Method for improving photoimage quality
The instant invention pertains to a method of improving the quality and resolution of photoimages by incorporating into the photocurable resin composition to be used a selected amount of a polymerization inhibitor so that photopolymerization of the photocurable resin is inhibited in those areas not directly impinged by light.
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Claims
1. A process to reduce the undesired polymerization caused by scattered and diffused light in a photopolymerizable material and to improve the quality and resolution of the final developed image formed by the irradiation of said photopolymerizable material by light, wherein the process comprises
- adding to the photopolymerizable material an effective inhibiting amount of an inhibitor which is bis(1-oxyl-2,2,6,6-tetra-methylpiperidin-4-yl) sebacate, wherein the amount of said inhibitor is sufficient to prevent or mitigate polymerization by diffused or scattered light, but is insufficient to prevent polymerization of the photopolyrnerizable material irradiated directly by light.
2. A process according to claim 1 wherein the polymerization inhibitor is present in an effective inhibiting amount of 0.0001 to 0.2% by weight of the total composition.
3. A process according to claim 1 wherein the light is actinic light.
4. A process according to claim 1 wherein irradiation of the light occurs through a photomask.
5. A photosensitive resin composition for preparing a relief printing plate, an etch resist, a solder mask or a screen printing stencil which comprises
- (A) from 5 to 98% by weight, based on the total weight of the components (A), (B), (C) and (D), of a polymer selected from the group consisting of an oligomer, a binder polymer and a mixture thereof,
- (B) from 1.0 to 94% by weight, based on the total weight of components (A), (B), (C) and (D), of an ethylenically unsaturated monomer,
- (C) from 0.001 to 10% by weight, based on the total weight of components (A), (B), (C) and (D), of a photopolymerization initiator selected from the group consisting of an acetophenone, a benzoin, a benzophenone, an anthraquinone, a xanthone, a thioxanthrone, and a mixture of one or more of these initiators, and
- (D) from 0.0001 to 0.2% by weight, based on the total weight of components (A), (B), (C) and (D), of a polymerization inhibitor which is bis(1-oxyl-2,2,6,6-tetramethylpiperidin-4-yl) sebacate.
6. A composition according to claim 5 which additionally contains component (E) which is from 0.05 to 10% by weight, based on the total weight of the composition, of a hindered amine containing a 2,2,6,6-tetramethylpiperldine moiety.
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Type: Grant
Filed: Mar 12, 1997
Date of Patent: Jun 15, 1999
Assignee: Ciba Specialty Chemicals Corporation (Tarrytown, NY)
Inventors: Chia-Hu Chang (New City, NY), Andrew Mar (Norwalk, CT), Thai Hong Nguyen (Airmont, NY), Harry Joseph Evers (Clinton Corners, NY), Hugh Stephen Laver (Reinach)
Primary Examiner: Cynthia Hamilton
Attorney: Luther A. R. Hall
Application Number: 8/820,322
International Classification: G03F 7028;
