines, manufacture, compositions of matter, means, methods, or steps, presently existing or later to be developed, that perform substantially the same function or achieve substantially the same result as the corresponding embodiments described herein may be utilized according to the present disclosure. Accordingly, the appended claims are intended to include within their scope such processes, machines, manufacture, compositions of matter, means, methods, or steps.
Claims
1. A method of forming a MEMS device, the method comprising:
- forming a cavity in a first substrate;
- patterning a second substrate to form a series of interdigitated fingers, wherein each of the series of interdigitated fingers is fixed at one end and is free at another end;
- mounting the second substrate atop the first substrate, wherein free ends of the series of interdigitated fingers extend over the cavity;
- forming a plurality of protrusions extending from a floor of the cavity, wherein a first interdigitated finger of the series of interdigitated fingers will contact a first protrusion of the plurality of protrusions when the series of interdigitated fingers are deflected downwards towards the floor of the cavity;
- electrically coupling the first protrusion of the plurality of protrusions to the series of interdigitated fingers; and
- electrically coupling a second protrusion of the plurality of protrusions to a potential voltage node that provides a voltage of an opposite polarity to that of a voltage on the series of interdigitated fingers.
2. The method of claim 1, wherein the plurality of protrusions have a lower surface energy than a surface energy of a material of the floor of the cavity.
3. The method of claim 1, wherein mounting the second substrate atop the first substrate comprises bonding a silicon surface of the second substrate to a silicon oxide surface of the first substrate.
4. The method of claim 1, further comprising electrically coupling the plurality of protrusions to a contact.
5. The method of claim 1, wherein forming the plurality of protrusions extending from the floor of the cavity comprises:
- blanket etching first portions of the first substrate; and
- after blanket etching the first portions of the first substrate, selectively etching second portions of the first substrate.
6. The method of claim 5, wherein forming the plurality of protrusions further comprises:
- after selectively etching the second portions of the first substrate, depositing a conductive material over remaining portions of the first substrate, the conductive material having a water contact angle in a range from 20° to 50°.
7. The method of claim 6, wherein the conductive material comprises TiN.
8. A method of forming a MEMS device, the method comprising:
- etching a first cavity and a second cavity in a topmost dielectric layer of a first substrate, a portion of the topmost dielectric layer being disposed between the first cavity and the second cavity;
- forming a first protrusion on a floor of the first cavity, and a second protrusion on a floor of the second cavity, wherein each of the first protrusion and the second protrusion have a low surface energy relative to the surface energy of a material of the topmost dielectric layer;
- bonding a second substrate to the first substrate; and
- after bonding the second substrate to the first substrate, patterning the second substrate to form a first movable element at least partially suspended above the first cavity, wherein the first protrusion is in a path of movement of the first movable element when the first movable element is deflected in a first direction.
9. The method of claim 8, wherein after bonding the second substrate to the first substrate, patterning the second substrate to form a second movable element at least partially suspended above the second cavity, wherein the second protrusion is in a path of movement of the second movable element when the second movable element is deflected in the first direction.
10. The method of claim 8, wherein the first substrate further comprises:
- a plurality of stacked dielectric layers beneath the topmost dielectric layer, the plurality of stacked dielectric layers having a plurality of interconnect layers formed therein.
11. The method of claim 8, wherein forming the first protrusion on the floor of the first cavity comprises:
- patterning the floor of the first cavity to form a protrusion extending therefrom; and
- depositing a first conductive film over a top surface and sidewalls of the protrusion, the first conductive film being electrically coupled to a first contact on the floor of the first cavity.
12. The method of claim 11, wherein forming the first protrusion on the floor of the first cavity further comprises depositing a second conductive film over the first conductive film, wherein the first conductive film comprises TiN, and the second conductive film comprises AlCu.
13. The method of claim 11, wherein the first protrusion comprises a surface that has a water contact angle that is higher than 15°, when measured in air.
14. The method of claim 11, wherein the second protrusion on the floor of the second cavity is electrically coupled to a second contact on the floor of the second cavity.
15. A method of forming a MEMS device, the method comprising:
- forming a cavity in a substrate;
- forming a protrusion that extends from a floor of the cavity, the protrusion comprising: a dielectric layer; and a conductive film over sidewalls and a top surface of the dielectric layer, wherein a first material of the conductive film has a low surface energy relative to the surface energy of a second material of the dielectric layer; and
- positioning a movable element above the cavity such that the movable element is configured to contact the protrusion when the movable element is deflected vertically downwards into the cavity.
16. The method of claim 15, further comprising:
- performing a wet process, wherein during the wet process, a liquid will occupy a space between the protrusion and the movable element, wherein a contact angle between the liquid and surfaces of the protrusion is in a range from 20° to 50°.
17. The method of claim 15, wherein the conductive film comprises TiN.
18. The method of claim 15, wherein the conductive film comprises amorphous carbon.
19. The method of claim 15, wherein the movable element comprises a membrane, a cantilever beam, or a comb structure.
20. The method of claim 15, wherein the protrusion is configured to be switchably coupled to a ground potential node or a potential voltage node.
Type: Application
Filed: Jul 3, 2023
Publication Date: Nov 2, 2023
Inventors: Yi Heng Tsai (Hsinchu), Chia-Hua Chu (Zhubei), Kuei-Sung Chang (Kaohsiung)
Application Number: 18/346,548