Face mask

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Description

FIG. 1 is a front, right perspective view of a face mask showing the new design;

FIG. 2 is a rear, left perspective view thereof;

FIG. 3 is a front elevation view thereof;

FIG. 4 is a rear elevation view thereof;

FIG. 5 is a right side elevation view thereof;

FIG. 6 is a left side elevation view thereof;

FIG. 7 is a top plan view thereof; and,

FIG. 8 is a bottom plan view thereof.

The broken lines depict portions of the face mask that form no part of the claimed design.

Claims

We claim the ornamental design for a face mask, as shown and described.

Referenced Cited
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Foreign Patent Documents
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Other references
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Patent History
Patent number: D1007670
Type: Grant
Filed: Mar 31, 2021
Date of Patent: Dec 12, 2023
Assignee: HONEYWELL INTERNATIONAL INC. (Charlotte, NC)
Inventors: Jana Bacinska (Brno), Daniel Yee (Santa Margarita, CA), Mark Peurifoy (Phoenix, AZ), Marie K. Hammer (Smithfield, RI), Sayanti Basu (Fort Mill, SC), José Antonio Fosado Rodríguez (Santa Bárbara), Alex Rochat (Ames, IA)
Primary Examiner: Kendra Leslie Hamilton
Assistant Examiner: Elizabeth S Struble
Application Number: 29/776,717
Classifications
Current U.S. Class: Mask (D24/110.1)