Face mask
Latest HONEYWELL INTERNATIONAL INC. Patents:
Description
In the drawings, the equal-length broken lines depict elements of the face mask that form no part of the claimed design.
Claims
We claim the ornamental design for a face mask, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
Other references
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Patent History
Patent number: D1035863
Type: Grant
Filed: Mar 31, 2021
Date of Patent: Jul 16, 2024
Assignee: HONEYWELL INTERNATIONAL INC. (Charlotte, NC)
Inventors: Jana Bacinska (Brno), Daniel Yee (Santa Margarita, CA), Mark Peurifoy (Phoenix, AZ), Marie K. Hammer (Smithfield, RI), Sayanti Basu (Fort Mill, SC), José Antonio Fosado Rodríguez (Santa Bárbara), Alex Rochat (Ames, IA)
Primary Examiner: Kendra Leslie Hamilton
Assistant Examiner: Elizabeth S Struble
Application Number: 29/776,722
Type: Grant
Filed: Mar 31, 2021
Date of Patent: Jul 16, 2024
Assignee: HONEYWELL INTERNATIONAL INC. (Charlotte, NC)
Inventors: Jana Bacinska (Brno), Daniel Yee (Santa Margarita, CA), Mark Peurifoy (Phoenix, AZ), Marie K. Hammer (Smithfield, RI), Sayanti Basu (Fort Mill, SC), José Antonio Fosado Rodríguez (Santa Bárbara), Alex Rochat (Ames, IA)
Primary Examiner: Kendra Leslie Hamilton
Assistant Examiner: Elizabeth S Struble
Application Number: 29/776,722
Classifications
Current U.S. Class:
Mask (D24/110.1)