Mask
Description
The broken lines in the drawings illustrate portions of the mask that form no part of the claimed design.
Claims
The ornamental design for a mask design as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
Other references
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Patent History
Patent number: D1001998
Type: Grant
Filed: Jun 21, 2019
Date of Patent: Oct 17, 2023
Inventor: Benjamin Emery (Casper, WY)
Primary Examiner: Samantha Wood
Assistant Examiner: Aula Soroush
Application Number: 29/695,829
Type: Grant
Filed: Jun 21, 2019
Date of Patent: Oct 17, 2023
Inventor: Benjamin Emery (Casper, WY)
Primary Examiner: Samantha Wood
Assistant Examiner: Aula Soroush
Application Number: 29/695,829
Classifications
Current U.S. Class:
Mask (D24/110.1)