Face mask
Latest HONEYWELL INTERNATIONAL INC. Patents:
Description
The broken lines depict portions of the face mask that form no part of the claimed design.
Claims
We claim the ornamental design for a face mask, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
Other references
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Patent History
Patent number: D1007670
Type: Grant
Filed: Mar 31, 2021
Date of Patent: Dec 12, 2023
Assignee: HONEYWELL INTERNATIONAL INC. (Charlotte, NC)
Inventors: Jana Bacinska (Brno), Daniel Yee (Santa Margarita, CA), Mark Peurifoy (Phoenix, AZ), Marie K. Hammer (Smithfield, RI), Sayanti Basu (Fort Mill, SC), José Antonio Fosado Rodríguez (Santa Bárbara), Alex Rochat (Ames, IA)
Primary Examiner: Kendra Leslie Hamilton
Assistant Examiner: Elizabeth S Struble
Application Number: 29/776,717
Type: Grant
Filed: Mar 31, 2021
Date of Patent: Dec 12, 2023
Assignee: HONEYWELL INTERNATIONAL INC. (Charlotte, NC)
Inventors: Jana Bacinska (Brno), Daniel Yee (Santa Margarita, CA), Mark Peurifoy (Phoenix, AZ), Marie K. Hammer (Smithfield, RI), Sayanti Basu (Fort Mill, SC), José Antonio Fosado Rodríguez (Santa Bárbara), Alex Rochat (Ames, IA)
Primary Examiner: Kendra Leslie Hamilton
Assistant Examiner: Elizabeth S Struble
Application Number: 29/776,717
Classifications
Current U.S. Class:
Mask (D24/110.1)