Respirator
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Description
In the drawings, the equal-length broken lines depict portions of the respirator that form no part of the claimed design.
Claims
The ornamental design for a respirator, as shown and described herein.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
Other references
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- “Leeko: Anti-Dust Spray Chemical Gas Dual Cartridge Respirator”. Found online at Amazon.com. Aug. 11, 2022. Reference dated Oct. 13, 2016. Retrieved from https://www.amazon.com/Leeko-Anti-dust-Cartridge-Respirator-Activated/dp/B01M4ILLSI?th=1.
- “3M: 53P71 Large Dual Cartridge OV/P95 Respirator”. Found online at Amazon.com. Aug. 11, 2022. Reference dated Jan. 6, 2005. Retrieved from https://www.amazon.com/3M-53P71-Cartridge-Respirator-Assembly/dp/B000BQ8DJI.
- “Vktech: Industrial Gas Chemical Anti-Dust Respirator Mask”. Found online at Amazon.com. Aug. 11, 2022. Reference dated Jan. 16, 2013. Retrieved from https://www.amazon.com/Vktech-Industrial-Chemical-Anti-Dust-Respirator/dp/B00B1YP7U2/.
- “Globe Newswire: Cool, Comfortable, and Optically Clear Mask by Omni Labs Protects with 99.997% Filtration.” Found online at globenewswire.com. Sep. 29, 2022. Reference dated Sep. 23, 2021. Retrieved from https://www.globenewswire.com/en/news-release/2021/09/23/2302580/0/en/Cool-Comfortable-and-Optically-Clear-Mask-By-O.
Patent History
Patent number: D1028221
Type: Grant
Filed: Feb 25, 2021
Date of Patent: May 21, 2024
Assignee: Omnimask LLC (Lafayette, CA)
Inventors: Marc Lurie (Lafayette, CA), Attila Vass (Lafayette, CA)
Primary Examiner: Kendra Leslie Hamilton
Assistant Examiner: Elizabeth S Struble
Application Number: 29/771,847
Type: Grant
Filed: Feb 25, 2021
Date of Patent: May 21, 2024
Assignee: Omnimask LLC (Lafayette, CA)
Inventors: Marc Lurie (Lafayette, CA), Attila Vass (Lafayette, CA)
Primary Examiner: Kendra Leslie Hamilton
Assistant Examiner: Elizabeth S Struble
Application Number: 29/771,847
Classifications
Current U.S. Class:
Mask (D24/110.1)